DE60310068D1 - Verfahren und vorrichtung zur abstimmbaren wellenlängenwandlung mittels eines bragg-gitters und laser in einem halbleitersubstrat - Google Patents
Verfahren und vorrichtung zur abstimmbaren wellenlängenwandlung mittels eines bragg-gitters und laser in einem halbleitersubstratInfo
- Publication number
- DE60310068D1 DE60310068D1 DE60310068T DE60310068T DE60310068D1 DE 60310068 D1 DE60310068 D1 DE 60310068D1 DE 60310068 T DE60310068 T DE 60310068T DE 60310068 T DE60310068 T DE 60310068T DE 60310068 D1 DE60310068 D1 DE 60310068D1
- Authority
- DE
- Germany
- Prior art keywords
- wavelength
- optical signal
- semiconductor substrate
- laser
- modulated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/34—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers
- H01S5/3401—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having no PN junction, e.g. unipolar lasers, intersubband lasers, quantum cascade lasers
- H01S5/3402—Structure or shape of the active region; Materials used for the active region comprising quantum well or superlattice structures, e.g. single quantum well [SQW] lasers, multiple quantum well [MQW] lasers or graded index separate confinement heterostructure [GRINSCH] lasers having no PN junction, e.g. unipolar lasers, intersubband lasers, quantum cascade lasers intersubband lasers, e.g. transitions within the conduction or valence bands
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/0607—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature
- H01S5/0608—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying physical parameters other than the potential of the electrodes, e.g. by an electric or magnetic field, mechanical deformation, pressure, light, temperature controlled by light, e.g. optical switch
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/50—Amplifier structures not provided for in groups H01S5/02 - H01S5/30
- H01S5/5054—Amplifier structures not provided for in groups H01S5/02 - H01S5/30 in which the wavelength is transformed by non-linear properties of the active medium, e.g. four wave mixing
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Biophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Semiconductor Lasers (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US171731 | 1988-04-05 | ||
US10/171,731 US6788727B2 (en) | 2002-06-13 | 2002-06-13 | Method and apparatus for tunable wavelength conversion using a bragg grating and a laser in a semiconductor substrate |
PCT/US2003/015420 WO2003107498A1 (en) | 2002-06-13 | 2003-05-15 | Method and apparatus for tunable wavelength conversion using a bragg grating and a laser in a semiconductor substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60310068D1 true DE60310068D1 (de) | 2007-01-11 |
DE60310068T2 DE60310068T2 (de) | 2007-07-05 |
Family
ID=29732842
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60310068T Expired - Lifetime DE60310068T2 (de) | 2002-06-13 | 2003-05-15 | Verfahren und vorrichtung zur abstimmbaren wellenlängenwandlung mittels eines bragg-gitters und laser in einem halbleitersubstrat |
Country Status (9)
Country | Link |
---|---|
US (1) | US6788727B2 (de) |
EP (1) | EP1512205B1 (de) |
JP (1) | JP4299240B2 (de) |
CN (1) | CN100344034C (de) |
AT (1) | ATE347186T1 (de) |
AU (1) | AU2003234614A1 (de) |
DE (1) | DE60310068T2 (de) |
TW (1) | TWI242657B (de) |
WO (1) | WO2003107498A1 (de) |
Families Citing this family (38)
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US6512385B1 (en) | 1999-07-26 | 2003-01-28 | Paul Pfaff | Method for testing a device under test including the interference of two beams |
GB0115657D0 (en) * | 2001-06-27 | 2001-08-15 | Univ Southampton | High quality surface engineering of domain structures in congruent lithium niobate single crystals |
US9952161B2 (en) | 2001-12-06 | 2018-04-24 | Attofemto, Inc. | Methods for obtaining and analyzing digital interferometric data for computer testing and developing semiconductor and anisotropic devices and materials |
US7733499B2 (en) | 2001-12-06 | 2010-06-08 | Attofemto, Inc. | Method for optically testing semiconductor devices |
US8462350B2 (en) | 2001-12-06 | 2013-06-11 | Attofemto, Inc. | Optically enhanced holographic interferometric testing methods for the development and evaluation of semiconductor devices, materials, wafers, and for monitoring all phases of development and manufacture |
US6649990B2 (en) * | 2002-03-29 | 2003-11-18 | Intel Corporation | Method and apparatus for incorporating a low contrast interface and a high contrast interface into an optical device |
US6788727B2 (en) | 2002-06-13 | 2004-09-07 | Intel Corporation | Method and apparatus for tunable wavelength conversion using a bragg grating and a laser in a semiconductor substrate |
US20040258360A1 (en) * | 2003-03-25 | 2004-12-23 | Lim Desmond R. | External gain element with mode converter and high index contrast waveguide |
US7555173B2 (en) * | 2003-04-09 | 2009-06-30 | Cornell Research Foundation, Inc. | Electro-optic modulator on rib waveguide |
US8086103B2 (en) * | 2004-04-29 | 2011-12-27 | Alcatel Lucent | Methods and apparatus for communicating dynamic optical wavebands (DOWBs) |
KR100579512B1 (ko) | 2004-12-08 | 2006-05-15 | 삼성전자주식회사 | 자체적으로 파장가변 레이저 광원을 생성하는 파장변환기 |
US20070280326A1 (en) * | 2005-12-16 | 2007-12-06 | Sioptical, Inc. | External cavity laser in thin SOI with monolithic electronics |
KR100908239B1 (ko) * | 2006-12-06 | 2009-07-20 | 한국전자통신연구원 | 채널 통과/결합 광 모듈 및 이를 이용한 oadm노드에서의 채널 통과/결합 방법 |
JP2010165994A (ja) * | 2009-01-19 | 2010-07-29 | Hamamatsu Photonics Kk | 量子カスケードレーザ |
CN101614879B (zh) * | 2009-07-24 | 2011-01-26 | 北京工业大学 | 窄带光滤波器 |
JP5552793B2 (ja) * | 2009-10-20 | 2014-07-16 | 住友電気工業株式会社 | 半導体回折格子素子、及び、半導体レーザ |
EP2403079B1 (de) * | 2010-06-30 | 2014-01-15 | Alcatel Lucent | Reflektiver optischer Halbleiterverstärker für optische Netzwerke |
WO2012021333A2 (en) * | 2010-08-11 | 2012-02-16 | President And Fellows Of Harvard College | Broadband quantum cascade laser source |
CN102044844B (zh) * | 2010-11-24 | 2012-05-23 | 中国科学院半导体研究所 | 分布放大的取样光栅分布布拉格反射可调谐激光器 |
FR2973594B1 (fr) * | 2011-03-31 | 2013-03-29 | Thales Sa | Systeme d'emission de signal optique |
CN102394471B (zh) * | 2011-08-13 | 2012-12-05 | 重庆大学 | 量子级联激光器全光相位调制系统 |
WO2012119391A1 (zh) * | 2011-08-16 | 2012-09-13 | 华为技术有限公司 | 可调激光器、光模块和无源光网络系统 |
JP5941655B2 (ja) * | 2011-10-28 | 2016-06-29 | 浜松ホトニクス株式会社 | 量子カスケードレーザ |
TWI595219B (zh) * | 2012-05-08 | 2017-08-11 | Sony Corp | Infrared conversion element, imaging device and imaging method |
GB201208335D0 (en) * | 2012-05-14 | 2012-06-27 | Copner Nigel J | Fast optical wavelength conversion |
WO2014018776A1 (en) * | 2012-07-26 | 2014-01-30 | Massachusetts Institute Of Technology | Photonic integrated circuits based on quantum cascade structures |
GB2506439A (en) * | 2012-10-01 | 2014-04-02 | Univ Cardiff | Lasing device with grating |
US9231368B2 (en) | 2012-11-30 | 2016-01-05 | Thorlabs Quantum Electronics, Inc. | Passive waveguide structure with alternating GaInAs/AlInAs layers for mid-infrared optoelectronic devices |
EP2926421B1 (de) * | 2012-11-30 | 2020-09-09 | Thorlabs Quantum Electronics, Inc. | Mehrwellenlängen-quantenkaskadenlaser mittels wachstum verschiedener aktiver und passiver kerne |
US20140185980A1 (en) * | 2012-12-31 | 2014-07-03 | Futurewei Technologies, Inc. | Silicon-On-Insulator Platform for Integration of Tunable Laser Arrays |
US9817190B2 (en) | 2013-10-24 | 2017-11-14 | Chemoptics Inc. | Tunable wavelength filter with embedded metal temperature sensor and its application to external-cavity type tunable wavelength laser |
US9588360B2 (en) * | 2014-03-31 | 2017-03-07 | Mellanox Technologies Silicon Photonics Inc. | Temperature control of components on an optical device |
JP2016072300A (ja) * | 2014-09-26 | 2016-05-09 | 住友電気工業株式会社 | 量子カスケード半導体レーザ |
JP2016072302A (ja) | 2014-09-26 | 2016-05-09 | 住友電気工業株式会社 | 量子カスケード半導体レーザ |
JP6464895B2 (ja) * | 2015-04-03 | 2019-02-06 | 住友電気工業株式会社 | 量子カスケード半導体レーザ |
CN108168438B (zh) * | 2017-12-28 | 2020-02-14 | 长春禹衡光学有限公司 | 一种封闭式光栅 |
CN110380326B (zh) * | 2019-07-29 | 2020-10-23 | 武汉电信器件有限公司 | 一种光信号输出装置及方法、存储介质 |
US11381056B2 (en) * | 2020-02-28 | 2022-07-05 | Silc Technologies, Inc. | Laser cavity construction for reduced wavelengths |
Family Cites Families (22)
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US5253314A (en) * | 1992-01-31 | 1993-10-12 | At&T Bell Laboratories | Tunable optical waveguide coupler |
US5379318A (en) * | 1994-01-31 | 1995-01-03 | Telefonaktiebolaget L M Ericsson | Alternating grating tunable DBR laser |
US5509025A (en) * | 1994-04-04 | 1996-04-16 | At&T Corp. | Unipolar semiconductor laser |
US5499256A (en) * | 1995-02-14 | 1996-03-12 | Deacon Research | Polarized frequency-selective optical source |
US5511083A (en) * | 1995-03-02 | 1996-04-23 | United Technologies Corporation | Polarized fiber laser source |
JPH09102643A (ja) | 1995-10-03 | 1997-04-15 | Nippon Telegr & Teleph Corp <Ntt> | 光波長変換回路 |
US7226966B2 (en) * | 2001-08-03 | 2007-06-05 | Nanogram Corporation | Structures incorporating polymer-inorganic particle blends |
US6014480A (en) * | 1997-11-21 | 2000-01-11 | Hewlett-Packard Company | Optical energy selector apparatus and method |
GB2325334B (en) * | 1998-07-10 | 1999-04-14 | Bookham Technology Ltd | External cavity laser |
US6055254A (en) * | 1998-09-23 | 2000-04-25 | Lucent Technologies Inc. | Quantum cascade light emitter with pre-biased internal electronic potential |
CN1329722A (zh) * | 1998-12-04 | 2002-01-02 | 塞德拉公司 | 压缩调谐的布拉格光栅和激光器 |
US6438277B1 (en) * | 1999-06-03 | 2002-08-20 | Fitel Usa Corp. | Stabilized thermally tunable optical waveguide devices and communication systems employing them |
US6510167B1 (en) * | 1999-09-22 | 2003-01-21 | Science & Technology Corporation @Unm | Method for actively modelocking an all-fiber laser |
US6527398B1 (en) * | 2000-06-08 | 2003-03-04 | Gregory J. Fetzer | Tubular-waveguide gas sample chamber for optical spectrometer, and related methods |
CN1114977C (zh) * | 2000-07-06 | 2003-07-16 | 中国科学院半导体研究所 | 选择区域外延制作电吸收调制分布反馈激光器的方法 |
GB2365620A (en) | 2000-08-07 | 2002-02-20 | Imperial College | Optical wavelength shifting by semiconductor intersubband laser |
US6470036B1 (en) * | 2000-11-03 | 2002-10-22 | Cidra Corporation | Tunable external cavity semiconductor laser incorporating a tunable bragg grating |
US6853671B2 (en) * | 2001-06-13 | 2005-02-08 | Intel Corporation | Method and apparatus for tuning a laser with a Bragg grating in a semiconductor substrate |
US6882776B2 (en) * | 2001-11-06 | 2005-04-19 | Intel Corporation | Method and apparatus of a semiconductor-based gain equalization device for optical amplifiers |
US6628450B2 (en) * | 2001-11-15 | 2003-09-30 | Intel Corporation | Method and apparatus for phase-shifting an optical beam in a semiconductor substrate |
US6785430B2 (en) * | 2002-02-25 | 2004-08-31 | Intel Corporation | Method and apparatus for integrating an optical transmit module |
US6788727B2 (en) | 2002-06-13 | 2004-09-07 | Intel Corporation | Method and apparatus for tunable wavelength conversion using a bragg grating and a laser in a semiconductor substrate |
-
2002
- 2002-06-13 US US10/171,731 patent/US6788727B2/en not_active Expired - Lifetime
-
2003
- 2003-05-15 DE DE60310068T patent/DE60310068T2/de not_active Expired - Lifetime
- 2003-05-15 AU AU2003234614A patent/AU2003234614A1/en not_active Abandoned
- 2003-05-15 JP JP2004514193A patent/JP4299240B2/ja not_active Expired - Fee Related
- 2003-05-15 EP EP03728956A patent/EP1512205B1/de not_active Expired - Lifetime
- 2003-05-15 CN CNB038137704A patent/CN100344034C/zh not_active Expired - Fee Related
- 2003-05-15 AT AT03728956T patent/ATE347186T1/de not_active IP Right Cessation
- 2003-05-15 WO PCT/US2003/015420 patent/WO2003107498A1/en active IP Right Grant
- 2003-06-12 TW TW092115973A patent/TWI242657B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
ATE347186T1 (de) | 2006-12-15 |
EP1512205A1 (de) | 2005-03-09 |
US20030231686A1 (en) | 2003-12-18 |
WO2003107498A1 (en) | 2003-12-24 |
AU2003234614A1 (en) | 2003-12-31 |
JP4299240B2 (ja) | 2009-07-22 |
CN1659752A (zh) | 2005-08-24 |
CN100344034C (zh) | 2007-10-17 |
TW200405049A (en) | 2004-04-01 |
US6788727B2 (en) | 2004-09-07 |
JP2005525707A (ja) | 2005-08-25 |
DE60310068T2 (de) | 2007-07-05 |
TWI242657B (en) | 2005-11-01 |
EP1512205B1 (de) | 2006-11-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |