DE60237485D1 - Poliervorrichtung - Google Patents

Poliervorrichtung

Info

Publication number
DE60237485D1
DE60237485D1 DE60237485T DE60237485T DE60237485D1 DE 60237485 D1 DE60237485 D1 DE 60237485D1 DE 60237485 T DE60237485 T DE 60237485T DE 60237485 T DE60237485 T DE 60237485T DE 60237485 D1 DE60237485 D1 DE 60237485D1
Authority
DE
Germany
Prior art keywords
polisher
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60237485T
Other languages
English (en)
Inventor
Tetsuji Togawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Application granted granted Critical
Publication of DE60237485D1 publication Critical patent/DE60237485D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B24B37/30—Work carriers for single side lapping of plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00—Drives or gearings; Equipment therefor
    • B24B47/02—Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables
    • B24B47/06—Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables by liquid or gas pressure only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
DE60237485T 2001-03-16 2002-03-15 Poliervorrichtung Expired - Lifetime DE60237485D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001077133A JP3922887B2 (ja) 2001-03-16 2001-03-16 ドレッサ及びポリッシング装置

Publications (1)

Publication Number Publication Date
DE60237485D1 true DE60237485D1 (de) 2010-10-14

Family

ID=18933937

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60237485T Expired - Lifetime DE60237485D1 (de) 2001-03-16 2002-03-15 Poliervorrichtung

Country Status (5)

Country Link
US (3) US6957998B2 (de)
EP (1) EP1240977B1 (de)
JP (1) JP3922887B2 (de)
KR (1) KR100870941B1 (de)
DE (1) DE60237485D1 (de)

Families Citing this family (47)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100470227B1 (ko) * 2001-06-07 2005-02-05 두산디앤디 주식회사 화학기계적 연마장치의 캐리어 헤드
US7101799B2 (en) 2001-06-19 2006-09-05 Applied Materials, Inc. Feedforward and feedback control for conditioning of chemical mechanical polishing pad
KR100688712B1 (ko) * 2002-09-17 2007-02-28 동부일렉트로닉스 주식회사 폴리싱 하우징의 가스누출부위 확인장치
JP4448297B2 (ja) * 2002-12-27 2010-04-07 株式会社荏原製作所 基板研磨装置及び基板研磨方法
US6945845B2 (en) * 2003-03-04 2005-09-20 Applied Materials, Inc. Chemical mechanical polishing apparatus with non-conductive elements
JP2004342751A (ja) * 2003-05-14 2004-12-02 Toshiba Corp Ｃｍｐ用スラリー、研磨方法、および半導体装置の製造方法
JP4718107B2 (ja) * 2003-05-20 2011-07-06 株式会社荏原製作所 基板保持装置及び研磨装置
JP2005034959A (ja) * 2003-07-16 2005-02-10 Ebara Corp 研磨装置及びリテーナリング
US20050167275A1 (en) 2003-10-22 2005-08-04 Arthur Keigler Method and apparatus for fluid processing a workpiece
US7727366B2 (en) * 2003-10-22 2010-06-01 Nexx Systems, Inc. Balancing pressure to improve a fluid seal
US6918821B2 (en) * 2003-11-12 2005-07-19 Dow Global Technologies, Inc. Materials and methods for low pressure chemical-mechanical planarization
US20050283993A1 (en) * 2004-06-18 2005-12-29 Qunwei Wu Method and apparatus for fluid processing and drying a workpiece
JP2006090453A (ja) * 2004-09-24 2006-04-06 Tokiko Techno Kk ガス供給装置
JP4453019B2 (ja) * 2005-03-25 2010-04-21 富士フイルム株式会社 ラビング方法、光学フィルムの製造方法及び装置
JP4814677B2 (ja) * 2006-03-31 2011-11-16 株式会社荏原製作所 基板保持装置および研磨装置
EP2024136A2 (de) * 2006-05-02 2009-02-18 Nxp B.V. Lösen von wafern
US7402098B2 (en) * 2006-10-27 2008-07-22 Novellus Systems, Inc. Carrier head for workpiece planarization/polishing
US7335092B1 (en) * 2006-10-27 2008-02-26 Novellus Systems, Inc. Carrier head for workpiece planarization/polishing
TWI367524B (en) * 2007-08-01 2012-07-01 Univ Nat Taiwan Science Tech Chemical mechanical polishing apparatus and chemical mechanical polishing method thereof
JP5144191B2 (ja) * 2007-09-21 2013-02-13 株式会社ディスコ 研削装置のチャックテーブル機構
JP4658182B2 (ja) * 2007-11-28 2011-03-23 株式会社荏原製作所 研磨パッドのプロファイル測定方法
JP2010036284A (ja) * 2008-08-01 2010-02-18 Tokyo Seimitsu Co Ltd 金属コンタミレス研磨ヘッド
KR101057228B1 (ko) * 2008-10-21 2011-08-16 주식회사 엘지실트론 경면연마장치의 가압헤드
DE102008061267A1 (de) * 2008-12-10 2010-06-24 Schneider Gmbh & Co. Kg Poliervorrichtung mit Drehdurchführung
JP5236515B2 (ja) * 2009-01-28 2013-07-17 株式会社荏原製作所 ドレッシング装置、化学的機械的研磨装置及び方法
KR101022277B1 (ko) * 2009-02-25 2011-03-21 그린스펙(주) 실리콘 베어 웨이퍼 연마장치용 캐리어 헤드
CN102205522B (zh) * 2011-05-24 2013-01-30 清华大学 用于化学机械抛光的气路正压系统及化学机械抛光设备
WO2013134075A1 (en) 2012-03-08 2013-09-12 Applied Materials, Inc. Detecting membrane breakage in a carrier head
JP5789634B2 (ja) * 2012-05-14 2015-10-07 株式会社荏原製作所 ワークピースを研磨するための研磨パッド並びに化学機械研磨装置、および該化学機械研磨装置を用いてワークピースを研磨する方法
KR101579591B1 (ko) * 2014-06-19 2015-12-23 주식회사 알앤비 폴리싱 헤드용 시편 가압 실린더
KR102173323B1 (ko) 2014-06-23 2020-11-04 삼성전자주식회사 캐리어 헤드, 화학적 기계식 연마 장치 및 웨이퍼 연마 방법
JP6535529B2 (ja) * 2015-07-08 2019-06-26 不二越機械工業株式会社 両面研磨装置の研磨布のドレッシング装置およびドレッシング方法
SG10201606197XA (en) 2015-08-18 2017-03-30 Ebara Corp Substrate adsorption method, substrate holding apparatus, substrate polishing apparatus, elastic film, substrate adsorption determination method for substrate holding apparatus, and pressure control method for substrate holding apparatus
JP6353418B2 (ja) * 2015-08-18 2018-07-04 株式会社荏原製作所 基板吸着方法、トップリングおよび基板研磨装置
JP6721967B2 (ja) * 2015-11-17 2020-07-15 株式会社荏原製作所 バフ処理装置および基板処理装置
JP6713377B2 (ja) * 2016-08-10 2020-06-24 エイブリック株式会社 研磨ヘッド、研磨ヘッドを有するｃｍｐ研磨装置およびそれを用いた半導体集積回路装置の製造方法
CN106425861B (zh) * 2016-12-06 2018-08-31 重庆市江津区前进焊接材料厂 一种压力稳定的手持抛光机的控制系统
JP6927560B2 (ja) * 2017-01-10 2021-09-01 不二越機械工業株式会社 ワーク研磨ヘッド
JP6757696B2 (ja) * 2017-04-21 2020-09-23 株式会社荏原製作所 漏れ検査方法、およびこの漏れ検査方法を実行するためのプログラムを記録したコンピュータ読み取り可能な記録媒体
KR102652046B1 (ko) * 2018-10-01 2024-03-29 주식회사 케이씨텍 화학 기계적 연마 장치의 컨디셔너
JP7058209B2 (ja) * 2018-11-21 2022-04-21 株式会社荏原製作所 基板ホルダに基板を保持させる方法
CN109664188B (zh) * 2018-12-14 2020-05-22 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） 晶圆片装卸装置
KR20200127328A (ko) * 2019-05-02 2020-11-11 삼성전자주식회사 컨디셔너, 이를 포함하는 화학 기계적 연마 장치 및 이 장치를 이용한 반도체 장치의 제조 방법
US11325223B2 (en) * 2019-08-23 2022-05-10 Applied Materials, Inc. Carrier head with segmented substrate chuck
WO2021262521A1 (en) * 2020-06-26 2021-12-30 Applied Materials, Inc. Deformable substrate chuck
JP7443169B2 (ja) 2020-06-29 2024-03-05 株式会社荏原製作所 基板処理装置、基板処理方法、および基板処理方法を基板処理装置のコンピュータに実行させるためのプログラムを格納した記憶媒体
KR20220026624A (ko) * 2020-08-25 2022-03-07 주식회사 제우스 기판처리장치 및 그 제어방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5762539A (en) * 1996-02-27 1998-06-09 Ebara Corporation Apparatus for and method for polishing workpiece
US5851140A (en) * 1997-02-13 1998-12-22 Integrated Process Equipment Corp. Semiconductor wafer polishing apparatus with a flexible carrier plate
JP3705670B2 (ja) * 1997-02-19 2005-10-12 株式会社荏原製作所 ポリッシング装置及び方法
US6019670A (en) 1997-03-10 2000-02-01 Applied Materials, Inc. Method and apparatus for conditioning a polishing pad in a chemical mechanical polishing system
US5857899A (en) * 1997-04-04 1999-01-12 Ontrak Systems, Inc. Wafer polishing head with pad dressing element
US5957751A (en) 1997-05-23 1999-09-28 Applied Materials, Inc. Carrier head with a substrate detection mechanism for a chemical mechanical polishing system
JP3027551B2 (ja) * 1997-07-03 2000-04-04 キヤノン株式会社 基板保持装置ならびに該基板保持装置を用いた研磨方法および研磨装置
US6217429B1 (en) * 1999-07-09 2001-04-17 Applied Materials, Inc. Polishing pad conditioner
JP2002144218A (ja) * 2000-11-09 2002-05-21 Ebara Corp 研磨装置
JP4072810B2 (ja) * 2001-01-19 2008-04-09 株式会社荏原製作所 ドレッシング装置および該ドレッシング装置を備えたポリッシング装置

Also Published As

Publication number Publication date
KR100870941B1 (ko) 2008-12-01
US7458879B2 (en) 2008-12-02
US20020132559A1 (en) 2002-09-19
EP1240977A2 (de) 2002-09-18
KR20020073440A (ko) 2002-09-26
US7108581B2 (en) 2006-09-19
EP1240977A3 (de) 2003-11-12
EP1240977B1 (de) 2010-09-01
US20050260925A1 (en) 2005-11-24
US20060270323A1 (en) 2006-11-30
JP2002280337A (ja) 2002-09-27
US6957998B2 (en) 2005-10-25
JP3922887B2 (ja) 2007-05-30

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