DE60226973D1 - Hybrides optisches element für röntgenstrahl-anwendungen und zugehöriges verfahren - Google Patents
Hybrides optisches element für röntgenstrahl-anwendungen und zugehöriges verfahrenInfo
- Publication number
- DE60226973D1 DE60226973D1 DE60226973T DE60226973T DE60226973D1 DE 60226973 D1 DE60226973 D1 DE 60226973D1 DE 60226973 T DE60226973 T DE 60226973T DE 60226973 T DE60226973 T DE 60226973T DE 60226973 D1 DE60226973 D1 DE 60226973D1
- Authority
- DE
- Germany
- Prior art keywords
- optical element
- related method
- hybrid optical
- producing
- optical effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title abstract 8
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0883—Mirrors with a refractive index gradient
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1838—Diffraction gratings for use with ultraviolet radiation or X-rays
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/26—Reflecting filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/283—Interference filters designed for the ultraviolet
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Health & Medical Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Public Health (AREA)
- Mathematical Physics (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Toxicology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Manufacturing & Machinery (AREA)
- Theoretical Computer Science (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Optical Integrated Circuits (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Materials For Medical Uses (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0107228A FR2825473B1 (fr) | 2001-06-01 | 2001-06-01 | Procede de modification controlee de proprietes reflectives d'un multicouche |
FR0109729 | 2001-07-20 | ||
PCT/FR2002/001831 WO2002097486A2 (fr) | 2001-06-01 | 2002-05-31 | Composant optique hybride pour applications rayons x, et procede associe |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60226973D1 true DE60226973D1 (de) | 2008-07-17 |
Family
ID=26213032
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60226973T Expired - Lifetime DE60226973D1 (de) | 2001-06-01 | 2002-05-31 | Hybrides optisches element für röntgenstrahl-anwendungen und zugehöriges verfahren |
Country Status (7)
Country | Link |
---|---|
US (1) | US20050094271A1 (de) |
EP (2) | EP1397813B1 (de) |
JP (1) | JP2004529388A (de) |
AT (1) | ATE397782T1 (de) |
AU (2) | AU2002344277A1 (de) |
DE (1) | DE60226973D1 (de) |
WO (2) | WO2002097486A2 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100345003C (zh) * | 2005-12-07 | 2007-10-24 | 乐孜纯 | 铝材料一维x射线折衍射微结构器件的制作方法 |
CN100359341C (zh) * | 2005-12-07 | 2008-01-02 | 乐孜纯 | 一维x射线折衍射微结构器件 |
CN1327250C (zh) * | 2005-12-07 | 2007-07-18 | 乐孜纯 | 聚甲基丙烯酸甲酯材料一维x射线折衍射微结构器件的制作方法 |
US8208602B2 (en) * | 2010-02-22 | 2012-06-26 | General Electric Company | High flux photon beams using optic devices |
US8311184B2 (en) | 2010-08-30 | 2012-11-13 | General Electric Company | Fan-shaped X-ray beam imaging systems employing graded multilayer optic devices |
US8744048B2 (en) | 2010-12-28 | 2014-06-03 | General Electric Company | Integrated X-ray source having a multilayer total internal reflection optic device |
US8761346B2 (en) | 2011-07-29 | 2014-06-24 | General Electric Company | Multilayer total internal reflection optic devices and methods of making and using the same |
CN102798902A (zh) * | 2012-07-23 | 2012-11-28 | 中国科学院长春光学精密机械与物理研究所 | 一种提高极紫外光谱纯度的新型多层膜 |
CN105873344A (zh) * | 2016-03-22 | 2016-08-17 | 中国工程物理研究院流体物理研究所 | 一种基于横向梯度多层膜反射元件的x射线单能成像方法 |
CN113936839B (zh) * | 2021-10-13 | 2022-06-10 | 哈尔滨工业大学 | 多层嵌套x射线聚焦镜主动力控制快速装调方法 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3498694A (en) * | 1966-09-23 | 1970-03-03 | Stromberg Carlson Corp | Optical interference filter means bombarded by crt beam for selectively passing monochromatic light |
FR2296937A1 (fr) * | 1974-12-31 | 1976-07-30 | Ibm | Cible a memoire deformographique couleur |
US5016265A (en) * | 1985-08-15 | 1991-05-14 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Variable magnification variable dispersion glancing incidence imaging x-ray spectroscopic telescope |
US4798446A (en) * | 1987-09-14 | 1989-01-17 | The United States Of America As Represented By The United States Department Of Energy | Aplanatic and quasi-aplanatic diffraction gratings |
FR2681720A1 (fr) * | 1991-09-25 | 1993-03-26 | Philips Electronique Lab | Dispositif incluant un miroir fonctionnant dans le domaine des rayons x ou des neutrons. |
JPH05134385A (ja) * | 1991-11-11 | 1993-05-28 | Nikon Corp | 反射マスク |
US5458084A (en) * | 1992-04-16 | 1995-10-17 | Moxtek, Inc. | X-ray wave diffraction optics constructed by atomic layer epitaxy |
JP3219502B2 (ja) * | 1992-12-01 | 2001-10-15 | キヤノン株式会社 | 反射型マスクとその製造方法、並びに露光装置と半導体デバイス製造方法 |
DE4407278A1 (de) * | 1994-03-04 | 1995-09-07 | Siemens Ag | Röntgen-Analysegerät |
US5646976A (en) * | 1994-08-01 | 1997-07-08 | Osmic, Inc. | Optical element of multilayered thin film for X-rays and neutrons |
US5935733A (en) * | 1996-04-05 | 1999-08-10 | Intel Corporation | Photolithography mask and method of fabrication |
JPH1073698A (ja) * | 1996-08-30 | 1998-03-17 | Nippon Telegr & Teleph Corp <Ntt> | レーザプラズマx線用真空紫外分光器 |
FR2760889B1 (fr) * | 1997-03-13 | 1999-07-30 | Centre Nat Rech Scient | Dispositif et procede de modulation d'un faisceau de rayons x |
US6041099A (en) * | 1998-02-19 | 2000-03-21 | Osmic, Inc. | Single corner kirkpatrick-baez beam conditioning optic assembly |
JP2001057328A (ja) * | 1999-08-18 | 2001-02-27 | Nikon Corp | 反射マスク、露光装置および集積回路の製造方法 |
US6317483B1 (en) * | 1999-11-29 | 2001-11-13 | X-Ray Optical Systems, Inc. | Doubly curved optical device with graded atomic planes |
DE10001291A1 (de) * | 2000-01-14 | 2001-07-19 | Zeiss Carl | Adaptronischer Spiegel |
US6829327B1 (en) * | 2000-09-22 | 2004-12-07 | X-Ray Optical Systems, Inc. | Total-reflection x-ray fluorescence apparatus and method using a doubly-curved optic |
-
2002
- 2002-05-31 AU AU2002344277A patent/AU2002344277A1/en not_active Abandoned
- 2002-05-31 EP EP02740845A patent/EP1397813B1/de not_active Expired - Lifetime
- 2002-05-31 EP EP02743341A patent/EP1395857A2/de not_active Ceased
- 2002-05-31 US US10/478,814 patent/US20050094271A1/en not_active Abandoned
- 2002-05-31 AT AT02740845T patent/ATE397782T1/de not_active IP Right Cessation
- 2002-05-31 WO PCT/FR2002/001831 patent/WO2002097486A2/fr active IP Right Grant
- 2002-05-31 WO PCT/FR2002/001830 patent/WO2002097485A2/fr not_active Application Discontinuation
- 2002-05-31 JP JP2003500610A patent/JP2004529388A/ja active Pending
- 2002-05-31 DE DE60226973T patent/DE60226973D1/de not_active Expired - Lifetime
- 2002-05-31 AU AU2002314278A patent/AU2002314278A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
AU2002344277A1 (en) | 2002-12-09 |
EP1395857A2 (de) | 2004-03-10 |
ATE397782T1 (de) | 2008-06-15 |
US20050094271A1 (en) | 2005-05-05 |
EP1397813B1 (de) | 2008-06-04 |
WO2002097485A2 (fr) | 2002-12-05 |
WO2002097486A2 (fr) | 2002-12-05 |
AU2002314278A1 (en) | 2002-12-09 |
WO2002097486A3 (fr) | 2003-12-18 |
WO2002097485A3 (fr) | 2003-03-20 |
EP1397813A2 (de) | 2004-03-17 |
JP2004529388A (ja) | 2004-09-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |