FR2825473B1 - Procede de modification controlee de proprietes reflectives d'un multicouche - Google Patents

Procede de modification controlee de proprietes reflectives d'un multicouche

Info

Publication number
FR2825473B1
FR2825473B1 FR0107228A FR0107228A FR2825473B1 FR 2825473 B1 FR2825473 B1 FR 2825473B1 FR 0107228 A FR0107228 A FR 0107228A FR 0107228 A FR0107228 A FR 0107228A FR 2825473 B1 FR2825473 B1 FR 2825473B1
Authority
FR
France
Prior art keywords
multilayer
reflective properties
controlled modification
modification
controlled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0107228A
Other languages
English (en)
Other versions
FR2825473A1 (fr
Inventor
Peter Hoghoj
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
XENOCS
Original Assignee
XENOCS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR0107228A priority Critical patent/FR2825473B1/fr
Application filed by XENOCS filed Critical XENOCS
Priority to PCT/FR2002/001831 priority patent/WO2002097486A2/fr
Priority to DE60226973T priority patent/DE60226973D1/de
Priority to EP02740845A priority patent/EP1397813B1/fr
Priority to AT02740845T priority patent/ATE397782T1/de
Priority to AU2002344277A priority patent/AU2002344277A1/en
Priority to PCT/FR2002/001830 priority patent/WO2002097485A2/fr
Priority to AU2002314278A priority patent/AU2002314278A1/en
Priority to EP02743341A priority patent/EP1395857A2/fr
Priority to JP2003500610A priority patent/JP2004529388A/ja
Priority to US10/478,814 priority patent/US20050094271A1/en
Publication of FR2825473A1 publication Critical patent/FR2825473A1/fr
Application granted granted Critical
Publication of FR2825473B1 publication Critical patent/FR2825473B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/26—Reflecting filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/28—Interference filters
    • G02B5/283—Interference filters designed for the ultraviolet
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Epidemiology (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR0107228A 2001-06-01 2001-06-01 Procede de modification controlee de proprietes reflectives d'un multicouche Expired - Fee Related FR2825473B1 (fr)

Priority Applications (11)

Application Number Priority Date Filing Date Title
FR0107228A FR2825473B1 (fr) 2001-06-01 2001-06-01 Procede de modification controlee de proprietes reflectives d'un multicouche
EP02743341A EP1395857A2 (fr) 2001-06-01 2002-05-31 Procede de modification controlee de proprietes reflectives d'un multicouche
EP02740845A EP1397813B1 (fr) 2001-06-01 2002-05-31 Composant optique hybride pour applications rayons x, et procede associe
AT02740845T ATE397782T1 (de) 2001-06-01 2002-05-31 Hybrides optisches element für röntgenstrahl- anwendungen und zugehöriges verfahren
AU2002344277A AU2002344277A1 (en) 2001-06-01 2002-05-31 Method for controlled modification of the reflective qualities of a multi-layer
PCT/FR2002/001830 WO2002097485A2 (fr) 2001-06-01 2002-05-31 Procede de modification controlee de proprietes reflectives d'un multicouche
PCT/FR2002/001831 WO2002097486A2 (fr) 2001-06-01 2002-05-31 Composant optique hybride pour applications rayons x, et procede associe
DE60226973T DE60226973D1 (de) 2001-06-01 2002-05-31 Hybrides optisches element für röntgenstrahl-anwendungen und zugehöriges verfahren
JP2003500610A JP2004529388A (ja) 2001-06-01 2002-05-31 Ｘ線用途分野のためのハイブリッド光学部品、および関連する方法
US10/478,814 US20050094271A1 (en) 2001-06-01 2002-05-31 Hybrid optical component for x ray applications and method associated therewith
AU2002314278A AU2002314278A1 (en) 2001-06-01 2002-05-31 Hybrid optical component for x ray applications and method associated therewith

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0107228A FR2825473B1 (fr) 2001-06-01 2001-06-01 Procede de modification controlee de proprietes reflectives d'un multicouche

Publications (2)

Publication Number Publication Date
FR2825473A1 FR2825473A1 (fr) 2002-12-06
FR2825473B1 true FR2825473B1 (fr) 2003-11-14

Family

ID=8863886

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0107228A Expired - Fee Related FR2825473B1 (fr) 2001-06-01 2001-06-01 Procede de modification controlee de proprietes reflectives d'un multicouche

Country Status (1)

Country Link
FR (1) FR2825473B1 (fr)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3498694A (en) * 1966-09-23 1970-03-03 Stromberg Carlson Corp Optical interference filter means bombarded by crt beam for selectively passing monochromatic light
FR2296937A1 (fr) * 1974-12-31 1976-07-30 Ibm Cible a memoire deformographique couleur
JPH05134385A (ja) * 1991-11-11 1993-05-28 Nikon Corp 反射マスク
JP3219502B2 (ja) * 1992-12-01 2001-10-15 キヤノン株式会社 反射型マスクとその製造方法、並びに露光装置と半導体デバイス製造方法
US5935733A (en) * 1996-04-05 1999-08-10 Intel Corporation Photolithography mask and method of fabrication
JP2001057328A (ja) * 1999-08-18 2001-02-27 Nikon Corp 反射マスク、露光装置および集積回路の製造方法

Also Published As

Publication number Publication date
FR2825473A1 (fr) 2002-12-06

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Year of fee payment: 16

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Effective date: 20180228