SG11201903901TA - Method for producing an optical system and optical system - Google Patents

Method for producing an optical system and optical system

Info

Publication number
SG11201903901TA
SG11201903901TA SG11201903901TA SG11201903901TA SG11201903901TA SG 11201903901T A SG11201903901T A SG 11201903901TA SG 11201903901T A SG11201903901T A SG 11201903901TA SG 11201903901T A SG11201903901T A SG 11201903901TA SG 11201903901T A SG11201903901T A SG 11201903901TA
Authority
SG
Singapore
Prior art keywords
optical
optical component
shaping element
component
optical system
Prior art date
Application number
SG11201903901TA
Inventor
Philipp-Immanuel Dietrich
Christian Koos
Matthias Blaicher
Ingo Reuter
Yilin Xu
Original Assignee
Karlsruher Inst Technologie
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Karlsruher Inst Technologie filed Critical Karlsruher Inst Technologie
Publication of SG11201903901TA publication Critical patent/SG11201903901TA/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/42Coupling light guides with opto-electronic elements
    • G02B6/4201Packages, e.g. shape, construction, internal or external details
    • G02B6/4204Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/704162.5D lithography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/16Surface shaping of articles, e.g. embossing; Apparatus therefor by wave energy or particle radiation, e.g. infrared heating
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938Using specific optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/26Optical coupling means
    • G02B6/30Optical coupling means for use between fibre and thin-film device
    • G02B6/305Optical coupling means for use between fibre and thin-film device and having an integrated mode-size expanding section, e.g. tapered waveguide
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24Coupling light guides
    • G02B6/26Optical coupling means
    • G02B6/32Optical coupling means having lens focusing means positioned between opposed fibre ends
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12133Functions
    • G02B2006/12147Coupler
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13Integrated optical circuits characterised by the manufacturing method
    • G02B6/138Integrated optical circuits characterised by the manufacturing method by using polymerisation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optical Couplings Of Light Guides (AREA)

Abstract

Method for producing an optical system and optical system The invention relates an optical system and to a method for producing it. The optical 5 system has at least two separate optical components (10, 11) and at least one optical connection between the two optical components (10, 11). The method here comprises the following steps: a) providing a first optical component (10) and a second, separate optical component (11), wherein the first optical component (10) has a first beam profile (30) and the 10 second optical component (11) has a second beam profile (31); b) designing the optical system by specifying an arrangement of the first optical component (10) and the second optical component (11) and form and target position of at least one beam-shaping element (40, 41), wherein the beam-shaping element (40, 41) is fixedly connected to the first optical component (10) and/or to the second 15 optical component (11), wherein the beam-shaping element (40, 41) is designated to change the first beam profile (30) and/or the second beam profile (31) such that, after positioning of the first optical component (10) and of the second optical component (11), an optical coupling between the first optical component (10) and the second optical component (11) is formed; 20 c) producing the beam-shaping element (40, 41) using a three-dimensional direct- writing lithography method in situ at the target position, as a result of which at least one optical component (15, 16) which is supplemented by the beam-shaping element (40, 41) is obtained; and d) positioning and fixing the optical component (15, 16), which is supplemented by the 25 beam-shaping element (40, 41), on a common base plate (50), as a result of which the optical system is obtained. The optical systems produced with the present method can preferably be used in optical data transfer, measurement technology and sensors, life sciences and medical technology, 30 or optical signal processing. (Figure 2)
SG11201903901TA 2016-11-02 2017-11-02 Method for producing an optical system and optical system SG11201903901TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102016221464.0A DE102016221464A1 (en) 2016-11-02 2016-11-02 Method of making an optical system and optical system
PCT/EP2017/078086 WO2018083191A1 (en) 2016-11-02 2017-11-02 Method for producing an optical system and optical system

Publications (1)

Publication Number Publication Date
SG11201903901TA true SG11201903901TA (en) 2019-05-30

Family

ID=60320857

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201903901TA SG11201903901TA (en) 2016-11-02 2017-11-02 Method for producing an optical system and optical system

Country Status (8)

Country Link
US (2) US11169446B2 (en)
EP (1) EP3535615B1 (en)
JP (2) JP2019533834A (en)
CN (1) CN109983381B (en)
CA (1) CA3041974A1 (en)
DE (1) DE102016221464A1 (en)
SG (1) SG11201903901TA (en)
WO (1) WO2018083191A1 (en)

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Also Published As

Publication number Publication date
JP7430756B2 (en) 2024-02-13
US20190258175A1 (en) 2019-08-22
DE102016221464A1 (en) 2018-05-03
CN109983381A (en) 2019-07-05
WO2018083191A1 (en) 2018-05-11
CN109983381B (en) 2021-06-22
EP3535615A1 (en) 2019-09-11
EP3535615C0 (en) 2023-09-27
CA3041974A1 (en) 2018-05-11
US11169446B2 (en) 2021-11-09
JP2019533834A (en) 2019-11-21
EP3535615B1 (en) 2023-09-27
US20220011677A1 (en) 2022-01-13
JP2022180575A (en) 2022-12-06

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