DE60220952T2 - Mikrowellenplasmaquelle - Google Patents
Mikrowellenplasmaquelle Download PDFInfo
- Publication number
- DE60220952T2 DE60220952T2 DE60220952T DE60220952T DE60220952T2 DE 60220952 T2 DE60220952 T2 DE 60220952T2 DE 60220952 T DE60220952 T DE 60220952T DE 60220952 T DE60220952 T DE 60220952T DE 60220952 T2 DE60220952 T2 DE 60220952T2
- Authority
- DE
- Germany
- Prior art keywords
- plasma
- magnetic field
- microwave
- burner
- plasma torch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000005672 electromagnetic field Effects 0.000 claims description 20
- 230000005684 electric field Effects 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 8
- 238000004458 analytical method Methods 0.000 claims description 7
- 239000002826 coolant Substances 0.000 claims 2
- 239000007789 gas Substances 0.000 description 22
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 238000001514 detection method Methods 0.000 description 6
- 239000000443 aerosol Substances 0.000 description 5
- 239000012159 carrier gas Substances 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052793 cadmium Inorganic materials 0.000 description 3
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 238000001636 atomic emission spectroscopy Methods 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004993 emission spectroscopy Methods 0.000 description 2
- 238000009616 inductively coupled plasma Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 239000006199 nebulizer Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000000559 atomic spectroscopy Methods 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000000112 cooling gas Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002500 effect on skin Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 238000012549 training Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
- G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/66—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence
- G01N21/68—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light electrically excited, e.g. electroluminescence using high frequency electric fields
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Pathology (AREA)
- Immunology (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Plasma Technology (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AUPS044202 | 2002-02-11 | ||
| AUPS0442A AUPS044202A0 (en) | 2002-02-11 | 2002-02-11 | Microwave plasma source |
| PCT/AU2002/001142 WO2003069964A1 (fr) | 2002-02-11 | 2002-08-23 | Source de plasma a micro-ondes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE60220952D1 DE60220952D1 (de) | 2007-08-09 |
| DE60220952T2 true DE60220952T2 (de) | 2008-03-06 |
Family
ID=3834043
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60220952T Expired - Lifetime DE60220952T2 (de) | 2002-02-11 | 2002-08-23 | Mikrowellenplasmaquelle |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7030979B2 (fr) |
| EP (1) | EP1474958B1 (fr) |
| JP (1) | JP4227023B2 (fr) |
| CN (1) | CN1286350C (fr) |
| AU (1) | AUPS044202A0 (fr) |
| CA (1) | CA2473837A1 (fr) |
| DE (1) | DE60220952T2 (fr) |
| WO (1) | WO2003069964A1 (fr) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070000601A1 (en) * | 2005-07-01 | 2007-01-04 | Joerg Hoeschele | Process and device for determing the quality of a weld seam or a thermal spray coating |
| US8003936B2 (en) * | 2007-10-10 | 2011-08-23 | Mks Instruments, Inc. | Chemical ionization reaction or proton transfer reaction mass spectrometry with a time-of-flight mass spectrometer |
| US8003935B2 (en) * | 2007-10-10 | 2011-08-23 | Mks Instruments, Inc. | Chemical ionization reaction or proton transfer reaction mass spectrometry with a quadrupole mass spectrometer |
| US8334505B2 (en) * | 2007-10-10 | 2012-12-18 | Mks Instruments, Inc. | Chemical ionization reaction or proton transfer reaction mass spectrometry |
| FR2953279B1 (fr) * | 2009-11-30 | 2013-08-02 | Commissariat Energie Atomique | Procede et dispositif pour le traitement des dechets par injection dans un plasma immerge. |
| US8436271B2 (en) * | 2010-04-14 | 2013-05-07 | Baruch Boris Gutman | Thermal nucleus fusion torch method |
| CN102291922B (zh) * | 2011-07-22 | 2013-03-20 | 中国科学院空间科学与应用研究中心 | 一种离子产生装置 |
| CN103764650A (zh) | 2011-09-09 | 2014-04-30 | 出光兴产株式会社 | 含氮芳香族杂环化合物 |
| US9991447B2 (en) | 2011-09-28 | 2018-06-05 | Idemitsu Korea Co., Ltd. | Material for organic electroluminescent element, and organic electroluminescent element produced using same |
| JPWO2013069242A1 (ja) | 2011-11-07 | 2015-04-02 | 出光興産株式会社 | 有機エレクトロルミネッセンス素子用材料及びそれを用いた有機エレクトロルミネッセンス素子 |
| US10477665B2 (en) * | 2012-04-13 | 2019-11-12 | Amastan Technologies Inc. | Microwave plasma torch generating laminar flow for materials processing |
| US20140058160A1 (en) * | 2012-08-21 | 2014-02-27 | Uop Llc | Methane conversion apparatus and process using a supersonic flow reactor |
| JP6323849B2 (ja) * | 2012-08-28 | 2018-05-16 | アジレント・テクノロジーズ・インクＡｇｉｌｅｎｔ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｉｎｃ． | 電磁導波路およびプラズマ源を含む機器、プラズマ生成方法 |
| WO2014159590A1 (fr) * | 2013-03-13 | 2014-10-02 | Radom Corporation | Spectromètre à plasma à micro-ondes utilisant un résonateur diélectrique |
| US9247629B2 (en) | 2013-03-15 | 2016-01-26 | Agilent Technologies, Inc. | Waveguide-based apparatus for exciting and sustaining a plasma |
| US9427821B2 (en) * | 2013-03-15 | 2016-08-30 | Agilent Technologies, Inc. | Integrated magnetron plasma torch, and related methods |
| US8773225B1 (en) * | 2013-03-15 | 2014-07-08 | Agilent Technologies, Inc. | Waveguide-based apparatus for exciting and sustaining a plasma |
| US20150118416A1 (en) * | 2013-10-31 | 2015-04-30 | Semes Co., Ltd. | Substrate treating apparatus and method |
| US9345121B2 (en) * | 2014-03-28 | 2016-05-17 | Agilent Technologies, Inc. | Waveguide-based apparatus for exciting and sustaining a plasma |
| US9875884B2 (en) * | 2015-02-28 | 2018-01-23 | Agilent Technologies, Inc. | Ambient desorption, ionization, and excitation for spectrometry |
| CN104749139B (zh) * | 2015-03-26 | 2018-08-03 | 四川大学 | 基体辅助下的等离子体表面进样激发光谱检测系统 |
| CN105898975B (zh) * | 2016-06-12 | 2018-07-17 | 浙江大学 | 一种大功率微波等离子体谐振腔 |
| CN105957793B (zh) * | 2016-06-21 | 2017-12-15 | 东华理工大学 | 一种采用微波等离子体炬电离源的电离质谱分析方法 |
| EP3316278A1 (fr) * | 2016-10-26 | 2018-05-02 | NovionX UG (haftungsbeschränkt) | Verfahren zur spektrometrie |
| EP3334256A1 (fr) * | 2016-12-09 | 2018-06-13 | Glass Expansion Pty. Limited | Torche à plasma |
| CN106793439A (zh) * | 2017-02-16 | 2017-05-31 | 浙江全世科技有限公司 | 一种自动点火的微波等离子体炬装置 |
| CN112866887A (zh) * | 2017-11-20 | 2021-05-28 | 成都溢杰科技有限公司 | 微波等离子体扬声方法 |
| IT201800020206A1 (it) | 2018-12-19 | 2020-06-19 | Directa Plus Spa | Apparecchiatura per il trattamento di materiali con plasma. |
| CA3131641A1 (fr) * | 2019-03-26 | 2020-10-01 | Ning Duanmu | Revetement segmente et procedes d'utilisation dans un appareil a plasma micro-onde |
| CN112343780B (zh) * | 2019-08-09 | 2021-08-13 | 哈尔滨工业大学 | 微波同轴谐振会切场推力器 |
| CN111145623B (zh) * | 2019-12-31 | 2021-12-10 | 河海大学常州校区 | 不同参数的正负电晕与物质作用实验研究装置及方法 |
| AT523626B1 (de) * | 2020-05-22 | 2021-10-15 | Anton Paar Gmbh | Hohlleiter-Einkoppeleinheit |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3905303C2 (de) * | 1988-02-24 | 1996-07-04 | Hitachi Ltd | Vorrichtung zur Erzeugung eines Plasmas durch Mikrowellen |
| US5051557A (en) * | 1989-06-07 | 1991-09-24 | The United States Of America As Represented By The Secretary Of The Department Of Health And Human Services | Microwave induced plasma torch with tantalum injector probe |
| IT1241166B (it) * | 1990-04-24 | 1993-12-29 | Sviluppo Materiali Spa | Dispositivo per la determinazione di bassissime concentrazioni di elementi mediante spettrometria in emissione atomica |
| US5349154A (en) * | 1991-10-16 | 1994-09-20 | Rockwell International Corporation | Diamond growth by microwave generated plasma flame |
| US5302803A (en) * | 1991-12-23 | 1994-04-12 | Consortium For Surface Processing, Inc. | Apparatus and method for uniform microwave plasma processing using TE1101 modes |
| US5453125A (en) * | 1994-02-17 | 1995-09-26 | Krogh; Ole D. | ECR plasma source for gas abatement |
| US5847355A (en) * | 1996-01-05 | 1998-12-08 | California Institute Of Technology | Plasma-assisted microwave processing of materials |
| EP1093847A1 (fr) * | 1999-04-12 | 2001-04-25 | Mitsubishi Heavy Industries, Ltd. | Dispositif de decomposition de composes halogenes organiques et procede de gestion de fonctionnement afferent, et procede de decomposition de composes halogenes organiques |
| US6696662B2 (en) * | 2000-05-25 | 2004-02-24 | Advanced Energy Industries, Inc. | Methods and apparatus for plasma processing |
| AUPQ861500A0 (en) | 2000-07-06 | 2000-08-03 | Varian Australia Pty Ltd | Plasma source for spectrometry |
-
2002
- 2002-02-11 AU AUPS0442A patent/AUPS044202A0/en not_active Abandoned
- 2002-08-23 CN CNB028280040A patent/CN1286350C/zh not_active Expired - Fee Related
- 2002-08-23 EP EP02766928A patent/EP1474958B1/fr not_active Expired - Fee Related
- 2002-08-23 CA CA002473837A patent/CA2473837A1/fr not_active Abandoned
- 2002-08-23 JP JP2003568942A patent/JP4227023B2/ja not_active Expired - Lifetime
- 2002-08-23 WO PCT/AU2002/001142 patent/WO2003069964A1/fr active IP Right Grant
- 2002-08-23 DE DE60220952T patent/DE60220952T2/de not_active Expired - Lifetime
- 2002-08-23 US US10/502,927 patent/US7030979B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US7030979B2 (en) | 2006-04-18 |
| CN1618260A (zh) | 2005-05-18 |
| JP2005517938A (ja) | 2005-06-16 |
| EP1474958A4 (fr) | 2005-04-27 |
| JP4227023B2 (ja) | 2009-02-18 |
| DE60220952D1 (de) | 2007-08-09 |
| AUPS044202A0 (en) | 2002-03-07 |
| EP1474958B1 (fr) | 2007-06-27 |
| US20050078309A1 (en) | 2005-04-14 |
| CN1286350C (zh) | 2006-11-22 |
| WO2003069964A1 (fr) | 2003-08-21 |
| EP1474958A1 (fr) | 2004-11-10 |
| CA2473837A1 (fr) | 2003-08-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |