DE69130094T2 - Einrichtung zum Erzeugen eines Plasmas - Google Patents

Einrichtung zum Erzeugen eines Plasmas

Info

Publication number
DE69130094T2
DE69130094T2 DE69130094T DE69130094T DE69130094T2 DE 69130094 T2 DE69130094 T2 DE 69130094T2 DE 69130094 T DE69130094 T DE 69130094T DE 69130094 T DE69130094 T DE 69130094T DE 69130094 T2 DE69130094 T2 DE 69130094T2
Authority
DE
Germany
Prior art keywords
cavity
interior
discharge tube
plasma
waveguide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69130094T
Other languages
English (en)
Other versions
DE69130094D1 (de
Inventor
Odile Dessaux
Christian Dupret
Pierre Goudmand
Christophe Hoyez
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
J REYDEL GONDECOURT FR
Original Assignee
J REYDEL GONDECOURT FR
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by J REYDEL GONDECOURT FR filed Critical J REYDEL GONDECOURT FR
Application granted granted Critical
Publication of DE69130094D1 publication Critical patent/DE69130094D1/de
Publication of DE69130094T2 publication Critical patent/DE69130094T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Absorbent Articles And Supports Therefor (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
DE69130094T 1990-07-27 1991-07-24 Einrichtung zum Erzeugen eines Plasmas Expired - Fee Related DE69130094T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9009618A FR2665323B1 (fr) 1990-07-27 1990-07-27 Dispositif de production d'un plasma.

Publications (2)

Publication Number Publication Date
DE69130094D1 DE69130094D1 (de) 1998-10-08
DE69130094T2 true DE69130094T2 (de) 1999-04-15

Family

ID=9399170

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69130094T Expired - Fee Related DE69130094T2 (de) 1990-07-27 1991-07-24 Einrichtung zum Erzeugen eines Plasmas

Country Status (6)

Country Link
EP (1) EP0468886B1 (de)
AT (1) ATE170701T1 (de)
DE (1) DE69130094T2 (de)
DK (1) DK0468886T3 (de)
ES (1) ES2122969T3 (de)
FR (1) FR2665323B1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2702328B1 (fr) * 1993-03-05 1995-05-12 Univ Lille Sciences Tech Dispositif de production d'un plasma.
FR2714789B1 (fr) * 1993-12-30 1996-03-22 Plasmion Dispositif pour former un plasma par application de micro-ondes.
US6034346A (en) * 1995-05-19 2000-03-07 Hitachi, Ltd. Method and apparatus for plasma processing apparatus
FR2746249B1 (fr) * 1996-03-13 1998-06-12 Dispositif d'excitation d'un plasma par energie micro-ondes repartie, procede de fabrication, et application au depot de revetements minces
US6039834A (en) 1997-03-05 2000-03-21 Applied Materials, Inc. Apparatus and methods for upgraded substrate processing system with microwave plasma source
DE19856307C1 (de) * 1998-12-07 2000-01-13 Bosch Gmbh Robert Vorrichtung zur Erzeugung eines freien kalten Plasmastrahles

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2074715A7 (de) * 1970-01-19 1971-10-08 Dupret Christian
FR2290126A1 (fr) * 1974-10-31 1976-05-28 Anvar Perfectionnements apportes aux dispositifs d'excitation, par des ondes hf, d'une colonne de gaz enfermee dans une enveloppe
IT206683Z2 (it) * 1985-11-20 1987-10-01 Gte Telecom Spa Cavita' risonante a microonde con dielettrico metallizato.
FR2616030A1 (fr) * 1987-06-01 1988-12-02 Commissariat Energie Atomique Procede de gravure ou de depot par plasma et dispositif pour la mise en oeuvre du procede
US4866346A (en) * 1987-06-22 1989-09-12 Applied Science & Technology, Inc. Microwave plasma generator
EP0321792A3 (de) * 1987-12-23 1991-03-20 Hewlett-Packard Company Mikrowellenresonanz Hohlraum

Also Published As

Publication number Publication date
EP0468886B1 (de) 1998-09-02
EP0468886A3 (en) 1992-03-04
EP0468886A2 (de) 1992-01-29
FR2665323A1 (fr) 1992-01-31
DK0468886T3 (da) 1999-05-31
FR2665323B1 (fr) 1996-09-27
ES2122969T3 (es) 1999-01-01
ATE170701T1 (de) 1998-09-15
DE69130094D1 (de) 1998-10-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee