DE602008005223D1 - Maskendatenerzeugungsverfahren, Maskenherstellungsverfahren, Belichtungsverfahren, Vorrichtungsherstellungsverfahren und Programm - Google Patents

Maskendatenerzeugungsverfahren, Maskenherstellungsverfahren, Belichtungsverfahren, Vorrichtungsherstellungsverfahren und Programm

Info

Publication number
DE602008005223D1
DE602008005223D1 DE602008005223T DE602008005223T DE602008005223D1 DE 602008005223 D1 DE602008005223 D1 DE 602008005223D1 DE 602008005223 T DE602008005223 T DE 602008005223T DE 602008005223 T DE602008005223 T DE 602008005223T DE 602008005223 D1 DE602008005223 D1 DE 602008005223D1
Authority
DE
Germany
Prior art keywords
mask
manufacturing
program
data generation
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602008005223T
Other languages
German (de)
English (en)
Inventor
Miyoko Kawashima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE602008005223D1 publication Critical patent/DE602008005223D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
DE602008005223T 2007-09-19 2008-09-02 Maskendatenerzeugungsverfahren, Maskenherstellungsverfahren, Belichtungsverfahren, Vorrichtungsherstellungsverfahren und Programm Active DE602008005223D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007242911 2007-09-19
JP2008041489A JP2009093138A (ja) 2007-09-19 2008-02-22 原版データの生成方法、原版作成方法、露光方法、デバイス製造方法及び原版データを作成するためのプログラム

Publications (1)

Publication Number Publication Date
DE602008005223D1 true DE602008005223D1 (de) 2011-04-14

Family

ID=40665153

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602008005223T Active DE602008005223D1 (de) 2007-09-19 2008-09-02 Maskendatenerzeugungsverfahren, Maskenherstellungsverfahren, Belichtungsverfahren, Vorrichtungsherstellungsverfahren und Programm

Country Status (4)

Country Link
JP (2) JP2009093138A (https=)
KR (1) KR101001219B1 (https=)
DE (1) DE602008005223D1 (https=)
TW (1) TWI371701B (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5665398B2 (ja) * 2009-08-10 2015-02-04 キヤノン株式会社 生成方法、作成方法、露光方法、デバイスの製造方法及びプログラム
JP5279745B2 (ja) * 2010-02-24 2013-09-04 株式会社東芝 マスクレイアウト作成方法、マスクレイアウト作成装置、リソグラフィ用マスクの製造方法、半導体装置の製造方法、およびコンピュータが実行可能なプログラム
JP5603685B2 (ja) * 2010-07-08 2014-10-08 キヤノン株式会社 生成方法、作成方法、露光方法、デバイスの製造方法及びプログラム
JP5627394B2 (ja) * 2010-10-29 2014-11-19 キヤノン株式会社 マスクのデータ及び露光条件を決定するためのプログラム、決定方法、マスク製造方法、露光方法及びデバイス製造方法
JP6039910B2 (ja) 2012-03-15 2016-12-07 キヤノン株式会社 生成方法、プログラム及び情報処理装置
JP5677356B2 (ja) 2012-04-04 2015-02-25 キヤノン株式会社 マスクパターンの生成方法
JP5656905B2 (ja) 2012-04-06 2015-01-21 キヤノン株式会社 決定方法、プログラム及び情報処理装置
KR101694275B1 (ko) * 2013-03-14 2017-01-23 에이에스엠엘 네델란즈 비.브이. 패터닝 디바이스, 기판에 마커를 생성하는 방법 및 디바이스 제조 방법
JP6192372B2 (ja) 2013-06-11 2017-09-06 キヤノン株式会社 マスクパターンの作成方法、プログラムおよび情報処理装置
JP6307367B2 (ja) * 2014-06-26 2018-04-04 株式会社ニューフレアテクノロジー マスク検査装置、マスク評価方法及びマスク評価システム

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3576791B2 (ja) * 1998-03-16 2004-10-13 株式会社東芝 マスクパターン設計方法
SG137657A1 (en) * 2002-11-12 2007-12-28 Asml Masktools Bv Method and apparatus for performing model-based layout conversion for use with dipole illumination
SG139530A1 (en) * 2003-01-14 2008-02-29 Asml Masktools Bv Method of optical proximity correction design for contact hole mask
US7247574B2 (en) * 2003-01-14 2007-07-24 Asml Masktools B.V. Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
US7376930B2 (en) * 2003-06-30 2008-05-20 Asml Masktools B.V. Method, program product and apparatus for generating assist features utilizing an image field map
SG109607A1 (en) * 2003-09-05 2005-03-30 Asml Masktools Bv Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography
SG125970A1 (en) * 2003-12-19 2006-10-30 Asml Masktools Bv Feature optimization using interference mapping lithography
US7620930B2 (en) * 2004-08-24 2009-11-17 Asml Masktools B.V. Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography
US7349066B2 (en) * 2005-05-05 2008-03-25 Asml Masktools B.V. Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence
JP5235322B2 (ja) * 2006-07-12 2013-07-10 キヤノン株式会社 原版データ作成方法及び原版データ作成プログラム

Also Published As

Publication number Publication date
KR20090030216A (ko) 2009-03-24
JP2009093138A (ja) 2009-04-30
JP2013011898A (ja) 2013-01-17
KR101001219B1 (ko) 2010-12-15
TWI371701B (en) 2012-09-01
JP5188644B2 (ja) 2013-04-24
TW200931290A (en) 2009-07-16

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