DE602007002929D1 - Lichtempfindliche Zusammensetzung - Google Patents

Lichtempfindliche Zusammensetzung

Info

Publication number
DE602007002929D1
DE602007002929D1 DE200760002929 DE602007002929T DE602007002929D1 DE 602007002929 D1 DE602007002929 D1 DE 602007002929D1 DE 200760002929 DE200760002929 DE 200760002929 DE 602007002929 T DE602007002929 T DE 602007002929T DE 602007002929 D1 DE602007002929 D1 DE 602007002929D1
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200760002929
Other languages
English (en)
Inventor
Mitsuru Ishibashi
Toru Ushirogouchi
Hiroshi Kiyomoto
Ryozo Akiyama
Yukiko Kawakami
Kazuhiko Ohtsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba TEC Corp
Original Assignee
Toshiba Corp
Toshiba TEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba TEC Corp filed Critical Toshiba Corp
Publication of DE602007002929D1 publication Critical patent/DE602007002929D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
DE200760002929 2006-02-08 2007-02-08 Lichtempfindliche Zusammensetzung Active DE602007002929D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006031452A JP4426537B2 (ja) 2006-02-08 2006-02-08 感光性組成物、それを用いた複合部材および電子部品

Publications (1)

Publication Number Publication Date
DE602007002929D1 true DE602007002929D1 (de) 2009-12-10

Family

ID=37915747

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200760002929 Active DE602007002929D1 (de) 2006-02-08 2007-02-08 Lichtempfindliche Zusammensetzung

Country Status (4)

Country Link
US (1) US20070202437A1 (de)
EP (2) EP1944651A3 (de)
JP (1) JP4426537B2 (de)
DE (1) DE602007002929D1 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4041146B2 (ja) * 2006-02-08 2008-01-30 東芝テック株式会社 感光性インクジェットインク
JP5269734B2 (ja) * 2008-10-16 2013-08-21 株式会社デンソー 重合硬化性組成物、その重合硬化方法、および重合硬化樹脂組成物
CN101851659B (zh) * 2010-04-23 2012-02-15 云南烟草科学研究院 水体致突变性检测的Ames实验微量波动法
JP5608491B2 (ja) * 2010-09-13 2014-10-15 東芝テック株式会社 導電パターンの形成方法および印刷物
JP2012216700A (ja) * 2011-04-01 2012-11-08 Fujifilm Corp パターン形成方法およびパターン
WO2015200706A1 (en) * 2014-06-25 2015-12-30 Rensselaer Polytechnic Institute Oxetane polymers and methods of preparation thereof
CN106459295B (zh) * 2014-06-27 2020-12-08 株式会社大赛璐 单体组合物及含有其的固化性组合物
JP6534869B2 (ja) * 2014-06-27 2019-06-26 株式会社ダイセル モノマー組成物、及びそれを含む硬化性組成物
JP6538447B2 (ja) * 2014-06-27 2019-07-03 株式会社ダイセル モノマー組成物、及びそれを含む硬化性組成物
EP3162835B1 (de) * 2014-06-27 2019-12-11 Daicel Corporation Monomerzusammensetzung und härtbare zusammensetzung damit
US10472466B2 (en) 2014-06-27 2019-11-12 Daicel Corporation Monomer composition and curable composition containing same
JP6502761B2 (ja) * 2014-06-27 2019-04-17 株式会社ダイセル モノマー組成物、及びそれを含む硬化性組成物
JP6510909B2 (ja) * 2014-06-27 2019-05-08 株式会社ダイセル モノマー組成物、及びそれを含む硬化性組成物
JP6285814B2 (ja) * 2014-07-03 2018-02-28 株式会社ダイセル 接着剤及びその使用方法並びに接着膜
US9359517B2 (en) * 2014-10-15 2016-06-07 Eastman Kodak Company Non-aqueous compositions of dispersed carbon-coated metal particles
CN106795384B (zh) * 2014-10-15 2020-10-30 柯达公司 经分散的经碳涂覆的金属颗粒、物品和用途
JP2017115073A (ja) * 2015-12-25 2017-06-29 株式会社ダイセル 立体造形用硬化性組成物
JP2017115072A (ja) * 2015-12-25 2017-06-29 株式会社ダイセル 立体造形用硬化性組成物
TWI629337B (zh) * 2016-07-29 2018-07-11 余琬琴 高附著性導電銅膠體及其網版印刷應用方法
US10913874B2 (en) * 2016-12-09 2021-02-09 Lg Chem, Ltd. Encapsulating composition
JP6538774B2 (ja) * 2017-07-28 2019-07-03 株式会社ダイセル モノマー混合物、及びそれを含む硬化性組成物
JP6665136B2 (ja) 2017-07-28 2020-03-13 株式会社ダイセル モノマー混合物、及びそれを含む硬化性組成物
JP2020062757A (ja) * 2018-10-15 2020-04-23 株式会社ミマキエンジニアリング インクジェット印刷装置、インクジェット印刷方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0018949B1 (de) * 1979-05-08 1984-04-11 Ciba-Geigy Ag Härtbare Epoxidharzgemische und Härtungsbeschleuniger dafür
US4427496A (en) * 1980-01-25 1984-01-24 Rca Corporation Method for improving the inspection of printed circuit boards
US4404355A (en) * 1980-10-08 1983-09-13 Ciba-Geigy Corporation Heat curable epoxy resin compositions
JP2001181385A (ja) * 1999-12-24 2001-07-03 Kansai Paint Co Ltd カチオン重合性着色組成物
JP2002040632A (ja) * 2000-07-21 2002-02-06 Showa Denko Kk レジストインキ組成物
JP4382364B2 (ja) * 2002-04-24 2009-12-09 株式会社東芝 液体インク
JP3797348B2 (ja) * 2003-02-24 2006-07-19 コニカミノルタホールディングス株式会社 活性エネルギー線硬化組成物
CA2522601C (en) * 2003-05-02 2009-05-12 Canon Kabushiki Kaisha Print ink containing a plurality of fluorescent coloring materials and inkjet recording method
JP4037856B2 (ja) * 2003-10-28 2008-01-23 東芝テック株式会社 インクジェットインク
GB0414847D0 (en) * 2004-07-02 2004-08-04 Avecia Ltd Process
US20060189716A1 (en) * 2005-02-24 2006-08-24 Toru Ushirogouchi Dispersion, inkjet ink, method of manufacturing dispersion, method of manufacturing inkjet ink, and printed matter

Also Published As

Publication number Publication date
EP1818376A1 (de) 2007-08-15
EP1944651A3 (de) 2008-08-27
JP4426537B2 (ja) 2010-03-03
US20070202437A1 (en) 2007-08-30
EP1818376B1 (de) 2009-10-28
EP1944651A2 (de) 2008-07-16
JP2007211098A (ja) 2007-08-23

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Legal Events

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8364 No opposition during term of opposition