DE602006010709D1 - Verfahren zur herstellung von hochreinem silicium - Google Patents

Verfahren zur herstellung von hochreinem silicium

Info

Publication number
DE602006010709D1
DE602006010709D1 DE602006010709T DE602006010709T DE602006010709D1 DE 602006010709 D1 DE602006010709 D1 DE 602006010709D1 DE 602006010709 T DE602006010709 T DE 602006010709T DE 602006010709 T DE602006010709 T DE 602006010709T DE 602006010709 D1 DE602006010709 D1 DE 602006010709D1
Authority
DE
Germany
Prior art keywords
preparing high
purity silicon
purity
silicon
preparing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006010709T
Other languages
English (en)
Inventor
Nobuaki Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Chemical and Materials Co Ltd
Original Assignee
Nippon Steel Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Materials Co Ltd filed Critical Nippon Steel Materials Co Ltd
Publication of DE602006010709D1 publication Critical patent/DE602006010709D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/037—Purification
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
DE602006010709T 2005-03-07 2006-02-28 Verfahren zur herstellung von hochreinem silicium Active DE602006010709D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005062559 2005-03-07
JP2006034360A JP4966560B2 (ja) 2005-03-07 2006-02-10 高純度シリコンの製造方法
PCT/JP2006/304187 WO2006095662A1 (en) 2005-03-07 2006-02-28 Method for producing high purity silicon

Publications (1)

Publication Number Publication Date
DE602006010709D1 true DE602006010709D1 (de) 2010-01-07

Family

ID=36564662

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006010709T Active DE602006010709D1 (de) 2005-03-07 2006-02-28 Verfahren zur herstellung von hochreinem silicium

Country Status (9)

Country Link
US (1) US7615202B2 (de)
EP (1) EP1904402B1 (de)
JP (1) JP4966560B2 (de)
KR (1) KR100935959B1 (de)
CN (1) CN101137575B (de)
BR (1) BRPI0608898A2 (de)
DE (1) DE602006010709D1 (de)
NO (1) NO20075025L (de)
WO (1) WO2006095662A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4741860B2 (ja) * 2005-03-07 2011-08-10 新日鉄マテリアルズ株式会社 高純度のシリコンの製造方法
US7682585B2 (en) 2006-04-25 2010-03-23 The Arizona Board Of Regents On Behalf Of The University Of Arizona Silicon refining process
DE102008036143A1 (de) * 2008-08-01 2010-02-04 Berlinsolar Gmbh Verfahren zum Entfernen von nichtmetallischen Verunreinigungen aus metallurgischem Silicium
WO2010056350A2 (en) * 2008-11-14 2010-05-20 Carnegie Mellon University Methods for casting by a float process and associated appratuses
JP2013086994A (ja) * 2011-10-14 2013-05-13 Mitsubishi Chemicals Corp シリコンの製造方法、シリコンウェハー及び太陽電池用パネル
JP5933834B2 (ja) * 2012-06-25 2016-06-15 シリコー マテリアルズ インコーポレイテッド シリコン溶融物の精製のための耐火性るつぼの表面のためのライニングならびに溶融のための当該るつぼを使用したシリコン溶融物の精製およびさらなる方向性凝固の方法
CN103276446B (zh) * 2013-06-06 2015-09-09 青岛隆盛晶硅科技有限公司 一种介质熔炼后渣剂再利用的方法
CN103708465B (zh) * 2013-12-06 2015-11-04 青岛隆盛晶硅科技有限公司 一种利用混渣的介质熔炼工艺
RU2766149C2 (ru) * 2015-10-09 2022-02-08 МИЛУОКИ СИЛИКОН, ЭлЭлСи Очищенный кремний, а также устройства и системы для его производства

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1100218B (it) * 1978-11-09 1985-09-28 Montedison Spa Procedimento per la purificazione di silicio
SU865951A1 (ru) 1980-01-25 1981-09-23 Научно-исследовательский институт металлургии Способ получени силикокальци
DE3201312C2 (de) * 1982-01-18 1983-12-22 Skw Trostberg Ag, 8223 Trostberg Verfahren zur Reinigung von Silicium
US4388286A (en) * 1982-01-27 1983-06-14 Atlantic Richfield Company Silicon purification
DE3208878A1 (de) * 1982-03-11 1983-09-22 Heliotronic Forschungs- und Entwicklungsgesellschaft für Solarzellen-Grundstoffe mbH, 8263 Burghausen Semikontinuierliches verfahren zur herstellung von reinem silicium
DE3208877A1 (de) * 1982-03-11 1983-09-22 Heliotronic Forschungs- und Entwicklungsgesellschaft für Solarzellen-Grundstoffe mbH, 8263 Burghausen Verfahren zur entfernung des schlackenanteils aus schmelzmischungen von schlacke und silicium
JPS60106943A (ja) 1983-11-15 1985-06-12 Showa Denko Kk ステンレス鋼の製造方法
SE460287B (sv) * 1987-09-15 1989-09-25 Casco Nobel Ab Foerfarande foer rening av kisel fraan bor
JP3205352B2 (ja) * 1990-05-30 2001-09-04 川崎製鉄株式会社 シリコン精製方法及び装置
JP3000109B2 (ja) 1990-09-20 2000-01-17 株式会社住友シチックス尼崎 高純度シリコン鋳塊の製造方法
JPH04193706A (ja) 1990-11-28 1992-07-13 Kawasaki Steel Corp シリコンの精製方法
JPH05246706A (ja) 1992-03-04 1993-09-24 Kawasaki Steel Corp シリコンの精製方法及びその装置
NO180532C (no) * 1994-09-01 1997-05-07 Elkem Materials Fremgangsmåte for fjerning av forurensninger fra smeltet silisium
JPH09202611A (ja) 1996-01-25 1997-08-05 Kawasaki Steel Corp 金属シリコン中のボロン除去方法
US5820842A (en) * 1996-09-10 1998-10-13 Elkem Metals Company L.P. Silicon refining process
JPH1149510A (ja) 1997-07-31 1999-02-23 Daido Steel Co Ltd 金属Ｓｉの精製方法及びその装置
US5972107A (en) 1997-08-28 1999-10-26 Crystal Systems, Inc. Method for purifying silicon
JP2000302432A (ja) 1999-04-19 2000-10-31 Shin Etsu Chem Co Ltd 高純度金属シリコンの精製方法
US20050139148A1 (en) * 2002-02-04 2005-06-30 Hiroyasu Fujiwara Silicon purifying method, slag for purifying silicon and purified silicon
JP2003277040A (ja) 2002-03-19 2003-10-02 Sharp Corp シリコンの精製方法および該方法により精製したシリコンを用いて製造する太陽電池
JP4766837B2 (ja) * 2004-03-03 2011-09-07 新日鉄マテリアルズ株式会社 シリコンからのホウ素除去方法

Also Published As

Publication number Publication date
WO2006095662A1 (en) 2006-09-14
CN101137575A (zh) 2008-03-05
US7615202B2 (en) 2009-11-10
CN101137575B (zh) 2010-07-21
US20080241045A1 (en) 2008-10-02
KR100935959B1 (ko) 2010-01-08
EP1904402B1 (de) 2009-11-25
NO20075025L (no) 2007-10-04
EP1904402A1 (de) 2008-04-02
BRPI0608898A2 (pt) 2010-02-09
KR20070114805A (ko) 2007-12-04
JP4966560B2 (ja) 2012-07-04
JP2006282498A (ja) 2006-10-19

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Legal Events

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