DE602005013729D1 - Methode zur Herstellung einer OLED unter Verwendung eines Donorsubstrats - Google Patents

Methode zur Herstellung einer OLED unter Verwendung eines Donorsubstrats

Info

Publication number
DE602005013729D1
DE602005013729D1 DE602005013729T DE602005013729T DE602005013729D1 DE 602005013729 D1 DE602005013729 D1 DE 602005013729D1 DE 602005013729 T DE602005013729 T DE 602005013729T DE 602005013729 T DE602005013729 T DE 602005013729T DE 602005013729 D1 DE602005013729 D1 DE 602005013729D1
Authority
DE
Germany
Prior art keywords
oled
making
donor substrate
donor
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005013729T
Other languages
English (en)
Inventor
Tae-Min Kang
Jae-Ho Lee
Seong-Taek Lee
Jin-Soo Kim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Display Co Ltd
Original Assignee
Samsung Mobile Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Mobile Display Co Ltd filed Critical Samsung Mobile Display Co Ltd
Publication of DE602005013729D1 publication Critical patent/DE602005013729D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382—Contact thermal transfer or sublimation processes
    • B41M5/38207—Contact thermal transfer or sublimation processes characterised by aspects not provided for in groups B41M5/385 - B41M5/395
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/12—Preparation of material for subsequent imaging, e.g. corona treatment, simultaneous coating, pre-treatments
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00—Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/36—Backcoats; Back layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • B41M5/42—Intermediate, backcoat, or covering layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • H10K71/421—Thermal treatment, e.g. annealing in the presence of a solvent vapour using coherent electromagnetic radiation, e.g. laser annealing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
DE602005013729T 2004-10-05 2005-10-04 Methode zur Herstellung einer OLED unter Verwendung eines Donorsubstrats Active DE602005013729D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020040079250A KR100793355B1 (ko) 2004-10-05 2004-10-05 도너 기판의 제조방법 및 유기전계발광표시장치의 제조방법

Publications (1)

Publication Number Publication Date
DE602005013729D1 true DE602005013729D1 (de) 2009-05-20

Family

ID=36125940

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005013729T Active DE602005013729D1 (de) 2004-10-05 2005-10-04 Methode zur Herstellung einer OLED unter Verwendung eines Donorsubstrats

Country Status (6)

Country Link
US (1) US7223514B2 (de)
EP (1) EP1646094B1 (de)
JP (1) JP4535387B2 (de)
KR (1) KR100793355B1 (de)
CN (1) CN100388422C (de)
DE (1) DE602005013729D1 (de)

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KR100769431B1 (ko) * 2006-06-09 2007-10-22 삼성에스디아이 주식회사 도너필름의 제조방법 및 이를 이용한 유기 전계발광표시장치의 제조방법
US7419757B2 (en) * 2006-10-20 2008-09-02 3M Innovative Properties Company Structured thermal transfer donors
JP2008235010A (ja) * 2007-03-20 2008-10-02 Sony Corp 表示装置の製造方法
CN101271869B (zh) * 2007-03-22 2015-11-25 株式会社半导体能源研究所 发光器件的制造方法
US20090130427A1 (en) * 2007-10-22 2009-05-21 The Regents Of The University Of California Nanomaterial facilitated laser transfer
US8425974B2 (en) * 2007-11-29 2013-04-23 Semiconductor Energy Laboratory Co., Ltd. Evaporation donor substrate and method for manufacturing light-emitting device
US8080811B2 (en) 2007-12-28 2011-12-20 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing evaporation donor substrate and light-emitting device
WO2009107548A1 (en) * 2008-02-29 2009-09-03 Semiconductor Energy Laboratory Co., Ltd. Deposition method and manufacturing method of light-emitting device
US8182863B2 (en) 2008-03-17 2012-05-22 Semiconductor Energy Laboratory Co., Ltd. Deposition method and manufacturing method of light-emitting device
US7932112B2 (en) * 2008-04-14 2011-04-26 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing light-emitting device
KR101629637B1 (ko) * 2008-05-29 2016-06-13 가부시키가이샤 한도오따이 에네루기 켄큐쇼 성막방법 및 발광장치의 제조방법
KR101084179B1 (ko) * 2009-12-28 2011-11-17 삼성모바일디스플레이주식회사 유기 발광 디스플레이 소자의 봉지 방법
KR20130010628A (ko) * 2011-07-19 2013-01-29 삼성디스플레이 주식회사 도너 기판, 도너 기판의 제조 방법 및 도너 기판을 이용한 유기 발광 표시 장치의 제조 방법
CN103882374B (zh) 2014-03-03 2016-01-13 京东方科技集团股份有限公司 掩膜版、有机层加工方法、显示基板制备方法
CN105870265A (zh) 2016-04-19 2016-08-17 京东方科技集团股份有限公司 发光二极管基板及其制备方法、显示装置
EP3287291A1 (de) * 2016-08-26 2018-02-28 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Verfahren und system zur applikation einer gemusterten struktur auf einem substrat
CN108598132A (zh) * 2018-05-23 2018-09-28 京东方科技集团股份有限公司 显示基板的制作方法、掩膜板的制作方法、显示装置
CN111254385A (zh) * 2020-01-19 2020-06-09 阿德文泰克全球有限公司 金属荫罩及其制备方法，电铸模板及其制备方法

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US5688551A (en) * 1995-11-13 1997-11-18 Eastman Kodak Company Method of forming an organic electroluminescent display panel
KR100441522B1 (ko) * 1996-10-23 2004-10-14 삼성에스디아이 주식회사 미소형상 형성용 전사필름 및 그 장치
KR100195175B1 (ko) * 1996-12-23 1999-06-15 손욱 유기전자발광소자 유기박막용 도너필름, 이를 이용한 유기전자발광소자의 제조방법 및 그 방법에 따라 제조된 유기전자발광소자
US5937272A (en) * 1997-06-06 1999-08-10 Eastman Kodak Company Patterned organic layers in a full-color organic electroluminescent display array on a thin film transistor array substrate
US5851709A (en) * 1997-10-31 1998-12-22 Eastman Kodak Company Method for selective transfer of a color organic layer
US6214631B1 (en) * 1998-10-30 2001-04-10 The Trustees Of Princeton University Method for patterning light emitting devices incorporating a movable mask
JP2000195665A (ja) * 1998-12-25 2000-07-14 Toyota Motor Corp 有機膜の形成方法
US6114088A (en) * 1999-01-15 2000-09-05 3M Innovative Properties Company Thermal transfer element for forming multilayer devices
JP4590663B2 (ja) * 1999-10-29 2010-12-01 セイコーエプソン株式会社 カラーフィルタの製造方法
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KR100741052B1 (ko) 2000-10-16 2007-07-19 삼성에스디아이 주식회사 유기 ｅｌ 소자의 증착마스크와 이를 이용한 증착방법 및그 장치
US6852355B2 (en) 2001-03-01 2005-02-08 E. I. Du Pont De Nemours And Company Thermal imaging processes and products of electroactive organic material
US6485884B2 (en) * 2001-04-27 2002-11-26 3M Innovative Properties Company Method for patterning oriented materials for organic electronic displays and devices
JP2003031359A (ja) * 2001-07-10 2003-01-31 Sharp Corp 薄膜製造装置およびそれを用いて製造された有機エレクトロルミネッセンス素子
US6695029B2 (en) * 2001-12-12 2004-02-24 Eastman Kodak Company Apparatus for permitting transfer of organic material from a donor to form a layer in an OLED device
JP2003347054A (ja) * 2002-05-29 2003-12-05 Sharp Corp 薄膜転写用フィルムとその製造方法およびそれを用いた有機ｅｌ素子
US6682863B2 (en) * 2002-06-27 2004-01-27 Eastman Kodak Company Depositing an emissive layer for use in an organic light-emitting display device (OLED)
US6890627B2 (en) * 2002-08-02 2005-05-10 Eastman Kodak Company Laser thermal transfer from a donor element containing a hole-transporting layer
KR100501315B1 (ko) * 2002-12-17 2005-07-18 삼성에스디아이 주식회사 레이저 전사법을 사용하는 저분자 풀칼라 유기 전계 발광소자용 도너 필름 및 그 필름을 사용하는 저분자 풀칼라유기 전계 발광 소자의 제조 방법
KR100611145B1 (ko) * 2003-11-25 2006-08-09 삼성에스디아이 주식회사 풀칼라 유기 전계 발광 소자용 도너 필름, 도너 필름의제조 방법 및 이 도너 필름을 사용한 풀칼라 유기 전계발광 소자

Also Published As

Publication number Publication date
US7223514B2 (en) 2007-05-29
KR100793355B1 (ko) 2008-01-11
JP4535387B2 (ja) 2010-09-01
JP2006108098A (ja) 2006-04-20
EP1646094B1 (de) 2009-04-08
CN1797713A (zh) 2006-07-05
US20060073406A1 (en) 2006-04-06
CN100388422C (zh) 2008-05-14
EP1646094A1 (de) 2006-04-12
KR20060030405A (ko) 2006-04-10

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