DE602005011067D1 - Ultraviolettdetektionssensor und Verfahren zu dessen Herstellung - Google Patents

Ultraviolettdetektionssensor und Verfahren zu dessen Herstellung

Info

Publication number
DE602005011067D1
DE602005011067D1 DE200560011067 DE602005011067T DE602005011067D1 DE 602005011067 D1 DE602005011067 D1 DE 602005011067D1 DE 200560011067 DE200560011067 DE 200560011067 DE 602005011067 T DE602005011067 T DE 602005011067T DE 602005011067 D1 DE602005011067 D1 DE 602005011067D1
Authority
DE
Germany
Prior art keywords
region
diamond layer
sub
production
detection sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200560011067
Other languages
English (en)
Inventor
Kazushi Hayashi
Takeshi Tachibana
Yoshihiro Yokota
Nobuyuki Kawakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Publication of DE602005011067D1 publication Critical patent/DE602005011067D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/429—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to measurement of ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264—Inorganic materials
    • H01L31/028—Inorganic materials including, apart from doping material or other impurities, only elements of Group IV of the Periodic Table
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/09—Devices sensitive to infrared, visible or ultraviolet radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
    • H01L31/108—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the Schottky type
    • H01L31/1085—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the Schottky type the devices being of the Metal-Semiconductor-Metal [MSM] Schottky barrier type
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J2001/0276—Protection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001—Core members of the connector
    • H01L2224/45099—Material
    • H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144—Gold (Au) as principal constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805—Shape
    • H01L2224/4809—Loop shape
    • H01L2224/48091—Arched
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/102—Material of the semiconductor or solid state bodies
    • H01L2924/1025—Semiconducting materials
    • H01L2924/10251—Elemental semiconductors, i.e. Group IV
    • H01L2924/10253—Silicon [Si]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/12—Passive devices, e.g. 2 terminal devices
    • H01L2924/1203—Rectifying Diode
    • H01L2924/12032—Schottky diode
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Light Receiving Elements (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Fire-Detection Mechanisms (AREA)
DE200560011067 2004-02-16 2005-02-16 Ultraviolettdetektionssensor und Verfahren zu dessen Herstellung Active DE602005011067D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004039083A JP4233467B2 (ja) 2004-02-16 2004-02-16 紫外線センサ及びその製造方法

Publications (1)

Publication Number Publication Date
DE602005011067D1 true DE602005011067D1 (de) 2009-01-02

Family

ID=34836336

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200560011067 Active DE602005011067D1 (de) 2004-02-16 2005-02-16 Ultraviolettdetektionssensor und Verfahren zu dessen Herstellung

Country Status (8)

Country Link
US (1) US7193241B2 (de)
EP (1) EP1583156B1 (de)
JP (1) JP4233467B2 (de)
KR (1) KR100626775B1 (de)
CN (1) CN100433369C (de)
AT (1) ATE414993T1 (de)
DE (1) DE602005011067D1 (de)
TW (1) TWI263777B (de)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006019649A (ja) * 2004-07-05 2006-01-19 Kobe Steel Ltd ダイヤモンドセンサ及びその製造方法
JP5019305B2 (ja) * 2005-08-29 2012-09-05 独立行政法人物質・材料研究機構 ダイヤモンド紫外線センサー
JP4931475B2 (ja) * 2006-05-11 2012-05-16 株式会社神戸製鋼所 紫外線検出素子及び検出方法
US8395318B2 (en) * 2007-02-14 2013-03-12 Ritedia Corporation Diamond insulated circuits and associated methods
KR100926533B1 (ko) * 2007-08-24 2009-11-12 (주)실리콘화일 자외선의 강도를 측정할 수 있는 이미지센서
JP4930499B2 (ja) * 2008-03-31 2012-05-16 ウシオ電機株式会社 光センサ
TWI368730B (en) 2008-05-30 2012-07-21 Au Optronics Corp Method for using display panel to detect intensity of ultraviolet rays and display device using the same
US8936367B2 (en) * 2008-06-17 2015-01-20 The Invention Science Fund I, Llc Systems and methods associated with projecting in response to conformation
US8262236B2 (en) * 2008-06-17 2012-09-11 The Invention Science Fund I, Llc Systems and methods for transmitting information associated with change of a projection surface
US20090313153A1 (en) * 2008-06-17 2009-12-17 Searete Llc, A Limited Liability Corporation Of The State Of Delaware. Systems associated with projection system billing
US8641203B2 (en) * 2008-06-17 2014-02-04 The Invention Science Fund I, Llc Methods and systems for receiving and transmitting signals between server and projector apparatuses
US8608321B2 (en) * 2008-06-17 2013-12-17 The Invention Science Fund I, Llc Systems and methods for projecting in response to conformation
US20090313151A1 (en) * 2008-06-17 2009-12-17 Searete Llc, A Limited Liability Corporation Of The State Of Delaware Methods associated with projection system billing
US20090309826A1 (en) * 2008-06-17 2009-12-17 Searete Llc, A Limited Liability Corporation Of The State Of Delaware Systems and devices
US20100066689A1 (en) * 2008-06-17 2010-03-18 Jung Edward K Y Devices related to projection input surfaces
US8308304B2 (en) * 2008-06-17 2012-11-13 The Invention Science Fund I, Llc Systems associated with receiving and transmitting information related to projection
US20090310039A1 (en) * 2008-06-17 2009-12-17 Searete Llc, A Limited Liability Corporation Of The State Of Delaware Methods and systems for user parameter responsive projection
US20090310098A1 (en) * 2008-06-17 2009-12-17 Searete Llc, A Limited Liability Corporation Of The State Of Delaware Methods and systems for projecting in response to conformation
US20090310103A1 (en) * 2008-06-17 2009-12-17 Searete Llc, A Limited Liability Corporation Of The State Of Delaware Methods and systems for receiving information associated with the coordinated use of two or more user responsive projectors
US8944608B2 (en) * 2008-06-17 2015-02-03 The Invention Science Fund I, Llc Systems and methods associated with projecting in response to conformation
US20100066983A1 (en) * 2008-06-17 2010-03-18 Jun Edward K Y Methods and systems related to a projection surface
US20110176119A1 (en) * 2008-06-17 2011-07-21 Searete Llc, A Limited Liability Corporation Of The State Of Delaware Methods and systems for projecting in response to conformation
US8403501B2 (en) 2008-06-17 2013-03-26 The Invention Science Fund, I, LLC Motion responsive devices and systems
US8267526B2 (en) * 2008-06-17 2012-09-18 The Invention Science Fund I, Llc Methods associated with receiving and transmitting information related to projection
US20090312854A1 (en) * 2008-06-17 2009-12-17 Searete Llc, A Limited Liability Corporation Of The State Of Delaware Methods and systems for transmitting information associated with the coordinated use of two or more user responsive projectors
US8820939B2 (en) * 2008-06-17 2014-09-02 The Invention Science Fund I, Llc Projection associated methods and systems
US20090310040A1 (en) * 2008-06-17 2009-12-17 Searete Llc, A Limited Liability Corporation Of The State Of Delaware Methods and systems for receiving instructions associated with user parameter responsive projection
US8723787B2 (en) * 2008-06-17 2014-05-13 The Invention Science Fund I, Llc Methods and systems related to an image capture projection surface
US8384005B2 (en) * 2008-06-17 2013-02-26 The Invention Science Fund I, Llc Systems and methods for selectively projecting information in response to at least one specified motion associated with pressure applied to at least one projection surface
US8602564B2 (en) * 2008-06-17 2013-12-10 The Invention Science Fund I, Llc Methods and systems for projecting in response to position
US8733952B2 (en) * 2008-06-17 2014-05-27 The Invention Science Fund I, Llc Methods and systems for coordinated use of two or more user responsive projectors
CA2732337C (en) * 2008-08-18 2021-12-07 Burcon Nutrascience (Mb) Corp. Production of canola protein isolate without heat treatment ("c200ca")
JP5460067B2 (ja) * 2009-02-09 2014-04-02 株式会社トクヤマ 放射線検出装置
KR101104735B1 (ko) * 2010-05-12 2012-01-11 한국전기안전공사 일체형 멀티 타입 어레이 자외선 센서
TWI422052B (zh) * 2010-11-30 2014-01-01 Univ Cheng Shiu Ultraviolet photodetector with passivation layer
JP6679064B2 (ja) * 2015-06-24 2020-04-15 ウシオ電機株式会社 真空紫外線センサ
RU2610522C1 (ru) * 2015-09-25 2017-02-13 Общество с ограниченной ответственностью "Интерпром" (ООО "Интерпром") Способ регистрации вакуумного ультрафиолета
CN108807562B (zh) * 2017-04-28 2021-01-05 清华大学 光电探测器及其制备方法
TWI643320B (zh) * 2017-09-12 2018-12-01 鼎元光電科技股份有限公司 具寬能隙氧化物之深紫外線感測裝置
FR3078169B1 (fr) * 2018-02-16 2020-03-13 Thales Dispositif et procede d'analyse en frequence d'un signal
WO2023214787A1 (ko) * 2022-05-03 2023-11-09 박재혁 자외선 센서
CN116072744B (zh) * 2023-01-16 2024-10-08 哈尔滨工业大学 一种采用铟纳米粒子局域表面等离激元共振提升金刚石紫外探测性能的方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4965252A (en) * 1988-06-28 1990-10-23 Hauser-Kuhrts, Inc. Cholesterol-lowering combination compositions of guar gum and niacin
JP2952906B2 (ja) * 1989-10-20 1999-09-27 株式会社島津製作所 フォトダイオード
US5352897A (en) * 1992-03-16 1994-10-04 Olympus Optical Co., Ltd. Device for detecting X-rays
JPH05281030A (ja) * 1992-04-03 1993-10-29 Osaka Gas Co Ltd 紫外線検出素子
JPH05335613A (ja) 1992-06-03 1993-12-17 Idemitsu Petrochem Co Ltd 紫外線受光デバイスおよびその製造方法
TW347149U (en) * 1993-02-26 1998-12-01 Dow Corning Integrated circuits protected from the environment by ceramic and barrier metal layers
DE69503285T2 (de) * 1994-04-07 1998-11-05 Sumitomo Electric Industries Diamantwafer und Verfahren zur Herstellung eines Diamantwafers
JPH08330624A (ja) * 1995-06-02 1996-12-13 Kobe Steel Ltd ダイヤモンド発光素子
US5677538A (en) 1995-07-07 1997-10-14 Trustees Of Boston University Photodetectors using III-V nitrides
JP4114709B2 (ja) * 1996-09-05 2008-07-09 株式会社神戸製鋼所 ダイヤモンド膜の形成方法
JP3560462B2 (ja) 1998-03-04 2004-09-02 株式会社神戸製鋼所 ダイヤモンド膜紫外線センサ及びセンサアレイ
KR20010006514A (ko) * 1999-10-16 2001-01-26 오오오 비소키 테크놀로기 기상합성에 의해 다이아몬드층을 얻는 방법
US6608360B2 (en) * 2000-12-15 2003-08-19 University Of Houston One-chip micro-integrated optoelectronic sensor
JP4166990B2 (ja) * 2002-02-22 2008-10-15 浜松ホトニクス株式会社 透過型光電陰極及び電子管
JP2003245599A (ja) * 2002-02-22 2003-09-02 Seiko Epson Corp 光学物品とその製造方法
KR100572853B1 (ko) * 2003-12-26 2006-04-24 한국전자통신연구원 반도체 광센서

Also Published As

Publication number Publication date
EP1583156A2 (de) 2005-10-05
TW200537079A (en) 2005-11-16
US7193241B2 (en) 2007-03-20
TWI263777B (en) 2006-10-11
CN1674301A (zh) 2005-09-28
CN100433369C (zh) 2008-11-12
EP1583156A3 (de) 2007-04-18
EP1583156B1 (de) 2008-11-19
ATE414993T1 (de) 2008-12-15
KR100626775B1 (ko) 2006-09-25
KR20060041936A (ko) 2006-05-12
JP4233467B2 (ja) 2009-03-04
US20050181122A1 (en) 2005-08-18
JP2005229078A (ja) 2005-08-25

Similar Documents

Publication Publication Date Title
DE602005011067D1 (de) Ultraviolettdetektionssensor und Verfahren zu dessen Herstellung
TW200612472A (en) Enhanced color image sensor device and method of making the same
TW200711007A (en) Methods and apparatus having wafer level chip scale package for sensing elements
WO2002055997A3 (en) Substrate for fluorescence analysis
TWI268629B (en) Method for forming image sensors with improved sensitivity
WO2007112181A3 (en) Method of monitoring a semiconductor processing system using a wireless sensor network
HK1164542A1 (zh) 基板保持裝置、具備其之曝光裝置、元件製造方法
WO2008123270A1 (ja) 半導体装置、半導体装置の製造方法及び表示装置
TW200722929A (en) Fabrication method for photomask, fabrication method for device and monitoring method for photomask
EP2458650A3 (de) Strahlendetektor, Verfahren zur Herstellung eines Strahlendetektors und lithografische Vorrichtung mit einem Strahlendetektor
WO2005073338A3 (en) Fluorescent, semi-conductive polymers, and devices comprising them
FR2908406B1 (fr) Couche poreuse, son procede de fabrication et ses applications.
DE60232576D1 (de) Kapazitiver Detektionssensor und Herstellungsverfahren dafür
SG137777A1 (en) Method and apparatus for the treatment of a semiconductor wafer
TW200736858A (en) Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus
DE60321525D1 (de) Verfahren, Inspektionssystem, Rechnerprogramm und Referenzsubstrat zum Erkennen von Maskenfehlern
SG123766A1 (en) Level sensor, lithographic apparatus and device manufacturing method
WO2007112180A3 (en) Semiconductor processing system with wireless sensor network monitoring system incorporated therewith
NL1026665A1 (nl) Reticule, inrichting voor het bewaken van een optisch stelsel, werkwijze voor het bewaken van een optisch stelsel en werkwijze voor het vervaardigen van een reticule.
WO2005078799A3 (en) Manufacture of flat panel light emitting devices
WO2009008237A1 (ja) 湿度検出素子及び湿度検出素子の製造方法
IS7486A (is) Næm aðferð til að greina kjarnsýrur
WO2008077012A3 (en) Multi-step photomask etching with chlorine for uniformity control
TW200739286A (en) Sensor unit, exposure apparatus, and device manufacturing method
TW200629973A (en) Display panel manufacturing method

Legal Events

Date Code Title Description
8364 No opposition during term of opposition