DE602005000352D1 - Methode zur Entnahme einer mikroskopischen Probe von einem Substrat - Google Patents

Methode zur Entnahme einer mikroskopischen Probe von einem Substrat

Info

Publication number
DE602005000352D1
DE602005000352D1 DE602005000352T DE602005000352T DE602005000352D1 DE 602005000352 D1 DE602005000352 D1 DE 602005000352D1 DE 602005000352 T DE602005000352 T DE 602005000352T DE 602005000352 T DE602005000352 T DE 602005000352T DE 602005000352 D1 DE602005000352 D1 DE 602005000352D1
Authority
DE
Germany
Prior art keywords
taking
substrate
microscopic sample
microscopic
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005000352T
Other languages
English (en)
Other versions
DE602005000352T2 (de
Inventor
Henk Gezinus Tappel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FEI Co
Original Assignee
FEI Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FEI Co filed Critical FEI Co
Publication of DE602005000352D1 publication Critical patent/DE602005000352D1/de
Application granted granted Critical
Publication of DE602005000352T2 publication Critical patent/DE602005000352T2/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00—Sampling; Preparing specimens for investigation
    • G01N1/28—Preparing specimens for investigation including physical details of (bio-)chemical methods covered elsewhere, e.g. G01N33/50, C12Q
    • G01N1/32—Polishing; Etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31732—Depositing thin layers on selected microareas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3174—Etching microareas
    • H01J2237/31745—Etching microareas for preparing specimen to be viewed in microscopes or analyzed in microanalysers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31749—Focused ion beam

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Sampling And Sample Adjustment (AREA)
DE602005000352T 2004-07-01 2005-06-27 Methode zur Entnahme einer mikroskopischen Probe von einem Substrat Active DE602005000352T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP04076893 2004-07-01
EP04076893 2004-07-01

Publications (2)

Publication Number Publication Date
DE602005000352D1 true DE602005000352D1 (de) 2007-02-01
DE602005000352T2 DE602005000352T2 (de) 2007-05-10

Family

ID=35512929

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005000352T Active DE602005000352T2 (de) 2004-07-01 2005-06-27 Methode zur Entnahme einer mikroskopischen Probe von einem Substrat

Country Status (4)

Country Link
US (1) US7408178B2 (de)
JP (1) JP2006017728A (de)
CN (1) CN100559155C (de)
DE (1) DE602005000352T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7442924B2 (en) * 2005-02-23 2008-10-28 Fei, Company Repetitive circumferential milling for sample preparation
US7423263B2 (en) * 2006-06-23 2008-09-09 Fei Company Planar view sample preparation
EP1879011B1 (de) * 2006-07-10 2013-01-30 Fei Company Verfahren zur Abtrennung einer kleinen Probe von einem Werkstück
US7615745B2 (en) * 2006-07-10 2009-11-10 Fei Company Method for separating a minute sample from a work piece
EP2104864B1 (de) 2006-10-20 2015-03-04 FEI Company Verfahren zur s/tem-sample-erzeugung und sample-struktur
WO2008051880A2 (en) 2006-10-20 2008-05-02 Fei Company Method and apparatus for sample extraction and handling
DE102008042179B9 (de) * 2008-09-17 2013-10-10 Carl Zeiss Microscopy Gmbh Verfahren zur Analyse einer Probe
DE102008064786B3 (de) 2008-09-17 2023-07-13 Carl Zeiss Microscopy Gmbh Verfahren zur Analyse einer Probe
DE102008052006B4 (de) * 2008-10-10 2018-12-20 3D-Micromac Ag Verfahren und Vorrichtung zur Herstellung von Proben für die Transmissionselektronenmikroskopie
PL2433662T3 (pl) * 2010-09-27 2014-10-31 Gambro Lundia Ab Urządzenie do pozaustrojowego oczyszczania krwi
US8258473B2 (en) * 2010-11-12 2012-09-04 Nanotem, Inc. Method and apparatus for rapid preparation of multiple specimens for transmission electron microscopy
MY183557A (en) * 2013-03-15 2021-02-26 Toray Industries Plasma cvd device and plasma cvd method
DE102013012225A1 (de) * 2013-07-23 2015-01-29 Carl Zeiss Microscopy Gmbh Verfahren zur TEM-Lamellen-Herstellung und Anordnung für TEM-Lamellen-Schutzvorrichtung
CN104792583B (zh) * 2014-01-17 2018-06-26 中芯国际集成电路制造(上海)有限公司 一种tem样品的制备方法
CN110579495B (zh) * 2019-10-23 2022-06-28 长江存储科技有限责任公司 一种tem样品及其制备方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6064228A (ja) * 1983-09-20 1985-04-12 Nec Corp 透過型電子顕微鏡試料の作製方法及びその作製装置
JP2774884B2 (ja) 1991-08-22 1998-07-09 株式会社日立製作所 試料の分離方法及びこの分離方法で得た分離試料の分析方法
JP3547143B2 (ja) * 1997-07-22 2004-07-28 株式会社日立製作所 試料作製方法
WO2002095378A1 (en) 2000-05-22 2002-11-28 Moore Thomas M Method for sample separation and lift-out
JP4178741B2 (ja) * 2000-11-02 2008-11-12 株式会社日立製作所 荷電粒子線装置および試料作製装置
DE60144508D1 (de) * 2000-11-06 2011-06-09 Hitachi Ltd Verfahren zur Herstellung von Proben
US6570170B2 (en) 2001-03-01 2003-05-27 Omniprobe, Inc. Total release method for sample extraction from a charged-particle instrument
JP2004093353A (ja) 2002-08-30 2004-03-25 Seiko Instruments Inc 試料作製装置
NL1023657C2 (nl) 2003-06-13 2004-12-14 Fei Co Werkwijze en apparaat voor het manipuleren van een microscopisch sample.
JP3887356B2 (ja) 2003-07-08 2007-02-28 エスアイアイ・ナノテクノロジー株式会社 薄片試料作製方法

Also Published As

Publication number Publication date
JP2006017728A (ja) 2006-01-19
US7408178B2 (en) 2008-08-05
CN1737532A (zh) 2006-02-22
CN100559155C (zh) 2009-11-11
DE602005000352T2 (de) 2007-05-10
US20060000973A1 (en) 2006-01-05

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Legal Events

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