DE602004022244D1 - Apparat zur Oberflächenbeobachtung - Google Patents

Apparat zur Oberflächenbeobachtung

Info

Publication number
DE602004022244D1
DE602004022244D1 DE602004022244T DE602004022244T DE602004022244D1 DE 602004022244 D1 DE602004022244 D1 DE 602004022244D1 DE 602004022244 T DE602004022244 T DE 602004022244T DE 602004022244 T DE602004022244 T DE 602004022244T DE 602004022244 D1 DE602004022244 D1 DE 602004022244D1
Authority
DE
Germany
Prior art keywords
surface observation
observation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004022244T
Other languages
English (en)
Inventor
Hiroyuki Hirata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Topcon Corp
Original Assignee
Topcon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Topcon Corp filed Critical Topcon Corp
Publication of DE602004022244D1 publication Critical patent/DE602004022244D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
DE602004022244T 2003-12-16 2004-12-10 Apparat zur Oberflächenbeobachtung Active DE602004022244D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003417534A JP4391217B2 (ja) 2003-12-16 2003-12-16 表面検査装置

Publications (1)

Publication Number Publication Date
DE602004022244D1 true DE602004022244D1 (de) 2009-09-10

Family

ID=34510604

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004022244T Active DE602004022244D1 (de) 2003-12-16 2004-12-10 Apparat zur Oberflächenbeobachtung

Country Status (7)

Country Link
US (1) US7432700B2 (de)
EP (1) EP1544897B1 (de)
JP (1) JP4391217B2 (de)
CN (1) CN100375259C (de)
DE (1) DE602004022244D1 (de)
IL (1) IL165287A (de)
TW (1) TWI265587B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4695106B2 (ja) * 2007-02-21 2011-06-08 東京エレクトロン株式会社 チャックトップの高さを求める方法及びこの方法を記録したプログラム記録媒体
JP5122880B2 (ja) * 2007-07-11 2013-01-16 株式会社ディスコ レーザー加工装置のアライメント方法
JP6080119B2 (ja) * 2012-06-15 2017-02-15 アテル株式会社 アライナ装置
CN102709224B (zh) * 2012-06-19 2015-01-14 北京七星华创电子股份有限公司 旋转薄片盘状物夹持装置
CN102808175B (zh) * 2012-07-24 2014-04-02 北京鼎臣超导科技有限公司 一种新型大面积双面超导薄膜基片夹具及其应用
CN103730400B (zh) * 2012-10-16 2016-06-29 沈阳芯源微电子设备有限公司 一种多尺寸晶圆对中装置
JP6179012B2 (ja) * 2013-07-28 2017-08-16 アテル株式会社 ウエハ位置決め装置
CN103745950B (zh) * 2014-01-29 2017-05-03 北京七星华创电子股份有限公司 一种具有限位结构的盘状物夹持装置
EP2942654B1 (de) * 2014-05-08 2018-10-10 Airbus Defence and Space GmbH Justiervorrichtung zur Einstellung einer Detektorebene
JP6989587B2 (ja) * 2016-07-09 2022-01-05 アプライド マテリアルズ インコーポレイテッドApplied Materials, Incorporated 基板キャリア
KR102017068B1 (ko) * 2017-09-12 2019-09-03 주식회사 필옵틱스 정밀 회전 스테이지 장치
US10978331B2 (en) * 2018-03-30 2021-04-13 Taiwan Semiconductor Manufacturing Co., Ltd. Systems and methods for orientator based wafer defect sensing
CN108612982A (zh) * 2018-06-25 2018-10-02 深圳市诚辉达电子有限公司 一种自动式夹持装置及夹持支架
CN112833733B (zh) * 2021-01-22 2023-07-11 湖北兴发化工集团股份有限公司 一种圆孔圆心定位装置及定位方法
CN114459311B (zh) * 2022-02-09 2023-09-05 重庆臻宝科技股份有限公司 硅环台阶检测装置
CN115889081B (zh) * 2022-11-30 2023-06-27 安徽微芯长江半导体材料有限公司 一种碳化硅晶片贴蜡装置及其方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3484982D1 (de) * 1983-11-26 1991-10-02 Toshiba Kawasaki Kk Apparat zum nachweis von oberflaechenfehlern.
JP2729297B2 (ja) 1987-12-24 1998-03-18 株式会社ダイヘン 半導体ウエハのセンタ合せ装置
JP2566042B2 (ja) 1990-05-21 1996-12-25 株式会社東芝 光半導体製造装置
JP2846423B2 (ja) 1990-07-10 1999-01-13 古河電気工業株式会社 円板のセンタリング装置
US5324927A (en) * 1993-01-08 1994-06-28 Board Of Regents-Univ. Of Nebraska Return mail piece and method of marking the same
JP3582918B2 (ja) * 1995-02-14 2004-10-27 株式会社トプコン レーザ測量機
JPH098086A (ja) * 1995-06-23 1997-01-10 Tokyo Electron Ltd プローブカード装着機構およびそれに用いる移動部材、並びにプローブカード装着機構を有するプローバー
US5635694A (en) * 1995-09-27 1997-06-03 Xerox Corporation System and method for embedding machine coded destination information into a postal mark
US5978781A (en) * 1997-05-08 1999-11-02 Pitney Bowes Inc. Digital printing, metering, and recording of other post services on the face of a mail piece
JPH11237345A (ja) * 1998-02-24 1999-08-31 Hitachi Ltd 表面計測装置
DE19812902A1 (de) * 1998-03-18 1999-09-23 Francotyp Postalia Gmbh Verfahren für eine Frankier- und Adressiermaschine
US6217034B1 (en) * 1998-09-24 2001-04-17 Kla-Tencor Corporation Edge handling wafer chuck
US6303509B1 (en) * 1999-10-29 2001-10-16 Taiwan Semiconductor Manufacturing Company Method to calibrate the wafer transfer for oxide etcher (with clamp)
JP2003090803A (ja) * 2001-09-19 2003-03-28 Mitsubishi Electric Corp 被処理基板欠陥検査装置、これを用いた半導体製造装置、及び被処理基板欠陥検査方法
JP4249498B2 (ja) 2003-01-20 2009-04-02 株式会社トプコン 表面検査装置

Also Published As

Publication number Publication date
EP1544897B1 (de) 2009-07-29
EP1544897A3 (de) 2006-02-15
CN1630056A (zh) 2005-06-22
US7432700B2 (en) 2008-10-07
CN100375259C (zh) 2008-03-12
EP1544897A2 (de) 2005-06-22
US20050126314A1 (en) 2005-06-16
JP4391217B2 (ja) 2009-12-24
JP2005180933A (ja) 2005-07-07
TWI265587B (en) 2006-11-01
TW200525685A (en) 2005-08-01
IL165287A (en) 2010-05-17
IL165287A0 (en) 2005-12-18

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