DE602004019217D1 - Photovernetzbare polyurethane - Google Patents
Photovernetzbare polyurethaneInfo
- Publication number
- DE602004019217D1 DE602004019217D1 DE602004019217T DE602004019217T DE602004019217D1 DE 602004019217 D1 DE602004019217 D1 DE 602004019217D1 DE 602004019217 T DE602004019217 T DE 602004019217T DE 602004019217 T DE602004019217 T DE 602004019217T DE 602004019217 D1 DE602004019217 D1 DE 602004019217D1
- Authority
- DE
- Germany
- Prior art keywords
- carbon atoms
- aliphatic
- covalently bonded
- olefinically unsaturated
- carboxyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920002635 polyurethane Polymers 0.000 title abstract 3
- 239000004814 polyurethane Substances 0.000 title abstract 3
- 125000004432 carbon atom Chemical group C* 0.000 abstract 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
- 125000001931 aliphatic group Chemical group 0.000 abstract 2
- 150000002009 diols Chemical class 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000004132 cross linking Methods 0.000 abstract 1
- 125000005442 diisocyanate group Chemical group 0.000 abstract 1
- -1 glycidyl ester Chemical class 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000465 moulding Methods 0.000 abstract 1
- 229910000679 solder Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/83—Chemically modified polymers
- C08G18/831—Chemically modified polymers by oxygen-containing compounds inclusive of carbonic acid halogenides, carboxylic acid halogenides and epoxy halides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/0804—Manufacture of polymers containing ionic or ionogenic groups
- C08G18/0819—Manufacture of polymers containing ionic or ionogenic groups containing anionic or anionogenic groups
- C08G18/0823—Manufacture of polymers containing ionic or ionogenic groups containing anionic or anionogenic groups containing carboxylate salt groups or groups forming them
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/65—Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
- C08G18/66—Compounds of groups C08G18/42, C08G18/48, or C08G18/52
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/65—Low-molecular-weight compounds having active hydrogen with high-molecular-weight compounds having active hydrogen
- C08G18/66—Compounds of groups C08G18/42, C08G18/48, or C08G18/52
- C08G18/6666—Compounds of group C08G18/48 or C08G18/52
- C08G18/6692—Compounds of group C08G18/48 or C08G18/52 with compounds of group C08G18/34
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/69—Polymers of conjugated dienes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
- C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polyurethanes Or Polyureas (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Ink Jet (AREA)
- Materials For Medical Uses (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH13632003 | 2003-08-07 | ||
PCT/EP2004/051709 WO2005014682A1 (en) | 2003-08-07 | 2004-08-04 | Photocrosslinkable polyurethanes |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602004019217D1 true DE602004019217D1 (en) | 2009-03-12 |
Family
ID=34120759
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602004019217T Expired - Lifetime DE602004019217D1 (en) | 2003-08-07 | 2004-08-04 | Photovernetzbare polyurethane |
Country Status (12)
Country | Link |
---|---|
US (1) | US7476484B2 (de) |
EP (1) | EP1651695B1 (de) |
JP (1) | JP5069465B2 (de) |
KR (2) | KR101289598B1 (de) |
CN (1) | CN100573325C (de) |
AT (1) | ATE421545T1 (de) |
BR (1) | BRPI0413182A (de) |
CA (1) | CA2532440A1 (de) |
DE (1) | DE602004019217D1 (de) |
ES (1) | ES2318324T3 (de) |
TW (1) | TWI349680B (de) |
WO (1) | WO2005014682A1 (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4596544B2 (ja) * | 2005-03-07 | 2010-12-08 | 昭和電工株式会社 | カルボキシル基含有ポリウレタン |
WO2007066630A1 (ja) * | 2005-12-06 | 2007-06-14 | Nok Corporation | ロッドシーリングシステム |
JP5265854B2 (ja) * | 2005-12-08 | 2013-08-14 | 昭和電工株式会社 | 熱硬化性樹脂組成物、熱可塑性樹脂溶液および皮膜形成材料ならびにこれらの硬化物 |
KR100984592B1 (ko) * | 2006-03-16 | 2010-09-30 | 쇼와 덴코 가부시키가이샤 | 열경화성 수지 조성물, 연성 회로 기판용 오버코팅제 및 표면 보호막 |
WO2008053985A1 (fr) * | 2006-11-02 | 2008-05-08 | Toyo Ink Manufacturing Co., Ltd. | Composition de résine photosensible, produit durci de celle-ci et procédé de production de résine photosensible |
US7935776B2 (en) * | 2007-03-21 | 2011-05-03 | Agi Corporation | Radiation curable and developable polyurethane and radiation curable and developable photo resist composition containing the same |
TWI336691B (en) * | 2008-02-15 | 2011-02-01 | Cornerstone Optical Co Ltd | Edge coated glass polarized lens |
US9809713B2 (en) * | 2008-09-05 | 2017-11-07 | Innovation Surface Technologies, Inc. | Photoactivatable crosslinker compositions for surface modification |
DE102008052625A1 (de) * | 2008-10-22 | 2010-04-29 | Tesa Se | Thermisch vernetzende Polyacrylate und Verfahren zu deren Herstellung |
JP5419755B2 (ja) * | 2009-03-27 | 2014-02-19 | 富士フイルム株式会社 | レーザー彫刻用レリーフ印刷版原版、レーザー彫刻用樹脂組成物、レリーフ印刷版、およびレリーフ印刷版の製造方法 |
DE102010028870A1 (de) * | 2010-05-11 | 2011-11-17 | Henkel Ag & Co. Kgaa | Filmbildender strahlenvernetzender Klebstoff |
US8292625B2 (en) | 2010-07-23 | 2012-10-23 | Pulpdent Corporation | Radically curable urethane dimethacrylates and compositions thereof for tougher dental prosthetics |
JP5029931B2 (ja) * | 2010-09-17 | 2012-09-19 | Dic株式会社 | インクジェット印刷用インクの製造方法及び印刷物 |
TW201213433A (en) * | 2010-09-28 | 2012-04-01 | Dow Global Technologies Llc | Epoxy composition with crystallization inhibition |
WO2013161861A1 (ja) * | 2012-04-27 | 2013-10-31 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機el表示装置、および、液晶表示装置 |
JP6379404B2 (ja) * | 2013-01-28 | 2018-08-29 | 日産化学株式会社 | パターンを有する基板の製造方法及びフッ酸エッチング用樹脂組成物 |
CN105102390B (zh) * | 2013-01-28 | 2019-03-01 | 日产化学工业株式会社 | 薄壁化的玻璃基板的制造方法 |
WO2014141969A1 (ja) * | 2013-03-12 | 2014-09-18 | 日産化学工業株式会社 | めっきレジスト用樹脂組成物およびそれを用いた基板の製造方法 |
JP6582363B2 (ja) * | 2013-12-03 | 2019-10-02 | オート化学工業株式会社 | 接着剤組成物及びその製造方法 |
JP6664212B2 (ja) * | 2014-12-26 | 2020-03-13 | 昭和電工株式会社 | ポリウレタン樹脂、オーバーコート用組成物およびポリウレタン樹脂の製造方法 |
ES2833200T3 (es) * | 2016-03-21 | 2021-06-14 | Basf Se | Poliuretano reticulado |
JP2018203820A (ja) * | 2017-05-31 | 2018-12-27 | 凸版印刷株式会社 | 水性ウレタン樹脂分散体及びそれを用いたフィルム及びシート |
CN109776756A (zh) * | 2019-01-21 | 2019-05-21 | 深圳市道尔顿电子材料有限公司 | 一种双重改性环氧丙烯酸酯及其光刻胶 |
CN116656229B (zh) * | 2023-04-18 | 2024-06-14 | 淮阴工学院 | 一种耐污型改性水性聚氨酯涂层的制备方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4666821A (en) * | 1984-02-23 | 1987-05-19 | W. R. Grace & Co. | Photopolymer for use as a solder mask |
JPH068336B2 (ja) * | 1985-03-15 | 1994-02-02 | 大日本印刷株式会社 | 新規ウレタン化合物及びその製造方法 |
US4877711A (en) | 1986-05-19 | 1989-10-31 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group |
ES2040792T3 (es) * | 1987-09-16 | 1993-11-01 | Canon Kabushiki Kaisha | Compuesto de resina curable por radiaciones de energia activa, que contiene poliuretano fotopolimerizable. |
DE4031732A1 (de) * | 1990-10-06 | 1992-04-09 | Basf Ag | Strahlenhaertbare, waessrige bindemitteldispersionen |
BE1010656A4 (fr) * | 1996-09-30 | 1998-11-03 | Ucb Sa | Monomeres, oligomeres et polymeres a groupes oxirannes terminaux, leur procede de preparation et leur polymerisation cationique sous irradiation. |
US6177523B1 (en) * | 1999-07-14 | 2001-01-23 | Cardiotech International, Inc. | Functionalized polyurethanes |
JP2001033960A (ja) * | 1999-07-16 | 2001-02-09 | Kansai Paint Co Ltd | フォトレジスト用感光性樹脂組成物及びレジストパターン形成方法 |
JP4503199B2 (ja) * | 2001-04-12 | 2010-07-14 | 岡本化学工業株式会社 | 感光性平版印刷版用感光性組成物 |
JP3846856B2 (ja) * | 2001-11-14 | 2006-11-15 | 日本化薬株式会社 | アルカリ水溶液可溶性ウレタン化エポキシカルボキシレート化合物及びそれを用いた感光性樹脂組成物並びにその硬化物 |
JP2002338652A (ja) * | 2001-05-17 | 2002-11-27 | Nippon Kayaku Co Ltd | アルカリ水溶液可溶性ウレタン化エポキシカルボキシレート化合物及びそれを用いた感光性樹脂組成物並びにその硬化物 |
JP2003268067A (ja) | 2002-03-13 | 2003-09-25 | Nippon Kayaku Co Ltd | 感光性樹脂、及びそれを用いた感光性樹脂組成物、並びにその硬化物 |
WO2002094904A1 (en) | 2001-05-17 | 2002-11-28 | Nippon Kayaku Kabushiki Kaisha | Photosensitive resin, photosensitive resin compositions containing the same and cured articles of the compositions |
JP2003155320A (ja) * | 2001-11-20 | 2003-05-27 | Nippon Kayaku Co Ltd | 感光性樹脂組成物及びその硬化物 |
JP2003122001A (ja) * | 2001-10-15 | 2003-04-25 | Nippon Kayaku Co Ltd | 感光性樹脂、及びそれを用いた感光性樹脂組成物、並びにその硬化物 |
JP3523857B2 (ja) * | 2001-12-25 | 2004-04-26 | 昭和高分子株式会社 | 感光性樹脂および感光性レジストインキ組成物 |
-
2004
- 2004-08-04 US US10/567,318 patent/US7476484B2/en not_active Expired - Fee Related
- 2004-08-04 AT AT04766414T patent/ATE421545T1/de not_active IP Right Cessation
- 2004-08-04 CN CNB2004800226591A patent/CN100573325C/zh not_active Expired - Fee Related
- 2004-08-04 KR KR1020127012938A patent/KR101289598B1/ko not_active IP Right Cessation
- 2004-08-04 EP EP04766414A patent/EP1651695B1/de not_active Expired - Lifetime
- 2004-08-04 BR BRPI0413182-7A patent/BRPI0413182A/pt not_active IP Right Cessation
- 2004-08-04 CA CA002532440A patent/CA2532440A1/en not_active Abandoned
- 2004-08-04 JP JP2006522358A patent/JP5069465B2/ja not_active Expired - Fee Related
- 2004-08-04 KR KR1020067002499A patent/KR101178308B1/ko not_active IP Right Cessation
- 2004-08-04 ES ES04766414T patent/ES2318324T3/es not_active Expired - Lifetime
- 2004-08-04 WO PCT/EP2004/051709 patent/WO2005014682A1/en active Application Filing
- 2004-08-04 DE DE602004019217T patent/DE602004019217D1/de not_active Expired - Lifetime
- 2004-08-05 TW TW093123448A patent/TWI349680B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
WO2005014682A1 (en) | 2005-02-17 |
JP2007501871A (ja) | 2007-02-01 |
BRPI0413182A (pt) | 2006-10-03 |
KR101178308B1 (ko) | 2012-08-29 |
US7476484B2 (en) | 2009-01-13 |
ES2318324T3 (es) | 2009-05-01 |
CN1835981A (zh) | 2006-09-20 |
KR101289598B1 (ko) | 2013-07-24 |
CA2532440A1 (en) | 2005-02-17 |
TWI349680B (en) | 2011-10-01 |
EP1651695A1 (de) | 2006-05-03 |
KR20060052968A (ko) | 2006-05-19 |
ATE421545T1 (de) | 2009-02-15 |
KR20120068993A (ko) | 2012-06-27 |
EP1651695B1 (de) | 2009-01-21 |
CN100573325C (zh) | 2009-12-23 |
US20060204895A1 (en) | 2006-09-14 |
TW200523285A (en) | 2005-07-16 |
JP5069465B2 (ja) | 2012-11-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |