DE602004003125D1 - Verfahren zur erkennung eines defekten pixels - Google Patents
Verfahren zur erkennung eines defekten pixelsInfo
- Publication number
- DE602004003125D1 DE602004003125D1 DE602004003125T DE602004003125T DE602004003125D1 DE 602004003125 D1 DE602004003125 D1 DE 602004003125D1 DE 602004003125 T DE602004003125 T DE 602004003125T DE 602004003125 T DE602004003125 T DE 602004003125T DE 602004003125 D1 DE602004003125 D1 DE 602004003125D1
- Authority
- DE
- Germany
- Prior art keywords
- detecting
- defective pixel
- defective
- pixel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/006—Electronic inspection or testing of displays and display drivers, e.g. of LED or LCD displays
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70653—Metrology techniques
- G03F7/70666—Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N17/00—Diagnosis, testing or measuring for television systems or their details
- H04N17/002—Diagnosis, testing or measuring for television systems or their details for television cameras
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US44014503P | 2003-01-15 | 2003-01-15 | |
US440145P | 2003-01-15 | ||
PCT/SE2004/000025 WO2004063695A1 (en) | 2003-01-15 | 2004-01-14 | A method to detect a defective pixel |
Publications (2)
Publication Number | Publication Date |
---|---|
DE602004003125D1 true DE602004003125D1 (de) | 2006-12-21 |
DE602004003125T2 DE602004003125T2 (de) | 2007-08-23 |
Family
ID=32713533
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602004003125T Expired - Fee Related DE602004003125T2 (de) | 2003-01-15 | 2004-01-14 | Verfahren zur erkennung eines defekten pixels |
Country Status (7)
Country | Link |
---|---|
US (1) | US7061226B2 (de) |
EP (1) | EP1583946B1 (de) |
JP (1) | JP2006516724A (de) |
KR (1) | KR20050086953A (de) |
CN (1) | CN1723384A (de) |
DE (1) | DE602004003125T2 (de) |
WO (1) | WO2004063695A1 (de) |
Families Citing this family (58)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI289708B (en) | 2002-12-25 | 2007-11-11 | Qualcomm Mems Technologies Inc | Optical interference type color display |
KR101124179B1 (ko) | 2003-04-09 | 2012-03-27 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
TWI474132B (zh) | 2003-10-28 | 2015-02-21 | 尼康股份有限公司 | 照明光學裝置、投影曝光裝置、曝光方法以及元件製造方法 |
TWI612338B (zh) | 2003-11-20 | 2018-01-21 | 尼康股份有限公司 | 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法 |
US7342705B2 (en) | 2004-02-03 | 2008-03-11 | Idc, Llc | Spatial light modulator with integrated optical compensation structure |
TWI360837B (en) | 2004-02-06 | 2012-03-21 | Nikon Corp | Polarization changing device, optical illumination |
US7706050B2 (en) | 2004-03-05 | 2010-04-27 | Qualcomm Mems Technologies, Inc. | Integrated modulator illumination |
US7750886B2 (en) * | 2004-09-27 | 2010-07-06 | Qualcomm Mems Technologies, Inc. | Methods and devices for lighting displays |
US7457547B2 (en) * | 2004-11-08 | 2008-11-25 | Optium Australia Pty Limited | Optical calibration system and method |
US7469058B2 (en) * | 2005-01-28 | 2008-12-23 | Asml Holding N.V. | Method and system for a maskless lithography rasterization technique based on global optimization |
US7630085B2 (en) * | 2005-04-19 | 2009-12-08 | Texas Instruments Incorporated | Interferometers of high resolutions |
US20060232784A1 (en) * | 2005-04-19 | 2006-10-19 | Regis Grasser | Interferometers of high resolutions |
US7557932B2 (en) * | 2005-04-19 | 2009-07-07 | Texas Instruments Incorporated | Characterization of micromirror array devices using interferometers |
ATE400062T1 (de) * | 2005-06-30 | 2008-07-15 | Suisse Electronique Microtech | Farbbildaufnahmesensor |
US20070081739A1 (en) * | 2005-10-11 | 2007-04-12 | International Business Machines Corporation | Modifying text or images when defect pixels are found on a display |
US7936445B2 (en) * | 2006-06-19 | 2011-05-03 | Asml Netherlands B.V. | Altering pattern data based on measured optical element characteristics |
US7766498B2 (en) | 2006-06-21 | 2010-08-03 | Qualcomm Mems Technologies, Inc. | Linear solid state illuminator |
US7845841B2 (en) | 2006-08-28 | 2010-12-07 | Qualcomm Mems Technologies, Inc. | Angle sweeping holographic illuminator |
WO2008045224A2 (en) * | 2006-10-06 | 2008-04-17 | Qualcomm Mems Technologies, Inc | Thin light bar and method of manufacturing |
EP2366943B1 (de) | 2006-10-06 | 2013-04-17 | Qualcomm Mems Technologies, Inc. | Beleuchtungseinrichtung einer Anzeigevorrichtung mit darin integrierter Struktur zur Erzeugung optischer Verluste |
EP2069838A2 (de) | 2006-10-06 | 2009-06-17 | Qualcomm Mems Technologies, Inc. | Beleuchtungsvorrichtung mit eingebautem lichtkoppler |
US7855827B2 (en) | 2006-10-06 | 2010-12-21 | Qualcomm Mems Technologies, Inc. | Internal optical isolation structure for integrated front or back lighting |
US8107155B2 (en) * | 2006-10-06 | 2012-01-31 | Qualcomm Mems Technologies, Inc. | System and method for reducing visual artifacts in displays |
US7864395B2 (en) | 2006-10-27 | 2011-01-04 | Qualcomm Mems Technologies, Inc. | Light guide including optical scattering elements and a method of manufacture |
US20080117231A1 (en) * | 2006-11-19 | 2008-05-22 | Tom Kimpe | Display assemblies and computer programs and methods for defect compensation |
US7777954B2 (en) | 2007-01-30 | 2010-08-17 | Qualcomm Mems Technologies, Inc. | Systems and methods of providing a light guiding layer |
WO2008095695A2 (de) | 2007-02-06 | 2008-08-14 | Carl Zeiss Smt Ag | Verfahren und vorrichtung zur überwachung von mehrfachspiegelanordnungen in einem beleuchtungssystem einer mikrolithographischen projektionsbelichtungsanlage |
CN100573315C (zh) * | 2007-04-04 | 2009-12-23 | 鸿富锦精密工业(深圳)有限公司 | 相机模块污点测试系统及方法 |
US7733439B2 (en) | 2007-04-30 | 2010-06-08 | Qualcomm Mems Technologies, Inc. | Dual film light guide for illuminating displays |
US7759620B2 (en) * | 2007-07-03 | 2010-07-20 | Micronic Laser Systems Ab | Fourier plane analysis and refinement of SLM calibration |
DE102008040742A1 (de) * | 2007-08-02 | 2009-02-05 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zur Überwachung von Mehrfachspiegelanordnungen, optische Anordnung mit einer derartigen Vorrichtung sowie mit einer zweiten Mehrfachspiegelanordnung zum Ein- und Ausschalten einer ersten Mehrfachspiegelanordnung sowie Beleuchtungsoptik für eine Projektionsbelichtungsanlage mit einer derartigen Vorrichtung |
US8451427B2 (en) | 2007-09-14 | 2013-05-28 | Nikon Corporation | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
JP5267029B2 (ja) * | 2007-10-12 | 2013-08-21 | 株式会社ニコン | 照明光学装置、露光装置及びデバイスの製造方法 |
CN101681123B (zh) * | 2007-10-16 | 2013-06-12 | 株式会社尼康 | 照明光学系统、曝光装置以及元件制造方法 |
CN101681125B (zh) * | 2007-10-16 | 2013-08-21 | 株式会社尼康 | 照明光学系统、曝光装置以及元件制造方法 |
US8379187B2 (en) | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
US9116346B2 (en) * | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
US8654061B2 (en) | 2008-02-12 | 2014-02-18 | Qualcomm Mems Technologies, Inc. | Integrated front light solution |
WO2009102731A2 (en) | 2008-02-12 | 2009-08-20 | Qualcomm Mems Technologies, Inc. | Devices and methods for enhancing brightness of displays using angle conversion layers |
WO2009129264A1 (en) | 2008-04-15 | 2009-10-22 | Qualcomm Mems Technologies, Inc. | Light with bi-directional propagation |
US8118468B2 (en) * | 2008-05-16 | 2012-02-21 | Qualcomm Mems Technologies, Inc. | Illumination apparatus and methods |
KR101695034B1 (ko) * | 2008-05-28 | 2017-01-10 | 가부시키가이샤 니콘 | 공간 광 변조기의 검사 장치, 조명 광학계, 노광 장치, 검사 방법, 조명 광학계의 조정 방법, 조명 방법, 노광 방법, 및 디바이스 제조 방법 |
JP2011526053A (ja) * | 2008-06-04 | 2011-09-29 | クォルコム・メムズ・テクノロジーズ・インコーポレーテッド | プリズム前方光に対するエッジシャドウの減少方法 |
DE102009009372A1 (de) * | 2009-02-18 | 2010-08-19 | Carl Zeiss Smt Ag | Monitoring von kippbaren Spiegeln |
US9121979B2 (en) | 2009-05-29 | 2015-09-01 | Qualcomm Mems Technologies, Inc. | Illumination devices and methods of fabrication thereof |
JP5481400B2 (ja) * | 2010-01-15 | 2014-04-23 | 株式会社日立ハイテクノロジーズ | マイクロミラーデバイスの選別方法、マイクロミラーデバイス選別装置およびマスクレス露光装置 |
US8902484B2 (en) | 2010-12-15 | 2014-12-02 | Qualcomm Mems Technologies, Inc. | Holographic brightness enhancement film |
JPWO2013031901A1 (ja) * | 2011-09-02 | 2015-03-23 | 株式会社ニコン | 空間光変調器の検査方法及び装置、並びに露光方法及び装置 |
KR101338362B1 (ko) * | 2012-03-09 | 2013-12-06 | 삼성전기주식회사 | 디지털 마이크로 미러 장치용 미러 불량 검출장치 |
DE102013222935A1 (de) * | 2013-11-11 | 2015-05-13 | Carl Zeiss Smt Gmbh | Vorrichtung zum Ermitteln eines Kippwinkels wenigstens eines Spiegels einer Lithographieanlage sowie Verfahren |
CN104978747A (zh) * | 2015-06-26 | 2015-10-14 | 清华大学 | 空间光调制器显微缺陷检测的目标提取方法及装置 |
CN104977154B (zh) * | 2015-06-26 | 2017-10-24 | 清华大学 | 具有子像素结构的空间光调制器缺陷分类方法 |
EP3387372B1 (de) * | 2015-12-08 | 2023-12-13 | Dental Imaging Technologies Corporation | 3d-scanner-kalibrierung mit aktiver anzeigezielvorrichtung |
JP6702602B2 (ja) * | 2016-08-25 | 2020-06-03 | Necディスプレイソリューションズ株式会社 | 自己画像診断方法、自己画像診断プログラム、ディスプレイ装置、及び自己画像診断システム |
JP6879841B2 (ja) * | 2017-06-28 | 2021-06-02 | 株式会社 東京ウエルズ | 画像処理方法および欠陥検査方法 |
JP2020067387A (ja) * | 2018-10-25 | 2020-04-30 | 株式会社エスケーエレクトロニクス | 欠陥画素検出装置及び欠陥画素検出方法 |
JP7193353B2 (ja) * | 2019-01-10 | 2022-12-20 | 株式会社エスケーエレクトロニクス | 空間光変調素子の検査装置及び検査方法 |
DE102022117536A1 (de) | 2022-07-13 | 2024-01-18 | Precitec Optronik Gmbh | Vorrichtung zur chromatisch konfokalen Messung von Abständen |
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US6751005B1 (en) * | 2002-12-20 | 2004-06-15 | Eastman Kodak Company | Compensating for pixel defects by spatial translation of scene content |
-
2004
- 2004-01-14 CN CNA2004800017454A patent/CN1723384A/zh active Pending
- 2004-01-14 DE DE602004003125T patent/DE602004003125T2/de not_active Expired - Fee Related
- 2004-01-14 JP JP2006500746A patent/JP2006516724A/ja active Pending
- 2004-01-14 WO PCT/SE2004/000025 patent/WO2004063695A1/en active IP Right Grant
- 2004-01-14 US US10/757,351 patent/US7061226B2/en not_active Expired - Lifetime
- 2004-01-14 EP EP04702111A patent/EP1583946B1/de not_active Expired - Fee Related
- 2004-01-14 KR KR1020057012487A patent/KR20050086953A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
EP1583946B1 (de) | 2006-11-08 |
EP1583946A1 (de) | 2005-10-12 |
JP2006516724A (ja) | 2006-07-06 |
KR20050086953A (ko) | 2005-08-30 |
DE602004003125T2 (de) | 2007-08-23 |
US20040207386A1 (en) | 2004-10-21 |
CN1723384A (zh) | 2006-01-18 |
WO2004063695A1 (en) | 2004-07-29 |
US7061226B2 (en) | 2006-06-13 |
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