DE60138021D1 - - Google Patents

Info

Publication number
DE60138021D1
DE60138021D1 DE60138021T DE60138021T DE60138021D1 DE 60138021 D1 DE60138021 D1 DE 60138021D1 DE 60138021 T DE60138021 T DE 60138021T DE 60138021 T DE60138021 T DE 60138021T DE 60138021 D1 DE60138021 D1 DE 60138021D1
Authority
DE
Germany
Prior art keywords
composition
composition comprises
multiphoton
light
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60138021T
Other languages
German (de)
English (en)
Inventor
Robert J Devoe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Application granted granted Critical
Publication of DE60138021D1 publication Critical patent/DE60138021D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymerisation Methods In General (AREA)
  • Glass Compositions (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
DE60138021T 2000-06-15 2001-06-14 Expired - Lifetime DE60138021D1 (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US21170300P 2000-06-15 2000-06-15
PCT/US2001/019164 WO2001096409A2 (en) 2000-06-15 2001-06-14 Multiphoton photosensitization system

Publications (1)

Publication Number Publication Date
DE60138021D1 true DE60138021D1 (https=) 2009-04-30

Family

ID=22788007

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60138021T Expired - Lifetime DE60138021D1 (https=) 2000-06-15 2001-06-14

Country Status (7)

Country Link
EP (1) EP1297021B1 (https=)
JP (1) JP5059273B2 (https=)
KR (2) KR100813320B1 (https=)
AT (1) ATE425993T1 (https=)
AU (1) AU2001268443A1 (https=)
DE (1) DE60138021D1 (https=)
WO (1) WO2001096409A2 (https=)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
KR100795759B1 (ko) * 2000-06-15 2008-01-21 쓰리엠 이노베이티브 프로퍼티즈 캄파니 미세유체 물품의 제조 방법
US7005229B2 (en) * 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
ATE357444T1 (de) 2000-08-17 2007-04-15 Lumera Corp Design und synthese von nlo-materialien für electro-optische anwendungen, die von thiophen abgeleitet sind
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
JP4001118B2 (ja) 2003-03-24 2007-10-31 ソニー株式会社 有機電界発光素子及びアミノモノスチリルナフタレン化合物
US20050046915A1 (en) * 2003-08-22 2005-03-03 Fuji Photo Film Co., Ltd. Hologram recording material composition, hologram recording material and hologram recording method
EP1510862A3 (en) * 2003-08-25 2006-08-09 Fuji Photo Film Co., Ltd. Hologram recording method and hologram recording material
JP4556531B2 (ja) * 2003-09-09 2010-10-06 三菱化学株式会社 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
JP2008181143A (ja) * 2003-09-09 2008-08-07 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
JP4430622B2 (ja) 2003-12-05 2010-03-10 スリーエム イノベイティブ プロパティズ カンパニー フォトニック結晶の製造方法
EP1621928B1 (en) * 2004-07-30 2008-12-17 Agfa Graphics N.V. Photopolymerizable composition.
DE102004055733B3 (de) * 2004-11-18 2006-05-04 Kodak Polychrome Graphics Gmbh Lithographie-Druckplattenvorläufer mit oligomeren oder polymeren Sensibilisatoren
EP1846527B1 (en) 2004-12-29 2008-08-06 3M Innovative Properties Company Multi-photon polymerizable pre-ceramic polymeric compositions
US7297374B1 (en) 2004-12-29 2007-11-20 3M Innovative Properties Company Single- and multi-photon polymerizable pre-ceramic polymeric compositions
JP2006289613A (ja) * 2005-04-05 2006-10-26 Fuji Photo Film Co Ltd ２光子吸収光記録材料、２光子吸収光記録媒体及びその記録再生方法、並びに２光子吸収光記録再生装置
JP2007078894A (ja) * 2005-09-12 2007-03-29 Fujifilm Corp 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
WO2007112309A2 (en) * 2006-03-24 2007-10-04 3M Innovative Properties Company Process for making microneedles, microneedle arrays, masters, and replication tools
JP5229521B2 (ja) * 2006-09-15 2013-07-03 株式会社リコー π共役系化合物とその用途、およびそれらを用いた素子、装置
JP5162511B2 (ja) * 2009-03-25 2013-03-13 富士フイルム株式会社 非共鳴２光子吸収重合用組成物及びそれを用いた３次元光記録媒体
KR101710319B1 (ko) * 2011-03-07 2017-02-24 산요가세이고교 가부시키가이샤 감광성 조성물, 경화물, 및, 활성 광선 경화물의 제조 방법
CN103492951A (zh) * 2011-04-22 2014-01-01 3M创新有限公司 增大多光子成像分辨率的方法
CN102768466A (zh) * 2011-05-05 2012-11-07 中国科学院理化技术研究所 化学增幅型正性光刻胶、制备方法及其在双光子精细加工中的应用
TWI475321B (zh) * 2013-03-06 2015-03-01 Chi Mei Corp 感光性樹脂組成物及其應用
US10133174B2 (en) 2013-12-06 2018-11-20 3M Innovative Properties Company Liquid photoreactive composition and method of fabricating structures
JP6722672B2 (ja) * 2014-12-19 2020-07-15 コベストロ、ドイチュラント、アクチエンゲゼルシャフトＣｏｖｅｓｔｒｏ Ｄｅｕｔｓｃｈｌａｎｄ Ａｇ 水分に安定なホログラフィック媒体
KR20170002937U (ko) 2016-02-12 2017-08-22 주식회사 오엠티 수납장용 레일 조립체
CN110240615A (zh) * 2018-03-09 2019-09-17 首都师范大学 新型有机小分子材料的合成方法、微晶的制备方法及其应用

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0675374A (ja) * 1992-07-02 1994-03-18 Showa Denko Kk 光硬化性材料及び硬化方法
US5747550A (en) * 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
JPH09160238A (ja) * 1995-12-05 1997-06-20 Toyobo Co Ltd 光重合性組成物、それを用いた感光性原版およびその露光方法
WO1998021521A1 (en) * 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
JPH11116611A (ja) * 1997-10-13 1999-04-27 Tokuyama Sekiyu Kagaku Kk 光重合性組成物
JP3674336B2 (ja) * 1998-10-02 2005-07-20 凸版印刷株式会社 可視光重合性組成物

Also Published As

Publication number Publication date
KR100813320B1 (ko) 2008-03-12
JP2004503616A (ja) 2004-02-05
KR20030011354A (ko) 2003-02-07
JP5059273B2 (ja) 2012-10-24
ATE425993T1 (de) 2009-04-15
EP1297021B1 (en) 2009-03-18
WO2001096409A2 (en) 2001-12-20
AU2001268443A1 (en) 2001-12-24
WO2001096409A3 (en) 2002-04-04
EP1297021A2 (en) 2003-04-02
KR20070118164A (ko) 2007-12-13

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