AU2001268443A1 - Multiphoton photosensitization system - Google Patents

Multiphoton photosensitization system

Info

Publication number
AU2001268443A1
AU2001268443A1 AU2001268443A AU6844301A AU2001268443A1 AU 2001268443 A1 AU2001268443 A1 AU 2001268443A1 AU 2001268443 A AU2001268443 A AU 2001268443A AU 6844301 A AU6844301 A AU 6844301A AU 2001268443 A1 AU2001268443 A1 AU 2001268443A1
Authority
AU
Australia
Prior art keywords
multiphoton
composition
composition comprises
light
photosensitization system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001268443A
Other languages
English (en)
Inventor
Robert J. De Voe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of AU2001268443A1 publication Critical patent/AU2001268443A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymerisation Methods In General (AREA)
  • Glass Compositions (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
AU2001268443A 2000-06-15 2001-06-14 Multiphoton photosensitization system Abandoned AU2001268443A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US21170300P 2000-06-15 2000-06-15
US60211703 2000-06-15
PCT/US2001/019164 WO2001096409A2 (en) 2000-06-15 2001-06-14 Multiphoton photosensitization system

Publications (1)

Publication Number Publication Date
AU2001268443A1 true AU2001268443A1 (en) 2001-12-24

Family

ID=22788007

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001268443A Abandoned AU2001268443A1 (en) 2000-06-15 2001-06-14 Multiphoton photosensitization system

Country Status (7)

Country Link
EP (1) EP1297021B1 (https=)
JP (1) JP5059273B2 (https=)
KR (2) KR20070118164A (https=)
AT (1) ATE425993T1 (https=)
AU (1) AU2001268443A1 (https=)
DE (1) DE60138021D1 (https=)
WO (1) WO2001096409A2 (https=)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001096958A2 (en) * 2000-06-15 2001-12-20 3M Innovative Properties Company Process for producing microfluidic articles
US7265161B2 (en) * 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US7005229B2 (en) * 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
WO2002014305A2 (en) 2000-08-17 2002-02-21 Lumera Corporation Design and synthesis of advanced nlo materials for electro-optic applications
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
JP4001118B2 (ja) 2003-03-24 2007-10-31 ソニー株式会社 有機電界発光素子及びアミノモノスチリルナフタレン化合物
US20050046915A1 (en) * 2003-08-22 2005-03-03 Fuji Photo Film Co., Ltd. Hologram recording material composition, hologram recording material and hologram recording method
EP1510862A3 (en) 2003-08-25 2006-08-09 Fuji Photo Film Co., Ltd. Hologram recording method and hologram recording material
JP2008181143A (ja) * 2003-09-09 2008-08-07 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
JP4556531B2 (ja) * 2003-09-09 2010-10-06 三菱化学株式会社 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、感光性画像形成材及び画像形成方法
EP1723455B1 (en) 2003-12-05 2009-08-12 3M Innovative Properties Company Process for producing photonic crystals
EP1621928B1 (en) * 2004-07-30 2008-12-17 Agfa Graphics N.V. Photopolymerizable composition.
DE102004055733B3 (de) * 2004-11-18 2006-05-04 Kodak Polychrome Graphics Gmbh Lithographie-Druckplattenvorläufer mit oligomeren oder polymeren Sensibilisatoren
KR101233918B1 (ko) 2004-12-29 2013-02-15 쓰리엠 이노베이티브 프로퍼티즈 컴파니 다중-광자 중합성 예비-세라믹 중합체 조성물
US7297374B1 (en) 2004-12-29 2007-11-20 3M Innovative Properties Company Single- and multi-photon polymerizable pre-ceramic polymeric compositions
JP2006289613A (ja) * 2005-04-05 2006-10-26 Fuji Photo Film Co Ltd ２光子吸収光記録材料、２光子吸収光記録媒体及びその記録再生方法、並びに２光子吸収光記録再生装置
JP2007078894A (ja) * 2005-09-12 2007-03-29 Fujifilm Corp 感光性組成物、パターン形成材料、感光性積層体、並びにパターン形成装置及びパターン形成方法
WO2007112309A2 (en) * 2006-03-24 2007-10-04 3M Innovative Properties Company Process for making microneedles, microneedle arrays, masters, and replication tools
JP5229521B2 (ja) * 2006-09-15 2013-07-03 株式会社リコー π共役系化合物とその用途、およびそれらを用いた素子、装置
JP5162511B2 (ja) * 2009-03-25 2013-03-13 富士フイルム株式会社 非共鳴２光子吸収重合用組成物及びそれを用いた３次元光記録媒体
KR101666263B1 (ko) * 2011-03-07 2016-10-13 산요가세이고교 가부시키가이샤 감광성 조성물, 경화물, 및, 활성 광선 경화물의 제조 방법
JP2014517856A (ja) * 2011-04-22 2014-07-24 スリーエム イノベイティブ プロパティズ カンパニー 改善された多光子撮像解像方法
CN102768466A (zh) * 2011-05-05 2012-11-07 中国科学院理化技术研究所 化学增幅型正性光刻胶、制备方法及其在双光子精细加工中的应用
TWI475321B (zh) * 2013-03-06 2015-03-01 Chi Mei Corp 感光性樹脂組成物及其應用
JP6566952B2 (ja) * 2013-12-06 2019-08-28 スリーエム イノベイティブ プロパティズ カンパニー 光反応性液体組成物及び構造体の作製方法
WO2016096641A1 (de) * 2014-12-19 2016-06-23 Covestro Deutschland Ag Feuchtigkeitsstabile holographische medien
KR20170002937U (ko) 2016-02-12 2017-08-22 주식회사 오엠티 수납장용 레일 조립체
CN110240615A (zh) * 2018-03-09 2019-09-17 首都师范大学 新型有机小分子材料的合成方法、微晶的制备方法及其应用

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0675374A (ja) * 1992-07-02 1994-03-18 Showa Denko Kk 光硬化性材料及び硬化方法
US5747550A (en) * 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
JPH09160238A (ja) * 1995-12-05 1997-06-20 Toyobo Co Ltd 光重合性組成物、それを用いた感光性原版およびその露光方法
WO1998021521A1 (en) * 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
JPH11116611A (ja) * 1997-10-13 1999-04-27 Tokuyama Sekiyu Kagaku Kk 光重合性組成物
JP3674336B2 (ja) * 1998-10-02 2005-07-20 凸版印刷株式会社 可視光重合性組成物

Also Published As

Publication number Publication date
WO2001096409A3 (en) 2002-04-04
WO2001096409A2 (en) 2001-12-20
DE60138021D1 (https=) 2009-04-30
JP5059273B2 (ja) 2012-10-24
KR100813320B1 (ko) 2008-03-12
KR20070118164A (ko) 2007-12-13
ATE425993T1 (de) 2009-04-15
JP2004503616A (ja) 2004-02-05
KR20030011354A (ko) 2003-02-07
EP1297021B1 (en) 2009-03-18
EP1297021A2 (en) 2003-04-02

Similar Documents

Publication Publication Date Title
AU2001268443A1 (en) Multiphoton photosensitization system
WO2004110607A3 (en) Multiphoton photosensitization method
AU2002363983A1 (en) Multiphoton photosensitization system
ATE440308T1 (de) Methode und gerät zur erzielung wiederholter multiphotonabsorption
ATE491969T1 (de) Mehrphotonen-fotosensibilisierungssystem
ATE186857T1 (de) Vorrichtung zum härten einer schicht auf einem substrat
ES2129101T3 (es) Metodo y aparato para investigar secuencias de polinucleotidos o de aminoacidos.
ES472499A1 (es) Procedimiento para combatir microorganismos en materiales organicos o sobre ellos y para protegerlos de su ataque
MXPA03006941A (es) Proceso para la determinacion en linea de peroxido de hidrogeno.
DK0862485T3 (da) Apparat til fotodynamisk behandling af levende væsener eller organer fra disse
ATE542568T1 (de) Anordnung zur reduktion von mikroorganismen
DK1027207T3 (da) Fremgangsmåde til at behandle en artikel indeholdende en oxiderbar organisk forbindelse
EP0801072A3 (en) Selective photoinduced flavin-dependent cleavage of rna at g-u base pairs
DK66492D0 (da) Apparat til indfoering af en reaktionskomponent i et under tryk staaende kammer, isaer et braend- eller reaktorkammer
WO2000001477A8 (en) Ultraviolet irradiation apparatus for photochemical reaction and method for preparing vitamin d derivative using the same
EP0204538A3 (en) Phototreating method and apparatus therefor
GB9501579D0 (en) Effecting reactions
ATE349771T1 (de) Reaktor zur beidseitig gleichzeitigen beschichtung von brillengläsern
WO2007076184A3 (en) Method and apparatus for intensity control of multiple light sources
AU6677194A (en) Device and process for optimizing the intensity of radiation directed onto sewage and waste water
NO304514B1 (no) FremgangsmÕte for fremstilling av 3-klorpropionsyre
WO2004046037A3 (en) Purification of contaminated water
WO1999022610A3 (en) Gas irradiation treatment
JPS6459155A (en) Determination of vanillyl mandelate
JPS5230778A (en) Treating method of waste products containing nitrogenous organic subst ances