DE60135851D1 - Plasmaquelle für die spektrometrie - Google Patents

Plasmaquelle für die spektrometrie

Info

Publication number
DE60135851D1
DE60135851D1 DE60135851T DE60135851T DE60135851D1 DE 60135851 D1 DE60135851 D1 DE 60135851D1 DE 60135851 T DE60135851 T DE 60135851T DE 60135851 T DE60135851 T DE 60135851T DE 60135851 D1 DE60135851 D1 DE 60135851D1
Authority
DE
Germany
Prior art keywords
spectrometry
plasma source
plasma
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60135851T
Other languages
English (en)
Inventor
Michael Ron Hammer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Varian Australia Pty Ltd
Original Assignee
Varian Australia Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian Australia Pty Ltd filed Critical Varian Australia Pty Ltd
Application granted granted Critical
Publication of DE60135851D1 publication Critical patent/DE60135851D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/4622—Microwave discharges using waveguides

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Plasma Technology (AREA)
DE60135851T 2000-07-06 2001-07-04 Plasmaquelle für die spektrometrie Expired - Lifetime DE60135851D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
AUPQ8615A AUPQ861500A0 (en) 2000-07-06 2000-07-06 Plasma source for spectrometry
PCT/AU2001/000805 WO2002004930A1 (en) 2000-07-06 2001-07-04 Plasma source for spectrometry

Publications (1)

Publication Number Publication Date
DE60135851D1 true DE60135851D1 (de) 2008-10-30

Family

ID=3822680

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60135851T Expired - Lifetime DE60135851D1 (de) 2000-07-06 2001-07-04 Plasmaquelle für die spektrometrie

Country Status (7)

Country Link
US (1) US6683272B2 (de)
EP (1) EP1305604B1 (de)
JP (1) JP4922530B2 (de)
AU (1) AUPQ861500A0 (de)
CA (1) CA2412529A1 (de)
DE (1) DE60135851D1 (de)
WO (1) WO2002004930A1 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
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US7591957B2 (en) * 2001-01-30 2009-09-22 Rapt Industries, Inc. Method for atmospheric pressure reactive atom plasma processing for surface modification
US7510664B2 (en) * 2001-01-30 2009-03-31 Rapt Industries, Inc. Apparatus and method for atmospheric pressure reactive atom plasma processing for shaping of damage free surfaces
US6660177B2 (en) * 2001-11-07 2003-12-09 Rapt Industries Inc. Apparatus and method for reactive atom plasma processing for material deposition
AU2002331413B2 (en) * 2002-02-11 2007-04-05 Agilent Technologies Australia (M) Pty Ltd Microwave plasma source
AUPS044202A0 (en) * 2002-02-11 2002-03-07 Varian Australia Pty Ltd Microwave plasma source
US20040173316A1 (en) * 2003-03-07 2004-09-09 Carr Jeffrey W. Apparatus and method using a microwave source for reactive atom plasma processing
US7371992B2 (en) 2003-03-07 2008-05-13 Rapt Industries, Inc. Method for non-contact cleaning of a surface
US7297892B2 (en) * 2003-08-14 2007-11-20 Rapt Industries, Inc. Systems and methods for laser-assisted plasma processing
US7304263B2 (en) * 2003-08-14 2007-12-04 Rapt Industries, Inc. Systems and methods utilizing an aperture with a reactive atom plasma torch
JP4064315B2 (ja) * 2003-08-20 2008-03-19 信越化学工業株式会社 誘導結合プラズマトーチ及び元素分析装置
AU2006228986B2 (en) * 2005-03-31 2011-08-11 Agilent Technologies Australia (M) Pty Ltd A plasma spectroscopy system with a gas supply
JP5317692B2 (ja) 2005-03-31 2013-10-16 アジレント・テクノロジーズ・オーストラリア（エム）プロプライエタリー・リミテッド ガス供給源を備えたプラズマ分光システム
US8128788B2 (en) * 2008-09-19 2012-03-06 Rf Thummim Technologies, Inc. Method and apparatus for treating a process volume with multiple electromagnetic generators
KR101750841B1 (ko) * 2009-02-05 2017-06-26 오엘리콘 멧코 아게, 볼렌 기재 표면의 코팅 또는 처리를 위한 플라즈마 코팅 시스템 및 그 방법
EP2420113A4 (de) 2009-04-14 2014-04-02 Rf Thummim Technologies Inc Verfahren und vorrichtung zur erregung von resonanzen in molekülen
US9295968B2 (en) 2010-03-17 2016-03-29 Rf Thummim Technologies, Inc. Method and apparatus for electromagnetically producing a disturbance in a medium with simultaneous resonance of acoustic waves created by the disturbance
JP6323849B2 (ja) * 2012-08-28 2018-05-16 アジレント・テクノロジーズ・インクＡｇｉｌｅｎｔ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｉｎｃ． 電磁導波路およびプラズマ源を含む機器、プラズマ生成方法
US8773225B1 (en) * 2013-03-15 2014-07-08 Agilent Technologies, Inc. Waveguide-based apparatus for exciting and sustaining a plasma
US9247629B2 (en) * 2013-03-15 2016-01-26 Agilent Technologies, Inc. Waveguide-based apparatus for exciting and sustaining a plasma
US9427821B2 (en) 2013-03-15 2016-08-30 Agilent Technologies, Inc. Integrated magnetron plasma torch, and related methods
US9345121B2 (en) * 2014-03-28 2016-05-17 Agilent Technologies, Inc. Waveguide-based apparatus for exciting and sustaining a plasma
JP6732006B2 (ja) 2015-07-31 2020-07-29 アジレント・テクノロジーズ・インクＡｇｉｌｅｎｔ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｉｎｃ． マイクロ波プラズマ生成用チャンバ及びプラズマ生成方法
PL235377B1 (pl) 2016-04-05 2020-07-13 Edward Reszke Adapter kształtujący mikrofalowe pole elektromagnetyczne nagrzewające toroidalne wyładowanie plazmowe
CN106061090B (zh) * 2016-05-31 2019-03-12 吉林大学 一种二次耦合微波等离子体重整装置
RU2650197C1 (ru) * 2017-03-09 2018-04-11 Общество С Ограниченной Ответственностью "Твинн" Многоступенчатый плазмотрон
IT201800020206A1 (it) * 2018-12-19 2020-06-19 Directa Plus Spa Apparecchiatura per il trattamento di materiali con plasma.
CN112996209B (zh) * 2021-05-07 2021-08-10 四川大学 一种微波激发常压等离子体射流的结构和阵列结构

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2533397A2 (fr) * 1982-09-16 1984-03-23 Anvar Perfectionnements aux torches a plasma
JPS6087200U (ja) * 1983-11-15 1985-06-15 新日本無線株式会社 マイクロ波プラズマ発生装置
JPS60189198A (ja) * 1984-03-08 1985-09-26 株式会社日立製作所 高周波放電発生装置
JP2675561B2 (ja) * 1987-12-18 1997-11-12 株式会社日立製作所 プラズマ微量元素分折装置
US4965540A (en) * 1987-12-23 1990-10-23 Hewlett-Packard Company Microwave resonant cavity
JPH0693397B2 (ja) * 1987-12-29 1994-11-16 日本高周波株式会社 熱プラズマ発生装置
DE3905303C2 (de) * 1988-02-24 1996-07-04 Hitachi Ltd Vorrichtung zur Erzeugung eines Plasmas durch Mikrowellen
JP2527150B2 (ja) * 1989-07-25 1996-08-21 豊信 吉田 マイクロ波熱プラズマ・ト―チ
JPH03222298A (ja) * 1990-01-26 1991-10-01 Hitachi Ltd マイクロ波プラズマ極微量元素分析装置
US5349154A (en) * 1991-10-16 1994-09-20 Rockwell International Corporation Diamond growth by microwave generated plasma flame
JPH07120396A (ja) * 1993-10-28 1995-05-12 Hitachi Ltd Ｉｃｐ発光分析装置
TW285746B (de) * 1994-10-26 1996-09-11 Matsushita Electric Ind Co Ltd
US5847355A (en) * 1996-01-05 1998-12-08 California Institute Of Technology Plasma-assisted microwave processing of materials
GB9612070D0 (en) * 1996-06-10 1996-08-14 Micromass Ltd Plasma mass spectrometer
FR2762748B1 (fr) * 1997-04-25 1999-06-11 Air Liquide Dispositif d'excitation d'un gaz par plasma d'onde de surface
RU2171554C2 (ru) * 1999-04-07 2001-07-27 Корчагин Юрий Владимирович Способ генерации плазмы и устройство для его осуществления
US6303007B1 (en) * 1999-11-15 2001-10-16 Archimedes Technology Group, Inc. Plasma injector

Also Published As

Publication number Publication date
JP2004502958A (ja) 2004-01-29
US20030111445A1 (en) 2003-06-19
EP1305604A1 (de) 2003-05-02
JP4922530B2 (ja) 2012-04-25
WO2002004930A1 (en) 2002-01-17
EP1305604B1 (de) 2008-09-17
AUPQ861500A0 (en) 2000-08-03
US6683272B2 (en) 2004-01-27
CA2412529A1 (en) 2002-01-17
EP1305604A4 (de) 2006-08-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition