DE60134317D1 - Material und verfahren für die herstellung eines elektrisch leitfähigen musters - Google Patents
Material und verfahren für die herstellung eines elektrisch leitfähigen mustersInfo
- Publication number
- DE60134317D1 DE60134317D1 DE60134317T DE60134317T DE60134317D1 DE 60134317 D1 DE60134317 D1 DE 60134317D1 DE 60134317 T DE60134317 T DE 60134317T DE 60134317 T DE60134317 T DE 60134317T DE 60134317 D1 DE60134317 D1 DE 60134317D1
- Authority
- DE
- Germany
- Prior art keywords
- production
- electrically conductive
- conductive pattern
- pattern
- electrically
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/093—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antistatic means, e.g. for charge depletion
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Electrodes Of Semiconductors (AREA)
- Manufacturing Of Electric Cables (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00202216 | 2000-06-26 | ||
PCT/EP2001/007083 WO2002006898A2 (en) | 2000-06-26 | 2001-06-22 | Material and method for making an electroconductive pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60134317D1 true DE60134317D1 (de) | 2008-07-17 |
Family
ID=8171695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60134317T Expired - Fee Related DE60134317D1 (de) | 2000-06-26 | 2001-06-22 | Material und verfahren für die herstellung eines elektrisch leitfähigen musters |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1297385B1 (de) |
JP (1) | JP2004504693A (de) |
KR (1) | KR20030076241A (de) |
CN (1) | CN100335970C (de) |
AU (1) | AU2002210414A1 (de) |
DE (1) | DE60134317D1 (de) |
WO (1) | WO2002006898A2 (de) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2003205961A1 (en) | 2002-02-05 | 2003-09-02 | Koninklijke Philips Electronics N.V. | Photo-sensitive composition |
JP4344589B2 (ja) * | 2003-11-11 | 2009-10-14 | 富士通株式会社 | 導電性樹脂組成物、導電性樹脂膜、電子装置の製造方法 |
US20080007518A1 (en) * | 2006-06-23 | 2008-01-10 | Debasis Majumdar | Conductive polymer coating with improved aging stability |
WO2008022908A1 (en) * | 2006-08-21 | 2008-02-28 | Agfa-Gevaert | Uv-photopolymerizable composition for producing organic conductive layers, patterns or prints |
CN101681131A (zh) * | 2007-06-12 | 2010-03-24 | 东亚合成株式会社 | 导电性高分子上的抗蚀剂膜的剥离剂、抗蚀剂膜的剥离方法及具有已图案化的导电性高分子的基板 |
KR101632085B1 (ko) * | 2008-07-29 | 2016-06-20 | 도아고세이가부시키가이샤 | 도전성 고분자의 패턴 형성 방법 |
WO2011055663A1 (ja) * | 2009-11-04 | 2011-05-12 | コニカミノルタホールディングス株式会社 | 透明電極および有機電子デバイス |
WO2011077804A1 (ja) * | 2009-12-22 | 2011-06-30 | コニカミノルタホールディングス株式会社 | 透明電極および有機電子デバイス |
JP5660121B2 (ja) * | 2010-02-24 | 2015-01-28 | コニカミノルタ株式会社 | 透明導電膜、および有機エレクトロルミネッセンス素子 |
JP5720671B2 (ja) * | 2010-03-17 | 2015-05-20 | コニカミノルタ株式会社 | 有機電子デバイスおよびその製造方法 |
EP2557899B1 (de) * | 2010-04-05 | 2016-08-17 | Konica Minolta Holdings, Inc. | Transparente elektrode und organisches elektronisches element damit |
JP5720680B2 (ja) * | 2010-05-28 | 2015-05-20 | コニカミノルタ株式会社 | 有機電子デバイス用電極 |
JP5700044B2 (ja) * | 2010-07-06 | 2015-04-15 | コニカミノルタ株式会社 | 有機光電変換素子およびその製造方法 |
JP5741581B2 (ja) * | 2010-07-29 | 2015-07-01 | コニカミノルタ株式会社 | 透明導電膜、および有機エレクトロルミネッセンス素子 |
WO2012039240A1 (ja) * | 2010-09-24 | 2012-03-29 | コニカミノルタホールディングス株式会社 | 透明電極の製造方法及び有機電子デバイス |
US8987720B2 (en) | 2010-12-13 | 2015-03-24 | Konica Minolta, Inc. | Transparent surface electrode, organic electronic element, and method for manufacturing transparent surface electrode |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH640354A5 (fr) * | 1981-03-24 | 1983-12-30 | Seitz Sa | Centreur pour connecteur de fibres optiques. |
US4914039A (en) * | 1988-04-20 | 1990-04-03 | Hoechst Celanese Corporation | Water developable, negative working overlay or transfer type diazo color proofing system |
DE3903421A1 (de) * | 1989-02-06 | 1990-08-09 | Hoechst Ag | Elektrisch leitfaehige resistmasse, verfahren zu ihrer herstellung und ihre verwendung |
US5246818A (en) * | 1989-08-16 | 1993-09-21 | Hoechst Celanese Corporation | Developer composition for positive working color proofing films |
US5561030A (en) * | 1991-05-30 | 1996-10-01 | Simon Fraser University | Fabrication of electronically conducting polymeric patterns |
JPH05226238A (ja) * | 1991-10-31 | 1993-09-03 | Internatl Business Mach Corp <Ibm> | E−ビームレジスト用の塩基現像可能な放電トップ層 |
JP3112745B2 (ja) * | 1992-06-17 | 2000-11-27 | 富士通株式会社 | パターン形成用導電性組成物及び該組成物を用いたパターン形成方法 |
US5370825A (en) * | 1993-03-03 | 1994-12-06 | International Business Machines Corporation | Water-soluble electrically conducting polymers, their synthesis and use |
-
2001
- 2001-06-22 AU AU2002210414A patent/AU2002210414A1/en not_active Abandoned
- 2001-06-22 JP JP2002512745A patent/JP2004504693A/ja not_active Withdrawn
- 2001-06-22 DE DE60134317T patent/DE60134317D1/de not_active Expired - Fee Related
- 2001-06-22 EP EP01978242A patent/EP1297385B1/de not_active Expired - Lifetime
- 2001-06-22 KR KR1020027017658A patent/KR20030076241A/ko not_active Application Discontinuation
- 2001-06-22 CN CNB018118364A patent/CN100335970C/zh not_active Expired - Fee Related
- 2001-06-22 WO PCT/EP2001/007083 patent/WO2002006898A2/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP2004504693A (ja) | 2004-02-12 |
WO2002006898A2 (en) | 2002-01-24 |
KR20030076241A (ko) | 2003-09-26 |
WO2002006898A3 (en) | 2002-05-02 |
CN1439117A (zh) | 2003-08-27 |
EP1297385A2 (de) | 2003-04-02 |
AU2002210414A1 (en) | 2002-01-30 |
CN100335970C (zh) | 2007-09-05 |
EP1297385B1 (de) | 2008-06-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |