DE60134317D1 - Material und verfahren für die herstellung eines elektrisch leitfähigen musters - Google Patents

Material und verfahren für die herstellung eines elektrisch leitfähigen musters

Info

Publication number
DE60134317D1
DE60134317D1 DE60134317T DE60134317T DE60134317D1 DE 60134317 D1 DE60134317 D1 DE 60134317D1 DE 60134317 T DE60134317 T DE 60134317T DE 60134317 T DE60134317 T DE 60134317T DE 60134317 D1 DE60134317 D1 DE 60134317D1
Authority
DE
Germany
Prior art keywords
production
electrically conductive
conductive pattern
pattern
electrically
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60134317T
Other languages
English (en)
Inventor
Johan Lamotte
Frank Louwet
Damme Marc Van
Joan Vermeersch
Aert Hubertus Van
Lambertus Groenendaal
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agfa Gevaert NV
Agfa Gevaert AG
Original Assignee
Agfa Gevaert NV
Agfa Gevaert AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Gevaert NV, Agfa Gevaert AG filed Critical Agfa Gevaert NV
Application granted granted Critical
Publication of DE60134317D1 publication Critical patent/DE60134317D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/093—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antistatic means, e.g. for charge depletion
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
DE60134317T 2000-06-26 2001-06-22 Material und verfahren für die herstellung eines elektrisch leitfähigen musters Expired - Fee Related DE60134317D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00202216 2000-06-26
PCT/EP2001/007083 WO2002006898A2 (en) 2000-06-26 2001-06-22 Material and method for making an electroconductive pattern

Publications (1)

Publication Number Publication Date
DE60134317D1 true DE60134317D1 (de) 2008-07-17

Family

ID=8171695

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60134317T Expired - Fee Related DE60134317D1 (de) 2000-06-26 2001-06-22 Material und verfahren für die herstellung eines elektrisch leitfähigen musters

Country Status (7)

Country Link
EP (1) EP1297385B1 (de)
JP (1) JP2004504693A (de)
KR (1) KR20030076241A (de)
CN (1) CN100335970C (de)
AU (1) AU2002210414A1 (de)
DE (1) DE60134317D1 (de)
WO (1) WO2002006898A2 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003205961A1 (en) 2002-02-05 2003-09-02 Koninklijke Philips Electronics N.V. Photo-sensitive composition
JP4344589B2 (ja) * 2003-11-11 2009-10-14 富士通株式会社 導電性樹脂組成物、導電性樹脂膜、電子装置の製造方法
US20080007518A1 (en) * 2006-06-23 2008-01-10 Debasis Majumdar Conductive polymer coating with improved aging stability
WO2008022908A1 (en) * 2006-08-21 2008-02-28 Agfa-Gevaert Uv-photopolymerizable composition for producing organic conductive layers, patterns or prints
CN101681131A (zh) * 2007-06-12 2010-03-24 东亚合成株式会社 导电性高分子上的抗蚀剂膜的剥离剂、抗蚀剂膜的剥离方法及具有已图案化的导电性高分子的基板
KR101632085B1 (ko) * 2008-07-29 2016-06-20 도아고세이가부시키가이샤 도전성 고분자의 패턴 형성 방법
WO2011055663A1 (ja) * 2009-11-04 2011-05-12 コニカミノルタホールディングス株式会社 透明電極および有機電子デバイス
WO2011077804A1 (ja) * 2009-12-22 2011-06-30 コニカミノルタホールディングス株式会社 透明電極および有機電子デバイス
JP5660121B2 (ja) * 2010-02-24 2015-01-28 コニカミノルタ株式会社 透明導電膜、および有機エレクトロルミネッセンス素子
JP5720671B2 (ja) * 2010-03-17 2015-05-20 コニカミノルタ株式会社 有機電子デバイスおよびその製造方法
EP2557899B1 (de) * 2010-04-05 2016-08-17 Konica Minolta Holdings, Inc. Transparente elektrode und organisches elektronisches element damit
JP5720680B2 (ja) * 2010-05-28 2015-05-20 コニカミノルタ株式会社 有機電子デバイス用電極
JP5700044B2 (ja) * 2010-07-06 2015-04-15 コニカミノルタ株式会社 有機光電変換素子およびその製造方法
JP5741581B2 (ja) * 2010-07-29 2015-07-01 コニカミノルタ株式会社 透明導電膜、および有機エレクトロルミネッセンス素子
WO2012039240A1 (ja) * 2010-09-24 2012-03-29 コニカミノルタホールディングス株式会社 透明電極の製造方法及び有機電子デバイス
US8987720B2 (en) 2010-12-13 2015-03-24 Konica Minolta, Inc. Transparent surface electrode, organic electronic element, and method for manufacturing transparent surface electrode

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH640354A5 (fr) * 1981-03-24 1983-12-30 Seitz Sa Centreur pour connecteur de fibres optiques.
US4914039A (en) * 1988-04-20 1990-04-03 Hoechst Celanese Corporation Water developable, negative working overlay or transfer type diazo color proofing system
DE3903421A1 (de) * 1989-02-06 1990-08-09 Hoechst Ag Elektrisch leitfaehige resistmasse, verfahren zu ihrer herstellung und ihre verwendung
US5246818A (en) * 1989-08-16 1993-09-21 Hoechst Celanese Corporation Developer composition for positive working color proofing films
US5561030A (en) * 1991-05-30 1996-10-01 Simon Fraser University Fabrication of electronically conducting polymeric patterns
JPH05226238A (ja) * 1991-10-31 1993-09-03 Internatl Business Mach Corp <Ibm> Ｅ−ビームレジスト用の塩基現像可能な放電トップ層
JP3112745B2 (ja) * 1992-06-17 2000-11-27 富士通株式会社 パターン形成用導電性組成物及び該組成物を用いたパターン形成方法
US5370825A (en) * 1993-03-03 1994-12-06 International Business Machines Corporation Water-soluble electrically conducting polymers, their synthesis and use

Also Published As

Publication number Publication date
JP2004504693A (ja) 2004-02-12
WO2002006898A2 (en) 2002-01-24
KR20030076241A (ko) 2003-09-26
WO2002006898A3 (en) 2002-05-02
CN1439117A (zh) 2003-08-27
EP1297385A2 (de) 2003-04-02
AU2002210414A1 (en) 2002-01-30
CN100335970C (zh) 2007-09-05
EP1297385B1 (de) 2008-06-04

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee