DE60132194T2 - Thioimidazolidinderivate als lichtschutzmittel für polymere - Google Patents

Thioimidazolidinderivate als lichtschutzmittel für polymere Download PDF

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Publication number
DE60132194T2
DE60132194T2 DE60132194T DE60132194T DE60132194T2 DE 60132194 T2 DE60132194 T2 DE 60132194T2 DE 60132194 T DE60132194 T DE 60132194T DE 60132194 T DE60132194 T DE 60132194T DE 60132194 T2 DE60132194 T2 DE 60132194T2
Authority
DE
Germany
Prior art keywords
alkylene
alkyl
sub
independently
phenylene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60132194T
Other languages
German (de)
English (en)
Other versions
DE60132194D1 (de
Inventor
Dario Lazzari
Graziano Zagnoni
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding AG filed Critical Ciba Holding AG
Application granted granted Critical
Publication of DE60132194D1 publication Critical patent/DE60132194D1/de
Publication of DE60132194T2 publication Critical patent/DE60132194T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/14—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing three or more hetero rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/04—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D233/28—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D233/30—Oxygen or sulfur atoms
    • C07D233/42—Sulfur atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
    • C07D403/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings
    • C07D403/12—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing two hetero rings linked by a chain containing hetero atoms as chain links
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D403/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00
    • C07D403/14—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, not provided for by group C07D401/00 containing three or more hetero rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37—Thiols
    • C08K5/378—Thiols containing heterocyclic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/34—Fog-inhibitors; Stabilisers; Agents inhibiting latent image regression
    • G03C1/346—Organic derivatives of bivalent sulfur, selenium or tellurium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Hydrogenated Pyridines (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Anti-Oxidant Or Stabilizer Compositions (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Polarising Elements (AREA)
  • Treatment Of Liquids With Adsorbents In General (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
DE60132194T 2000-02-25 2001-02-19 Thioimidazolidinderivate als lichtschutzmittel für polymere Expired - Lifetime DE60132194T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00810161 2000-02-25
EP00810161 2000-02-25
PCT/EP2001/001829 WO2001062739A2 (en) 2000-02-25 2001-02-19 Thioimidazolidine derivatives as light stabilizers for polymers

Publications (2)

Publication Number Publication Date
DE60132194D1 DE60132194D1 (de) 2008-02-14
DE60132194T2 true DE60132194T2 (de) 2008-12-24

Family

ID=8174569

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60132194T Expired - Lifetime DE60132194T2 (de) 2000-02-25 2001-02-19 Thioimidazolidinderivate als lichtschutzmittel für polymere

Country Status (9)

Country Link
US (1) US6924330B2 (enExample)
EP (1) EP1282605B1 (enExample)
JP (1) JP2003524004A (enExample)
AT (1) ATE382608T1 (enExample)
AU (1) AU3548401A (enExample)
CA (1) CA2399183A1 (enExample)
DE (1) DE60132194T2 (enExample)
TW (1) TW561151B (enExample)
WO (1) WO2001062739A2 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6734149B2 (en) 2001-01-24 2004-05-11 Rohm And Haas Company Combination of additives for lubricating oils
DE60200029T2 (de) 2001-01-24 2004-04-22 Rohm And Haas Co. Thioimidazolidin Derivate als öllösliche Additive für Schmierölen
US20030073835A1 (en) 2001-07-31 2003-04-17 Dario Lazzari Imidazolidinone derivatives
US6998368B2 (en) 2002-08-07 2006-02-14 Rohm And Haas Company Cyclic nitroxyl compounds as additives for lubricating oils
US7678849B2 (en) * 2005-03-29 2010-03-16 Honda Motor Co., Ltd. High chroma hals stabilized polymer composition
EP3224314B1 (en) 2014-11-24 2019-06-26 Lubrizol Advanced Materials, Inc. Novel coupled uracil compound for vinyl chloride polymer resins
US11021574B2 (en) * 2016-12-02 2021-06-01 3M Innovative Properties Company Dual cure monomers
CN107739344A (zh) * 2017-10-10 2018-02-27 浙江新东港药业股份有限公司 制备Lesinurd的方法及其中间体

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3205195A (en) * 1962-01-02 1965-09-07 Firestone Tire & Rubber Co Imidazolidine thione stabilizers for synthetic rubbers
DE1695737B2 (de) * 1966-06-15 1976-09-23 Sankyo Co. Ltd., Tokio 2,2,5,5-tetrasubstituierte imidazolidin-4-on-1-oxide
CA979709A (en) * 1970-08-27 1975-12-16 Anita Von Konig Photographic material having improved properties
DE2042533C3 (de) 1970-08-27 1981-10-01 Agfa-Gevaert Ag, 5090 Leverkusen Verfahren zur Herstellung photographischer Silberhalogenidemulsionen
CH579117A5 (enExample) * 1973-06-22 1976-08-31 Ciba Geigy Ag
DE2621947A1 (de) * 1975-05-23 1976-12-09 Ciba Geigy Ag Neue hydroxide von 3-alkyl-4-oxo- imidazolidinen

Also Published As

Publication number Publication date
ATE382608T1 (de) 2008-01-15
EP1282605B1 (en) 2008-01-02
WO2001062739A2 (en) 2001-08-30
CA2399183A1 (en) 2001-08-30
TW561151B (en) 2003-11-11
DE60132194D1 (de) 2008-02-14
EP1282605A2 (en) 2003-02-12
JP2003524004A (ja) 2003-08-12
US20030109609A1 (en) 2003-06-12
US6924330B2 (en) 2005-08-02
AU3548401A (en) 2001-09-03
WO2001062739A3 (en) 2002-02-14

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: CIBA HOLDING INC., BASEL, CH

8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: MAIWALD PATENTANWALTSGESELLSCHAFT MBH, 80335 MUENC