DE60123092D1 - Anordnung zur direkten bilderzeugung durch laser - Google Patents

Anordnung zur direkten bilderzeugung durch laser

Info

Publication number
DE60123092D1
DE60123092D1 DE60123092T DE60123092T DE60123092D1 DE 60123092 D1 DE60123092 D1 DE 60123092D1 DE 60123092 T DE60123092 T DE 60123092T DE 60123092 T DE60123092 T DE 60123092T DE 60123092 D1 DE60123092 D1 DE 60123092D1
Authority
DE
Germany
Prior art keywords
media surface
laser
optical path
light source
positioned along
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60123092T
Other languages
English (en)
Other versions
DE60123092T2 (de
Inventor
C Fitzer
Thien Tran
Biljana Tadic-Galeb
L Bartz
C Grillo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Application granted granted Critical
Publication of DE60123092D1 publication Critical patent/DE60123092D1/de
Publication of DE60123092T2 publication Critical patent/DE60123092T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/447—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
    • B41J2/455—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources using laser arrays, the laser array being smaller than the medium to be recorded
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
    • B41J2/475—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material for heating selectively by radiation or ultrasonic waves
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/125—Details of the optical system between the polygonal mirror and the image plane
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1033—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials by laser or spark ablation

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Facsimile Scanning Arrangements (AREA)
  • Laser Beam Printer (AREA)
  • Lenses (AREA)
  • Laser Surgery Devices (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Lasers (AREA)
DE60123092T 2000-10-10 2001-02-16 Anordnung zur direkten bilderzeugung durch laser Expired - Fee Related DE60123092T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US685754 2000-10-10
US09/685,754 US6396616B1 (en) 2000-10-10 2000-10-10 Direct laser imaging system
PCT/US2001/005154 WO2002030675A1 (en) 2000-10-10 2001-02-16 Direct laser imaging system

Publications (2)

Publication Number Publication Date
DE60123092D1 true DE60123092D1 (de) 2006-10-26
DE60123092T2 DE60123092T2 (de) 2007-04-19

Family

ID=24753538

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60123092T Expired - Fee Related DE60123092T2 (de) 2000-10-10 2001-02-16 Anordnung zur direkten bilderzeugung durch laser

Country Status (9)

Country Link
US (1) US6396616B1 (de)
EP (1) EP1324883B1 (de)
JP (1) JP2004512549A (de)
KR (1) KR100698344B1 (de)
AT (1) ATE339318T1 (de)
AU (1) AU2001243181A1 (de)
DE (1) DE60123092T2 (de)
TW (1) TW523968B (de)
WO (1) WO2002030675A1 (de)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4397571B2 (ja) 2001-09-25 2010-01-13 株式会社半導体エネルギー研究所 レーザ照射方法およびレーザ照射装置、並びに半導体装置の作製方法
US6750423B2 (en) * 2001-10-25 2004-06-15 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation method, laser irradiation apparatus, and method of manufacturing a semiconductor device
US6700096B2 (en) * 2001-10-30 2004-03-02 Semiconductor Energy Laboratory Co., Ltd. Laser apparatus, laser irradiation method, manufacturing method for semiconductor device, semiconductor device, production system for semiconductor device using the laser apparatus, and electronic equipment
TWI289896B (en) * 2001-11-09 2007-11-11 Semiconductor Energy Lab Laser irradiation apparatus, laser irradiation method, and method of manufacturing a semiconductor device
TWI291729B (en) * 2001-11-22 2007-12-21 Semiconductor Energy Lab A semiconductor fabricating apparatus
CN100508140C (zh) * 2001-11-30 2009-07-01 株式会社半导体能源研究所 用于半导体器件的制造方法
JP3949564B2 (ja) * 2001-11-30 2007-07-25 株式会社半導体エネルギー研究所 レーザ照射装置及び半導体装置の作製方法
US7133737B2 (en) * 2001-11-30 2006-11-07 Semiconductor Energy Laboratory Co., Ltd. Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer
US7214573B2 (en) 2001-12-11 2007-05-08 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a semiconductor device that includes patterning sub-islands
US7449146B2 (en) * 2002-09-30 2008-11-11 3M Innovative Properties Company Colorimetric sensor
US20040062682A1 (en) * 2002-09-30 2004-04-01 Rakow Neal Anthony Colorimetric sensor
US7338820B2 (en) * 2002-12-19 2008-03-04 3M Innovative Properties Company Laser patterning of encapsulated organic light emitting diodes
JP4282985B2 (ja) * 2002-12-27 2009-06-24 株式会社半導体エネルギー研究所 表示装置の作製方法
US7397592B2 (en) * 2003-04-21 2008-07-08 Semiconductor Energy Laboratory Co., Ltd. Beam irradiation apparatus, beam irradiation method, and method for manufacturing a thin film transistor
US6894843B2 (en) * 2003-05-23 2005-05-17 Foxlink Image Technology Co., Ltd. Optical apparatus for a line scanner system with reduced optical total track
JP4027359B2 (ja) * 2003-12-25 2007-12-26 キヤノン株式会社 マイクロ揺動体、光偏向器、画像形成装置
US20050155500A1 (en) * 2004-01-16 2005-07-21 Icon Textile Laser Systems, Inc. Screen printing and laser treating system and method
KR100634539B1 (ko) * 2005-02-07 2006-10-13 삼성전자주식회사 주사 광학 이미징 시스템
JP2009503593A (ja) * 2005-08-02 2009-01-29 カール ツァイス レーザー オプティクス ゲーエムベーハー 線焦点を作成する光学システム、この光学システムを用いる走査システム、および基板のレーザ加工方法
JP2007110064A (ja) 2005-09-14 2007-04-26 Ishikawajima Harima Heavy Ind Co Ltd レーザアニール方法及び装置
DE202005015719U1 (de) 2005-10-07 2005-12-08 Trumpf Laser Gmbh + Co. Kg F/theta-Objektiv und Scannervorrichtung damit
US8293340B2 (en) 2005-12-21 2012-10-23 3M Innovative Properties Company Plasma deposited microporous analyte detection layer
US7556774B2 (en) * 2005-12-21 2009-07-07 3M Innovative Properties Company Optochemical sensor and method of making the same
CN100443954C (zh) * 2006-03-17 2008-12-17 郎欢标 光学输入方法、设备及该设备的分光式镜头模组
US7767143B2 (en) 2006-06-27 2010-08-03 3M Innovative Properties Company Colorimetric sensors
US7857463B2 (en) * 2007-03-29 2010-12-28 Texas Instruments Incorporated Optical system for a thin, low-chin, projection television
WO2010046830A1 (en) * 2008-10-21 2010-04-29 Koninklijke Philips Electronics N.V. Patterned oled device, method of generating a patterning, system for patterning and method of calibrating the system
JP2012513601A (ja) 2008-12-23 2012-06-14 スリーエム イノベイティブ プロパティズ カンパニー 微多孔性有機ケイ酸塩材料を有する有機化学センサ
CN102405409B (zh) 2008-12-23 2014-11-05 3M创新有限公司 具有微孔有机硅材料的有机化学传感器
JP2011005951A (ja) 2009-06-25 2011-01-13 Nifco Inc 押上装置
KR101124347B1 (ko) * 2011-01-25 2012-03-23 주식회사아톤 사각 방향으로 조사되는 스캔된 레이저 빔을 이용한 대상물의 가공 방법 및 그 장치
JP6049686B2 (ja) 2011-03-28 2016-12-21 スリーエム イノベイティブ プロパティズ カンパニー マスキング層接着剤を含むセンサー
CN103620506B (zh) 2011-06-10 2016-11-16 惠普发展公司，有限责任合伙企业 光学扫描装置、系统和方法
US8531751B2 (en) 2011-08-19 2013-09-10 Orbotech Ltd. System and method for direct imaging
PT2869963T (pt) * 2012-07-04 2017-01-03 Saint Gobain Dispositivo e processo para o transformação a laser de substratos de grande superfície mediante a utilização de pelo menos duas pontes
US9798150B2 (en) 2012-10-10 2017-10-24 Broadcast 3Dtv, Inc. System for distributing auto-stereoscopic images
US8797611B2 (en) 2012-12-12 2014-08-05 Hewlett-Packard Development Company, L.P. Illumination assembly
DE102016211811B4 (de) 2016-06-30 2022-02-24 Trumpf Laser Gmbh F-Theta-Objektiv und Scannervorrichtung damit
TWI625604B (zh) * 2016-12-29 2018-06-01 旭東機械工業股份有限公司 穿透式雷射直接成像系統
TWI666526B (zh) * 2017-10-31 2019-07-21 旭東機械工業股份有限公司 無光罩雷射直寫曝光機
JP7117555B2 (ja) * 2018-03-08 2022-08-15 パナソニックＩｐマネジメント株式会社 レーザレーダ
GB2580052B (en) 2018-12-20 2021-01-06 Exalos Ag Source module and optical system for line-field imaging
CN112631078A (zh) * 2019-10-08 2021-04-09 旭东机械工业股份有限公司 反射式无掩膜激光直写曝光机

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4099830A (en) 1976-12-15 1978-07-11 A. J. Bingley Limited Optical systems including polygonal mirrors rotatable about two axes
US4499437A (en) 1981-07-08 1985-02-12 Eastman Kodak Company Apparatus and method providing improved control of a laser beam
JPS5986025A (ja) 1982-11-10 1984-05-18 Fuji Photo Film Co Ltd 光量補正装置
US4796038A (en) 1985-07-24 1989-01-03 Ateq Corporation Laser pattern generation apparatus
US5241330A (en) 1990-10-02 1993-08-31 Dainippon Screen Mfg. Co., Ltd. Beam recording with scanning speed change due to F.θ lens characteristics
US5298729A (en) 1992-02-14 1994-03-29 Ncr Corporation Multiple depth of field optical scanner
US5309178A (en) 1992-05-12 1994-05-03 Optrotech Ltd. Laser marking apparatus including an acoustic modulator
JPH0631974A (ja) 1992-07-17 1994-02-08 Hitachi Koki Co Ltd 光記録方法
US5392149A (en) 1992-10-20 1995-02-21 E-Systems, Inc. Polygonal mirror optical scanning system
JPH06202024A (ja) 1992-11-13 1994-07-22 Minolta Camera Co Ltd レーザビーム走査光学系
JPH06305189A (ja) 1993-04-23 1994-11-01 Canon Inc 画像形成方法
US5625402A (en) 1993-04-30 1997-04-29 Eastman Kodak Company Digital printers using multiple lasers or laser arrays with different wavelengths
JP2951842B2 (ja) 1993-08-13 1999-09-20 東芝テック株式会社 光走査装置
JP3031801B2 (ja) 1993-08-20 2000-04-10 富士写真フイルム株式会社 熱記録方法および装置
GB9318804D0 (en) 1993-09-10 1993-10-27 Ici Plc Optical data recordal
US5659532A (en) * 1994-08-15 1997-08-19 Matsushita Electric Industrial Co., Ltd. Optical scanning apparatus with polygon mirrors reflecting light beam at a constant speed larger than dθ/dt
EP0708520A1 (de) 1994-10-17 1996-04-24 Megapower International Corporation U.S.A. Magnetisch angetriebener Motor
EP0708550A3 (de) * 1994-10-18 1998-01-14 Minnesota Mining And Manufacturing Company Bildaufzeichnung durch Ablationsübertragung unter Verwendung von Laserstrahlen nullter Ordnung in einer Flachfeldabtastvorrichtung
KR960032037A (ko) 1995-02-25 1996-09-17 김광호 광주사장치
DE69601432T2 (de) 1995-03-16 1999-10-07 Minnesota Mining & Mfg Schwarz-Metall wärmebildbare Transparenz-Elemente
US5822345A (en) 1996-07-08 1998-10-13 Presstek, Inc. Diode-pumped laser system and method
US5929892A (en) 1996-08-26 1999-07-27 Hewlett-Packard Company Beam deflecting for enhanced laser printer scanning
US5875206A (en) 1996-09-10 1999-02-23 Mitsubishi Chemical America, Inc. Laser diode pumped solid state laser, printer and method using same
US5867298A (en) 1996-12-16 1999-02-02 Eastman Kodak Company Dual format pre-objective scanner
US6023059A (en) 1998-01-14 2000-02-08 Eastman Kodak Company Dual format pre-objective scanner

Also Published As

Publication number Publication date
WO2002030675A1 (en) 2002-04-18
JP2004512549A (ja) 2004-04-22
TW523968B (en) 2003-03-11
DE60123092T2 (de) 2007-04-19
US6396616B1 (en) 2002-05-28
EP1324883B1 (de) 2006-09-13
EP1324883A1 (de) 2003-07-09
AU2001243181A1 (en) 2002-04-22
KR100698344B1 (ko) 2007-03-23
ATE339318T1 (de) 2006-10-15
KR20030041156A (ko) 2003-05-23

Similar Documents

Publication Publication Date Title
DE60123092D1 (de) Anordnung zur direkten bilderzeugung durch laser
KR960042115A (ko) 광학 소자 및 이를 이용하는 주사 광학 장치
EP0400830A3 (de) Laser
EP0851261A3 (de) Optisches Abtastgerät
ATE408167T1 (de) Linsenabbildungssystem mit zwei positiven linsen
EP1199592A3 (de) Optisches Abtastgerät
EP0853253A3 (de) Optisches Abtastgerät
US8279499B2 (en) Single LED dual light guide
EP1677135A3 (de) Optische Abtastvorrichtung und Verfahren zu dessen Einstellung
EP1300838A3 (de) Optische Kopfanordnung und Optisches Gerät zur Verwendung derselben
WO2001086326A3 (en) Solid immersion lenses for focusing collimated light in the near-field region
WO2003101754A3 (en) System and method for direct laser engraving of images onto a printing substrate
EP1130438A3 (de) Optisches Abtastgerät mit einer Linse, die auf beiden Seiten asphärische Oberflächen hat
DE60321643D1 (de) Linsenabbildungssystem
EP1724769A3 (de) Optisches Aufzeichnungsmedium sowie optisches Aufzeichnungs- und Wiedergabeverfahren
JP2005140843A5 (de)
TW200604720A (en) Projection optical system and pattern writing apparatus
EP1124151A3 (de) Optische Abtastvorrichtung und diese verwendendes Bilderzeugungsgerät
AU2826789A (en) An optical system for laser marking
EP0940701A3 (de) Optischer Koppler mit anamorphotischer Mikrolinse
JPH06501792A (ja) マイクロリレーレンズとして使用するに適した高開口数の有限共役レンズ系及びそのレンズ系を用いたプリンタ
MY125818A (en) Optical scanning device and optical apparatus for reading and/or writing information in an information plane provided with such a device
WO2002084214A8 (en) Optical apparatus for measuring objects having a rectilinear profile
KR970022570A (ko) 투영 광학계 및 노광 장치
EP1345064A3 (de) Laserbelichtungsgerät mit Matrix aus brechenden Elementen

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee