DE60102518D1 - Mehrfachbehälter für die Spülung mit einem hochreinen Lösungsmittel - Google Patents

Mehrfachbehälter für die Spülung mit einem hochreinen Lösungsmittel

Info

Publication number
DE60102518D1
DE60102518D1 DE60102518T DE60102518T DE60102518D1 DE 60102518 D1 DE60102518 D1 DE 60102518D1 DE 60102518 T DE60102518 T DE 60102518T DE 60102518 T DE60102518 T DE 60102518T DE 60102518 D1 DE60102518 D1 DE 60102518D1
Authority
DE
Germany
Prior art keywords
solvent
rinsing
eliminates
multiple containers
customer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60102518T
Other languages
English (en)
Other versions
DE60102518T2 (de
Inventor
Robert Sam Zorich
David Allen Roberts
George Oleg Voloshin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Products and Chemicals Inc
Original Assignee
Air Products and Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Products and Chemicals Inc filed Critical Air Products and Chemicals Inc
Publication of DE60102518D1 publication Critical patent/DE60102518D1/de
Application granted granted Critical
Publication of DE60102518T2 publication Critical patent/DE60102518T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08Cleaning containers, e.g. tanks
    • B08B9/20Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought
    • B08B9/28Cleaning containers, e.g. tanks by using apparatus into or on to which containers, e.g. bottles, jars, cans are brought the apparatus cleaning by splash, spray, or jet application, with or without soaking
    • B08B9/34Arrangements of conduits or nozzles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/02Cleaning pipes or tubes or systems of pipes or tubes
    • B08B9/027Cleaning the internal surfaces; Removal of blockages
    • B08B9/032Cleaning the internal surfaces; Removal of blockages by the mechanical action of a moving fluid, e.g. by flushing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4407Cleaning of reactor or reactor parts by using wet or mechanical methods
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/2931Diverse fluid containing pressure systems
    • Y10T137/3115Gas pressure storage over or displacement of liquid
    • Y10T137/3127With gas maintenance or application
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/4238With cleaner, lubrication added to fluid or liquid sealing at valve interface
    • Y10T137/4245Cleaning or steam sterilizing
    • Y10T137/4259With separate material addition
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/8593Systems
    • Y10T137/86348Tank with internally extending flow guide, pipe or conduit

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Cleaning In General (AREA)
  • Loading And Unloading Of Fuel Tanks Or Ships (AREA)
  • Gas Separation By Absorption (AREA)
  • Detergent Compositions (AREA)
DE2001602518 2000-06-21 2001-06-19 Mehrfachbehälter für die Spülung mit einem hochreinen Lösungsmittel Expired - Lifetime DE60102518T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US21309200P 2000-06-21 2000-06-21
US213092P 2000-06-21
US21579600P 2000-07-05 2000-07-05
US215796P 2000-07-05
US675376 2000-09-29
US09/675,376 US6837251B1 (en) 2000-06-21 2000-09-29 Multiple contents container assembly for ultrapure solvent purging

Publications (2)

Publication Number Publication Date
DE60102518D1 true DE60102518D1 (de) 2004-05-06
DE60102518T2 DE60102518T2 (de) 2005-02-03

Family

ID=27395824

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2001602518 Expired - Lifetime DE60102518T2 (de) 2000-06-21 2001-06-19 Mehrfachbehälter für die Spülung mit einem hochreinen Lösungsmittel

Country Status (8)

Country Link
US (3) US6837251B1 (de)
EP (1) EP1166900B1 (de)
JP (1) JP3554294B2 (de)
KR (1) KR100396037B1 (de)
CN (1) CN1220558C (de)
AT (1) ATE262986T1 (de)
DE (1) DE60102518T2 (de)
TW (1) TW495392B (de)

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US6958300B2 (en) * 2002-08-28 2005-10-25 Micron Technology, Inc. Systems and methods for forming metal oxides using metal organo-amines and metal organo-oxides
US7112485B2 (en) 2002-08-28 2006-09-26 Micron Technology, Inc. Systems and methods for forming zirconium and/or hafnium-containing layers
KR100464010B1 (ko) * 2002-11-19 2004-12-31 엘지전자 주식회사 자동차용 정보재생 장치의 잠금장치
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US7124913B2 (en) 2003-06-24 2006-10-24 Air Products And Chemicals, Inc. High purity chemical container with diptube and level sensor terminating in lowest most point of concave floor
US7261118B2 (en) * 2003-08-19 2007-08-28 Air Products And Chemicals, Inc. Method and vessel for the delivery of precursor materials
US7293569B2 (en) * 2005-12-13 2007-11-13 Air Liquide Electronics U.S. Lp Alkylsilanes as solvents for low vapor pressure precursors
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US8518483B2 (en) * 2007-01-29 2013-08-27 Praxair Technology, Inc. Diptube apparatus and method for delivering vapor phase reagent to a deposition chamber
DE102007023085A1 (de) * 2007-05-16 2007-10-25 Alldos Eichler Gmbh Vorrichtung zur Erzeugung von fluiden Reaktionsprodukten
US20090258143A1 (en) * 2008-04-11 2009-10-15 Peck John D Reagent dispensing apparatus and delivery method
US20090255466A1 (en) * 2008-04-11 2009-10-15 Peck John D Reagent dispensing apparatus and delivery method
US8328938B2 (en) * 2008-08-21 2012-12-11 United Microelectronics Corp. Buffer apparatus and thin film deposition system
US8261908B2 (en) * 2008-12-05 2012-09-11 Linde Aktiengesellschaft Container for precursors used in deposition processes
US8491720B2 (en) * 2009-04-10 2013-07-23 Applied Materials, Inc. HVPE precursor source hardware
US8912353B2 (en) 2010-06-02 2014-12-16 Air Products And Chemicals, Inc. Organoaminosilane precursors and methods for depositing films comprising same
US9677178B2 (en) 2012-01-27 2017-06-13 Versum Materials Us, Llc Alkoxyaminosilane compounds and applications thereof
US9200167B2 (en) 2012-01-27 2015-12-01 Air Products And Chemicals, Inc. Alkoxyaminosilane compounds and applications thereof
DE102012204902A1 (de) * 2012-03-27 2013-10-02 Evonik Degussa Gmbh Gebinde zur Handhabung und für den Transport von hochreinen und ultra hochreinen Chemikalien
US9978585B2 (en) 2012-06-01 2018-05-22 Versum Materials Us, Llc Organoaminodisilane precursors and methods for depositing films comprising same
US9337018B2 (en) 2012-06-01 2016-05-10 Air Products And Chemicals, Inc. Methods for depositing films with organoaminodisilane precursors
US20140174656A1 (en) * 2012-12-20 2014-06-26 Intermolecular, Inc. Method to Improve the Operational Robustness and Safety of Combinatorial Processing Systems
US8765546B1 (en) 2013-06-24 2014-07-01 United Microelectronics Corp. Method for fabricating fin-shaped field-effect transistor
TWI726944B (zh) * 2015-12-06 2021-05-11 美商應用材料股份有限公司 用於封閉金屬容器的連續液體位準量測偵測器
US11236866B2 (en) 2018-09-03 2022-02-01 Te-Ming Chiang Liquid transfer apparatus
US11186421B2 (en) * 2019-09-25 2021-11-30 Custom Biogenic Systems, Inc. Storage tank device configured to prevent ice formation
US20210123134A1 (en) * 2019-10-24 2021-04-29 Entegris, Inc. Sublimation ampoule with level sensing
KR20210119802A (ko) * 2020-03-25 2021-10-06 삼성전자주식회사 가스 용기 및 이를 포함하는 증착 시스템
CN112090454A (zh) * 2020-09-16 2020-12-18 浙江天顺生物科技有限公司 一种大孔弱碱性苯乙烯阴离子交换树脂方法及其设备
US20230113646A1 (en) * 2021-10-05 2023-04-13 Entegris, Inc. Precursor delivery systems for determining material levels
TW202413383A (zh) 2022-08-12 2024-04-01 美商蓋列斯特股份有限公司 含不飽和取代基之高純度錫化合物及其製造方法

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Also Published As

Publication number Publication date
EP1166900B1 (de) 2004-03-31
US6913029B2 (en) 2005-07-05
KR20010114168A (ko) 2001-12-29
EP1166900A3 (de) 2003-07-09
EP1166900A2 (de) 2002-01-02
KR100396037B1 (ko) 2003-08-27
JP3554294B2 (ja) 2004-08-18
US6840252B2 (en) 2005-01-11
JP2002159929A (ja) 2002-06-04
TW495392B (en) 2002-07-21
US20050028841A1 (en) 2005-02-10
CN1220558C (zh) 2005-09-28
CN1356181A (zh) 2002-07-03
DE60102518T2 (de) 2005-02-03
US6837251B1 (en) 2005-01-04
ATE262986T1 (de) 2004-04-15
US20040028569A1 (en) 2004-02-12

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Legal Events

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8364 No opposition during term of opposition