DE60035054T2 - Ionenstrahl-Vakuumzerstäubungsapparatur und Verfahren - Google Patents
Ionenstrahl-Vakuumzerstäubungsapparatur und Verfahren Download PDFInfo
- Publication number
- DE60035054T2 DE60035054T2 DE60035054T DE60035054T DE60035054T2 DE 60035054 T2 DE60035054 T2 DE 60035054T2 DE 60035054 T DE60035054 T DE 60035054T DE 60035054 T DE60035054 T DE 60035054T DE 60035054 T2 DE60035054 T2 DE 60035054T2
- Authority
- DE
- Germany
- Prior art keywords
- target
- substrate
- voltage
- grid
- power supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims description 27
- 238000001659 ion-beam spectroscopy Methods 0.000 title description 3
- 239000000758 substrate Substances 0.000 claims abstract description 82
- 150000002500 ions Chemical class 0.000 claims abstract description 68
- 238000004544 sputter deposition Methods 0.000 claims abstract description 42
- 238000000151 deposition Methods 0.000 claims abstract description 40
- 239000000463 material Substances 0.000 claims abstract description 40
- 230000008021 deposition Effects 0.000 claims abstract description 33
- 230000010354 integration Effects 0.000 claims abstract description 17
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 6
- 230000001133 acceleration Effects 0.000 claims description 59
- 238000010884 ion-beam technique Methods 0.000 claims description 31
- 239000010409 thin film Substances 0.000 claims description 13
- 238000007599 discharging Methods 0.000 claims description 9
- 238000010304 firing Methods 0.000 claims description 5
- 230000001154 acute effect Effects 0.000 claims description 3
- 230000003750 conditioning effect Effects 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims 2
- 239000008141 laxative Substances 0.000 claims 2
- 229940125722 laxative agent Drugs 0.000 claims 2
- 238000000605 extraction Methods 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 15
- 239000007789 gas Substances 0.000 description 11
- 238000010276 construction Methods 0.000 description 9
- 239000002131 composite material Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 7
- 238000005259 measurement Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000013077 target material Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 238000000427 thin-film deposition Methods 0.000 description 2
- 101100232929 Caenorhabditis elegans pat-4 gene Proteins 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005513 bias potential Methods 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012806 monitoring device Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000011664 nicotinic acid Substances 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3142—Ion plating
- H01J2237/3146—Ion beam bombardment sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9922110 | 1999-09-17 | ||
| GBGB9922110.3A GB9922110D0 (en) | 1999-09-17 | 1999-09-17 | Ion beam vacuum sputtering apparatus and method |
| PCT/GB2000/003577 WO2001022470A1 (en) | 1999-09-17 | 2000-09-18 | Ion beam vacuum sputtering apparatus and method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE60035054D1 DE60035054D1 (de) | 2007-07-12 |
| DE60035054T2 true DE60035054T2 (de) | 2008-01-03 |
Family
ID=10861175
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60035054T Expired - Lifetime DE60035054T2 (de) | 1999-09-17 | 2000-09-18 | Ionenstrahl-Vakuumzerstäubungsapparatur und Verfahren |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP1212777B1 (enExample) |
| JP (1) | JP2003522296A (enExample) |
| AT (1) | ATE363726T1 (enExample) |
| AU (1) | AU7433800A (enExample) |
| DE (1) | DE60035054T2 (enExample) |
| GB (1) | GB9922110D0 (enExample) |
| WO (1) | WO2001022470A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4439169B2 (ja) * | 2002-09-10 | 2010-03-24 | 株式会社アルバック | 真空処理方法及び真空装置 |
| JP2009545101A (ja) | 2006-07-20 | 2009-12-17 | アビザ テクノロジー リミティド | プラズマ源 |
| CN101490789B (zh) | 2006-07-20 | 2011-04-13 | 阿维扎技术有限公司 | 离子源 |
| US8425741B2 (en) | 2006-07-20 | 2013-04-23 | Aviza Technology Limited | Ion deposition apparatus having rotatable carousel for supporting a plurality of targets |
| GB0921791D0 (en) * | 2009-12-14 | 2010-01-27 | Aviza Technologies Ltd | Ion beam source |
| US9097076B2 (en) | 2013-02-07 | 2015-08-04 | Weatherford Technology Holdings, Llc | Hard surfacing non-metallic slip components for downhole tools |
| US9273527B2 (en) | 2013-02-07 | 2016-03-01 | Weatherford Technology Holdings, Llc | Hard surfacing metallic slip components for downhole tools |
| CN113301704B (zh) * | 2021-05-17 | 2023-08-22 | 中国科学院近代物理研究所 | 一种抑制差分系统充气气流效应的装置及方法 |
| CN114302549B (zh) * | 2021-12-31 | 2024-02-20 | 中山市博顿光电科技有限公司 | 射频离子源系统及射频离子源控制方法 |
| CN114381702B (zh) * | 2021-12-31 | 2023-01-06 | 北京航空航天大学 | 一种新型高能离子束流产生方法 |
| EP4250335A1 (en) * | 2022-03-25 | 2023-09-27 | Impedans Ltd | Apparatus for non-invasive sensing of radio-frequency current spectra flowing in a plasma processing chamber |
| KR102674395B1 (ko) * | 2023-12-04 | 2024-06-12 | 주식회사 디에프텍 | 이온빔 소스를 이용하여 내플라즈마 특성 향상을 위한 코팅 방법 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0390692A3 (en) * | 1989-03-29 | 1991-10-02 | Terumo Kabushiki Kaisha | Method of forming thin film, apparatus for forming thin film and sensor |
| JPH07113173A (ja) * | 1993-10-13 | 1995-05-02 | Hitachi Ltd | イオンビームスパッタ装置 |
| JPH0967670A (ja) * | 1995-08-25 | 1997-03-11 | Nissin Electric Co Ltd | イオンビームスパッタリング装置 |
| GB9622127D0 (en) * | 1996-10-24 | 1996-12-18 | Nordiko Ltd | Ion gun |
-
1999
- 1999-09-17 GB GBGB9922110.3A patent/GB9922110D0/en not_active Ceased
-
2000
- 2000-09-18 JP JP2001525747A patent/JP2003522296A/ja active Pending
- 2000-09-18 AU AU74338/00A patent/AU7433800A/en not_active Abandoned
- 2000-09-18 WO PCT/GB2000/003577 patent/WO2001022470A1/en not_active Ceased
- 2000-09-18 AT AT00962690T patent/ATE363726T1/de not_active IP Right Cessation
- 2000-09-18 DE DE60035054T patent/DE60035054T2/de not_active Expired - Lifetime
- 2000-09-18 EP EP00962690A patent/EP1212777B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE60035054D1 (de) | 2007-07-12 |
| AU7433800A (en) | 2001-04-24 |
| EP1212777B1 (en) | 2007-05-30 |
| EP1212777A1 (en) | 2002-06-12 |
| JP2003522296A (ja) | 2003-07-22 |
| WO2001022470A1 (en) | 2001-03-29 |
| GB9922110D0 (en) | 1999-11-17 |
| ATE363726T1 (de) | 2007-06-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE60035054T2 (de) | Ionenstrahl-Vakuumzerstäubungsapparatur und Verfahren | |
| DE60201044T2 (de) | Vorrichtung und Verfahren zur Vakuumbeschichtung mittels Lichtbogen | |
| DE68925898T2 (de) | Grossflächige uniforme elektronenquelle | |
| DE3206882C2 (de) | Verfahren und Vorrichtung zum Verdampfen von Material unter Vakuum | |
| DE3885706T2 (de) | Magnetron-Bedampfungssystem zum Ätzen oder Niederschlagen. | |
| DE3856268T2 (de) | Verfahren und vorrichtung zur erzeugung von teilchenbündeln | |
| DE19941670A1 (de) | Massenspektrometer | |
| DE3802852C2 (enExample) | ||
| EP0282835A2 (de) | Verfahren und Vorrichtung zur Regelung der reaktiven Schichtabscheidung auf Substraten mittels Magnetronkatoden | |
| DE3605129A1 (de) | Ladungstraegerteilchen-strahlvorrichtung | |
| DE4126236A1 (de) | Rotierende magnetron-katode und verfahren zur anwendung | |
| WO2011160766A1 (de) | Arc-verdampfungsquelle mit definiertem elektrischem feld | |
| DE19650542A1 (de) | Dreidimensionales Quadrupolmassenspektrometer | |
| DE4225169A1 (de) | Verfahren und Vorrichtung zur Erzeugung von Agglomeratstrahlen | |
| DE1922871A1 (de) | Verfahren und Vorrichtung zur Ionenerzeugung | |
| DE2226171A1 (de) | Elektronenkanone | |
| EP0216750B1 (de) | Ionenstrahlgerät und Verfahren zur Ausführung von Änderungen, insbesondere Reparaturen an Substraten unter Verwendung eines Ionenstrahlgerätes | |
| DE2608958A1 (de) | Vorrichtung zum erzeugen von strahlen aus geladenen teilchen | |
| DE69712739T2 (de) | Massenselektor | |
| EP1609882A1 (de) | Kathodenzerstäubungsvorrichtung und -verfahren | |
| DD219354A1 (de) | Verfahren zur regelung der plasmaparameter in vakuumbeschichtungseinrichtungen mit bogenentladungen | |
| EP0472938A2 (de) | Anordnung zum Testen und Reparieren einer integrierten Schaltung | |
| DE102010030372B4 (de) | Vorrichtung zur Strukturierung von Festkörperflächen mit Ionenstrahlen aus einem Ionenstrahlspektrum | |
| DE4205752C2 (de) | Sekundärionen-Massenspektrometer | |
| DE2420656B2 (de) | Vorrichtung zur Elektronenstrahlverdampfung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| R082 | Change of representative |
Ref document number: 1212777 Country of ref document: EP |