DE60032980D1 - Verfahren und Vorrichtung zum Überführen eines flüssigen Materials in ein Gas. - Google Patents

Verfahren und Vorrichtung zum Überführen eines flüssigen Materials in ein Gas.

Info

Publication number
DE60032980D1
DE60032980D1 DE60032980T DE60032980T DE60032980D1 DE 60032980 D1 DE60032980 D1 DE 60032980D1 DE 60032980 T DE60032980 T DE 60032980T DE 60032980 T DE60032980 T DE 60032980T DE 60032980 D1 DE60032980 D1 DE 60032980D1
Authority
DE
Germany
Prior art keywords
transferring
gas
liquid material
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60032980T
Other languages
English (en)
Other versions
DE60032980T2 (de
Inventor
Hiroshi Nishizato
Hideaki Miyamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Stec KK
Original Assignee
Stec KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stec KK filed Critical Stec KK
Publication of DE60032980D1 publication Critical patent/DE60032980D1/de
Application granted granted Critical
Publication of DE60032980T2 publication Critical patent/DE60032980T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
    • B01D3/343—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas
    • B01D3/346—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances the substance being a gas the gas being used for removing vapours, e.g. transport gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/10—Mixing gases with gases
    • B01F23/12—Mixing gases with gases with vaporisation of a liquid
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S261/00—Gas and liquid contact apparatus
    • Y10S261/65—Vaporizers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Nozzles (AREA)
DE60032980T 1999-09-14 2000-09-06 Verfahren und Vorrichtung zum Überführen eines flüssigen Materials in ein Gas. Expired - Lifetime DE60032980T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP26081999 1999-09-14
JP26081999 1999-09-14
JP2000225445A JP4393677B2 (ja) 1999-09-14 2000-07-26 液体材料気化方法および装置並びに制御バルブ
JP2000225445 2000-07-26

Publications (2)

Publication Number Publication Date
DE60032980D1 true DE60032980D1 (de) 2007-03-08
DE60032980T2 DE60032980T2 (de) 2007-11-15

Family

ID=26544762

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60032980T Expired - Lifetime DE60032980T2 (de) 1999-09-14 2000-09-06 Verfahren und Vorrichtung zum Überführen eines flüssigen Materials in ein Gas.

Country Status (5)

Country Link
US (1) US6752387B1 (de)
EP (1) EP1085106B1 (de)
JP (1) JP4393677B2 (de)
KR (1) KR100386217B1 (de)
DE (1) DE60032980T2 (de)

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JP3881569B2 (ja) * 2002-03-13 2007-02-14 株式会社堀場エステック 液体材料気化装置
JP3826072B2 (ja) 2002-06-03 2006-09-27 アドバンスド エナジー ジャパン株式会社 液体材料気化供給装置
AU2002953538A0 (en) * 2002-12-23 2003-01-16 Pickering, Graham Clean line heated valve
US6907897B2 (en) * 2003-06-26 2005-06-21 Planar Systems, Inc. Diaphragm valve for high-temperature precursor supply in atomic layer deposition
US7021330B2 (en) * 2003-06-26 2006-04-04 Planar Systems, Inc. Diaphragm valve with reliability enhancements for atomic layer deposition
US6941963B2 (en) * 2003-06-26 2005-09-13 Planar Systems, Inc. High-speed diaphragm valve for atomic layer deposition
WO2005112081A1 (en) * 2004-04-08 2005-11-24 Sebine Technology, Inc. Vaporizer with integral diaphragm
US20070042119A1 (en) * 2005-02-10 2007-02-22 Larry Matthysse Vaporizer for atomic layer deposition system
US7975718B2 (en) * 2007-04-16 2011-07-12 Applied Materials, Inc. In-situ monitor of injection valve
GB0718686D0 (en) * 2007-09-25 2007-10-31 P2I Ltd Vapour delivery system
GB0718801D0 (en) * 2007-09-25 2007-11-07 P2I Ltd Vapour delivery system
US8544828B2 (en) 2007-12-19 2013-10-01 Horiba Stec, Co., Ltd. Liquid material vaporization apparatus
US8221513B2 (en) * 2008-01-29 2012-07-17 Kellogg Brown & Root Llc Low oxygen carrier fluid with heating value for feed to transport gasification
JP5193826B2 (ja) * 2008-11-28 2013-05-08 株式会社堀場エステック 液体材料気化装置
JP5419276B2 (ja) * 2009-12-24 2014-02-19 株式会社堀場製作所 材料ガス濃度制御システム及び材料ガス濃度制御システム用プログラム
KR101078411B1 (ko) 2011-07-06 2011-10-31 주식회사 신명 액체의 기화장치
JP6275373B2 (ja) * 2012-08-28 2018-02-07 株式会社日本触媒 シリコン膜形成方法、およびシリコン膜形成装置
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
JP5548292B1 (ja) 2013-05-30 2014-07-16 株式会社堀場エステック 加熱気化システムおよび加熱気化方法
US10550947B2 (en) * 2015-01-16 2020-02-04 Kitz Sct Corporation Block valve and block valve for raw material container
KR20160147482A (ko) * 2015-06-15 2016-12-23 삼성전자주식회사 가스 혼합부를 갖는 반도체 소자 제조 설비
JP6675865B2 (ja) 2015-12-11 2020-04-08 株式会社堀場エステック 液体材料気化装置
US10983538B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller
KR102250139B1 (ko) 2018-01-23 2021-05-10 (주)티티에스 액체 소스 기화 장치 및 기화 방법
KR102216526B1 (ko) 2019-06-10 2021-02-17 (주)티티에스 밸브 조립체
US11459654B2 (en) * 2020-11-19 2022-10-04 Eugenus, Inc. Liquid precursor injection for thin film deposition
JP2023067758A (ja) 2021-11-01 2023-05-16 株式会社堀場エステック 気化装置、気化装置の制御方法、気化装置用プログラム、及び、流体制御装置
KR102375713B1 (ko) 2021-11-11 2022-03-17 정병운 매트 겸용 사우나기

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JP4140742B2 (ja) * 1997-08-07 2008-08-27 東京エレクトロン株式会社 圧力及び流量の制御方法並びにその装置
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Also Published As

Publication number Publication date
JP4393677B2 (ja) 2010-01-06
JP2001156055A (ja) 2001-06-08
US6752387B1 (en) 2004-06-22
EP1085106B1 (de) 2007-01-17
KR20010030372A (ko) 2001-04-16
KR100386217B1 (ko) 2003-06-02
EP1085106A1 (de) 2001-03-21
DE60032980T2 (de) 2007-11-15

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