DE59611458D1 - REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen - Google Patents

REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen

Info

Publication number
DE59611458D1
DE59611458D1 DE59611458T DE59611458T DE59611458D1 DE 59611458 D1 DE59611458 D1 DE 59611458D1 DE 59611458 T DE59611458 T DE 59611458T DE 59611458 T DE59611458 T DE 59611458T DE 59611458 D1 DE59611458 D1 DE 59611458D1
Authority
DE
Germany
Prior art keywords
projection exposure
exposure equipment
microlithography projection
rema objective
rema
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE59611458T
Other languages
English (en)
Inventor
Gerd Fuerter
Johannes Wangler
Udo Dinger
Gerhard Ittner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Application granted granted Critical
Publication of DE59611458D1 publication Critical patent/DE59611458D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter
DE59611458T 1995-12-27 1996-11-09 REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen Expired - Fee Related DE59611458D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19548805A DE19548805A1 (de) 1995-12-27 1995-12-27 REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen

Publications (1)

Publication Number Publication Date
DE59611458D1 true DE59611458D1 (de) 2008-03-13

Family

ID=7781468

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19548805A Withdrawn DE19548805A1 (de) 1995-12-27 1995-12-27 REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
DE59611458T Expired - Fee Related DE59611458D1 (de) 1995-12-27 1996-11-09 REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19548805A Withdrawn DE19548805A1 (de) 1995-12-27 1995-12-27 REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen

Country Status (5)

Country Link
US (1) US5982558A (de)
EP (1) EP0783137B1 (de)
JP (2) JPH09197270A (de)
KR (1) KR100433129B1 (de)
DE (2) DE19548805A1 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7130129B2 (en) 1996-12-21 2006-10-31 Carl Zeiss Smt Ag Reticle-masking objective with aspherical lenses
DE19653983A1 (de) * 1996-12-21 1998-06-25 Zeiss Carl Fa REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
DE19809395A1 (de) * 1998-03-05 1999-09-09 Zeiss Carl Fa Beleuchtungssystem und REMA-Objektiv mit Linsenverschiebung und Betriebsverfahren dafür
DE19908526A1 (de) * 1999-02-26 2000-08-31 Zeiss Carl Fa Beleuchtungssystem mit Feldspiegeln zur Erzielung einer gleichförmigen Scanenergie
US20070030948A1 (en) * 1998-05-05 2007-02-08 Carl Zeiss Smt Ag Illumination system with field mirrors for producing uniform scanning energy
DE19855157A1 (de) 1998-11-30 2000-05-31 Zeiss Carl Fa Projektionsobjektiv
DE19942281A1 (de) * 1999-05-14 2000-11-16 Zeiss Carl Fa Projektionsobjektiv
US6583937B1 (en) 1998-11-30 2003-06-24 Carl-Zeiss Stiftung Illuminating system of a microlithographic projection exposure arrangement
WO2000033138A1 (de) * 1998-11-30 2000-06-08 Carl Zeiss Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
US6445442B2 (en) * 1998-12-08 2002-09-03 Carl-Zeiss-Stiftung Projection-microlithographic device
DE10005189A1 (de) 2000-02-05 2001-08-09 Zeiss Carl Projektionsbelichtungsanlage mit reflektivem Retikel
US6717651B2 (en) 2000-04-12 2004-04-06 Nikon Corporation Exposure apparatus, method for manufacturing thereof and method for manufacturing microdevice
US6339505B1 (en) 2000-06-26 2002-01-15 International Business Machines Corporation Method for radiation projection and lens assembly for semiconductor exposure tools
JP2002055277A (ja) * 2000-08-11 2002-02-20 Nikon Corp リレー結像光学系、および該光学系を備えた照明光学装置並びに露光装置
US6683728B2 (en) 2001-03-20 2004-01-27 Carl-Zeiss-Stiftung Illumination system with reduced energy loading
DE10138847A1 (de) * 2001-08-15 2003-02-27 Zeiss Carl Blende für eine Integratoreinheit
US20050134825A1 (en) * 2002-02-08 2005-06-23 Carl Zeiss Smt Ag Polarization-optimized illumination system
US20050094268A1 (en) * 2002-03-14 2005-05-05 Carl Zeiss Smt Ag Optical system with birefringent optical elements
US7932020B2 (en) * 2003-07-10 2011-04-26 Takumi Technology Corporation Contact or proximity printing using a magnified mask image
WO2005024516A2 (de) * 2003-08-14 2005-03-17 Carl Zeiss Smt Ag Beleuchtungseinrichtung für eine mikrolithographische projektionsbelichtungsanlage
US6961186B2 (en) * 2003-09-26 2005-11-01 Takumi Technology Corp. Contact printing using a magnified mask image
US7055127B2 (en) * 2003-10-27 2006-05-30 Takumi Technology Corp. Mask data preparation
WO2005040927A2 (en) 2003-10-18 2005-05-06 Carl Zeiss Smt Ag Device and method for illumination dose adjustments in microlithography
JP2005301054A (ja) * 2004-04-14 2005-10-27 Canon Inc 照明光学系及びそれを用いた露光装置
US7301707B2 (en) * 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
US20070285644A1 (en) * 2004-09-13 2007-12-13 Carl Zeiss Smt Ag Microlithographic Projection Exposure Apparatus
DE102008007449A1 (de) * 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie
US10139735B2 (en) 2014-06-23 2018-11-27 Asml Netherlands B.V. Lithographic apparatus and method
WO2022016456A1 (zh) * 2020-07-23 2022-01-27 欧菲光集团股份有限公司 光学系统、取像模组及电子设备

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4474463A (en) * 1982-08-30 1984-10-02 Tre Semiconductor Equipment Corporation Mixer coupling lens subassembly for photolithographic system
US4929071A (en) * 1985-12-20 1990-05-29 Lockheed Missiles & Space Company, Inc. Long-focus color-corrected petzval-type optical objective
US4770477A (en) * 1986-12-04 1988-09-13 The Perkin-Elmer Corporation Lens usable in the ultraviolet
JP3353902B2 (ja) * 1990-12-12 2002-12-09 オリンパス光学工業株式会社 投影レンズ系
JPH0536586A (ja) 1991-08-02 1993-02-12 Canon Inc 像投影方法及び該方法を用いた半導体デバイスの製造方法
DE4342424A1 (de) 1993-12-13 1995-06-14 Zeiss Carl Fa Beleuchtungseinrichtung für eine Projektions-Mikrolithographie- Belichtungsanlage
EP0658810B1 (de) * 1993-12-13 1998-11-25 Carl Zeiss Beleuchtungseinrichtung für ein optisches System mit einem Reticle-Maskierungssystem
US5559637A (en) * 1994-02-04 1996-09-24 Corning Incorporated Field curvature corrector
US5677797A (en) * 1994-02-04 1997-10-14 U.S. Precision Lens Inc. Method for correcting field curvature
DE4417489A1 (de) * 1994-05-19 1995-11-23 Zeiss Carl Fa Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
EP0687956B2 (de) * 1994-06-17 2005-11-23 Carl Zeiss SMT AG Beleuchtungseinrichtung
JPH08179204A (ja) * 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置

Also Published As

Publication number Publication date
JPH09197270A (ja) 1997-07-31
EP0783137B1 (de) 2008-01-23
DE19548805A1 (de) 1997-07-03
JP2008033365A (ja) 2008-02-14
EP0783137A3 (de) 1999-10-27
KR100433129B1 (ko) 2004-09-04
US5982558A (en) 1999-11-09
EP0783137A2 (de) 1997-07-09
KR970048690A (ko) 1997-07-29

Similar Documents

Publication Publication Date Title
DE59611458D1 (de) REMA-Objektiv für Mikrolithographie-Projektionsbelichtungsanlagen
DE59610973D1 (de) Beleuchtungseinrichtung für ein Projektions-Mikrolithographie-Gerät
DE69511141T2 (de) Resistzusammensetzung für tiefe Ultraviolettbelichtung
DE59913282D1 (de) Projektions-belichtungsanlage der mikrolithographie
DE59508534D1 (de) Höchstaperturiges katadioptrisches reduktionsobjektiv für die mikrolithographie
DE59611251D1 (de) Mikrolithographie-Projektionsbelichtungsanlage mit radial-polarisations-drehender optischer Anordnung
DE69509502D1 (de) Rohling für belichtungsmaske
DE69728948D1 (de) Projektionsbelichtungsapparat
DE59707065D1 (de) Lithographie-belichtungseinrichtung
DE69232367D1 (de) Röntgenapparat zur Projektionslithographie
DE69424138D1 (de) Projektionsbelichtungsvorrichtung
DE69702641D1 (de) Belichtungssystem und belichtungsgerät für uv-lithographie
DE69933918D1 (de) Lithographischer Projektionsapparat
DE59508636D1 (de) Entwickler für Photoresistschichten
DE69636769D1 (de) Automatisches Entwicklungsgerät für lichtempfindliche Druckplatten
DE69703076D1 (de) Lithographischer projektionsapparat zur abtastbelichtung
DE69225347T2 (de) Projektionsbelichtungsmethode und optische Maske für die Projektionsbelichtung
KR970002479A (ko) 보조 마스크를 이용한 투영 노광장치
DE69604905D1 (de) System für abtastlithographie mit gegenbewegung
DE69130407T2 (de) Maske für Belichtungsgerät zur verkleinernden Projektion
DE69928328D1 (de) Lithographischer Projektionsapparat
DE59406271D1 (de) Beleuchtungseinrichtung für eine Projektions-Mikrolithographie-Belichtungsanlage
DE69904881T2 (de) Projektionsbelichtungsgerät
KR960003067U (ko) 노광장치의 레티클 스테이지
KR960038709U (ko) 웨이퍼 노광장치의 스테이지

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee