DE59409654D1 - Verfahren zur Strukturierung von Polymerfolien - Google Patents

Verfahren zur Strukturierung von Polymerfolien

Info

Publication number
DE59409654D1
DE59409654D1 DE59409654T DE59409654T DE59409654D1 DE 59409654 D1 DE59409654 D1 DE 59409654D1 DE 59409654 T DE59409654 T DE 59409654T DE 59409654 T DE59409654 T DE 59409654T DE 59409654 D1 DE59409654 D1 DE 59409654D1
Authority
DE
Germany
Prior art keywords
plasma
texturing
polymer foils
microformings
eroded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE59409654T
Other languages
German (de)
English (en)
Inventor
Walter Schmidt
Hermann Schmid
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dyconex Patente AG
Original Assignee
Dyconex Patente AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dyconex Patente AG filed Critical Dyconex Patente AG
Application granted granted Critical
Publication of DE59409654D1 publication Critical patent/DE59409654D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0041—Etching of the substrate by chemical or physical means by plasma etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C37/00—Component parts, details, accessories or auxiliary operations, not covered by group B29C33/00 or B29C35/00
    • B29C2037/90—Measuring, controlling or regulating
    • B29C2037/903—Measuring, controlling or regulating by means of a computer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/0554—Metal used as mask for etching vias, e.g. by laser ablation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/16—Inspection; Monitoring; Aligning
    • H05K2203/163—Monitoring a manufacturing process

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Chemical Vapour Deposition (AREA)
DE59409654T 1993-11-23 1994-11-02 Verfahren zur Strukturierung von Polymerfolien Expired - Lifetime DE59409654D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH348693 1993-11-23

Publications (1)

Publication Number Publication Date
DE59409654D1 true DE59409654D1 (de) 2001-03-15

Family

ID=4257036

Family Applications (1)

Application Number Title Priority Date Filing Date
DE59409654T Expired - Lifetime DE59409654D1 (de) 1993-11-23 1994-11-02 Verfahren zur Strukturierung von Polymerfolien

Country Status (6)

Country Link
US (1) US5746929A (enExample)
EP (1) EP0658416B1 (enExample)
JP (1) JP3493234B2 (enExample)
AT (1) ATE199072T1 (enExample)
CA (1) CA2136361C (enExample)
DE (1) DE59409654D1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2751665B1 (fr) * 1996-07-23 1998-09-04 Air Liquide Procede et dispositif de commande du fonctionnement d'un systeme de traitement de surface
FR2751664B1 (fr) * 1996-07-23 1998-09-04 Air Liquide Procede et dispositif de commande du fonctionnement d'un systeme de traitement de surface d'un substrat solide en defilement
EP1360067B1 (en) * 2000-12-12 2007-02-21 C-Core Technologies Inc. Lightweight circuit board with conductive constraining cores
US20060234042A1 (en) * 2002-09-05 2006-10-19 Rui Yang Etched dielectric film in microfluidic devices
US20040258885A1 (en) * 2002-09-05 2004-12-23 Kreutter Nathan P. Etched dielectric film in microfluidic devices
US20060104035A1 (en) * 2004-08-24 2006-05-18 Vasoya Kalu K Edge plated printed wiring boards
US7301105B2 (en) * 2004-08-27 2007-11-27 Stablcor, Inc. Printed wiring boards possessing regions with different coefficients of thermal expansion
WO2006099554A2 (en) * 2005-03-15 2006-09-21 C-Core Technologies, Inc. Manufacturing process: how to construct constraining core material into printed wiring board
USRE45637E1 (en) 2005-08-29 2015-07-28 Stablcor Technology, Inc. Processes for manufacturing printed wiring boards
CN103298243B (zh) 2006-07-14 2016-05-11 斯塔布科尔技术公司 具有构成电路一部分的核心层的增层印刷线路板衬底
US9332632B2 (en) 2014-08-20 2016-05-03 Stablcor Technology, Inc. Graphene-based thermal management cores and systems and methods for constructing printed wiring boards
PH12022550412A1 (en) * 2019-08-24 2024-04-22 Lohia Corp Ltd A process and an apparatus for bag formation

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4209356A (en) * 1978-10-18 1980-06-24 General Electric Company Selective etching of polymeric materials embodying silicones via reactor plasmas
JPS5925227A (ja) * 1982-08-02 1984-02-09 Hitachi Ltd プラズマエツチング装置
AU544534B2 (en) * 1983-06-14 1985-06-06 Toyota Jidosha Kabushiki Kaisha Plasma coating
US4445966A (en) * 1983-06-20 1984-05-01 Honeywell Inc. Method of plasma etching of films containing chromium
DE3566088D1 (en) * 1984-03-12 1988-12-15 Commissariat Energie Atomique Treatment of a surface of a part to improve the adhesion of a coating deposited on the part particularly by hot projection
JPS61268730A (ja) * 1985-05-22 1986-11-28 Mazda Motor Corp プラズマ処理装置
JPS6250335A (ja) * 1985-08-29 1987-03-05 Toyoda Gosei Co Ltd プラズマ処理装置
JPS6289736A (ja) * 1985-10-15 1987-04-24 Daihatsu Motor Co Ltd プラズマ処理装置
JPS6399243A (ja) * 1986-10-15 1988-04-30 Mazda Motor Corp プラズマ処理装置
US5215619A (en) * 1986-12-19 1993-06-01 Applied Materials, Inc. Magnetic field-enhanced plasma etch reactor
KR970003885B1 (ko) * 1987-12-25 1997-03-22 도오교오 에레구토론 가부시끼 가이샤 에칭 방법 및 그 장치
US4971651A (en) * 1990-02-05 1990-11-20 Hitachi, Ltd. Microwave plasma processing method and apparatus
DE4232998A1 (de) * 1992-10-01 1994-04-07 Basf Ag Verfahren zur Oberflächenbehandlung von Kunststoffteilen
US5372673A (en) * 1993-01-25 1994-12-13 Motorola, Inc. Method for processing a layer of material while using insitu monitoring and control

Also Published As

Publication number Publication date
EP0658416A3 (enExample) 1995-07-26
CA2136361C (en) 2005-11-15
EP0658416B1 (de) 2001-02-07
JP3493234B2 (ja) 2004-02-03
US5746929A (en) 1998-05-05
CA2136361A1 (en) 1995-05-24
JPH083339A (ja) 1996-01-09
ATE199072T1 (de) 2001-02-15
EP0658416A2 (de) 1995-06-21

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