DE50201035D1 - Verfahren zum herstellen von dünnschicht-chipwiderständen - Google Patents

Verfahren zum herstellen von dünnschicht-chipwiderständen

Info

Publication number
DE50201035D1
DE50201035D1 DE50201035T DE50201035T DE50201035D1 DE 50201035 D1 DE50201035 D1 DE 50201035D1 DE 50201035 T DE50201035 T DE 50201035T DE 50201035 T DE50201035 T DE 50201035T DE 50201035 D1 DE50201035 D1 DE 50201035D1
Authority
DE
Germany
Prior art keywords
resistor
chip resistors
layer chip
substrate
producing thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE50201035T
Other languages
English (en)
Inventor
Wolfgang Werner
Horst Wolf
Wilhelm Kuehl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BC Components Holdings BV
Original Assignee
BC Components Holdings BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BC Components Holdings BV filed Critical BC Components Holdings BV
Priority to DE50201035T priority Critical patent/DE50201035D1/de
Application granted granted Critical
Publication of DE50201035D1 publication Critical patent/DE50201035D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/003—Apparatus or processes specially adapted for manufacturing resistors using lithography, e.g. photolithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/006—Apparatus or processes specially adapted for manufacturing resistors adapted for manufacturing resistor chips
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
    • H01C17/24—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
    • H01C17/242—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material by laser
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/94—Laser ablative material removal

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Non-Adjustable Resistors (AREA)
  • Semiconductor Integrated Circuits (AREA)
DE50201035T 2001-03-02 2002-02-19 Verfahren zum herstellen von dünnschicht-chipwiderständen Expired - Lifetime DE50201035D1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE50201035T DE50201035D1 (de) 2001-03-02 2002-02-19 Verfahren zum herstellen von dünnschicht-chipwiderständen

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10110179A DE10110179B4 (de) 2001-03-02 2001-03-02 Verfahren zum Herstellen von Dünnschicht-Chipwiderständen
DE50201035T DE50201035D1 (de) 2001-03-02 2002-02-19 Verfahren zum herstellen von dünnschicht-chipwiderständen
PCT/EP2002/001730 WO2002071419A1 (de) 2001-03-02 2002-02-19 Verfahren zum herstellen von dünnschicht-chipwiderständen

Publications (1)

Publication Number Publication Date
DE50201035D1 true DE50201035D1 (de) 2004-10-21

Family

ID=7676132

Family Applications (2)

Application Number Title Priority Date Filing Date
DE10110179A Expired - Fee Related DE10110179B4 (de) 2001-03-02 2001-03-02 Verfahren zum Herstellen von Dünnschicht-Chipwiderständen
DE50201035T Expired - Lifetime DE50201035D1 (de) 2001-03-02 2002-02-19 Verfahren zum herstellen von dünnschicht-chipwiderständen

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE10110179A Expired - Fee Related DE10110179B4 (de) 2001-03-02 2001-03-02 Verfahren zum Herstellen von Dünnschicht-Chipwiderständen

Country Status (9)

Country Link
US (1) US6998220B2 (de)
EP (1) EP1374257B1 (de)
JP (1) JP4092209B2 (de)
KR (1) KR100668185B1 (de)
CN (1) CN100413000C (de)
AT (1) ATE276575T1 (de)
DE (2) DE10110179B4 (de)
TW (1) TW594802B (de)
WO (1) WO2002071419A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10110179B4 (de) 2001-03-02 2004-10-14 BCcomponents Holding B.V. Verfahren zum Herstellen von Dünnschicht-Chipwiderständen
US7378337B2 (en) * 2003-11-04 2008-05-27 Electro Scientific Industries, Inc. Laser-based termination of miniature passive electronic components
TW200534296A (en) * 2004-02-09 2005-10-16 Rohm Co Ltd Method of making thin-film chip resistor
JP2011187985A (ja) * 2004-03-31 2011-09-22 Mitsubishi Materials Corp チップ抵抗器の製造方法
US7882621B2 (en) * 2008-02-29 2011-02-08 Yageo Corporation Method for making chip resistor components
CN102176356A (zh) * 2011-03-01 2011-09-07 西安天衡计量仪表有限公司 一种铂电阻芯片及铂电阻芯片的制备方法
DE102018115205A1 (de) 2018-06-25 2020-01-02 Vishay Electronic Gmbh Verfahren zur Herstellung einer Vielzahl von Widerstandsbaueinheiten

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1765145C3 (de) * 1968-04-09 1973-11-29 Siemens Ag, 1000 Berlin U. 8000 Muenchen Verfahren zum Bearbeiten dunner Schichten von elektrischen Schalt kreisen mit Laserstrahlen
US3699649A (en) * 1969-11-05 1972-10-24 Donald A Mcwilliams Method of and apparatus for regulating the resistance of film resistors
US4468414A (en) * 1983-07-29 1984-08-28 Harris Corporation Dielectric isolation fabrication for laser trimming
US4594265A (en) * 1984-05-15 1986-06-10 Harris Corporation Laser trimming of resistors over dielectrically isolated islands
DE3843230C1 (en) * 1988-12-22 1989-09-21 W.C. Heraeus Gmbh, 6450 Hanau, De Process for making a metallic pattern on a base, in particular for the laser structuring of conductor tracks
JPH04178503A (ja) * 1990-11-14 1992-06-25 Nec Corp 歪センサーの製造方法
US5384230A (en) * 1992-03-02 1995-01-24 Berg; N. Edward Process for fabricating printed circuit boards
DE4429794C1 (de) * 1994-08-23 1996-02-29 Fraunhofer Ges Forschung Verfahren zum Herstellen von Chip-Widerständen
US5683928A (en) * 1994-12-05 1997-11-04 General Electric Company Method for fabricating a thin film resistor
US5852226A (en) * 1997-01-14 1998-12-22 Pioneer Hi-Bred International, Inc. Soybean variety 93B82
US5976392A (en) * 1997-03-07 1999-11-02 Yageo Corporation Method for fabrication of thin film resistor
DE19901540A1 (de) * 1999-01-16 2000-07-20 Philips Corp Intellectual Pty Verfahren zur Feinabstimmung eines passiven, elektronischen Bauelementes
US6365483B1 (en) * 2000-04-11 2002-04-02 Viking Technology Corporation Method for forming a thin film resistor
US6605760B1 (en) * 2000-12-22 2003-08-12 Pioneer Hi-Bred International, Inc. Soybean variety 94B73
US6613965B1 (en) * 2000-12-22 2003-09-02 Pioneer Hi-Bred International, Inc. Soybean variety 94B54
DE10110179B4 (de) 2001-03-02 2004-10-14 BCcomponents Holding B.V. Verfahren zum Herstellen von Dünnschicht-Chipwiderständen

Also Published As

Publication number Publication date
US20040126704A1 (en) 2004-07-01
DE10110179B4 (de) 2004-10-14
CN1552080A (zh) 2004-12-01
ATE276575T1 (de) 2004-10-15
KR100668185B1 (ko) 2007-01-11
DE10110179A1 (de) 2002-12-05
TW594802B (en) 2004-06-21
KR20030086282A (ko) 2003-11-07
JP2004530290A (ja) 2004-09-30
CN100413000C (zh) 2008-08-20
EP1374257A1 (de) 2004-01-02
JP4092209B2 (ja) 2008-05-28
US6998220B2 (en) 2006-02-14
WO2002071419A1 (de) 2002-09-12
EP1374257B1 (de) 2004-09-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition