DE4235200C1 - - Google Patents

Info

Publication number
DE4235200C1
DE4235200C1 DE19924235200 DE4235200A DE4235200C1 DE 4235200 C1 DE4235200 C1 DE 4235200C1 DE 19924235200 DE19924235200 DE 19924235200 DE 4235200 A DE4235200 A DE 4235200A DE 4235200 C1 DE4235200 C1 DE 4235200C1
Authority
DE
Germany
Prior art keywords
radiation
vapor
electron
electron beam
sensors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE19924235200
Other languages
German (de)
English (en)
Inventor
Volker O-8051 Dresden De Kirchhoff
Christoph O-8051 Dresden De Metzner
Klaus O-8019 Dresden De Goedicke
Siegfried Prof. Dr. O-8051 Dresden De Schiller
Heinz O-8020 Dresden De Kern
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority to DE19924235200 priority Critical patent/DE4235200C1/de
Application granted granted Critical
Publication of DE4235200C1 publication Critical patent/DE4235200C1/de
Priority to JP6509491A priority patent/JPH08505433A/ja
Priority to PCT/DE1993/000749 priority patent/WO1994009177A1/de
Priority to EP93918892A priority patent/EP0664839B1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
DE19924235200 1992-10-19 1992-10-19 Expired - Fee Related DE4235200C1 (enExample)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE19924235200 DE4235200C1 (enExample) 1992-10-19 1992-10-19
JP6509491A JPH08505433A (ja) 1992-10-19 1993-08-18 電子ビーム蒸発中のプロセス安定化方法及び装置
PCT/DE1993/000749 WO1994009177A1 (de) 1992-10-19 1993-08-18 Verfahren und einrichtung zur prozessstabilisierung beim elektronenstrahlverdampfen
EP93918892A EP0664839B1 (de) 1992-10-19 1993-08-18 Verfahren und einrichtung zur prozessstabilisierung beim elektronenstrahlverdampfen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19924235200 DE4235200C1 (enExample) 1992-10-19 1992-10-19

Publications (1)

Publication Number Publication Date
DE4235200C1 true DE4235200C1 (enExample) 1993-07-29

Family

ID=6470796

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19924235200 Expired - Fee Related DE4235200C1 (enExample) 1992-10-19 1992-10-19

Country Status (4)

Country Link
EP (1) EP0664839B1 (enExample)
JP (1) JPH08505433A (enExample)
DE (1) DE4235200C1 (enExample)
WO (1) WO1994009177A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006003108B4 (de) 2005-01-28 2018-05-09 Raytheon Company Schnell reagierendes Elektronenstrahl-Ablagerungssystem mit einer Steuereinrichtung, die vorlaufende und nachlaufende Ablagerungsindikatoren verwendet

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102010003661A1 (de) * 2010-04-06 2011-11-17 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur Elektronenstrahlverdampfung dielektrischer Materialien
CN110538477B (zh) * 2019-08-02 2021-06-18 北京师范大学 一种可多位点同时监测系统内蒸汽温度的旋转蒸发仪

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4166784A (en) * 1978-04-28 1979-09-04 Applied Films Lab, Inc. Feedback control for vacuum deposition apparatus
US4362936A (en) * 1979-11-26 1982-12-07 Leybold-Heraeus Gmbh Apparatus for monitoring and/or controlling plasma processes
US4404709A (en) * 1980-06-07 1983-09-20 Gebr. Happich Gmbh Fastening device for handles, arms rests etc. on the wall of a vehicle, or the like
DD239811A1 (de) * 1985-07-31 1986-10-08 Ardenne Forschungsinst Verfahren zum aufbringen von verbindungsschichten

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57161063A (en) * 1981-03-31 1982-10-04 Nippon Sheet Glass Co Ltd Method and device for sticking metallic oxide film on substrate
JPS6026660A (ja) * 1983-07-26 1985-02-09 Ulvac Corp 蒸発源の溶融面制御装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4166784A (en) * 1978-04-28 1979-09-04 Applied Films Lab, Inc. Feedback control for vacuum deposition apparatus
US4362936A (en) * 1979-11-26 1982-12-07 Leybold-Heraeus Gmbh Apparatus for monitoring and/or controlling plasma processes
US4404709A (en) * 1980-06-07 1983-09-20 Gebr. Happich Gmbh Fastening device for handles, arms rests etc. on the wall of a vehicle, or the like
DD239811A1 (de) * 1985-07-31 1986-10-08 Ardenne Forschungsinst Verfahren zum aufbringen von verbindungsschichten

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006003108B4 (de) 2005-01-28 2018-05-09 Raytheon Company Schnell reagierendes Elektronenstrahl-Ablagerungssystem mit einer Steuereinrichtung, die vorlaufende und nachlaufende Ablagerungsindikatoren verwendet

Also Published As

Publication number Publication date
JPH08505433A (ja) 1996-06-11
WO1994009177A1 (de) 1994-04-28
EP0664839B1 (de) 1996-03-27
EP0664839A1 (de) 1995-08-02

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Legal Events

Date Code Title Description
8100 Publication of the examined application without publication of unexamined application
D1 Grant (no unexamined application published) patent law 81
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee