JPH08505433A - 電子ビーム蒸発中のプロセス安定化方法及び装置 - Google Patents
電子ビーム蒸発中のプロセス安定化方法及び装置Info
- Publication number
- JPH08505433A JPH08505433A JP6509491A JP50949193A JPH08505433A JP H08505433 A JPH08505433 A JP H08505433A JP 6509491 A JP6509491 A JP 6509491A JP 50949193 A JP50949193 A JP 50949193A JP H08505433 A JPH08505433 A JP H08505433A
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- electron beam
- sensor
- vapor
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 68
- 230000006641 stabilisation Effects 0.000 title claims abstract description 16
- 238000011105 stabilization Methods 0.000 title claims abstract description 16
- 238000005566 electron beam evaporation Methods 0.000 title claims abstract description 11
- 230000005855 radiation Effects 0.000 claims abstract description 26
- 230000003595 spectral effect Effects 0.000 claims abstract description 11
- 239000011364 vaporized material Substances 0.000 claims abstract description 9
- 238000001704 evaporation Methods 0.000 claims description 61
- 230000008020 evaporation Effects 0.000 claims description 57
- 239000000463 material Substances 0.000 claims description 33
- 238000010894 electron beam technology Methods 0.000 claims description 20
- 230000003287 optical effect Effects 0.000 claims description 12
- 230000008016 vaporization Effects 0.000 claims description 9
- 230000003321 amplification Effects 0.000 claims description 7
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 7
- 238000009834 vaporization Methods 0.000 claims description 7
- 230000005540 biological transmission Effects 0.000 claims description 6
- 230000003993 interaction Effects 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 4
- 230000000087 stabilizing effect Effects 0.000 claims description 4
- 238000011156 evaluation Methods 0.000 claims description 2
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 239000006096 absorbing agent Substances 0.000 claims 3
- 238000000576 coating method Methods 0.000 abstract description 19
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000011521 glass Substances 0.000 abstract description 2
- 230000007774 longterm Effects 0.000 abstract description 2
- 238000005272 metallurgy Methods 0.000 abstract description 2
- 238000004806 packaging method and process Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 17
- 239000011248 coating agent Substances 0.000 description 15
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000004886 process control Methods 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000000889 atomisation Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000006100 radiation absorber Substances 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 230000002123 temporal effect Effects 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 238000000295 emission spectrum Methods 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000001285 laser absorption spectroscopy Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000010327 methods by industry Methods 0.000 description 1
- -1 oxides Chemical class 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19924235200 DE4235200C1 (enExample) | 1992-10-19 | 1992-10-19 | |
| DE4235200.2 | 1992-10-19 | ||
| PCT/DE1993/000749 WO1994009177A1 (de) | 1992-10-19 | 1993-08-18 | Verfahren und einrichtung zur prozessstabilisierung beim elektronenstrahlverdampfen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH08505433A true JPH08505433A (ja) | 1996-06-11 |
Family
ID=6470796
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6509491A Pending JPH08505433A (ja) | 1992-10-19 | 1993-08-18 | 電子ビーム蒸発中のプロセス安定化方法及び装置 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0664839B1 (enExample) |
| JP (1) | JPH08505433A (enExample) |
| DE (1) | DE4235200C1 (enExample) |
| WO (1) | WO1994009177A1 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7130062B2 (en) | 2005-01-28 | 2006-10-31 | Raytheon Company | Rapid-response electron-beam deposition system having a controller utilizing leading and trailing deposition indicators |
| DE102010003661A1 (de) * | 2010-04-06 | 2011-11-17 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zur Elektronenstrahlverdampfung dielektrischer Materialien |
| CN110538477B (zh) * | 2019-08-02 | 2021-06-18 | 北京师范大学 | 一种可多位点同时监测系统内蒸汽温度的旋转蒸发仪 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4166784A (en) * | 1978-04-28 | 1979-09-04 | Applied Films Lab, Inc. | Feedback control for vacuum deposition apparatus |
| DE2947542A1 (de) * | 1979-11-26 | 1981-06-04 | Leybold-Heraeus GmbH, 5000 Köln | Einrichtung zur ueberwachung und/oder steuerung von plasmaprozessen |
| DE3021552A1 (de) * | 1980-06-07 | 1982-01-07 | Gebr. Happich Gmbh, 5600 Wuppertal | Befestigungsvorrichtung fuer haltegriffe, armlehnen o.dgl. an der karosseriewand von fahrzeugen |
| JPS57161063A (en) * | 1981-03-31 | 1982-10-04 | Nippon Sheet Glass Co Ltd | Method and device for sticking metallic oxide film on substrate |
| JPS6026660A (ja) * | 1983-07-26 | 1985-02-09 | Ulvac Corp | 蒸発源の溶融面制御装置 |
| DD239811A1 (de) * | 1985-07-31 | 1986-10-08 | Ardenne Forschungsinst | Verfahren zum aufbringen von verbindungsschichten |
-
1992
- 1992-10-19 DE DE19924235200 patent/DE4235200C1/de not_active Expired - Fee Related
-
1993
- 1993-08-18 JP JP6509491A patent/JPH08505433A/ja active Pending
- 1993-08-18 WO PCT/DE1993/000749 patent/WO1994009177A1/de not_active Ceased
- 1993-08-18 EP EP93918892A patent/EP0664839B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| WO1994009177A1 (de) | 1994-04-28 |
| EP0664839B1 (de) | 1996-03-27 |
| EP0664839A1 (de) | 1995-08-02 |
| DE4235200C1 (enExample) | 1993-07-29 |
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