DE4100462C2 - - Google Patents
Info
- Publication number
- DE4100462C2 DE4100462C2 DE4100462A DE4100462A DE4100462C2 DE 4100462 C2 DE4100462 C2 DE 4100462C2 DE 4100462 A DE4100462 A DE 4100462A DE 4100462 A DE4100462 A DE 4100462A DE 4100462 C2 DE4100462 C2 DE 4100462C2
- Authority
- DE
- Germany
- Prior art keywords
- discharge
- microwave
- light source
- source device
- discharge space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/044—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by a separate microwave unit
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP476290A JPH03210759A (ja) | 1990-01-11 | 1990-01-11 | マイクロ波放電光源装置 |
JP17091690A JPH0461741A (ja) | 1990-06-26 | 1990-06-26 | マイクロ波放電光源装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE4100462A1 DE4100462A1 (de) | 1991-07-18 |
DE4100462C2 true DE4100462C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-03-04 |
Family
ID=26338595
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE4100462A Granted DE4100462A1 (de) | 1990-01-11 | 1991-01-09 | Mikrowellenentladungs-lichtquellenvorrichtung |
Country Status (2)
Country | Link |
---|---|
US (1) | US5144199A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
DE (1) | DE4100462A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10235036A1 (de) * | 2002-07-31 | 2004-02-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | UV-Lichtquelle |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5359177A (en) * | 1990-11-14 | 1994-10-25 | Mitsubishi Denki Kabushiki Kaisha | Microwave plasma apparatus for generating a uniform plasma |
DE4202734A1 (de) * | 1992-01-31 | 1993-08-05 | Leybold Ag | Strahlungsquelle, insbesondere fuer strahlungs-induzierte aetz- und cvd-anlagen |
US5564267A (en) * | 1995-05-10 | 1996-10-15 | Leaf-Pro, Inc. | Raking and pick-up tool |
WO1999048135A1 (en) * | 1998-03-16 | 1999-09-23 | Matsushita Electric Industrial Co., Ltd. | Electrodeless discharge energy supply apparatus and electrodeless discharge lamp device |
US6652709B1 (en) * | 1999-11-02 | 2003-11-25 | Canon Kabushiki Kaisha | Plasma processing apparatus having circular waveguide, and plasma processing method |
US6908586B2 (en) * | 2001-06-27 | 2005-06-21 | Fusion Uv Systems, Inc. | Free radical polymerization method having reduced premature termination, apparatus for performing the method and product formed thereby |
US20050023417A1 (en) * | 2003-07-31 | 2005-02-03 | Burns Kelson O. | Leaf loader devices and methods |
GB0516695D0 (en) | 2005-08-15 | 2005-09-21 | Boc Group Plc | Microwave plasma reactor |
DE102010015495B4 (de) * | 2010-04-16 | 2012-04-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung zum Erzeugen von UV-Licht |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4504768A (en) * | 1982-06-30 | 1985-03-12 | Fusion Systems Corporation | Electrodeless lamp using a single magnetron and improved lamp envelope therefor |
JPS6136923A (ja) * | 1984-07-30 | 1986-02-21 | Ulvac Corp | 光励起プロセス装置 |
JPS6347366A (ja) * | 1986-08-18 | 1988-02-29 | Canon Inc | マイクロ波プラズマcvd法による機能性堆積膜の形成装置 |
JPS6463262A (en) * | 1987-09-02 | 1989-03-09 | Hitachi Ltd | Illuminant device |
US4975625A (en) * | 1988-06-24 | 1990-12-04 | Fusion Systems Corporation | Electrodeless lamp which couples to small bulb |
US5008593A (en) * | 1990-07-13 | 1991-04-16 | The United States Of America As Represented By The Secretary Of The Air Force | Coaxial liquid cooling of high power microwave excited plasma UV lamps |
JPH06136923A (ja) * | 1992-10-27 | 1994-05-17 | Naka Ind Ltd | 免震床用スプリング装置 |
-
1991
- 1991-01-04 US US07/637,636 patent/US5144199A/en not_active Expired - Fee Related
- 1991-01-09 DE DE4100462A patent/DE4100462A1/de active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10235036A1 (de) * | 2002-07-31 | 2004-02-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | UV-Lichtquelle |
Also Published As
Publication number | Publication date |
---|---|
US5144199A (en) | 1992-09-01 |
DE4100462A1 (de) | 1991-07-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE4134900C2 (de) | Mikrowellenplasmagerät und Mikrowellen-Entladungslichtquellengerät damit | |
DE3750115T2 (de) | Plasmabearbeitungsgerät. | |
DE69820518T2 (de) | Vorrichtung zur Gasanregung durch Oberflächenwellen-Plasma und diese Vorrichtung enthaltende Gasanregungsanlage | |
DE60221975T2 (de) | Mikrowellenplasmaprozesseinrichtung, plasmazündverfahren, plasmabildeverfahren und plasmaprozessverfahren | |
DE4100462C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
DE69510576T2 (de) | Plasma-Entschichtungsvorrichtung mit Mikrowellenfalle | |
DE4136297A1 (de) | Vorrichtung zur lokalen erzeugung eines plasmas in einer behandlungskammer mittels mikrowellenanregung | |
DE102006048815B4 (de) | Vorrichtung und Verfahren zur Erzeugung von Mikrowellenplasmen hoher Leistung | |
EP1060355A2 (de) | Verfahren und vorrichtung zum mikrowellensintern von kernbrennstoff | |
DE4028525A1 (de) | Mikrowellen-plasmaquellenvorrichtung | |
DE4004560A1 (de) | Mikrowelleninduzierte plasmaquellen | |
DE69622463T2 (de) | Ionenstrahl-Bearbeitungsapparat | |
DE7228091U (de) | Ionenquelle mit hochfrequenz-hohlraumresonator | |
DE102006048816A1 (de) | Vorrichtung und Verfahren zur lokalen Erzeugung von Mikrowellenplasmen | |
DE3111305A1 (de) | Mikrowellen-entladungs-ionenquelle | |
DE60220086T2 (de) | Methode und apparat um sichtbares licht im uv und ir bereich mit einer elektrodenlosen lampe zu erzeugen | |
EP0981831B1 (de) | Entladungslampe mit dielektrisch behinderten elektroden | |
DE19847848C1 (de) | Vorrichtung und Erzeugung angeregter/ionisierter Teilchen in einem Plasma | |
EP0849769B1 (de) | Verfahren und Vorrichtung zur Aussenbeschichtung von Lampen | |
EP1819208B1 (de) | Vorrichtung und Verfahren zur Erzeugung angeregter und/oder ionisierter Teilchen in einem Plasma | |
DE20004368U1 (de) | Elektrodenlose Entladungslampe | |
EP0780881A2 (de) | Elektrodenlose Entladungslampe | |
DE69309427T2 (de) | Ummantelte stiftelektrode für hochfrequenz angeregte gasentladungsquellen | |
DE102008001514A1 (de) | Mikrowellen-erregtes Plasmaverarbeitungsgerät unter Verwendung einer von gezahnten Wellenleiter-Plasmareaktoren erregten linearen Mikrowellenplasmaquelle | |
DE10341239B4 (de) | ECR-Plasmaquelle mit linearer Plasmaaustrittsöffnung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
OP8 | Request for examination as to paragraph 44 patent law | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |