DE4100462A1 - Mikrowellenentladungs-lichtquellenvorrichtung - Google Patents

Mikrowellenentladungs-lichtquellenvorrichtung

Info

Publication number
DE4100462A1
DE4100462A1 DE4100462A DE4100462A DE4100462A1 DE 4100462 A1 DE4100462 A1 DE 4100462A1 DE 4100462 A DE4100462 A DE 4100462A DE 4100462 A DE4100462 A DE 4100462A DE 4100462 A1 DE4100462 A1 DE 4100462A1
Authority
DE
Germany
Prior art keywords
microwave
discharge
waveguide
light source
dielectric plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE4100462A
Other languages
German (de)
English (en)
Other versions
DE4100462C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Masakazu Taki
Kenji Yoshizawa
Junichi Nishimae
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP476290A external-priority patent/JPH03210759A/ja
Priority claimed from JP17091690A external-priority patent/JPH0461741A/ja
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of DE4100462A1 publication Critical patent/DE4100462A1/de
Application granted granted Critical
Publication of DE4100462C2 publication Critical patent/DE4100462C2/de
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
    • H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
    • H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
    • H01J65/044—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by a separate microwave unit
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Discharge Lamps And Accessories Thereof (AREA)
DE4100462A 1990-01-11 1991-01-09 Mikrowellenentladungs-lichtquellenvorrichtung Granted DE4100462A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP476290A JPH03210759A (ja) 1990-01-11 1990-01-11 マイクロ波放電光源装置
JP17091690A JPH0461741A (ja) 1990-06-26 1990-06-26 マイクロ波放電光源装置

Publications (2)

Publication Number Publication Date
DE4100462A1 true DE4100462A1 (de) 1991-07-18
DE4100462C2 DE4100462C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-03-04

Family

ID=26338595

Family Applications (1)

Application Number Title Priority Date Filing Date
DE4100462A Granted DE4100462A1 (de) 1990-01-11 1991-01-09 Mikrowellenentladungs-lichtquellenvorrichtung

Country Status (2)

Country Link
US (1) US5144199A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE4100462A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4134900A1 (de) * 1990-11-14 1992-05-21 Mitsubishi Electric Corp Mikrowellenplasmageraet
DE4202734A1 (de) * 1992-01-31 1993-08-05 Leybold Ag Strahlungsquelle, insbesondere fuer strahlungs-induzierte aetz- und cvd-anlagen
EP0989589A4 (en) * 1998-03-16 2001-10-10 Matsushita Electric Ind Co Ltd ELECTRODELESS DISCHARGE POWER SUPPLY AND ELECTRODELESS DISCHARGE LAMP DEVICE
WO2011128443A3 (de) * 2010-04-16 2012-02-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. Vorrichtung zum erzeugen von uv-licht mit einer gasgefüllten plasmakammer

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5564267A (en) * 1995-05-10 1996-10-15 Leaf-Pro, Inc. Raking and pick-up tool
US6652709B1 (en) * 1999-11-02 2003-11-25 Canon Kabushiki Kaisha Plasma processing apparatus having circular waveguide, and plasma processing method
US6908586B2 (en) * 2001-06-27 2005-06-21 Fusion Uv Systems, Inc. Free radical polymerization method having reduced premature termination, apparatus for performing the method and product formed thereby
DE10235036A1 (de) * 2002-07-31 2004-02-26 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. UV-Lichtquelle
US20050023417A1 (en) * 2003-07-31 2005-02-03 Burns Kelson O. Leaf loader devices and methods
GB0516695D0 (en) 2005-08-15 2005-09-21 Boc Group Plc Microwave plasma reactor

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3323637C2 (de) * 1982-06-30 1986-03-27 Fusion Systems Corp., Rockville, Md. Anordnung zum Betrieb einer langgestreckten elektrodenlosen Lampe
DE3727542A1 (de) * 1986-08-18 1988-03-24 Canon Kk Vorrichtung zur bildung einer funktionellen bedampfungsschicht mittels eines mikrowellen-plasma-bedampfungsverfahrens
JPH06136923A (ja) * 1992-10-27 1994-05-17 Naka Ind Ltd 免震床用スプリング装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6136923A (ja) * 1984-07-30 1986-02-21 Ulvac Corp 光励起プロセス装置
JPS6463262A (en) * 1987-09-02 1989-03-09 Hitachi Ltd Illuminant device
US4975625A (en) * 1988-06-24 1990-12-04 Fusion Systems Corporation Electrodeless lamp which couples to small bulb
US5008593A (en) * 1990-07-13 1991-04-16 The United States Of America As Represented By The Secretary Of The Air Force Coaxial liquid cooling of high power microwave excited plasma UV lamps

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3323637C2 (de) * 1982-06-30 1986-03-27 Fusion Systems Corp., Rockville, Md. Anordnung zum Betrieb einer langgestreckten elektrodenlosen Lampe
DE3727542A1 (de) * 1986-08-18 1988-03-24 Canon Kk Vorrichtung zur bildung einer funktionellen bedampfungsschicht mittels eines mikrowellen-plasma-bedampfungsverfahrens
JPH06136923A (ja) * 1992-10-27 1994-05-17 Naka Ind Ltd 免震床用スプリング装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP 62-55 859 (A) In: Patents Abstr. of Japan, Sect. E. Vol. 11(1987), Nr. 244(E-530) *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4134900A1 (de) * 1990-11-14 1992-05-21 Mitsubishi Electric Corp Mikrowellenplasmageraet
US5359177A (en) * 1990-11-14 1994-10-25 Mitsubishi Denki Kabushiki Kaisha Microwave plasma apparatus for generating a uniform plasma
DE4202734A1 (de) * 1992-01-31 1993-08-05 Leybold Ag Strahlungsquelle, insbesondere fuer strahlungs-induzierte aetz- und cvd-anlagen
EP0989589A4 (en) * 1998-03-16 2001-10-10 Matsushita Electric Ind Co Ltd ELECTRODELESS DISCHARGE POWER SUPPLY AND ELECTRODELESS DISCHARGE LAMP DEVICE
US6518703B1 (en) 1998-03-16 2003-02-11 Matsushita Electrical Industrial Co., Ltd. Electrodeless discharge energy supply apparatus and electrodeless discharge lamp device using surface wave transmission line
WO2011128443A3 (de) * 2010-04-16 2012-02-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. Vorrichtung zum erzeugen von uv-licht mit einer gasgefüllten plasmakammer

Also Published As

Publication number Publication date
US5144199A (en) 1992-09-01
DE4100462C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-03-04

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee