DE4035080A1 - Verfahren und einrichtung zur herstellung von partiellen metallischen schichten - Google Patents
Verfahren und einrichtung zur herstellung von partiellen metallischen schichtenInfo
- Publication number
- DE4035080A1 DE4035080A1 DE4035080A DE4035080A DE4035080A1 DE 4035080 A1 DE4035080 A1 DE 4035080A1 DE 4035080 A DE4035080 A DE 4035080A DE 4035080 A DE4035080 A DE 4035080A DE 4035080 A1 DE4035080 A1 DE 4035080A1
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- metal
- solution
- production
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/14—Decomposition by irradiation, e.g. photolysis, particle radiation or by mixed irradiation sources
- C23C18/143—Radiation by light, e.g. photolysis or pyrolysis
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
- H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0347—Overplating, e.g. for reinforcing conductors or bumps; Plating over filled vias
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/121—Metallo-organic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Chemical & Material Sciences (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Manufacturing Of Printed Wiring (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4035080A DE4035080A1 (de) | 1990-11-05 | 1990-11-05 | Verfahren und einrichtung zur herstellung von partiellen metallischen schichten |
| EP91118471A EP0484808A2 (de) | 1990-11-05 | 1991-10-30 | Verfahren und Einrichtung zur Herstellung von partiellen metallischen Schichten |
| JP3286785A JPH04272182A (ja) | 1990-11-05 | 1991-10-31 | 部分金属層製造方法および装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4035080A DE4035080A1 (de) | 1990-11-05 | 1990-11-05 | Verfahren und einrichtung zur herstellung von partiellen metallischen schichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE4035080A1 true DE4035080A1 (de) | 1992-05-07 |
Family
ID=6417641
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE4035080A Ceased DE4035080A1 (de) | 1990-11-05 | 1990-11-05 | Verfahren und einrichtung zur herstellung von partiellen metallischen schichten |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0484808A2 (enExample) |
| JP (1) | JPH04272182A (enExample) |
| DE (1) | DE4035080A1 (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE20204442U1 (de) | 2002-03-15 | 2002-06-20 | Wieland Dental + Technik GmbH & Co. KG, 75179 Pforzheim | Leitfähigkeitsstift |
| DE102006030822A1 (de) * | 2006-06-30 | 2008-01-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Herstellen einer metallischen Kontaktstruktur einer Solarzelle |
| WO2009071145A2 (de) | 2007-12-07 | 2009-06-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur metallisierung von solarzellen, hotmelt-aerosol-tinte und aerosol-jet-drucksystem |
| CN117083416A (zh) * | 2021-01-29 | 2023-11-17 | 米德耐克斯股份公司 | 将金属涂层施加到表面上的方法和装置 |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4230149A1 (de) * | 1992-09-09 | 1994-03-17 | Heraeus Noblelight Gmbh | Verfahren zur Herstellung von oxydischen Schutzschichten |
| US5448605A (en) * | 1993-10-29 | 1995-09-05 | General Electric Company | Palladium acetylacetonate solution and related method of manufacture |
| CA2147522A1 (en) * | 1994-05-11 | 1995-11-12 | Ronald Sinclair Nohr | Method of coating a substrate with copper |
| ATE225567T1 (de) * | 1994-08-11 | 2002-10-15 | Canon Kk | Verwendung einer lösung für die herstellung einer elektroemittierenden vorrichtung und methode zur herstellung von elektroemittierenden vorrichtungen |
| GB2376566B (en) * | 1997-10-14 | 2003-02-05 | Patterning Technologies Ltd | Method of forming an electronic device |
| AU9451098A (en) | 1997-10-14 | 1999-05-03 | Patterning Technologies Limited | Method of forming an electronic device |
| US7323634B2 (en) | 1998-10-14 | 2008-01-29 | Patterning Technologies Limited | Method of forming an electronic device |
| JP4503792B2 (ja) * | 1999-08-11 | 2010-07-14 | 三ツ星ベルト株式会社 | セラミックス回路基板の製造方法 |
| GB2391871A (en) * | 2002-08-16 | 2004-02-18 | Qinetiq Ltd | Depositing conductive solid materials using reservoirs in a printhead |
| GB0402960D0 (en) | 2004-02-10 | 2004-03-17 | Plastic Logic Ltd | Thermal imaging of catalyst in electroless deposition of metal films |
| US20050276911A1 (en) * | 2004-06-15 | 2005-12-15 | Qiong Chen | Printing of organometallic compounds to form conductive traces |
| US7547647B2 (en) | 2004-07-06 | 2009-06-16 | Hewlett-Packard Development Company, L.P. | Method of making a structure |
| JP2006075744A (ja) * | 2004-09-10 | 2006-03-23 | Jsr Corp | アルミニウムパターンの形成方法 |
| JP5382797B2 (ja) * | 2009-09-30 | 2014-01-08 | 独立行政法人産業技術総合研究所 | 導電性組成物を用いた電気化学反応による構造体の作製方法 |
| JP5382796B2 (ja) * | 2009-09-30 | 2014-01-08 | 独立行政法人産業技術総合研究所 | 導電性組成物および電気化学反応方法および構造体 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3047884A1 (de) * | 1980-12-18 | 1982-07-15 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zur automatisierbaren bearbeitung in der halbleitertechnologie, z.b. von leiterplatten |
| EP0132677A1 (de) * | 1983-07-22 | 1985-02-13 | Bayer Ag | Verfahren zum Aktivieren von Substratoberflächen für die direkte partielle Metallisierung von Trägermaterialien |
| US4720914A (en) * | 1984-07-26 | 1988-01-26 | Matsushita Electric Industrial Co., Ltd. | Method for forming thick film circuit using rotatable nozzle having wide discharge hole |
| DE3840199A1 (de) * | 1988-11-29 | 1990-05-31 | Asea Brown Boveri | Verfahren zur metallisierung |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2757029A1 (de) * | 1977-12-21 | 1980-01-31 | Guenther Dr Ing Herrmann | Verfahren zur herstellung einer schaltungsplatte |
| JPS56164595A (en) * | 1980-05-23 | 1981-12-17 | Tokyo Shibaura Electric Co | Method of producing circuit board |
| JPS59112685A (ja) * | 1982-12-17 | 1984-06-29 | 松下電器産業株式会社 | 電子回路板の製造方法 |
| JPS59177358A (ja) * | 1983-03-28 | 1984-10-08 | Nec Corp | 局所金属堆積方法および装置 |
| US4668533A (en) * | 1985-05-10 | 1987-05-26 | E. I. Du Pont De Nemours And Company | Ink jet printing of printed circuit boards |
| JPS63192874A (ja) * | 1987-02-06 | 1988-08-10 | Electroplating Eng Of Japan Co | 金属被膜品の製造方法 |
| NL8700833A (nl) * | 1987-04-09 | 1988-11-01 | Philips Nv | Werkwijze voor het vervaardigen van een gedrukte bedradingspaneel. |
| JPH01196194A (ja) * | 1988-02-01 | 1989-08-07 | Matsushita Electric Ind Co Ltd | 回路描画装置 |
| DE58907207D1 (de) * | 1988-07-02 | 1994-04-21 | Heraeus Noblelight Gmbh | Verfahren zur Herstellung von metallischen Schichten. |
-
1990
- 1990-11-05 DE DE4035080A patent/DE4035080A1/de not_active Ceased
-
1991
- 1991-10-30 EP EP91118471A patent/EP0484808A2/de not_active Withdrawn
- 1991-10-31 JP JP3286785A patent/JPH04272182A/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3047884A1 (de) * | 1980-12-18 | 1982-07-15 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zur automatisierbaren bearbeitung in der halbleitertechnologie, z.b. von leiterplatten |
| EP0132677A1 (de) * | 1983-07-22 | 1985-02-13 | Bayer Ag | Verfahren zum Aktivieren von Substratoberflächen für die direkte partielle Metallisierung von Trägermaterialien |
| US4720914A (en) * | 1984-07-26 | 1988-01-26 | Matsushita Electric Industrial Co., Ltd. | Method for forming thick film circuit using rotatable nozzle having wide discharge hole |
| DE3840199A1 (de) * | 1988-11-29 | 1990-05-31 | Asea Brown Boveri | Verfahren zur metallisierung |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE20204442U1 (de) | 2002-03-15 | 2002-06-20 | Wieland Dental + Technik GmbH & Co. KG, 75179 Pforzheim | Leitfähigkeitsstift |
| DE102006030822A1 (de) * | 2006-06-30 | 2008-01-03 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Herstellen einer metallischen Kontaktstruktur einer Solarzelle |
| WO2009071145A2 (de) | 2007-12-07 | 2009-06-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur metallisierung von solarzellen, hotmelt-aerosol-tinte und aerosol-jet-drucksystem |
| DE102007058972A1 (de) * | 2007-12-07 | 2009-07-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Metallisierung von Solarzellen, Hotmelt-Aerosol-Tinte und Aerosol-Jet-Drucksystem |
| CN117083416A (zh) * | 2021-01-29 | 2023-11-17 | 米德耐克斯股份公司 | 将金属涂层施加到表面上的方法和装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0484808A2 (de) | 1992-05-13 |
| EP0484808A3 (enExample) | 1994-02-09 |
| JPH04272182A (ja) | 1992-09-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8127 | New person/name/address of the applicant |
Owner name: HERAEUS NOBLELIGHT GMBH, 63450 HANAU, DE |
|
| 8110 | Request for examination paragraph 44 | ||
| 8131 | Rejection |