DE3881418D1 - Hohlkathoden-ionenquellen. - Google Patents

Hohlkathoden-ionenquellen.

Info

Publication number
DE3881418D1
DE3881418D1 DE8888850086T DE3881418T DE3881418D1 DE 3881418 D1 DE3881418 D1 DE 3881418D1 DE 8888850086 T DE8888850086 T DE 8888850086T DE 3881418 T DE3881418 T DE 3881418T DE 3881418 D1 DE3881418 D1 DE 3881418D1
Authority
DE
Germany
Prior art keywords
cave
ion sources
cathode ion
cathode
sources
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8888850086T
Other languages
English (en)
Other versions
DE3881418T2 (de
Inventor
Ryota Fukui
Kenichi Takagi
Riichi Kikuchi
Kazuo Takayama
Akira Daiichi Coop Iz Tonegawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP62054110A external-priority patent/JP2519709B2/ja
Priority claimed from JP63022065A external-priority patent/JP2720971B2/ja
Application filed by Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Ulvac Inc
Application granted granted Critical
Publication of DE3881418D1 publication Critical patent/DE3881418D1/de
Publication of DE3881418T2 publication Critical patent/DE3881418T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
DE88850086T 1987-03-11 1988-03-10 Hohlkathoden-ionenquellen. Expired - Fee Related DE3881418T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62054110A JP2519709B2 (ja) 1987-03-11 1987-03-11 ホロ−カソ−ド型イオン源
JP63022065A JP2720971B2 (ja) 1988-02-03 1988-02-03 ホローカソード型イオン源

Publications (2)

Publication Number Publication Date
DE3881418D1 true DE3881418D1 (de) 1993-07-08
DE3881418T2 DE3881418T2 (de) 1993-11-04

Family

ID=26359224

Family Applications (1)

Application Number Title Priority Date Filing Date
DE88850086T Expired - Fee Related DE3881418T2 (de) 1987-03-11 1988-03-10 Hohlkathoden-ionenquellen.

Country Status (3)

Country Link
US (1) US4894546A (de)
EP (1) EP0282467B1 (de)
DE (1) DE3881418T2 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2639756B1 (fr) * 1988-11-30 1994-05-13 Centre Nal Recherc Scientifique Source de vapeurs et d'ions
US5126163A (en) * 1990-09-05 1992-06-30 Northeastern University Method for metal ion implantation using multiple pulsed arcs
IT1246682B (it) * 1991-03-04 1994-11-24 Proel Tecnologie Spa Dispositivo a catodo cavo non riscaldato per la generazione dinamica di plasma
EP0510340B1 (de) * 1991-04-23 1995-05-10 Balzers Aktiengesellschaft Verfahren zur Abtragung von Material von einer Oberfläche in einer Vakuumkammer
IT1262897B (it) * 1992-03-11 1996-07-22 Proel Tecnologie Spa Generatore di plasma perfezionato e relativo metodo di ionizzazione
DE4208764C2 (de) * 1992-03-19 1994-02-24 Kernforschungsz Karlsruhe Gasgefüllter Teilchenbeschleuniger
FR2722213B1 (fr) * 1994-07-05 1996-09-20 Plasmion Dispositif pour creer un faisceau d'ions d'energie ajustable notamment pour le traitement au defile et sous vide de surfaces de grandes dimensions
US5604350A (en) * 1995-11-16 1997-02-18 Taiwan Semiconductor Manufacturing Company Ltd. Fitting for an ion source assembly
DE19744060C2 (de) * 1997-10-06 1999-08-12 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Oberflächenbehandlung von Substraten
US6729174B1 (en) 1998-09-14 2004-05-04 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Process for testing a xenon gas feed system of a hollow cathode assembly
US6064156A (en) * 1998-09-14 2000-05-16 The United States Of America As Represented By The Administrator Of Nasa Process for ignition of gaseous electrical discharge between electrodes of a hollow cathode assembly
US6547979B1 (en) * 2000-08-31 2003-04-15 Micron Technology, Inc. Methods of enhancing selectivity of etching silicon dioxide relative to one or more organic substances; and plasma reaction chambers
DE10058326C1 (de) * 2000-11-24 2002-06-13 Astrium Gmbh Induktiv gekoppelte Hochfrequenz-Elektronenquelle mit reduziertem Leistungsbedarf durch elektrostatischen Einschluss von Elektronen
GB0131097D0 (en) * 2001-12-31 2002-02-13 Applied Materials Inc Ion sources
DE10336273A1 (de) * 2003-08-07 2005-03-10 Fraunhofer Ges Forschung Vorrichtung zur Erzeugung von EUV- und weicher Röntgenstrahlung
KR100553716B1 (ko) * 2004-08-02 2006-02-24 삼성전자주식회사 이온 주입 설비의 이온 소스부
DE102010011592A1 (de) * 2010-03-16 2011-09-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Hohlkathoden-Plasmaquelle sowie Verwendung der Hohlkathoden-Plasmaquelle
CN102497721B (zh) * 2011-11-29 2014-04-30 北京大学 双空心阴极以及双空心阴极等离子体装置和应用
CN109628903B (zh) * 2018-11-20 2020-01-21 深圳市华星光电技术有限公司 基板载具、溅镀装置及溅镀方法
RU2740146C1 (ru) * 2019-10-10 2021-01-11 Евгений Олегович Щербаков Ионный источник (ионная пушка)
CN113223921B (zh) * 2021-03-31 2023-03-14 杭州谱育科技发展有限公司 多通道式离子源及其工作方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2501882A (en) * 1948-03-18 1950-03-28 Research Corp High-voltage high-vacuum acceleration tube
US2770755A (en) * 1954-02-05 1956-11-13 Myron L Good Linear accelerator
GB1488657A (en) * 1973-09-24 1977-10-12 Ion Tech Ltd Ion sources
DE3038575A1 (de) * 1980-10-13 1982-04-22 Sergej Ivanovič Tomsk Beljuk Elektronen-ionenquelle
US4475063A (en) * 1981-06-22 1984-10-02 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Hollow cathode apparatus
DD217082A1 (de) * 1983-08-11 1985-01-02 Karl Marx Stadt Tech Hochschul Einstrahl-ionenquelle
JPS60170141A (ja) * 1984-02-13 1985-09-03 Toshiba Corp イオン源装置
KR900003310B1 (ko) * 1986-05-27 1990-05-14 리가가구 겡큐소 이온 발생 장치

Also Published As

Publication number Publication date
EP0282467B1 (de) 1993-06-02
EP0282467A1 (de) 1988-09-14
DE3881418T2 (de) 1993-11-04
US4894546A (en) 1990-01-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee