DE3861522D1 - Behandlungsverfahren fuer photolacke. - Google Patents

Behandlungsverfahren fuer photolacke.

Info

Publication number
DE3861522D1
DE3861522D1 DE8888101168T DE3861522T DE3861522D1 DE 3861522 D1 DE3861522 D1 DE 3861522D1 DE 8888101168 T DE8888101168 T DE 8888101168T DE 3861522 T DE3861522 T DE 3861522T DE 3861522 D1 DE3861522 D1 DE 3861522D1
Authority
DE
Germany
Prior art keywords
paints
photo
treatment method
treatment
photo paints
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8888101168T
Other languages
English (en)
Inventor
Shinji C O Ushio Denki Suzuki
Hiroko C O Ushio Denki Suzuki
Tetsuji C O Ushio Denki Arai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP6397887A external-priority patent/JPS63232330A/ja
Priority claimed from JP6397987A external-priority patent/JPS63232331A/ja
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Application granted granted Critical
Publication of DE3861522D1 publication Critical patent/DE3861522D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE8888101168T 1987-03-20 1988-01-27 Behandlungsverfahren fuer photolacke. Expired - Lifetime DE3861522D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP6397887A JPS63232330A (ja) 1987-03-20 1987-03-20 レジスト処理方法
JP6397987A JPS63232331A (ja) 1987-03-20 1987-03-20 レジスト処理方法

Publications (1)

Publication Number Publication Date
DE3861522D1 true DE3861522D1 (de) 1991-02-21

Family

ID=26405110

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8888101168T Expired - Lifetime DE3861522D1 (de) 1987-03-20 1988-01-27 Behandlungsverfahren fuer photolacke.

Country Status (3)

Country Link
US (1) US4900938A (de)
EP (1) EP0282703B1 (de)
DE (1) DE3861522D1 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0740546B2 (ja) * 1987-03-24 1995-05-01 ウシオ電機株式会社 レジスト処理方法
JP2731950B2 (ja) * 1989-07-13 1998-03-25 キヤノン株式会社 露光方法
US5138643A (en) * 1989-10-02 1992-08-11 Canon Kabushiki Kaisha Exposure apparatus
US5229616A (en) * 1991-09-12 1993-07-20 Hoya Corporation Lamp for enveloping a single isotope of a metal element and exposure apparatus including the lamp
JPH07280739A (ja) * 1994-04-07 1995-10-27 Matsushita Electron Corp 異物検査方法
US5648198A (en) * 1994-12-13 1997-07-15 Kabushiki Kaisha Toshiba Resist hardening process having improved thermal stability
JP3859259B2 (ja) * 1995-07-13 2006-12-20 三星電子株式会社 紫外線照射装置
US8137656B2 (en) 2003-12-03 2012-03-20 Ge Healthcare Limited Method and apparatus for synthesis of [11C]phosgene using concentrated [11C] carbon monoxide with UV light
KR20130120586A (ko) * 2012-04-26 2013-11-05 삼성전자주식회사 패턴 형성 방법
US8986562B2 (en) 2013-08-07 2015-03-24 Ultratech, Inc. Methods of laser processing photoresist in a gaseous environment
JP2021012989A (ja) * 2019-07-09 2021-02-04 株式会社ディスコ 絶縁層形成方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4993467A (de) * 1972-11-07 1974-09-05
US4253888A (en) * 1978-06-16 1981-03-03 Matsushita Electric Industrial Co., Ltd. Pretreatment of photoresist masking layers resulting in higher temperature device processing
US4421784A (en) * 1982-02-12 1983-12-20 Union Carbide Corporation Process for producing textured coatings
US4417948A (en) * 1982-07-09 1983-11-29 International Business Machines Corporation Self developing, photoetching of polyesters by far UV radiation
US4548688A (en) * 1983-05-23 1985-10-22 Fusion Semiconductor Systems Hardening of photoresist
US4613404A (en) * 1984-11-16 1986-09-23 Fuji Photo Film Co., Ltd. Materials which exhibit a surface active effect with vacuum baked photoresists and method of using the same
DE3571161D1 (en) * 1985-03-22 1989-07-27 Ibm Deutschland Lift-off mask production process and use of the mask
JPH0685082B2 (ja) * 1986-03-31 1994-10-26 ウシオ電機株式会社 レジスト処理方法
JPS63260028A (ja) * 1986-11-19 1988-10-27 Tokyo Ohka Kogyo Co Ltd ホトレジストの熱安定化装置
JPS63276224A (ja) * 1987-05-08 1988-11-14 Nec Corp 紫外線照射装置

Also Published As

Publication number Publication date
EP0282703A3 (en) 1988-10-26
US4900938A (en) 1990-02-13
EP0282703A2 (de) 1988-09-21
EP0282703B1 (de) 1991-01-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition