DE3577811D1 - Fotobehandlungsgeraet. - Google Patents

Fotobehandlungsgeraet.

Info

Publication number
DE3577811D1
DE3577811D1 DE8585305236T DE3577811T DE3577811D1 DE 3577811 D1 DE3577811 D1 DE 3577811D1 DE 8585305236 T DE8585305236 T DE 8585305236T DE 3577811 T DE3577811 T DE 3577811T DE 3577811 D1 DE3577811 D1 DE 3577811D1
Authority
DE
Germany
Prior art keywords
treatment device
photo treatment
photo
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8585305236T
Other languages
English (en)
Inventor
Makoto C O Patent Divis Sekine
Haruo C O Patent Divisio Okano
Yasuhiro C O Patent Di Horiike
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE3577811D1 publication Critical patent/DE3577811D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0041—Photosensitive materials providing an etching agent upon exposure
DE8585305236T 1984-09-18 1985-07-23 Fotobehandlungsgeraet. Expired - Lifetime DE3577811D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59195163A JPH0622222B2 (ja) 1984-09-18 1984-09-18 光処理装置

Publications (1)

Publication Number Publication Date
DE3577811D1 true DE3577811D1 (de) 1990-06-28

Family

ID=16336472

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585305236T Expired - Lifetime DE3577811D1 (de) 1984-09-18 1985-07-23 Fotobehandlungsgeraet.

Country Status (4)

Country Link
US (1) US4642171A (de)
EP (1) EP0175456B1 (de)
JP (1) JPH0622222B2 (de)
DE (1) DE3577811D1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5178682A (en) * 1988-06-21 1993-01-12 Mitsubishi Denki Kabushiki Kaisha Method for forming a thin layer on a semiconductor substrate and apparatus therefor
JP2804762B2 (ja) * 1988-07-19 1998-09-30 東京エレクトロン株式会社 プラズマ処理装置
JP2819166B2 (ja) * 1989-10-03 1998-10-30 キヤノン株式会社 放射光用光学素子の汚れ除去装置および方法
US5503721A (en) * 1991-07-18 1996-04-02 Hri Research, Inc. Method for photoactivation
US5185132A (en) * 1989-12-07 1993-02-09 Research Development Corporation Of Japan Atomspheric plasma reaction method and apparatus therefor
US5085727A (en) * 1990-05-21 1992-02-04 Applied Materials, Inc. Plasma etch apparatus with conductive coating on inner metal surfaces of chamber to provide protection from chemical corrosion
US6433343B1 (en) 1992-03-02 2002-08-13 Cerus Corporation Device and method for photoactivation
JP2953426B2 (ja) 1997-05-01 1999-09-27 日本電気株式会社 Ｌｓｉ製造用プロセス装置
US7498156B2 (en) * 1998-07-21 2009-03-03 Caridianbct Biotechnologies, Llc Use of visible light at wavelengths of 500 to 550 nm to reduce the number of pathogens in blood and blood components
US6277337B1 (en) 1998-07-21 2001-08-21 Gambro, Inc. Method and apparatus for inactivation of biological contaminants using photosensitizers
US7049110B2 (en) * 1998-07-21 2006-05-23 Gambro, Inc. Inactivation of West Nile virus and malaria using photosensitizers
US6258577B1 (en) 1998-07-21 2001-07-10 Gambro, Inc. Method and apparatus for inactivation of biological contaminants using endogenous alloxazine or isoalloxazine photosensitizers
US7094378B1 (en) 2000-06-15 2006-08-22 Gambro, Inc. Method and apparatus for inactivation of biological contaminants using photosensitizers
US7220747B2 (en) 1999-07-20 2007-05-22 Gambro, Inc. Method for preventing damage to or rejuvenating a cellular blood component using mitochondrial enhancer
US6268120B1 (en) 1999-10-19 2001-07-31 Gambro, Inc. Isoalloxazine derivatives to neutralize biological contaminants
US7648699B2 (en) * 2000-06-02 2010-01-19 Caridianbct Biotechnologies, Llc Preventing transfusion related complications in a recipient of a blood transfusion
US7985588B2 (en) * 2000-06-02 2011-07-26 Caridianbct Biotechnologies, Llc Induction of and maintenance of nucleic acid damage in pathogens using riboflavin and light
TW590780B (en) * 2000-06-02 2004-06-11 Gambro Inc Additive solutions containing riboflavin
US6843961B2 (en) * 2000-06-15 2005-01-18 Gambro, Inc. Reduction of contaminants in blood and blood products using photosensitizers and peak wavelengths of light
US9044523B2 (en) 2000-06-15 2015-06-02 Terumo Bct, Inc. Reduction of contaminants in blood and blood products using photosensitizers and peak wavelengths of light
WO2010050337A1 (ja) * 2008-10-31 2010-05-06 日本電気株式会社 エッチング方法及び薄膜デバイス

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2841477A (en) * 1957-03-04 1958-07-01 Pacific Semiconductors Inc Photochemically activated gaseous etching method
IL64258A0 (en) * 1980-12-15 1982-02-28 Hughes Aircraft Co Method and apparatus for photochemical vapor deposition
US4419201A (en) * 1981-08-24 1983-12-06 Bell Telephone Laboratories, Incorporated Apparatus and method for plasma-assisted etching of wafers
US4397724A (en) * 1981-08-24 1983-08-09 Bell Telephone Laboratories, Incorporated Apparatus and method for plasma-assisted etching of wafers
JPH0622212B2 (ja) * 1983-05-31 1994-03-23 株式会社東芝 ドライエッチング方法
FR2548218B1 (fr) * 1983-06-29 1987-03-06 Pauleau Yves Procede de depot de couches minces par reaction chimique en phase gazeuse utilisant deux rayonnements differents
JPS6012128A (ja) * 1983-06-30 1985-01-22 Anelva Corp 光化学的表面処理装置
US4496420A (en) * 1984-04-06 1985-01-29 Bmc Industries, Inc. Process for plasma desmear etching of printed circuit boards and apparatus used therein

Also Published As

Publication number Publication date
US4642171A (en) 1987-02-10
EP0175456A3 (en) 1987-04-29
EP0175456A2 (de) 1986-03-26
JPH0622222B2 (ja) 1994-03-23
EP0175456B1 (de) 1990-05-23
JPS6173332A (ja) 1986-04-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)