DE3829260C2 - - Google Patents

Info

Publication number
DE3829260C2
DE3829260C2 DE19883829260 DE3829260A DE3829260C2 DE 3829260 C2 DE3829260 C2 DE 3829260C2 DE 19883829260 DE19883829260 DE 19883829260 DE 3829260 A DE3829260 A DE 3829260A DE 3829260 C2 DE3829260 C2 DE 3829260C2
Authority
DE
Germany
Prior art keywords
coating chamber
objects
screen
substrates
lamellae
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE19883829260
Other languages
German (de)
English (en)
Other versions
DE3829260A1 (de
Inventor
Nikolaus 5204 Lohmar De Matentzoglu
Guenter 5110 Alsdorf De Schumacher
Joerg 5860 Iserlohn De Becker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MULTI-ARC OBERFLAECHENTECHNIK GMBH, 5060 BERGISCH
Original Assignee
Multi-Arc Oberflaechentechnik 5060 Bergisch Gladbach De GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Multi-Arc Oberflaechentechnik 5060 Bergisch Gladbach De GmbH filed Critical Multi-Arc Oberflaechentechnik 5060 Bergisch Gladbach De GmbH
Priority to DE19883829260 priority Critical patent/DE3829260A1/de
Publication of DE3829260A1 publication Critical patent/DE3829260A1/de
Application granted granted Critical
Publication of DE3829260C2 publication Critical patent/DE3829260C2/de
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055Arc discharge
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325Electric arc evaporation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32623Mechanical discharge control means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
DE19883829260 1988-08-29 1988-08-29 Plasmabeschichtungskammer mit entfernbarem schutzschirm Granted DE3829260A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19883829260 DE3829260A1 (de) 1988-08-29 1988-08-29 Plasmabeschichtungskammer mit entfernbarem schutzschirm

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19883829260 DE3829260A1 (de) 1988-08-29 1988-08-29 Plasmabeschichtungskammer mit entfernbarem schutzschirm

Publications (2)

Publication Number Publication Date
DE3829260A1 DE3829260A1 (de) 1990-03-01
DE3829260C2 true DE3829260C2 (enrdf_load_stackoverflow) 1992-08-06

Family

ID=6361807

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19883829260 Granted DE3829260A1 (de) 1988-08-29 1988-08-29 Plasmabeschichtungskammer mit entfernbarem schutzschirm

Country Status (1)

Country Link
DE (1) DE3829260A1 (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4042337C1 (en) * 1990-08-22 1991-09-12 Plasco Dr. Ehrich Plasma-Coating Gmbh, 6501 Heidesheim, De Controlling degree of ionisation of vapour for surface coating - by preventing straight line current flow between hot anode target surface and cold cathode by using movable wall between them
DE4035131C2 (de) * 1990-11-05 1995-09-21 Balzers Hochvakuum Verfahren und Vorrichtung zum gleichmäßigen Erwärmen von Heizgut, insbes. von zu beschichtenden Substraten, in einer Vakuumkammer
DE69227313T2 (de) * 1991-04-29 1999-04-08 Scientific-Industrial Enterprise Novatech, Moscow Verfahren und vorrichtung zur behandlung von bauteilen in einem gasentladungsplasma
DE4125365C1 (enrdf_load_stackoverflow) * 1991-07-31 1992-05-21 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De
IT1253063B (it) * 1991-12-13 1995-07-10 Unicoat Srl Vaporizzatore ad arco voltaico
DE4203371C1 (enrdf_load_stackoverflow) * 1992-02-06 1993-02-25 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De
DE4443740B4 (de) * 1994-12-08 2005-09-15 W. Blösch AG Vorrichtung zum Beschichten von Substraten
EP1524329A1 (de) * 2003-10-17 2005-04-20 Platit AG Modulare Vorrichtung zur Beschichtung von Oberflächen
DE102010042839B4 (de) * 2010-10-22 2016-07-21 Von Ardenne Gmbh Durchlauf-Vakuumbeschichtungsanlage zum Beschichten von Substraten
CH715877A1 (de) * 2019-02-26 2020-08-31 Oerlikon Surface Solutions Ag Pfaeffikon Vakuumkammer mit Elektrodenanordnung für eine Plasmaquelle zur Durchführung von Plasmabehandlungen.

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4511593A (en) * 1983-01-17 1985-04-16 Multi-Arc Vacuum Systems Inc. Vapor deposition apparatus and method

Also Published As

Publication number Publication date
DE3829260A1 (de) 1990-03-01

Similar Documents

Publication Publication Date Title
DE3873250T2 (de) Verfahren und anlage zur herstellung duenner schichten mittels eines plasmas fuer elektronische bzw. opto-elektronische anwendungen.
DE3726006C2 (enrdf_load_stackoverflow)
DE4235953C2 (de) Sputterquelle mit einer linearen Hohlkathode zum reaktiven Beschichten von Substraten
DE2448023B2 (de) Vorrichtung zum bedampfen von werkstuecken mit duennen filmen
DE3829260C2 (enrdf_load_stackoverflow)
DE4439920A1 (de) Umweltschonende Verfahren und umweltschonende Vorrichtung zur Abscheidung und/oder Rückgewinnung von Metall oder Halbleitermetall unter Verwendung der Sublimation
DE1765417A1 (de) Maskenloses Aufdampfverfahren
DE4104415C1 (enrdf_load_stackoverflow)
EP0213556A2 (de) Vorrichtung für das Aufdampfen von anorganischen Verbindungen mittels einer Photonen-erzeugenden thermischen Strahlungsheizquelle in kontinuierlich betriebenen Vakuumbedampfungsanlagen
DE2755852C2 (de) Anlage zum Behandeln von Substraten mittels eines Ionenstrahls
DE2917841A1 (de) Verdampfer fuer vakuumaufdampfanlagen
CH621580A5 (enrdf_load_stackoverflow)
DE2527184C3 (de) Vorrichtung zur Herstellung von Targets für Kathodenzerstäubung
DE4040856A1 (de) Zerstaeubungsanlage
DE3414669C2 (de) Verdampferzelle
DE1298833B (de) Vorrichtung zum Vakuumaufdampfen einer Vielzahl von festhaftenden Schichten bestimmter Dicke aus verschiedenen Materialien auf eine Unterlage mittels Elektronenbeschuss
DE1298381B (de) Bedampfungseinrichtung zur Herstellung duenner Schichten
EP0002688A1 (de) Apparat zur Bestahlung einer Auffangfläche mit Ionen
DE4443740B4 (de) Vorrichtung zum Beschichten von Substraten
DE1521175B2 (de) Vorrichtung zur verdampfung von werkstoffen im vakuum
DE2639033C3 (de) Bauteil in mit Ladungsträgerstrahlen arbeitenden elektrischen Vakuumgeräten und Verfahren zu dessen Herstellung
DE960221C (de) Elektronenroehre mit mindestens zwei auf Wandungsteile des Gefaesses aufgedampften Elektroden
DE2810811C2 (de) Vakuumaufdampfanlage
DE3047602C2 (enrdf_load_stackoverflow)
CH627790A5 (en) Electron beam evaporator and container for holding evaporable material

Legal Events

Date Code Title Description
8127 New person/name/address of the applicant

Owner name: MULTI-ARC OBERFLAECHENTECHNIK GMBH, 5060 BERGISCH

8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee