DE3829159A1 - Vorrichtung zur aufnahme von halbleiterscheibchen - Google Patents

Vorrichtung zur aufnahme von halbleiterscheibchen

Info

Publication number
DE3829159A1
DE3829159A1 DE19883829159 DE3829159A DE3829159A1 DE 3829159 A1 DE3829159 A1 DE 3829159A1 DE 19883829159 DE19883829159 DE 19883829159 DE 3829159 A DE3829159 A DE 3829159A DE 3829159 A1 DE3829159 A1 DE 3829159A1
Authority
DE
Germany
Prior art keywords
supports
support
slots
essentially
cross
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19883829159
Other languages
German (de)
English (en)
Other versions
DE3829159C2 (enExample
Inventor
Eberhard Zell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WESTDEUTSCHE QUARZSCHMELZE GMB
Original Assignee
WESTDEUTSCHE QUARZSCHMELZE GMB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WESTDEUTSCHE QUARZSCHMELZE GMB filed Critical WESTDEUTSCHE QUARZSCHMELZE GMB
Priority to DE19883829159 priority Critical patent/DE3829159A1/de
Publication of DE3829159A1 publication Critical patent/DE3829159A1/de
Application granted granted Critical
Publication of DE3829159C2 publication Critical patent/DE3829159C2/de
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67313—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE19883829159 1988-08-27 1988-08-27 Vorrichtung zur aufnahme von halbleiterscheibchen Granted DE3829159A1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19883829159 DE3829159A1 (de) 1988-08-27 1988-08-27 Vorrichtung zur aufnahme von halbleiterscheibchen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19883829159 DE3829159A1 (de) 1988-08-27 1988-08-27 Vorrichtung zur aufnahme von halbleiterscheibchen

Publications (2)

Publication Number Publication Date
DE3829159A1 true DE3829159A1 (de) 1990-03-08
DE3829159C2 DE3829159C2 (enExample) 1993-08-05

Family

ID=6361751

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19883829159 Granted DE3829159A1 (de) 1988-08-27 1988-08-27 Vorrichtung zur aufnahme von halbleiterscheibchen

Country Status (1)

Country Link
DE (1) DE3829159A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4428169A1 (de) * 1994-08-09 1996-02-15 Steag Micro Tech Gmbh Träger für Substrate
US5582649A (en) * 1996-02-29 1996-12-10 The United States Of America As Represented By The Secretary Of The Air Force Wafer transfer apparatus for use in a film deposition furnace

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH570700A5 (enExample) * 1973-10-19 1975-12-15 Heraeus Schott Quarzschmelze
US4053294A (en) * 1976-05-19 1977-10-11 California Quartzware Corporation Low stress semiconductor wafer carrier and method of manufacture
DE8021868U1 (de) * 1980-08-16 1981-01-29 Heraeus Quarzschmelze Gmbh, 6450 Hanau Traegerhorde fuer halbleiterscheiben
EP0056326A2 (en) * 1981-01-14 1982-07-21 Northern Telecom Limited Coating of semiconductor wafers and apparatus therefor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH570700A5 (enExample) * 1973-10-19 1975-12-15 Heraeus Schott Quarzschmelze
US4053294A (en) * 1976-05-19 1977-10-11 California Quartzware Corporation Low stress semiconductor wafer carrier and method of manufacture
DE8021868U1 (de) * 1980-08-16 1981-01-29 Heraeus Quarzschmelze Gmbh, 6450 Hanau Traegerhorde fuer halbleiterscheiben
EP0056326A2 (en) * 1981-01-14 1982-07-21 Northern Telecom Limited Coating of semiconductor wafers and apparatus therefor

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4428169A1 (de) * 1994-08-09 1996-02-15 Steag Micro Tech Gmbh Träger für Substrate
WO1996005611A1 (de) * 1994-08-09 1996-02-22 Steag Microtech Gmbh Donaueschingen Träger für substrate
US5582649A (en) * 1996-02-29 1996-12-10 The United States Of America As Represented By The Secretary Of The Air Force Wafer transfer apparatus for use in a film deposition furnace

Also Published As

Publication number Publication date
DE3829159C2 (enExample) 1993-08-05

Similar Documents

Publication Publication Date Title
DE3930056C2 (de) Behandlungskorb zur Aufnahme dünner Platten, insbesondere von Halbleiterwafern
DE69128567T2 (de) Kassette für eine einzelne Reihe von Reagenzröhrchen oder dergleichen
EP0303224A2 (de) Kristallisationseinrichtung
DE20201877U1 (de) Kunststein für Pflasterzwecke
DE69311659T2 (de) Positioniervorrichtung zum Schneiden von Fliessen entlang einer Diagonale
EP0166032A2 (de) Trägerhorde aus Quarzglas für scheibenförmige Substrate
DE3829159A1 (de) Vorrichtung zur aufnahme von halbleiterscheibchen
EP1186891A1 (de) Träger für eine Mikrotiterplatte
EP1006564A1 (de) Verfahren zur Herstellung einer Haltevorrichtung für Halbleiterscheiben und nach diesem Verfahren hergestellte Haltevorrichtung
DE10159418A1 (de) Waagschale und Bestückungs-Plattform für eine Waage sowie Massenkomparator mit einer solchen
DE1498929C3 (de) Bearbeitungsvorrichtung für röhren- oder zylinderförmige Gefäße
DE3624728A1 (de) Vorrichtung zum ab- und anloeten von bestandteilen z.b. einer elektronischen schaltung mittels eines erhitzten fluidums
DE102022117649B4 (de) Filter rmit v-förmig angeordneten Medienpaketen und Schutzgitter
DE7427725U (de) Gestellanordnung fuer toepferwaren
DE8810867U1 (de) Vorrichtung zur Aufnahme von Halbleiterscheibchen
DE3148513A1 (de) Ausrichtbare stuetzeinrichtung fuer ein grosses kugelkalottenfoermiges teil
DE3024985A1 (de) Schieberverschluss fuer giesspfannen o.ae.
DE3807710C2 (enExample)
EP0864828B1 (de) Hubbalkenofen
CH661906A5 (en) Transport and storage element for elongate material
DE2520234A1 (de) Befestigungsanordnung fuer kernreaktorbrennstaebe o.dgl.
DE2012532A1 (de) Tragegestell
DE3919626C2 (enExample)
DE4004830C2 (enExample)
DE7520498U (de) Vorrichtung zum zeilengerechten transportieren von auf einer ebenen absetzflaeche fluchtend angeordneten mauerwerksteinen

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee