DE3787035D1 - Optisches projektionssystem fuer praezisionskopien. - Google Patents
Optisches projektionssystem fuer praezisionskopien.Info
- Publication number
- DE3787035D1 DE3787035D1 DE8787103472T DE3787035T DE3787035D1 DE 3787035 D1 DE3787035 D1 DE 3787035D1 DE 8787103472 T DE8787103472 T DE 8787103472T DE 3787035 T DE3787035 T DE 3787035T DE 3787035 D1 DE3787035 D1 DE 3787035D1
- Authority
- DE
- Germany
- Prior art keywords
- copies
- precision
- projection system
- optical projection
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0884—Catadioptric systems having a pupil corrector
- G02B17/0888—Catadioptric systems having a pupil corrector the corrector having at least one aspheric surface, e.g. Schmidt plates
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0836—Catadioptric systems using more than three curved mirrors
- G02B17/084—Catadioptric systems using more than three curved mirrors on-axis systems with at least one of the mirrors having a central aperture
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5405186A JPS62210415A (ja) | 1986-03-12 | 1986-03-12 | 精密複写用投影光学系 |
JP61159055A JPS6314113A (ja) | 1986-07-07 | 1986-07-07 | 微細パタ−ン投影光学系 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3787035D1 true DE3787035D1 (de) | 1993-09-23 |
DE3787035T2 DE3787035T2 (de) | 1994-03-10 |
Family
ID=26394795
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE87103472T Expired - Fee Related DE3787035T2 (de) | 1986-03-12 | 1987-03-11 | Optisches Projektionssystem für Präzisionskopien. |
Country Status (3)
Country | Link |
---|---|
US (1) | US4861148A (de) |
EP (1) | EP0237041B1 (de) |
DE (1) | DE3787035T2 (de) |
Families Citing this family (66)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5004331A (en) * | 1989-05-03 | 1991-04-02 | Hughes Aircraft Company | Catadioptric projector, catadioptric projection system and process |
US5071240A (en) * | 1989-09-14 | 1991-12-10 | Nikon Corporation | Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image |
US5572375A (en) * | 1990-08-03 | 1996-11-05 | Crabtree, Iv; Allen F. | Method and apparatus for manipulating, projecting and displaying light in a volumetric format |
US5136413A (en) * | 1990-11-05 | 1992-08-04 | Litel Instruments | Imaging and illumination system with aspherization and aberration correction by phase steps |
US5291339A (en) * | 1990-11-30 | 1994-03-01 | Olympus Optical Co., Ltd. | Schwarzschild optical system |
US5212588A (en) * | 1991-04-09 | 1993-05-18 | The United States Of America As Represented By The United States Department Of Energy | Reflective optical imaging system for extreme ultraviolet wavelengths |
US5173801A (en) * | 1991-08-16 | 1992-12-22 | Hughes Aircraft Company | Wide field of view afocal three-mirror anastigmat |
US5361292A (en) * | 1993-05-11 | 1994-11-01 | The United States Of America As Represented By The Department Of Energy | Condenser for illuminating a ring field |
US5392119A (en) * | 1993-07-13 | 1995-02-21 | Litel Instruments | Plate correction of imaging systems |
WO1996007075A1 (en) * | 1993-07-13 | 1996-03-07 | Litel Instruments, Inc. | Corrector plate correction of extant imaging systems for approaching diffraction limit |
US5548444A (en) * | 1994-07-06 | 1996-08-20 | Hughes Danbury Optical Systems, Inc. | Optical beam homogenizing apparatus and method |
US5581413A (en) * | 1994-11-30 | 1996-12-03 | Texas Instruments Incorporated | Optical guide for increasing printer image width |
US5870235A (en) * | 1996-04-03 | 1999-02-09 | Science Applications International Corporation | Energy-efficient headlamp |
US6157498A (en) | 1996-06-19 | 2000-12-05 | Nikon Corporation | Dual-imaging optical system |
US5847879A (en) * | 1997-02-26 | 1998-12-08 | Raytheon Company | Dual wavelength wide angle large reflective unobscured system |
US5828455A (en) * | 1997-03-07 | 1998-10-27 | Litel Instruments | Apparatus, method of measurement, and method of data analysis for correction of optical system |
US5978085A (en) * | 1997-03-07 | 1999-11-02 | Litel Instruments | Apparatus method of measurement and method of data analysis for correction of optical system |
GB9711366D0 (en) * | 1997-06-02 | 1997-07-30 | Pilkington Perkin Elmer Ltd | Optical imaging system |
US5903386A (en) * | 1998-01-20 | 1999-05-11 | Northrop Grumman Corporation | Tilted primary clamshell lens laser scanner |
US6356345B1 (en) | 1998-02-11 | 2002-03-12 | Litel Instruments | In-situ source metrology instrument and method of use |
WO1999052004A1 (fr) | 1998-04-07 | 1999-10-14 | Nikon Corporation | Appareil et procede d'exposition a projection, et systeme optique reflechissant a refraction |
US6577443B2 (en) | 1998-05-30 | 2003-06-10 | Carl-Zeiss Stiftung | Reduction objective for extreme ultraviolet lithography |
DE19923609A1 (de) * | 1998-05-30 | 1999-12-02 | Zeiss Carl Fa | Ringfeld-4-Spiegelsysteme mit konvexem Primärspiegel für die EUV-Lithographie |
US6741338B2 (en) | 1999-02-10 | 2004-05-25 | Litel Instruments | In-situ source metrology instrument and method of use |
WO2001050171A1 (de) | 1999-12-29 | 2001-07-12 | Carl Zeiss | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
TW538256B (en) * | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
JP2001228401A (ja) * | 2000-02-16 | 2001-08-24 | Canon Inc | 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法 |
JP4245286B2 (ja) * | 2000-10-23 | 2009-03-25 | 株式会社ニコン | 反射屈折光学系および該光学系を備えた露光装置 |
US6699627B2 (en) | 2000-12-08 | 2004-03-02 | Adlai Smith | Reference wafer and process for manufacturing same |
US7099011B2 (en) | 2000-12-08 | 2006-08-29 | Litel Instruments | Method and apparatus for self-referenced projection lens distortion mapping |
US6573986B2 (en) | 2000-12-08 | 2003-06-03 | Litel Instruments | Method and apparatus for self-referenced projection lens distortion mapping |
US6734971B2 (en) * | 2000-12-08 | 2004-05-11 | Lael Instruments | Method and apparatus for self-referenced wafer stage positional error mapping |
US7261983B2 (en) * | 2000-12-08 | 2007-08-28 | Litel Instruments | Reference wafer and process for manufacturing same |
US7871002B2 (en) * | 2000-12-08 | 2011-01-18 | Litel Instruments | Method and apparatus for self-referenced wafer stage positional error mapping |
DE10139177A1 (de) * | 2001-08-16 | 2003-02-27 | Zeiss Carl | Objektiv mit Pupillenobskuration |
US6906780B1 (en) | 2001-09-20 | 2005-06-14 | Litel Instruments | Method and apparatus for self-referenced dynamic step and scan intra-field lens distortion |
US7136144B2 (en) * | 2001-09-20 | 2006-11-14 | Litel Instruments | Method and apparatus for self-referenced dynamic step and scan intra-field lens distortion |
US6906303B1 (en) | 2001-09-20 | 2005-06-14 | Litel Instruments | Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
US7262398B2 (en) * | 2001-09-20 | 2007-08-28 | Litel Instruments | Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
US7268360B2 (en) * | 2001-09-20 | 2007-09-11 | Litel Instruments | Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
US7265829B2 (en) * | 2002-12-17 | 2007-09-04 | Molecular Devices Corporation | Reflective optic system for imaging microplate readers |
JP4241281B2 (ja) * | 2003-09-17 | 2009-03-18 | キヤノン株式会社 | 露光装置 |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US6983215B2 (en) * | 2003-12-02 | 2006-01-03 | Mks Instruments, Inc. | RF metrology characterization for field installation and serviceability for the plasma processing industry |
US7466489B2 (en) * | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
WO2005059645A2 (en) * | 2003-12-19 | 2005-06-30 | Carl Zeiss Smt Ag | Microlithography projection objective with crystal elements |
US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
WO2005069055A2 (en) | 2004-01-14 | 2005-07-28 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US7463422B2 (en) * | 2004-01-14 | 2008-12-09 | Carl Zeiss Smt Ag | Projection exposure apparatus |
WO2005098504A1 (en) | 2004-04-08 | 2005-10-20 | Carl Zeiss Smt Ag | Imaging system with mirror group |
US7088427B2 (en) * | 2004-04-20 | 2006-08-08 | Litel Instruments | Apparatus and method for high resolution in-situ illumination source measurement in projection imaging systems |
US7671979B2 (en) * | 2004-04-28 | 2010-03-02 | Litel Instruments | Apparatus and process for determination of dynamic lens field curvature |
US7126668B2 (en) * | 2004-04-28 | 2006-10-24 | Litel Instruments | Apparatus and process for determination of dynamic scan field curvature |
US7053979B2 (en) * | 2004-05-12 | 2006-05-30 | Litel Instruments | Process for amelioration of scanning synchronization error |
KR20140138350A (ko) | 2004-05-17 | 2014-12-03 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
JP2006119490A (ja) * | 2004-10-25 | 2006-05-11 | Canon Inc | 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法 |
DE102005042005A1 (de) | 2004-12-23 | 2006-07-06 | Carl Zeiss Smt Ag | Hochaperturiges Objektiv mit obskurierter Pupille |
US7817246B2 (en) * | 2006-06-21 | 2010-10-19 | Asml Netherlands B.V. | Optical apparatus |
US20080112927A1 (en) * | 2006-10-23 | 2008-05-15 | Genegrafts Ltd. | Cells and methods utilizing same for modifying the electrophysiological function of excitable tissues |
FR2910978B1 (fr) * | 2006-12-28 | 2009-07-31 | Commissariat Energie Atomique | Systeme optique de traitement d'un faisceau lumineux |
DE102007051669A1 (de) * | 2007-10-26 | 2009-04-30 | Carl Zeiss Smt Ag | Abbildende Optik, Projektionsbelichtungsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik sowie Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage |
DE102008033340B3 (de) * | 2008-07-16 | 2010-04-08 | Carl Zeiss Smt Ag | Abbildende Optik |
MX2012003156A (es) * | 2009-09-14 | 2012-09-28 | Sloan Kettering Inst Cancer | Aparato, sistema y metodo para proporcionar la direccion y enfoque de laser para incision, escision y ablacion de tejido en cirugia minimamente invasiva. |
DE102011076752A1 (de) * | 2011-05-31 | 2012-12-06 | Carl Zeiss Smt Gmbh | Abbildende Optik |
CN102981255B (zh) * | 2011-09-07 | 2016-04-20 | 上海微电子装备有限公司 | 一种大视场投影物镜 |
US11561476B1 (en) * | 2021-07-10 | 2023-01-24 | Kenneth Carlisle Johnson | UV lithography system |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR784063A (fr) * | 1933-11-18 | 1935-07-22 | Maillet | Système catoptrique ou catadioptrique destiné en particulier à un projecteur |
US2344756A (en) * | 1941-01-06 | 1944-03-21 | Taylor Taylor & Hobson Ltd | Optical objective |
US2327947A (en) * | 1941-02-20 | 1943-08-24 | Taylor Taylor & Hobson Ltd | Optical objective |
GB548729A (en) * | 1941-02-20 | 1942-10-22 | Taylor Taylor & Hobson Ltd | Improvements in or relating to optical objectives |
US2380887A (en) * | 1941-05-22 | 1945-07-31 | Taylor Taylor & Hobson Ltd | Optical system |
US2683394A (en) * | 1951-09-08 | 1954-07-13 | American Optical Corp | Wide aperture optical projection lens system |
US2891437A (en) * | 1956-10-31 | 1959-06-23 | Robert W Tripp | Folded optics reticule system |
GB867251A (en) * | 1958-12-05 | 1961-05-03 | Gen Electric Co Ltd | Improvements in or relating to optical systems |
US3325238A (en) * | 1963-06-04 | 1967-06-13 | Keuffel & Esser Co | Solar simulator |
GB1388545A (en) * | 1971-06-09 | 1975-03-26 | Rank Organisation Ltd | Catadioptric lenses |
US3748015A (en) * | 1971-06-21 | 1973-07-24 | Perkin Elmer Corp | Unit power imaging catoptric anastigmat |
JPS5712966A (en) * | 1980-06-21 | 1982-01-22 | Tomie Numahata | Mixed cake from rice and barley |
-
1987
- 1987-03-11 EP EP87103472A patent/EP0237041B1/de not_active Expired - Lifetime
- 1987-03-11 DE DE87103472T patent/DE3787035T2/de not_active Expired - Fee Related
- 1987-03-11 US US07/024,134 patent/US4861148A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE3787035T2 (de) | 1994-03-10 |
US4861148A (en) | 1989-08-29 |
EP0237041B1 (de) | 1993-08-18 |
EP0237041A3 (en) | 1989-05-03 |
EP0237041A2 (de) | 1987-09-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |