DE3784963D1 - Optisches projektionssystem. - Google Patents
Optisches projektionssystem.Info
- Publication number
- DE3784963D1 DE3784963D1 DE8787106243T DE3784963T DE3784963D1 DE 3784963 D1 DE3784963 D1 DE 3784963D1 DE 8787106243 T DE8787106243 T DE 8787106243T DE 3784963 T DE3784963 T DE 3784963T DE 3784963 D1 DE3784963 D1 DE 3784963D1
- Authority
- DE
- Germany
- Prior art keywords
- projection system
- optical projection
- optical
- projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0852—Catadioptric systems having a field corrector only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0804—Catadioptric systems using two curved mirrors
- G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10233686A JPS62258414A (ja) | 1986-05-02 | 1986-05-02 | 精密複写用投影光学系 |
JP61159050A JPS6314112A (ja) | 1986-07-07 | 1986-07-07 | 微細パタ−ン投影光学系 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3784963D1 true DE3784963D1 (de) | 1993-04-29 |
DE3784963T2 DE3784963T2 (de) | 1993-07-15 |
Family
ID=26443043
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8787106243T Expired - Fee Related DE3784963T2 (de) | 1986-05-02 | 1987-04-29 | Optisches projektionssystem. |
Country Status (3)
Country | Link |
---|---|
US (1) | US4757354A (de) |
EP (1) | EP0243950B1 (de) |
DE (1) | DE3784963T2 (de) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2754570B2 (ja) * | 1988-05-16 | 1998-05-20 | ミノルタ株式会社 | オートフォーカス可能な反射望遠レンズ鏡胴 |
US5003345A (en) * | 1989-12-27 | 1991-03-26 | General Signal Corporation | Apparatus and method for aligning and focusing an image of a reticle onto a semiconductor wafer |
US5136413A (en) * | 1990-11-05 | 1992-08-04 | Litel Instruments | Imaging and illumination system with aspherization and aberration correction by phase steps |
US5291339A (en) * | 1990-11-30 | 1994-03-01 | Olympus Optical Co., Ltd. | Schwarzschild optical system |
US5287218A (en) * | 1992-04-07 | 1994-02-15 | Hughes Aircraft Company | Re-imaging optical system including refractive and diffractive optical elements |
US5448410A (en) * | 1992-07-31 | 1995-09-05 | International Business Machines Corporation | Variable magnification laser imaging system |
JPH09311278A (ja) | 1996-05-20 | 1997-12-02 | Nikon Corp | 反射屈折光学系 |
JP3395801B2 (ja) | 1994-04-28 | 2003-04-14 | 株式会社ニコン | 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法 |
USRE38438E1 (en) | 1994-08-23 | 2004-02-24 | Nikon Corporation | Catadioptric reduction projection optical system and exposure apparatus having the same |
JPH08179204A (ja) * | 1994-11-10 | 1996-07-12 | Nikon Corp | 投影光学系及び投影露光装置 |
JP3454390B2 (ja) | 1995-01-06 | 2003-10-06 | 株式会社ニコン | 投影光学系、投影露光装置及び投影露光方法 |
JP2000081367A (ja) | 1998-09-07 | 2000-03-21 | Nikon Corp | 光透過性光学部材、その製造方法、その評価方法、および光リソグラフィー装置 |
KR20000034967A (ko) | 1998-11-30 | 2000-06-26 | 헨켈 카르스텐 | 수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치 |
US7151592B2 (en) * | 1999-02-15 | 2006-12-19 | Carl Zeiss Smt Ag | Projection system for EUV lithography |
WO2001050171A1 (de) | 1999-12-29 | 2001-07-12 | Carl Zeiss | Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen |
TW538256B (en) | 2000-01-14 | 2003-06-21 | Zeiss Stiftung | Microlithographic reduction projection catadioptric objective |
WO2002044786A2 (en) * | 2000-11-28 | 2002-06-06 | Carl Zeiss Smt Ag | Catadioptric projection system for 157 nm lithography |
JP2001228401A (ja) * | 2000-02-16 | 2001-08-24 | Canon Inc | 投影光学系、および該投影光学系による投影露光装置、デバイス製造方法 |
JP2002083766A (ja) | 2000-06-19 | 2002-03-22 | Nikon Corp | 投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置 |
KR20010113527A (ko) * | 2000-06-19 | 2001-12-28 | 시마무라 테루오 | 투영 광학계, 그 제조 방법 및 투영 노광 장치 |
JP2004525398A (ja) * | 2001-01-09 | 2004-08-19 | カール ツァイス エスエムテー アーゲー | Euvリソグラフィ用の投影系 |
EP1615076A1 (de) * | 2001-01-09 | 2006-01-11 | Carl Zeiss SMT AG | Projektionssystem für die extrem-ultraviolettlithographie |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US7466489B2 (en) * | 2003-12-15 | 2008-12-16 | Susanne Beder | Projection objective having a high aperture and a planar end surface |
WO2005059645A2 (en) * | 2003-12-19 | 2005-06-30 | Carl Zeiss Smt Ag | Microlithography projection objective with crystal elements |
WO2005069055A2 (en) | 2004-01-14 | 2005-07-28 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US7463422B2 (en) * | 2004-01-14 | 2008-12-09 | Carl Zeiss Smt Ag | Projection exposure apparatus |
KR20050080376A (ko) * | 2004-02-09 | 2005-08-12 | 삼성전자주식회사 | 투사광학계 및 그것을 갖는 화상 투사 장치 |
WO2005098504A1 (en) | 2004-04-08 | 2005-10-20 | Carl Zeiss Smt Ag | Imaging system with mirror group |
KR20140138350A (ko) | 2004-05-17 | 2014-12-03 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
JP2006119490A (ja) * | 2004-10-25 | 2006-05-11 | Canon Inc | 反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法 |
JP2008532273A (ja) * | 2005-02-25 | 2008-08-14 | カール ツァイス エスエムテー アクチエンゲゼルシャフト | マイクロ・リソグラフィー投影露光装置のための光学システム |
US20080112927A1 (en) * | 2006-10-23 | 2008-05-15 | Genegrafts Ltd. | Cells and methods utilizing same for modifying the electrophysiological function of excitable tissues |
US7633689B2 (en) * | 2007-07-18 | 2009-12-15 | Asml Holding N.V. | Catadioptric optical system for scatterometry |
TWI640809B (zh) | 2017-05-19 | 2018-11-11 | 大立光電股份有限公司 | 攝影鏡片系統、取像裝置及電子裝置 |
CN112764196B (zh) * | 2021-01-08 | 2022-03-11 | 广景视睿科技(深圳)有限公司 | 一种双远心投影镜头及汽车的抬头显示装置 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB618253A (en) * | 1946-05-01 | 1949-02-18 | Wray Optical Works Ltd | Improvements in or relating to optical objectives |
US2520633A (en) * | 1948-10-20 | 1950-08-29 | Polaroid Corp | Optical system |
US3748015A (en) * | 1971-06-21 | 1973-07-24 | Perkin Elmer Corp | Unit power imaging catoptric anastigmat |
JPS5951229B2 (ja) * | 1978-07-11 | 1984-12-12 | マブチモ−タ−株式会社 | 直流電動機のブリツジ式ガバナ−起動回路 |
JPS5712966A (en) * | 1980-06-21 | 1982-01-22 | Tomie Numahata | Mixed cake from rice and barley |
US4425037A (en) * | 1981-05-15 | 1984-01-10 | General Signal Corporation | Apparatus for projecting a series of images onto dies of a semiconductor wafer |
JPS5825637A (ja) * | 1981-08-08 | 1983-02-15 | Canon Inc | 投影焼付装置 |
US4600265A (en) * | 1983-01-27 | 1986-07-15 | Pilkington P.E. Limited | Infra-red optical systems |
-
1987
- 1987-04-28 US US07/043,620 patent/US4757354A/en not_active Expired - Fee Related
- 1987-04-29 EP EP87106243A patent/EP0243950B1/de not_active Expired - Lifetime
- 1987-04-29 DE DE8787106243T patent/DE3784963T2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE3784963T2 (de) | 1993-07-15 |
EP0243950A3 (en) | 1989-02-08 |
US4757354A (en) | 1988-07-12 |
EP0243950A2 (de) | 1987-11-04 |
EP0243950B1 (de) | 1993-03-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |