DE3786668T2 - Lichtempfindliche zusammensetzung. - Google Patents

Lichtempfindliche zusammensetzung.

Info

Publication number
DE3786668T2
DE3786668T2 DE87115278T DE3786668T DE3786668T2 DE 3786668 T2 DE3786668 T2 DE 3786668T2 DE 87115278 T DE87115278 T DE 87115278T DE 3786668 T DE3786668 T DE 3786668T DE 3786668 T2 DE3786668 T2 DE 3786668T2
Authority
DE
Germany
Prior art keywords
light sensitive
sensitive composition
composition
light
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE87115278T
Other languages
English (en)
Other versions
DE3786668D1 (de
Inventor
Masaharu Taniguchi
Chikara Ichijo
Junichi Fujikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Publication of DE3786668D1 publication Critical patent/DE3786668D1/de
Application granted granted Critical
Publication of DE3786668T2 publication Critical patent/DE3786668T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Detergent Compositions (AREA)
  • Cosmetics (AREA)
DE87115278T 1987-02-25 1987-10-19 Lichtempfindliche zusammensetzung. Expired - Fee Related DE3786668T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP62040153A JPS63208035A (ja) 1987-02-25 1987-02-25 フレキソ印刷版材
EP87115278A EP0312624B1 (de) 1987-02-25 1987-10-19 Lichtempfindliche Zusammensetzung

Publications (2)

Publication Number Publication Date
DE3786668D1 DE3786668D1 (de) 1993-08-26
DE3786668T2 true DE3786668T2 (de) 1993-11-04

Family

ID=39672894

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87115278T Expired - Fee Related DE3786668T2 (de) 1987-02-25 1987-10-19 Lichtempfindliche zusammensetzung.

Country Status (4)

Country Link
US (1) US4927739A (de)
EP (1) EP0312624B1 (de)
JP (2) JPS63208035A (de)
DE (1) DE3786668T2 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2700933B2 (ja) * 1989-11-28 1998-01-21 日本石油株式会社 永久保護膜用樹脂組成物および永久保護膜の製造方法
DE4004512A1 (de) * 1990-02-14 1991-08-22 Hoechst Ag Verfahren zur herstellung von photopolymerplatten
US5238783A (en) * 1990-04-16 1993-08-24 Toray Industries, Inc. Photosensitive polymer composition for water developable flexographic printing plate
GB9122577D0 (en) * 1991-10-24 1991-12-04 Hercules Inc Improved moulding resin with quick-release properties
US5362605A (en) * 1993-05-10 1994-11-08 W. R. Grace & Co.-Conn. Photosensitive polymer composition for flexographic printing plates processable in aqueous media
US6042987A (en) * 1996-10-16 2000-03-28 Fuji Photo Film Co., Ltd Negative type image recording material
WO2001044874A1 (en) * 1999-12-14 2001-06-21 Bernard Cooke Compositions, articles, methods for producing and processing these articles
JP4696346B2 (ja) * 2000-09-20 2011-06-08 Ｄｉｃ株式会社 エネルギー線硬化型印刷インキ組成物及びその製造方法
WO2003093360A1 (fr) * 2002-05-02 2003-11-13 New Japan Chemical Co., Ltd. Agent permettant d'inhiber la migration d'odeur et de gout provoquee par le diacetal, composition de diacetal contenant cet agent permettant d'inhiber la migration d'odeur et de gout, agent de nucleation pour polyolefine comprenant cette composition, et composition de resine polyolefinique et objet moule contenant tous deux
US6881533B2 (en) * 2003-02-18 2005-04-19 Kodak Polychrome Graphics Llc Flexographic printing plate with ink-repellent non-image areas
JP4675196B2 (ja) * 2005-09-20 2011-04-20 富士フイルム株式会社 ホログラム記録媒体用組成物、ホログラム記録媒体及びその製造方法、並びに、ホログラム記録方法及びホログラム再生方法
TW201523161A (zh) * 2013-08-30 2015-06-16 Nissan Chemical Ind Ltd 光阻圖型之形成方法以及光阻圖型形成用組成物
US20220135798A1 (en) * 2019-01-31 2022-05-05 Kusumoto Chemicals, Ltd. Rheology control agent and curable composition using the same

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2787546A (en) * 1955-02-08 1957-04-02 Eastman Kodak Co Light-sensitive photographic elements for photomechanical processes
US3615469A (en) * 1969-06-02 1971-10-26 Goodrich Co B F Polymeric printing plates
JPS4847950A (de) * 1971-10-21 1973-07-07
US4198236A (en) * 1974-01-21 1980-04-15 E. I. Du Pont De Nemours And Company Method for preparation of lithographic printing plate having addition polymerized areas and binder areas
JPS51106501A (ja) * 1975-03-15 1976-09-21 Tokyo Ohka Kogyo Co Ltd Furekisobanyokankoseijushisoseibutsu
JPS5264301A (en) * 1975-11-19 1977-05-27 Nippon Paint Co Ltd Flexo graphic press plate
JPS52134503A (en) * 1976-05-06 1977-11-10 Tokyo Ouka Kougiyou Kk Photoosensitive flexo graphic printing plate material
JPS5823616B2 (ja) * 1976-11-08 1983-05-16 東レ株式会社 感光性ポリマ組成物
JPS5830569B2 (ja) * 1977-03-31 1983-06-30 富士写真フイルム株式会社 写真感光材料
US4227979A (en) * 1977-10-05 1980-10-14 Ppg Industries, Inc. Radiation-curable coating compositions containing amide acrylate compounds
US4195997A (en) * 1978-01-23 1980-04-01 E. I. Du Pont De Nemours And Company Photopolymerizable compositions containing selected cellulose acetate butyrate as a binder
US4177074A (en) * 1978-01-25 1979-12-04 E. I. Du Pont De Nemours And Company Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates
US4362808A (en) * 1979-07-25 1982-12-07 Armstrong World Industries, Inc. Print screen stencil and its production
US4252888A (en) * 1980-02-26 1981-02-24 Minnesota Mining And Manufacturing Company Solder mask composition
JPS5922219B2 (ja) * 1980-07-07 1984-05-25 東京応化工業株式会社 フレキソ印刷版用感光性樹脂組成物
US4394435A (en) * 1981-10-01 1983-07-19 Uniroyal, Inc. Syndiotactic polybutadiene composition for a photosensitive printing plate
JPS59121041A (ja) * 1982-12-27 1984-07-12 Sekisui Chem Co Ltd 画像形成用材料
JPS60189488A (ja) * 1984-03-09 1985-09-26 Canon Inc 感熱転写材
US4686172A (en) * 1985-07-18 1987-08-11 Uniroyal Plastics Co., Inc. Photosensitive elastomeric composition for flexographic printing plates having improved softness
JPS62121334A (ja) * 1985-11-21 1987-06-02 Shimadzu Corp 材料疲労試験機の試験片伸び測定装置
JP2661413B2 (ja) * 1991-06-28 1997-10-08 三菱電機株式会社 包装装置

Also Published As

Publication number Publication date
DE3786668D1 (de) 1993-08-26
JPS63146030A (ja) 1988-06-18
EP0312624B1 (de) 1993-07-21
JPS63208035A (ja) 1988-08-29
JPH054661B2 (de) 1993-01-20
EP0312624A1 (de) 1989-04-26
US4927739A (en) 1990-05-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee