DE3785550D1 - Photosensible zusammensetzung mit verbesserter haftung, gegenstaende und verfahren. - Google Patents

Photosensible zusammensetzung mit verbesserter haftung, gegenstaende und verfahren.

Info

Publication number
DE3785550D1
DE3785550D1 DE8787117547T DE3785550T DE3785550D1 DE 3785550 D1 DE3785550 D1 DE 3785550D1 DE 8787117547 T DE8787117547 T DE 8787117547T DE 3785550 T DE3785550 T DE 3785550T DE 3785550 D1 DE3785550 D1 DE 3785550D1
Authority
DE
Germany
Prior art keywords
photosensitive composition
improved liability
liability
improved
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8787117547T
Other languages
English (en)
Other versions
DE3785550T2 (de
Inventor
Joseph Edmund Gervay
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of DE3785550D1 publication Critical patent/DE3785550D1/de
Application granted granted Critical
Publication of DE3785550T2 publication Critical patent/DE3785550T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/026—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from the reaction products of polyepoxides and unsaturated monocarboxylic acids, their anhydrides, halogenides or esters with low molecular weight
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C08L63/10—Epoxy resins modified by unsaturated compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676—Single layer compositions
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0104—Properties and characteristics in general
    • H05K2201/0133—Elastomeric or compliant polymer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0023—Etching of the substrate by chemical or physical means by exposure and development of a photosensitive insulating layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
DE87117547T 1986-12-02 1987-11-27 Photosensible zusammensetzung mit verbesserter haftung, gegenstaende und verfahren. Expired - Lifetime DE3785550T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US93688086A 1986-12-02 1986-12-02

Publications (2)

Publication Number Publication Date
DE3785550D1 true DE3785550D1 (de) 1993-05-27
DE3785550T2 DE3785550T2 (de) 1993-11-04

Family

ID=25469191

Family Applications (1)

Application Number Title Priority Date Filing Date
DE87117547T Expired - Lifetime DE3785550T2 (de) 1986-12-02 1987-11-27 Photosensible zusammensetzung mit verbesserter haftung, gegenstaende und verfahren.

Country Status (6)

Country Link
EP (1) EP0270945B1 (de)
JP (1) JPH0742343B2 (de)
KR (1) KR910003980B1 (de)
CN (1) CN1021448C (de)
BR (1) BR8706493A (de)
DE (1) DE3785550T2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5302494A (en) * 1985-06-10 1994-04-12 The Foxboro Company Multilayer circuit board having microporous layers and process for making same
JPH04504332A (ja) * 1989-10-30 1992-07-30 ザ・フォックスボロ・カンパニー ミクロ孔の層を有する多層回路板及びその製造方法
WO1993011465A1 (en) * 1991-12-06 1993-06-10 Akzo Nobel N.V. Photopolymerizable composition containing interlinked allylic and epoxy polymer networks
TW268031B (de) * 1993-07-02 1996-01-11 Ciba Geigy
KR100903767B1 (ko) * 2003-04-25 2009-06-19 주식회사 동진쎄미켐 Ｌｃｄ 흑색 컬러 레지스트용 감광성 수지 조성물

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5137102B2 (de) * 1972-09-21 1976-10-13
US4278752A (en) * 1978-09-07 1981-07-14 E. I. Du Pont De Nemours And Company Flame retardant radiation sensitive element
US4283243A (en) * 1978-10-24 1981-08-11 E. I. Du Pont De Nemours And Company Use of photosensitive stratum to create through-hole connections in circuit boards
JPS57131221A (en) * 1981-02-05 1982-08-14 Ube Ind Ltd Photo-curable composition
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
JPS5918717A (ja) * 1982-07-23 1984-01-31 Hitachi Chem Co Ltd 硬化性樹脂組成物
US4469777A (en) * 1983-12-01 1984-09-04 E. I. Du Pont De Nemours And Company Single exposure process for preparing printed circuits
US4554229A (en) * 1984-04-06 1985-11-19 At&T Technologies, Inc. Multilayer hybrid integrated circuit

Also Published As

Publication number Publication date
JPS63159417A (ja) 1988-07-02
CN87108226A (zh) 1988-08-17
CN1021448C (zh) 1993-06-30
EP0270945B1 (de) 1993-04-21
EP0270945A3 (en) 1990-02-14
KR910003980B1 (ko) 1991-06-17
KR880008085A (ko) 1988-08-30
EP0270945A2 (de) 1988-06-15
BR8706493A (pt) 1988-07-12
JPH0742343B2 (ja) 1995-05-10
DE3785550T2 (de) 1993-11-04

Similar Documents

Publication Publication Date Title
ATA901883A (de) Polydom, verfahren zu seiner herstellung und immunodiagnostische verfahren
DE3688093D1 (de) Durchsichtiger gegenstand und verfahren zu seiner herstellung.
DE3587442D1 (de) Verfahren zur herstellung von polysilsesquioxanen.
DE3675687D1 (de) Verfahren zur herstellung von 2,2,6,6,-tetraalkyl-4-piperidylamine.
DE3575423D1 (de) Verfahren zur herstellung von heteroaryloxyacetamiden.
DE3586638D1 (de) Verfahren zur herstellung von vanadylphthalocyanin.
DE3786639D1 (de) Verfahren zur herstellung von entwicklerpulver.
DE3578062D1 (de) Verfahren zur herstellung von iodbenzol.
NL189716C (nl) Diorganopolysiloxanen en werkwijze ter bereiding daarvan.
DE3777615D1 (de) Verfahren zur herstellung von metalloxiden.
DE3578375D1 (de) Knochenzement und verfahren zu seiner herstellung.
DE3382650D1 (de) Verfahren zur herstellung von alpha-methylstyrol-acrylonitril-copolymeren.
DE3577854D1 (de) Verfahren zur herstellung von aethylenkopolymer.
DE3778148D1 (de) Zusammensetzungen mit discorhabdin, sowie verfahren zu deren verwendung.
DE3667167D1 (de) Verfahren zur herstellung von 1,5-diazido-3-nitrazapentan.
DE3677272D1 (de) Verfahren zur herstellung von 2,2,6,6-tetraalkyl-4-piperidylaminen.
DE68906948D1 (de) Verfahren zur herstellung von nitrilen oder oxiden.
DE3676215D1 (de) Verfahren zur herstellung von 2,3,4,5-tetrafluorbenzoesaeure.
DE3686235D1 (de) Hitzebestaendige zusammensetzung und verfahren zu deren herstellung.
DE3579136D1 (de) Verfahren zur herstellung von hochgereinigten, hepatitis-b-virus-infektionsfreien gammaglobulinen.
DE3789154D1 (de) Photoempfindliche Zusammensetzung, Herstellungs- und Anwendungsverfahren.
DE3781660D1 (de) Verfahren zur herstellung von elementen mit zwischenraum.
DE3585219D1 (de) Verfahren zur herstellung von n-formyl-alpha-aspartyl-phenylalaninen.
DE3783288D1 (de) Farbkopie und verfahren zu deren herstellung.
DE3575133D1 (de) Verfahren zur herstellung von 1-alkyl- oder 1-cycloalkylpiperazinen.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition