DE3782205D1 - Behandlung einer photoresistmaterialien enthaltenden abfalloesung. - Google Patents

Behandlung einer photoresistmaterialien enthaltenden abfalloesung.

Info

Publication number
DE3782205D1
DE3782205D1 DE8787306477T DE3782205T DE3782205D1 DE 3782205 D1 DE3782205 D1 DE 3782205D1 DE 8787306477 T DE8787306477 T DE 8787306477T DE 3782205 T DE3782205 T DE 3782205T DE 3782205 D1 DE3782205 D1 DE 3782205D1
Authority
DE
Germany
Prior art keywords
treating
solution containing
waste solution
photoresist materials
containing photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8787306477T
Other languages
English (en)
Other versions
DE3782205T2 (de
Inventor
Kohei Miki
Hiroshi Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
Original Assignee
Sumitomo Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP17189486A external-priority patent/JPH0615078B2/ja
Priority claimed from JP62007449A external-priority patent/JPS63178888A/ja
Application filed by Sumitomo Heavy Industries Ltd filed Critical Sumitomo Heavy Industries Ltd
Application granted granted Critical
Publication of DE3782205D1 publication Critical patent/DE3782205D1/de
Publication of DE3782205T2 publication Critical patent/DE3782205T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C11/00—Auxiliary processes in photography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/02—Treatment of water, waste water, or sewage by heating
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/40—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture or use of photosensitive materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00—Technologies for wastewater treatment
    • Y02W10/30—Wastewater or sewage treatment systems using renewable energies
    • Y02W10/37—Wastewater or sewage treatment systems using renewable energies using solar energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE8787306477T 1986-07-23 1987-07-22 Behandlung einer photoresistmaterialien enthaltenden abfalloesung. Expired - Lifetime DE3782205T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP17189486A JPH0615078B2 (ja) 1986-07-23 1986-07-23 フオトレジスト廃液処理方法
JP62007449A JPS63178888A (ja) 1987-01-17 1987-01-17 フオトレジスト含有廃液の処理方法

Publications (2)

Publication Number Publication Date
DE3782205D1 true DE3782205D1 (de) 1992-11-19
DE3782205T2 DE3782205T2 (de) 1993-02-25

Family

ID=26341741

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787306477T Expired - Lifetime DE3782205T2 (de) 1986-07-23 1987-07-22 Behandlung einer photoresistmaterialien enthaltenden abfalloesung.

Country Status (5)

Country Link
US (1) US4786417A (de)
EP (1) EP0254550B1 (de)
KR (1) KR950014323B1 (de)
CN (1) CN1010555B (de)
DE (1) DE3782205T2 (de)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5006233A (en) * 1988-01-11 1991-04-09 Loctite Corporation Water purification system
US5112491A (en) * 1991-03-01 1992-05-12 E. I. Du Pont De Nemours And Company Management of waste solution containing photoresist materials
JPH0724458A (ja) * 1991-03-27 1995-01-27 Loctite Corp 含浸処理用洗浄廃水処理方法
GB9121317D0 (en) * 1991-10-09 1991-11-20 Dantex Graphics Ltd Filter unit
US5205937A (en) * 1992-04-30 1993-04-27 U.S. Filter Membralox Recovery and reuse of water-based cleaners
US5275734A (en) * 1992-08-04 1994-01-04 International Business Machines Corporation Chemical pre-treatment and biological destruction of propylene carbonate waste streams effluent streams to reduce the biological oxygen demand thereof
KR100264643B1 (ko) * 1992-11-10 2000-09-01 쓰라히데 죠오 수산화유기사급암모늄을 함유하는 폐액의 처리방법
US5811224A (en) * 1994-08-24 1998-09-22 Bayer Corporation Process for rejuvenating developer in printing plate development
CA2226966A1 (en) * 1995-07-13 1997-01-30 Lori Klinger Making a photopolymer printing plate
DE19530989C1 (de) * 1995-08-23 1997-03-13 Atotech Deutschland Gmbh Verfahren zum Filmstrippen
US5753135A (en) * 1995-10-23 1998-05-19 Jablonsky; Julius James Apparatus and method for recovering photoresist developers and strippers
US6074561A (en) * 1995-10-23 2000-06-13 Phoenankh Corp. Apparatus and method for recovering photoresist developers and strippers
DE29517588U1 (de) * 1995-11-06 1996-02-08 Cimatec GmbH Produkte für Leiterplatten, 67292 Kirchheimbolanden Maschine zur Flüssigkeitsbehandlung von Gegenständen, insbesondere Platinen in der Leiterplattenfertigung
DE19600967C2 (de) * 1996-01-12 1998-06-04 Schweizer Electronic Ag Verfahren zum Auftrennen von aus der Leiterplattenherstellung stammenden organischen Prozeßlösungen
FR2749947B1 (fr) * 1996-06-14 1998-08-28 Photomeca Egg Procede et dispositif pour la separation totale en continu d'un melange photopolymeres et eau par membrane et filtre, pour la confection de cliches souples utilisables en imprimerie
WO1998049102A1 (de) 1997-04-28 1998-11-05 Siemens Aktiengesellschaft Verfahren und vorrichtung zur behandlung von abwasser aus einem chemisch-mechanischen polierprozess in der chipfertigung
US6106722A (en) * 1997-08-12 2000-08-22 Kinetico Incorporated Filtering photoresist-containing liquid
US6153107A (en) 1997-08-14 2000-11-28 Asahi Kasei Kogyo Kabushiki Kaisha Process for treating development waste liquor
EP0933684A1 (de) * 1998-01-22 1999-08-04 Toyo Boseki Kabushiki Kaisha Entwicklungsverfahren für fotoempfindliche Druckplatten und Entwicklungsgerät
JP2000338684A (ja) * 1999-05-26 2000-12-08 Nagase & Co Ltd 基板表面処理装置
US6855487B2 (en) * 2001-10-26 2005-02-15 Kodak Polychrome Graphics, Llc Method and apparatus for refreshment and reuse of loaded developer
US6759185B2 (en) 2001-11-14 2004-07-06 Kodak Polychrome Graphics Llc Method for reuse of loaded developer
JP2006210751A (ja) * 2005-01-31 2006-08-10 Mitsubishi Chemical Engineering Corp シンナーのリサイクル供給装置
CN1317199C (zh) * 2005-04-01 2007-05-23 上海洁申实业有限公司 从光刻胶和/或剥离液中回收有机化合物的方法
CN101042529B (zh) * 2006-03-23 2010-09-15 财团法人工业技术研究院 光刻胶再生方法及其系统
KR100763504B1 (ko) * 2006-06-16 2007-10-04 주식회사 이엔에프테크놀로지 가교성 포토레지스트 성분을 포함하는 폐유기용제의처리방법
US7919152B2 (en) * 2008-01-07 2011-04-05 Objet Geometries Ltd. Method and apparatus for curing waste containing photopolymeric components
DE112010001432T5 (de) * 2009-03-31 2012-10-25 Kurita Water Industries, Ltd. Vorrichtung und Verfahren zur Aufbereitung einer Ätzlösung
JP2011090282A (ja) * 2009-09-25 2011-05-06 Fujifilm Corp 感光性平版印刷版の製版処理廃液の処理方法
JP2012154994A (ja) * 2011-01-24 2012-08-16 Kurita Water Ind Ltd カラーフィルタ製造工程における現像排水の処理方法
CN104536272A (zh) * 2014-12-05 2015-04-22 江门崇达电路技术有限公司 一种pcb生产用显影机的过滤系统
CN109466201B (zh) * 2017-09-07 2020-10-27 乐凯华光印刷科技有限公司 一种再生柔性版及其制备方法
CN110668529A (zh) * 2018-07-02 2020-01-10 陈俊吉 显影液再生系统及其正负型光刻胶分离装置
RU2693768C1 (ru) * 2018-09-10 2019-07-04 Александр Дмитриевич Юрасов Устройство для промывки изделий фотополимерной 3d печати
CN110387158B (zh) * 2019-07-16 2021-07-16 福建钰融科技有限公司 用稀释液减压蒸馏残液制备的铁红防锈漆及其制备方法
CN110484126B (zh) * 2019-07-16 2021-04-30 福建中安高新材料研究院有限公司 用稀释液减压蒸馏残液制备的大红透明漆及其制备方法
CN113003745A (zh) * 2021-02-24 2021-06-22 绵阳艾萨斯电子材料有限公司 一种废有机碱的纯化再生方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4171265A (en) * 1974-10-02 1979-10-16 Saint-Gobain Industries Suppression of pollution in mineral fiber manufacture
JPS5371686A (en) * 1976-12-09 1978-06-26 Efu Konerii Robaato Tubular molecule filtering apparatus
FR2388077A1 (fr) * 1977-04-22 1978-11-17 Rhone Poulenc Ind Liant pour la preparation de compositions aqueuses pour couchage de papiers et cartons pour impression
US4111803A (en) * 1977-06-03 1978-09-05 The United States Of America As Represented By The Secretary Of Agriculture Process for recovering proteinaceous matter from acid whey and tannery unhairing effluents
DE3143106A1 (de) * 1981-10-30 1983-05-11 Basf Ag, 6700 Ludwigshafen Verfahren und vorrichtung zur regenerierung waessrigerauswaschloesungen von wasserentwickelbaren photosensitiven aufzeichnungsmaterialien
US4595498A (en) * 1984-12-27 1986-06-17 Thomson Components-Mostek Corporation Water-polishing loop

Also Published As

Publication number Publication date
DE3782205T2 (de) 1993-02-25
KR950014323B1 (ko) 1995-11-24
EP0254550A1 (de) 1988-01-27
CN1010555B (zh) 1990-11-28
CN87105308A (zh) 1988-02-03
KR880002052A (ko) 1988-04-28
US4786417A (en) 1988-11-22
EP0254550B1 (de) 1992-10-14

Similar Documents

Publication Publication Date Title
DE3782205D1 (de) Behandlung einer photoresistmaterialien enthaltenden abfalloesung.
DE3761941D1 (de) Wegwerfwindel.
ATE58132T1 (de) Thiazepinverbindungen.
DK530287D0 (da) Fremgangsmaade til behandling af spildevand
DK469587D0 (da) Ikke droevlende udladningspumpe.
DE3789121D1 (de) Entwicklungsverfahren.
DE3775726D1 (de) Abfallbehandlungsvorrichtung.
DE3764053D1 (de) Behandlung von waesserigem abfall.
NO872850D0 (no) Fotokjemisk sensitiverende materialer.
DE3762164D1 (de) Schlammlanze.
DK164190C (da) Affaldskurvfor
DE68923219D1 (de) Behandlung von Abfällen.
DE69022813D1 (de) Abfallbehandlung.
DE58905848D1 (de) Aufbereiten von radioaktivem abwasser.
DE3774503D1 (de) Wegwerfwindel.
ATE81476T1 (de) Behandlung einer photoresistmaterialien enthaltenden abfalloesung.
DE3762183D1 (de) Unentzuendbares fluessiges geruchsbeseitigungsmittel.
DE3687749D1 (de) Photolack-behandlungsverfahren.
NO862156L (no) Innretning for rensing av avloepsvann.
DE3784053D1 (de) Einrichtung zur behandlung einer materialbahn.
DE3676509D1 (de) Abwasserklaeranlage.
KR870018596U (ko) 폐기물 소각장치
KR880009814U (ko) 위생 쓰레기 투입구
KR880004833U (ko) 개방형 건류식 폐기물소각장치
IT8783481A0 (it) Impianto trattamento rifiuti.

Legal Events

Date Code Title Description
8364 No opposition during term of opposition