CA2226966A1 - Making a photopolymer printing plate - Google Patents
Making a photopolymer printing plate Download PDFInfo
- Publication number
- CA2226966A1 CA2226966A1 CA 2226966 CA2226966A CA2226966A1 CA 2226966 A1 CA2226966 A1 CA 2226966A1 CA 2226966 CA2226966 CA 2226966 CA 2226966 A CA2226966 A CA 2226966A CA 2226966 A1 CA2226966 A1 CA 2226966A1
- Authority
- CA
- Canada
- Prior art keywords
- processing solution
- ultrafiltration
- plate
- polymeric material
- process according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/145—Ultrafiltration
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
Landscapes
- Engineering & Computer Science (AREA)
- Water Supply & Treatment (AREA)
- Environmental & Geological Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Organic Chemistry (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
A process of making a photopolymer printing plate includes steps of exposing a photopolymer material to light that is applied in a predetermined image pattern, washing the plate with a processing solution in order to cause polymeric material from portions of the plate that are determined by the image pattern to dissolve from the plate into the processing solution, and removing the dissolved polymeric material from the processing solution on the molecular level by ultrafiltration. The use of ultrafiltration permits the polymeric material to be efficiently recovered without the need for conventional recovery techniques such as distillation or flocculation, and allows reuse of the filtrate to process additional photopolymer plates. A system (10) for performing the process is also disclosed. The system is comprised of a plate making system (12), and an ultrafiltration system (24) with an ultrafilter (26) and a recirculation conduit (32).
Description
CA 02226966 l998-0l-l3 W O 97/03382 PCTrUS96/11185 MAKING A PHOTOPOLYMER PRINTING PLATE.
FIELD OF ~1~ lNV~NllON
This invention relates broadly to the commercial printing industry, and more specifically to systems o~ the photopolymer type ~or making printing plates.
DESCRIPTION OF THE RTIT.~TF.n TECHNOLOGY
Photopolymer printing technology, such as the FLEX-LITE SPLASH7M brand systems recently introduced by the owner o~ this invention, Poly~ibron Technologies, Inc., involves making a ~lexographic printing plate by exposing a predetermined image onto a photosensitive polymeric material, which is then etched with a process solution to expose the image in a raised pattern on the printing plate.
Polymer that is removed ~rom the plate during the etching process becomes dissolved in a process or wash solution that is used to ~lush the printing plate.
Removing the dissolved polymer ~rom the process solution is currently an expensive and laborious process, but one that is necessary ~or environmental reasons.
Current processes to remove the dissolved polymer include distillation or chemical addition and ~locculation o~ the polymer. Distillation units are costly and time consuming to operate. Flocculation involves the addition o~ a chemical such as borax to the solution, which raises the pH
and renders the polymer insoluble in the washout solution.
The stickiness o~ ~locculated polymer, however, makes it very di~icult to mechanically remove ~rom the solvent;
mechanical separators ~oul almost immediately.
i CA 02226966 l998-0l-l3 W O 97/03382 PCT~US96/11185 It is clear that a long and un~llled need exists for an improved process and system ~or removing dissolved polymer ~rom solution in a photopolymer printing plate making ~acility that is less laborious and expensive than the systems and processes that are currentiy in use.
SU~ RY OF I~E lNV~N-llON
Accordingly, it is an object o~ the invention to provide an improved process and system ~or removing dissolved polymer ~rom solution in a photopolymer printing plate making ~acility that is less laborious and expensive than the systems and processes that are currently in use.
In order to achieve the above and other objects o~
the invention, an improved process o~ making a photopolymer printing plate includes steps o~ (a) exposing a photopolymer material to light that is applied in a predetermined image pattern; (b) washing the polymer with a processing solution in order to cause polymeric material ~rom portions o~ the polymer that are determined by the image pattern to dissolve from the polymer into the processing solution; and (c) removing the dissolved polymeric material ~rom the processing solution on the molecular level by ultra~iltration, whereby the polymeric material may be e~iciently recovered without the need for conventional recovery techniques such as distillation or ~locculation.
This allows the filtrate to be reused to process additional photopolymer plates.
An improved system for making and recovering e~luent ~rom a photopolymer printing plate includes, according to a second aspect o~ the invention, an exposure system ~or exposing a sur~ace o~ a photopolymer material to light that is applied in a predetermined image pattern; a washout system ~or washing the unexposed polymer with a processing solution in order to cause polymeric material ~rom portions o~ the polymer that are determined by the image pattern to dissolve ~rom the sur~ace into the processing solution; and an ultra~iltration system ~or removing the dissolved polymeric material ~rom the CA 02226966 l998-0l-l3 W O 97/03382 PCTrUS96/11185 processing solution on the molecular level by ultrafiltration, whereby the polymeric material may be e~ficiently recovered without the need for conventional recovery techniques such as distillation or flocculation.
These and various other advantages and features of J novelty which characterize the invention are pointed out with particularity in the claims annexed hereto and ~orming a part hereof. However, for a better understanding of the invention, its advantages, and the objects obtained by its use, reference should be made to the drawings which form a further part hereof, and to the accompanying descriptive matter, in which there is illustrated and described a pre~erred embodiment of the invention.
BRIEF DESCRIPTION OF '1'~ DRAWINGS
FIG. 1 is a schematic diagram depicting an improved system for recovering effluent from a photopolymer printing plate according to the preferred embodiment o~ the invention.
DET~TT.T~.n DESCRIPTION OF '1'~ PR~K~ EMBODIMENT(S) Re~erring now to Figure 1, an improved system 10 ~or making a photopolymer type printing plate includes the actual plate making system 12, which includes, in an arrangement that is well known in this area of technology, an exposure system ~or exposing a photopolymer material plate to light that is applied in a predetermined image pattern, and a washout system for washing the plate with a processing solution in order to cause polymeric material ~rom portions o~ the plate that are determined by the image pattern to dissolve from the plate into the processing solution. System 10 further includes a conduit 14 ~or passing the process solution that has the dissolved polymeric material therein to a holding tank 40, as may be seen in FIGURE 1. A ~ill control valve 16 having a ~loat member 18 is provided in the conduit 14 to prevent over-filling of the holding tank 40. System 10 further includes, W 097/03382 PCTrUS96/11185 as may also be seen in FIGURE 1, an ultrafiltration system 24 for removing the dissolved polymeric material from the processing solution on the molecular level by ultrafiltration, so that the polymeric material may be efficiently recovered without the need for conventional recovery techniques, such as distillation or flocculation.
Ultrafiltration system 24 includes an intake conduit 22, through which processing solution is drawn from the tank 40 by means of pump 28 and ~orced into an intake port of an ultrafilter 26, as may also be seen in FIGURE 1. The pressure at the intake port of the ultxafilter 26 is monitored by a pressure gauge 30. A second, recirculation conduit 32 is communicated at a first end with a recirculation port of the ultrafilter 26, which.is of the cross ~low type, and at a second end with a holding tank 40.
A pressure gauge 34 and temperature gauge 36 is interposed within the conduit 32, as may be seen in FIGURE 1.
Ultrafilter 26 further has a permeate port to which a third conduit 38 is communicated, as may be seen in FIGURE 1. As is known in filtration technology, a large volume of processing fluid is circulated within one side of the ultra~ilter 26 thorough the intake conduit 22 and the recirculation conduit 32. A relatively small amount of clean, filtered permeate fluid is emitted from the permeate port and is taken away for reuse by the permeate conduit 38.
The processing solution used in the plate making system 12 is preferably acidic, having a pH that is substantially within the range of 1.0 to 4.0, with a more preferred range of about 2.0 to 2.5 and a most preferred level of about 2Ø The temperature of the solution at the ultrafilter 26 is preferably within the range of about 75 to about 95 degrees Fahrenheit.
In the most preferred embodiment, plate making system 12 utilizes photo sensitized plates that are predominantly polyurethane, and that produce polymers in the processing solution that have a number average molecular weight (Mn) of about 29,500, and a weight average molecular -W O 97/03382 PCT~US96/11185 weight of about 80,200. The invention embraces the concept o~ using ultrafiltration to remove such molecules from the processing solution, meaning that a membrane having a nominal molecular weight cut-off of about 10,000 to about 40,000 could be used. However, the inventors have also discovered that, for unknown reasons, near perfect filtration can be achieved with a membrane that has a nominal molecular weight cut-off that is substantially greater than 40,000. This is a result of the product forming a second dynamic layer over the initial membrane material.
The inventors have determined that ultrafilter 26 can produce optimal filtration of the processing solution at a nominal molecular weight cut-of~ that is within the range of about 50,000 to about 100,000. Most preferably, filter 26 has a nominal molecular weight cut off of 60,000 to 70,000. A membrane having a nominal molecular weight cut off of 60,000 can be obtained as Model AES 100 from Advanced Membrane Technologies of San Diego, California. Advanced Membrane Technologies also supplies a membrane having a nominal molecular weight cut off of 70,000 under the Model Code AF 100. By increasing the nominal molecular weight cut off of the membrane that is used in ultrafilter 26, the flow capacity of ultra~ilter 26 and the life of the membrane itself are increased when compared to a membrane that has a lower nominal molecular weight cut o~f. For example, it has been determined that an ultrafilter 26 based upon the Model AES 100 membrane described above will have a life of 1 year or greater, which is considered to be outstanding in this area of technology.
It is to be understood, however, that even though numerous characteristics and advantages of the present invention have been set forth in the foregoing description, together with details of the structure and function of the invention, the disclosure is illustrative only, and changes may be made in detail, especially in matters of shape, size and arrangement of parts within the principles of the . W O 97/03382 PCTAUS96/11185 ; - 6 -invention to the full extent indicated by the broad general meaning of the terms in which the appended claims are expressed.
FIELD OF ~1~ lNV~NllON
This invention relates broadly to the commercial printing industry, and more specifically to systems o~ the photopolymer type ~or making printing plates.
DESCRIPTION OF THE RTIT.~TF.n TECHNOLOGY
Photopolymer printing technology, such as the FLEX-LITE SPLASH7M brand systems recently introduced by the owner o~ this invention, Poly~ibron Technologies, Inc., involves making a ~lexographic printing plate by exposing a predetermined image onto a photosensitive polymeric material, which is then etched with a process solution to expose the image in a raised pattern on the printing plate.
Polymer that is removed ~rom the plate during the etching process becomes dissolved in a process or wash solution that is used to ~lush the printing plate.
Removing the dissolved polymer ~rom the process solution is currently an expensive and laborious process, but one that is necessary ~or environmental reasons.
Current processes to remove the dissolved polymer include distillation or chemical addition and ~locculation o~ the polymer. Distillation units are costly and time consuming to operate. Flocculation involves the addition o~ a chemical such as borax to the solution, which raises the pH
and renders the polymer insoluble in the washout solution.
The stickiness o~ ~locculated polymer, however, makes it very di~icult to mechanically remove ~rom the solvent;
mechanical separators ~oul almost immediately.
i CA 02226966 l998-0l-l3 W O 97/03382 PCT~US96/11185 It is clear that a long and un~llled need exists for an improved process and system ~or removing dissolved polymer ~rom solution in a photopolymer printing plate making ~acility that is less laborious and expensive than the systems and processes that are currentiy in use.
SU~ RY OF I~E lNV~N-llON
Accordingly, it is an object o~ the invention to provide an improved process and system ~or removing dissolved polymer ~rom solution in a photopolymer printing plate making ~acility that is less laborious and expensive than the systems and processes that are currently in use.
In order to achieve the above and other objects o~
the invention, an improved process o~ making a photopolymer printing plate includes steps o~ (a) exposing a photopolymer material to light that is applied in a predetermined image pattern; (b) washing the polymer with a processing solution in order to cause polymeric material ~rom portions o~ the polymer that are determined by the image pattern to dissolve from the polymer into the processing solution; and (c) removing the dissolved polymeric material ~rom the processing solution on the molecular level by ultra~iltration, whereby the polymeric material may be e~iciently recovered without the need for conventional recovery techniques such as distillation or ~locculation.
This allows the filtrate to be reused to process additional photopolymer plates.
An improved system for making and recovering e~luent ~rom a photopolymer printing plate includes, according to a second aspect o~ the invention, an exposure system ~or exposing a sur~ace o~ a photopolymer material to light that is applied in a predetermined image pattern; a washout system ~or washing the unexposed polymer with a processing solution in order to cause polymeric material ~rom portions o~ the polymer that are determined by the image pattern to dissolve ~rom the sur~ace into the processing solution; and an ultra~iltration system ~or removing the dissolved polymeric material ~rom the CA 02226966 l998-0l-l3 W O 97/03382 PCTrUS96/11185 processing solution on the molecular level by ultrafiltration, whereby the polymeric material may be e~ficiently recovered without the need for conventional recovery techniques such as distillation or flocculation.
These and various other advantages and features of J novelty which characterize the invention are pointed out with particularity in the claims annexed hereto and ~orming a part hereof. However, for a better understanding of the invention, its advantages, and the objects obtained by its use, reference should be made to the drawings which form a further part hereof, and to the accompanying descriptive matter, in which there is illustrated and described a pre~erred embodiment of the invention.
BRIEF DESCRIPTION OF '1'~ DRAWINGS
FIG. 1 is a schematic diagram depicting an improved system for recovering effluent from a photopolymer printing plate according to the preferred embodiment o~ the invention.
DET~TT.T~.n DESCRIPTION OF '1'~ PR~K~ EMBODIMENT(S) Re~erring now to Figure 1, an improved system 10 ~or making a photopolymer type printing plate includes the actual plate making system 12, which includes, in an arrangement that is well known in this area of technology, an exposure system ~or exposing a photopolymer material plate to light that is applied in a predetermined image pattern, and a washout system for washing the plate with a processing solution in order to cause polymeric material ~rom portions o~ the plate that are determined by the image pattern to dissolve from the plate into the processing solution. System 10 further includes a conduit 14 ~or passing the process solution that has the dissolved polymeric material therein to a holding tank 40, as may be seen in FIGURE 1. A ~ill control valve 16 having a ~loat member 18 is provided in the conduit 14 to prevent over-filling of the holding tank 40. System 10 further includes, W 097/03382 PCTrUS96/11185 as may also be seen in FIGURE 1, an ultrafiltration system 24 for removing the dissolved polymeric material from the processing solution on the molecular level by ultrafiltration, so that the polymeric material may be efficiently recovered without the need for conventional recovery techniques, such as distillation or flocculation.
Ultrafiltration system 24 includes an intake conduit 22, through which processing solution is drawn from the tank 40 by means of pump 28 and ~orced into an intake port of an ultrafilter 26, as may also be seen in FIGURE 1. The pressure at the intake port of the ultxafilter 26 is monitored by a pressure gauge 30. A second, recirculation conduit 32 is communicated at a first end with a recirculation port of the ultrafilter 26, which.is of the cross ~low type, and at a second end with a holding tank 40.
A pressure gauge 34 and temperature gauge 36 is interposed within the conduit 32, as may be seen in FIGURE 1.
Ultrafilter 26 further has a permeate port to which a third conduit 38 is communicated, as may be seen in FIGURE 1. As is known in filtration technology, a large volume of processing fluid is circulated within one side of the ultra~ilter 26 thorough the intake conduit 22 and the recirculation conduit 32. A relatively small amount of clean, filtered permeate fluid is emitted from the permeate port and is taken away for reuse by the permeate conduit 38.
The processing solution used in the plate making system 12 is preferably acidic, having a pH that is substantially within the range of 1.0 to 4.0, with a more preferred range of about 2.0 to 2.5 and a most preferred level of about 2Ø The temperature of the solution at the ultrafilter 26 is preferably within the range of about 75 to about 95 degrees Fahrenheit.
In the most preferred embodiment, plate making system 12 utilizes photo sensitized plates that are predominantly polyurethane, and that produce polymers in the processing solution that have a number average molecular weight (Mn) of about 29,500, and a weight average molecular -W O 97/03382 PCT~US96/11185 weight of about 80,200. The invention embraces the concept o~ using ultrafiltration to remove such molecules from the processing solution, meaning that a membrane having a nominal molecular weight cut-off of about 10,000 to about 40,000 could be used. However, the inventors have also discovered that, for unknown reasons, near perfect filtration can be achieved with a membrane that has a nominal molecular weight cut-off that is substantially greater than 40,000. This is a result of the product forming a second dynamic layer over the initial membrane material.
The inventors have determined that ultrafilter 26 can produce optimal filtration of the processing solution at a nominal molecular weight cut-of~ that is within the range of about 50,000 to about 100,000. Most preferably, filter 26 has a nominal molecular weight cut off of 60,000 to 70,000. A membrane having a nominal molecular weight cut off of 60,000 can be obtained as Model AES 100 from Advanced Membrane Technologies of San Diego, California. Advanced Membrane Technologies also supplies a membrane having a nominal molecular weight cut off of 70,000 under the Model Code AF 100. By increasing the nominal molecular weight cut off of the membrane that is used in ultrafilter 26, the flow capacity of ultra~ilter 26 and the life of the membrane itself are increased when compared to a membrane that has a lower nominal molecular weight cut o~f. For example, it has been determined that an ultrafilter 26 based upon the Model AES 100 membrane described above will have a life of 1 year or greater, which is considered to be outstanding in this area of technology.
It is to be understood, however, that even though numerous characteristics and advantages of the present invention have been set forth in the foregoing description, together with details of the structure and function of the invention, the disclosure is illustrative only, and changes may be made in detail, especially in matters of shape, size and arrangement of parts within the principles of the . W O 97/03382 PCTAUS96/11185 ; - 6 -invention to the full extent indicated by the broad general meaning of the terms in which the appended claims are expressed.
Claims (22)
1. An improved process of making a photopolymer printing plate, comprising steps of:
(a) exposing a plate comprising photopolymer material to light that is applied in a predetermined image pattern;
(b) washing the plate with a processing solution in order to cause polymeric material from portions of the plate that are determined by the image pattern to dissolve from the plate into the processing solution; and (c) removing the dissolved polymeric material from the processing solution on the molecular level by ultrafiltration, whereby the polymeric material may be efficiently recovered without the need for conventional recovery techniques such as distillation or flocculation.
(a) exposing a plate comprising photopolymer material to light that is applied in a predetermined image pattern;
(b) washing the plate with a processing solution in order to cause polymeric material from portions of the plate that are determined by the image pattern to dissolve from the plate into the processing solution; and (c) removing the dissolved polymeric material from the processing solution on the molecular level by ultrafiltration, whereby the polymeric material may be efficiently recovered without the need for conventional recovery techniques such as distillation or flocculation.
2. A process according to claim 1, wherein step (c) is performed so as to remove substantially all of the polymeric material from the processing solution.
3. A process according to claim 1, wherein steps (b) and (c) are performed with a processing solution that is acidic.
4. A process according to claim 3, wherein steps (b) and (c) are performed with a processing solution that has a ph that is substantially within the range of 1.0 to 4Ø
5. A process according to claim 3, wherein steps (b) and (c) are performed with a processing solution that has a pH of about 2.0 to about 2.5.
6. A process according to claim 1, wherein step (c) is performed at a temperature that is substantially within the range of about 75 to 95 degrees Fahrenheit.
7. A process according to claim 1, wherein step (c) is performed with an ultrafiltration membrane that is designed to preclude passage therethrough of polymeric molecules having a weight average molecular weight of within the range of about 10,000 to about 100,000.
8. A process according to claim 7, wherein step (c) is performed with an ultrafiltration membrane that is designed to preclude passage therethrough of polymeric molecules having a weight average molecular weight of within the range of at least 50,000 to at least 100,000, but that, as a result of a dynamic layer that forms against the membrane, achieves excellent filtration of polymeric molecules having molecular weights of lower than 50,000.
9. A process according to claim 8, wherein step (c) is performed with an ultrafiltration membrane that is designed to preclude passage therethrough of substantially all polymeric molecules having a weight average molecular weight of at least 70,000.
10. A process according to claim 1, wherein step (c) is performed with an ultrafiltration membrane that is designed to preclude passage therethrough of substantially all polymeric molecules having a weight average molecular weight of about 70,000.
11. A process according to claim 1, wherein step (c) is performed with a filter that comprises polyether sulfone.
12. An improved system for recovering effluent from a photopolymer printing plate, comprising:
exposure means for exposing a plate comprising photopolymer material to light that is applied in a predetermined image pattern;
washout means for washing the surface with a processing solution in order to cause polymeric material from portions of the plate that are determined by the image pattern to dissolve from the plate into the processing solution; and ultrafiltration means for removing the dissolved polymeric material from the processing solution on the molecular level by ultrafiltration, whereby the polymeric material may be efficiently recovered without the need for conventional recovery techniques such as distillation or flocculation, and filtrate may be reused to process additional plates.
exposure means for exposing a plate comprising photopolymer material to light that is applied in a predetermined image pattern;
washout means for washing the surface with a processing solution in order to cause polymeric material from portions of the plate that are determined by the image pattern to dissolve from the plate into the processing solution; and ultrafiltration means for removing the dissolved polymeric material from the processing solution on the molecular level by ultrafiltration, whereby the polymeric material may be efficiently recovered without the need for conventional recovery techniques such as distillation or flocculation, and filtrate may be reused to process additional plates.
13. A system according to claim 12, wherein said ultrafiltration means is constructed and arranged to remove substantially all of the polymeric material from the processing solution.
14. A system according to claim 12, wherein said processing solution is acidic.
15. A system according to claim 14, wherein said processing solution has a ph that is substantially within the range of 1.0 to 4Ø
16. A system according to claim 14, wherein said processing solution has a ph of about 2.0 to about 2.5.
17. A system according to claim 11, wherein said ultrafiltration means operates at a temperature that is substantially within the range of about 75 to 95 degrees Fahrenheit.
18. A system according to claim 11, wherein said ultrafiltration means comprises an ultrafiltration membrane that is designed to preclude passage therethrough of polymeric molecules having a weight average molecular weight of within the range of at about 10,000 to about 100,000.
19. A system according to claim 18, wherein said ultrafiltration membrane is designed to preclude passage therethrough of polymeric molecules having a weight average molecular weight of within the range of at least 50,000 to at least 100,000, but that, as a result of a dynamic layer that forms against the membrane, achieves excellent filtration of polymeric molecules having molecular weights of lower than 50,000.
20. A system according to claim 19, wherein said ultrafiltration means comprises an ultrafiltration membrane that is designed to preclude passage therethrough of substantially all polymeric molecules having a weight average molecular weight of at least 70,000.
21. A system according to claim 12, wherein said ultrafiltration means comprises an ultrafiltration membrane that is designed to preclude passage therethrough of substantially all polymeric molecules having a weight average molecular weight of about 70,000.
22. A system according to claim 12, wherein said ultrafiltration means comprises a filter that comprises polyether sulfone.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US50230795A | 1995-07-13 | 1995-07-13 | |
| US08/502,307 | 1995-07-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2226966A1 true CA2226966A1 (en) | 1997-01-30 |
Family
ID=23997231
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA 2226966 Abandoned CA2226966A1 (en) | 1995-07-13 | 1996-07-02 | Making a photopolymer printing plate |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP0838045A4 (en) |
| JP (1) | JPH11509010A (en) |
| AU (1) | AU6406896A (en) |
| CA (1) | CA2226966A1 (en) |
| WO (1) | WO1997003382A1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8083947B2 (en) * | 2009-02-24 | 2011-12-27 | Eastman Kodak Company | Polymer-containing solvent purifying process |
| GB2509986B (en) * | 2013-01-22 | 2018-01-10 | Dantex Graphics Ltd | Processing waste washout liquid |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0004326B1 (en) * | 1978-03-18 | 1982-09-29 | Hoechst Aktiengesellschaft | Device for the development of printing plates with a tank for the developing liquid |
| DE3143106A1 (en) * | 1981-10-30 | 1983-05-11 | Basf Ag, 6700 Ludwigshafen | Process and equipment for regenerating aqueous washing-out solutions of water-developable photosensitive recording materials |
| US4786417A (en) * | 1986-07-23 | 1988-11-22 | Sumitomo Heavy Industries Ltd. | Management of photoresist materials containing waste solution |
| DE69032262T2 (en) * | 1989-11-30 | 1998-08-27 | Toyo Boseki | Device and method for developing photopolymer printing plates |
| US5171767A (en) * | 1991-05-06 | 1992-12-15 | Rohm And Haas Company | Utrafiltration process for the recovery of polymeric latices from whitewater |
| US5328805A (en) * | 1992-08-28 | 1994-07-12 | W. R. Grace & Co.-Conn. | Aqueous developable photosensitive polyurethane-(meth)acrylate |
| US5811224A (en) * | 1994-08-24 | 1998-09-22 | Bayer Corporation | Process for rejuvenating developer in printing plate development |
-
1996
- 1996-07-02 WO PCT/US1996/011185 patent/WO1997003382A1/en not_active Application Discontinuation
- 1996-07-02 AU AU64068/96A patent/AU6406896A/en not_active Abandoned
- 1996-07-02 JP JP9505866A patent/JPH11509010A/en active Pending
- 1996-07-02 EP EP96923595A patent/EP0838045A4/en not_active Withdrawn
- 1996-07-02 CA CA 2226966 patent/CA2226966A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11509010A (en) | 1999-08-03 |
| AU6406896A (en) | 1997-02-10 |
| WO1997003382A1 (en) | 1997-01-30 |
| EP0838045A1 (en) | 1998-04-29 |
| EP0838045A4 (en) | 1998-10-28 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6083670A (en) | Process and equipment for rejuvenation treatment of photoresist development waste | |
| JP4085987B2 (en) | Recycle processing method of photoresist development waste liquid | |
| US6074561A (en) | Apparatus and method for recovering photoresist developers and strippers | |
| US5753135A (en) | Apparatus and method for recovering photoresist developers and strippers | |
| US6180009B1 (en) | Method of filtering the organic solutions arising in the production of circuit boards | |
| CA2226966A1 (en) | Making a photopolymer printing plate | |
| US5874204A (en) | Process for rejuvenation treatment of photoresist development waste | |
| JP3758011B2 (en) | Equipment for recovering and reusing recycled developer from photoresist developer waste | |
| JP3497841B2 (en) | Developing waste liquid recycling apparatus and developing waste liquid recycling method | |
| JPH0615078B2 (en) | Photoresist waste liquid treatment method | |
| JP3355837B2 (en) | Method for regenerating developer for photosensitive material and apparatus for developing photosensitive material | |
| JP2002228795A (en) | Treating method and treating device for radioactive waste water | |
| CN218478550U (en) | Separation filtration system for recycling organic glue development waste liquid | |
| JP3534155B2 (en) | Pure water production equipment | |
| CN113009792A (en) | Developing solution recovery device | |
| JP2005175118A (en) | Regenerating processing device for waste photoresist developer | |
| TWI457290B (en) | Treatment of slab | |
| JPH0418563A (en) | Method and device for developing photosensitive resin plate | |
| JP3218077B2 (en) | Surface water purification method and apparatus | |
| CN114890567A (en) | Separation and filtration system and separation and filtration method for recycling organic glue development waste liquid | |
| JP2004298680A (en) | Method for treating used photoresist developer | |
| US6652761B2 (en) | Method of recycling wash-water resulting from film treatment | |
| CN115155338A (en) | Polyamide composite membrane and preparation method thereof | |
| JPH1034147A (en) | Method and apparatus for treating washing liquid resulting from washing of photosensitive resin plate | |
| McCray | Development of a membrane-based process for the treatment of oily waste waters. Final report, March 4, 1992--March 5, 1994 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FZDE | Dead |