DE3781988D1 - Herstellung eines durchsichtigen leitfaehigen filmes. - Google Patents

Herstellung eines durchsichtigen leitfaehigen filmes.

Info

Publication number
DE3781988D1
DE3781988D1 DE8787901677T DE3781988T DE3781988D1 DE 3781988 D1 DE3781988 D1 DE 3781988D1 DE 8787901677 T DE8787901677 T DE 8787901677T DE 3781988 T DE3781988 T DE 3781988T DE 3781988 D1 DE3781988 D1 DE 3781988D1
Authority
DE
Germany
Prior art keywords
producing
conductive film
clear conductive
clear
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8787901677T
Other languages
English (en)
Other versions
DE3781988T2 (de
Inventor
Tetsuya Nomachi
Yoichi Murayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tobi Co Ltd
Original Assignee
Tobi Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tobi Co Ltd filed Critical Tobi Co Ltd
Application granted granted Critical
Publication of DE3781988D1 publication Critical patent/DE3781988D1/de
Publication of DE3781988T2 publication Critical patent/DE3781988T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Non-Insulated Conductors (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
DE8787901677T 1986-03-12 1987-03-11 Herstellung eines durchsichtigen leitfaehigen filmes. Expired - Fee Related DE3781988T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP61054162A JPH0734332B2 (ja) 1986-03-12 1986-03-12 透明導電性フイルムの製造方法
PCT/JP1987/000152 WO1987005742A1 (en) 1986-03-12 1987-03-11 Process for producing transparent conductive film

Publications (2)

Publication Number Publication Date
DE3781988D1 true DE3781988D1 (de) 1992-11-05
DE3781988T2 DE3781988T2 (de) 1993-02-18

Family

ID=12962849

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787901677T Expired - Fee Related DE3781988T2 (de) 1986-03-12 1987-03-11 Herstellung eines durchsichtigen leitfaehigen filmes.

Country Status (5)

Country Link
US (1) US5013416A (de)
EP (1) EP0261245B1 (de)
JP (1) JPH0734332B2 (de)
DE (1) DE3781988T2 (de)
WO (1) WO1987005742A1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01184273A (ja) * 1988-01-18 1989-07-21 Tobi Co Ltd 反応性プラズマビーム製膜方法とその装置
JP2738432B2 (ja) * 1988-05-06 1998-04-08 株式会社 トービ プラズマビーム製膜装置
JP2744950B2 (ja) * 1989-01-27 1998-04-28 セイコーインスツルメンツ株式会社 多色表示装置の製造方法
EP0385475A3 (de) * 1989-03-02 1991-04-03 Asahi Glass Company Ltd. Verfahren zur Herstellung eines durchsichtigen leitenden Films
US5105291A (en) * 1989-11-20 1992-04-14 Ricoh Company, Ltd. Liquid crystal display cell with electrodes of substantially amorphous metal oxide having low resistivity
US5224441A (en) * 1991-09-27 1993-07-06 The Boc Group, Inc. Apparatus for rapid plasma treatments and method
DE4427581A1 (de) 1994-08-04 1996-02-08 Leybold Ag Verfahren zum Aufbringen einer transparenten Metalloxidschicht auf eine Folie
CA2353506A1 (en) * 1998-11-02 2000-05-11 3M Innovative Properties Company Transparent conductive oxides for plastic flat panel displays
US6517687B1 (en) * 1999-03-17 2003-02-11 General Electric Company Ultraviolet filters with enhanced weatherability and method of making
JP2000282225A (ja) * 1999-04-01 2000-10-10 Nippon Sheet Glass Co Ltd 透明導電膜形成方法及び該方法より形成された透明導電膜
JP3933346B2 (ja) * 1999-05-26 2007-06-20 正路 朝本 イオンプレーティングを用いる成膜体の製造方法及び製造装置
US6273991B1 (en) * 1999-07-28 2001-08-14 Saunders & Associates, Inc. Apparatus for plasma ion trimming of frequency devices
US6933051B2 (en) * 2002-08-17 2005-08-23 3M Innovative Properties Company Flexible electrically conductive film
JP4601381B2 (ja) * 2004-10-12 2010-12-22 大日本印刷株式会社 圧力勾配型イオンプレーティング式成膜装置
EP2125361B1 (de) * 2006-12-28 2019-01-23 3M Innovative Properties Company Keimbildungsschicht zur ausbildung dünner metallschichten
US8350451B2 (en) * 2008-06-05 2013-01-08 3M Innovative Properties Company Ultrathin transparent EMI shielding film comprising a polymer basecoat and crosslinked polymer transparent dielectric layer
EP2495738A4 (de) * 2009-10-30 2013-11-13 Sumitomo Chemical Co Verfahren zur herstellung eines mehrschichtigen films
US9297076B2 (en) * 2010-07-23 2016-03-29 Lotus Applied Technology, Llc Substrate transport mechanism contacting a single side of a flexible web substrate for roll-to-roll thin film deposition
TWI541612B (zh) * 2014-12-30 2016-07-11 Organic vacuum coating system and film forming method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3562141A (en) * 1968-02-23 1971-02-09 John R Morley Vacuum vapor deposition utilizing low voltage electron beam
GB1596385A (en) * 1976-12-29 1981-08-26 Matsushita Electric Ind Co Ltd Methods and apparatus for manufacturing magnetic recording media
JPS546878A (en) * 1977-06-20 1979-01-19 Fuji Photo Film Co Ltd Continuous vapor deposition apparatus
JPS56136410A (en) * 1980-03-28 1981-10-24 Teijin Ltd Method of producing transparent conductive laminate
US4526132A (en) * 1982-11-24 1985-07-02 Konishiroku Photo Industry Co., Ltd. Evaporator
US4605565A (en) * 1982-12-09 1986-08-12 Energy Conversion Devices, Inc. Method of depositing a highly conductive, highly transmissive film
US4514437A (en) * 1984-05-02 1985-04-30 Energy Conversion Devices, Inc. Apparatus for plasma assisted evaporation of thin films and corresponding method of deposition
JPH0672300B2 (ja) * 1986-03-12 1994-09-14 株式会社ト−ビ ハイブリツドイオンプレ−テイング装置
JPS62222518A (ja) * 1986-03-24 1987-09-30 東レ株式会社 透明導電膜の製造方法
JP2624778B2 (ja) * 1988-06-13 1997-06-25 株式会社トービ Ｉｔｏ透明導電性フィルムの高速製造方法

Also Published As

Publication number Publication date
WO1987005742A1 (en) 1987-09-24
EP0261245A1 (de) 1988-03-30
US5013416A (en) 1991-05-07
DE3781988T2 (de) 1993-02-18
EP0261245B1 (de) 1992-09-30
JPH0734332B2 (ja) 1995-04-12
JPS63908A (ja) 1988-01-05
EP0261245A4 (de) 1989-01-12

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee