DE3721001C2 - - Google Patents
Info
- Publication number
- DE3721001C2 DE3721001C2 DE3721001A DE3721001A DE3721001C2 DE 3721001 C2 DE3721001 C2 DE 3721001C2 DE 3721001 A DE3721001 A DE 3721001A DE 3721001 A DE3721001 A DE 3721001A DE 3721001 C2 DE3721001 C2 DE 3721001C2
- Authority
- DE
- Germany
- Prior art keywords
- zone
- semiconductor
- metal ring
- main
- floating metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/118—Electrodes comprising insulating layers having particular dielectric or electrostatic properties, e.g. having static charges
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
- H10D62/103—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices
- H10D62/105—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE]
- H10D62/106—Constructional design considerations for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse-biased devices by having particular doping profiles, shapes or arrangements of PN junctions; by having supplementary regions, e.g. junction termination extension [JTE] having supplementary regions doped oppositely to or in rectifying contact with regions of the semiconductor bodies, e.g. guard rings with PN or Schottky junctions
Landscapes
- Electrodes Of Semiconductors (AREA)
- Semiconductor Integrated Circuits (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19873721001 DE3721001A1 (de) | 1987-06-25 | 1987-06-25 | Hochsperrendes halbleiterbauelement |
PCT/DE1988/000266 WO1988010512A1 (fr) | 1987-06-25 | 1988-05-05 | Composant semi-conducteur a pouvoir bloquant eleve |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19873721001 DE3721001A1 (de) | 1987-06-25 | 1987-06-25 | Hochsperrendes halbleiterbauelement |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3721001A1 DE3721001A1 (de) | 1989-01-05 |
DE3721001C2 true DE3721001C2 (en, 2012) | 1993-04-22 |
Family
ID=6330284
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19873721001 Granted DE3721001A1 (de) | 1987-06-25 | 1987-06-25 | Hochsperrendes halbleiterbauelement |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE3721001A1 (en, 2012) |
WO (1) | WO1988010512A1 (en, 2012) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4410354A1 (de) * | 1994-03-25 | 1995-10-19 | Semikron Elektronik Gmbh | Leistungshalbleiterbauelement |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5204545A (en) * | 1989-11-22 | 1993-04-20 | Mitsubishi Denki Kabushiki Kaisha | Structure for preventing field concentration in semiconductor device and method of forming the same |
JPH0783048B2 (ja) * | 1989-11-22 | 1995-09-06 | 三菱電機株式会社 | 半導体装置における電界集中防止構造およびその形成方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE38718C (de) * | R. herrmann in Stötteritz | Neuerung an Liniirmaschinen | ||
GB1030050A (en) * | 1963-11-13 | 1966-05-18 | Motorola Inc | Punchthrough breakdown rectifier |
DE3122352A1 (de) * | 1981-06-05 | 1983-01-13 | Horst Dipl.-Phys. 7410 Reutlingen Meinders | Hochsperrendes, planares halbleiterbauelement mit lackabdeckung |
JPS5976466A (ja) * | 1982-10-25 | 1984-05-01 | Mitsubishi Electric Corp | プレ−ナ形半導体装置 |
JPS61158177A (ja) * | 1984-12-28 | 1986-07-17 | Toshiba Corp | 半導体装置 |
-
1987
- 1987-06-25 DE DE19873721001 patent/DE3721001A1/de active Granted
-
1988
- 1988-05-05 WO PCT/DE1988/000266 patent/WO1988010512A1/de unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4410354A1 (de) * | 1994-03-25 | 1995-10-19 | Semikron Elektronik Gmbh | Leistungshalbleiterbauelement |
Also Published As
Publication number | Publication date |
---|---|
WO1988010512A1 (fr) | 1988-12-29 |
DE3721001A1 (de) | 1989-01-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8110 | Request for examination paragraph 44 | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |