DE3672490D1 - Anordnung zur ausrichtung einer photomaske auf einer gedruckten schaltungsplatte. - Google Patents

Anordnung zur ausrichtung einer photomaske auf einer gedruckten schaltungsplatte.

Info

Publication number
DE3672490D1
DE3672490D1 DE8686907051T DE3672490T DE3672490D1 DE 3672490 D1 DE3672490 D1 DE 3672490D1 DE 8686907051 T DE8686907051 T DE 8686907051T DE 3672490 T DE3672490 T DE 3672490T DE 3672490 D1 DE3672490 D1 DE 3672490D1
Authority
DE
Germany
Prior art keywords
photomask
aligning
arrangement
circuit board
printed circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686907051T
Other languages
English (en)
Inventor
V Cronin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
M&T Chemicals Inc
Original Assignee
M&T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M&T Chemicals Inc filed Critical M&T Chemicals Inc
Application granted granted Critical
Publication of DE3672490D1 publication Critical patent/DE3672490D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/02—Exposure apparatus for contact printing
    • G03B27/14—Details
    • G03B27/18—Maintaining or producing contact pressure between original and light-sensitive material
    • G03B27/20—Maintaining or producing contact pressure between original and light-sensitive material by using a vacuum or fluid pressure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/08—Treatments involving gases
    • H05K2203/085—Using vacuum or low pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Fluid Mechanics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE8686907051T 1985-10-25 1986-10-24 Anordnung zur ausrichtung einer photomaske auf einer gedruckten schaltungsplatte. Expired - Fee Related DE3672490D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/791,256 US4698284A (en) 1985-10-25 1985-10-25 Device for aligning a photomask onto a printed wiring board
PCT/US1986/002255 WO1987002790A1 (en) 1985-10-25 1986-10-24 Device for aligning a photomask onto a printed wiring board

Publications (1)

Publication Number Publication Date
DE3672490D1 true DE3672490D1 (de) 1990-08-09

Family

ID=25153138

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686907051T Expired - Fee Related DE3672490D1 (de) 1985-10-25 1986-10-24 Anordnung zur ausrichtung einer photomaske auf einer gedruckten schaltungsplatte.

Country Status (10)

Country Link
US (1) US4698284A (de)
EP (1) EP0245434B1 (de)
JP (1) JPS62502364A (de)
KR (1) KR900005419B1 (de)
CN (1) CN1003677B (de)
AU (1) AU583699B2 (de)
CA (1) CA1269824A (de)
DE (1) DE3672490D1 (de)
PH (1) PH23138A (de)
WO (1) WO1987002790A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4976817A (en) * 1988-12-09 1990-12-11 Morton International, Inc. Wet lamination process and apparatus
DE3906179A1 (de) * 1989-02-28 1990-08-30 Basf Ag Vorrichtung zum belichten von photopolymeren druckplatten
JPH03244528A (ja) * 1989-09-28 1991-10-31 Three D Syst Inc 実質的に平担な立体平版加工面の形成装置および方法
JPH03288858A (ja) * 1990-04-06 1991-12-19 Canon Inc 画像形成装置
US5912094A (en) * 1997-05-15 1999-06-15 Lucent Technologies, Inc. Method and apparatus for making a micro device
FR2822966B1 (fr) 2001-03-28 2003-12-12 Automa Tech Sa Chassis d'exposition a la lumiere d'un circuit imprime
JP2009093027A (ja) * 2007-10-10 2009-04-30 Csun Mfg Ltd マスクパターンフィルム圧着機の圧着構造及びその圧着方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3180242A (en) * 1962-11-08 1965-04-27 Robcrtson Photo Mechanix Inc Plate making apparatus
US3837887A (en) * 1969-06-16 1974-09-24 Asahi Chemical Ind Process for the preparation of printing plate of photosensitive resin
GB1346306A (en) * 1970-07-24 1974-02-06 Parker Ltd R J J E Photolithographic vacuum frame assembly
US3940211A (en) * 1971-03-22 1976-02-24 Kasper Instruments, Inc. Step-and-repeat projection alignment and exposure system
US3865254A (en) * 1973-05-21 1975-02-11 Kasker Instr Inc Prealignment system for an optical alignment and exposure instrument
JPS5541828B2 (de) * 1974-06-06 1980-10-27
JPS53123374A (en) * 1977-04-04 1978-10-27 Ebara Corp Controlling method for concentrating still
US4204736A (en) * 1978-04-26 1980-05-27 Fuji Photo Film Co., Ltd. Method and device for contact-printing
JPS6042933B2 (ja) * 1978-07-11 1985-09-25 富士写真フイルム株式会社 密着焼付方法
JPS54141633A (en) * 1978-04-26 1979-11-05 Fuji Photo Film Co Ltd Contact printing method
JPS6046427B2 (ja) * 1978-07-18 1985-10-16 富士写真フイルム株式会社 密着焼付方法および装置
JPS55146442A (en) * 1979-05-02 1980-11-14 Fuji Photo Film Co Ltd Film focal plane holder
US4508802A (en) * 1982-06-11 1985-04-02 E. I. Du Pont De Nemours And Company Multiple registration and imaging process to form a set of registered imaged elements
US4522903A (en) * 1982-06-11 1985-06-11 E. I. Du Pont De Nemours And Company Sequential automatic registration and imagewise exposure of a sheet substrate
US4548884A (en) * 1982-06-11 1985-10-22 E. I. Du Pont De Nemours And Company Registering and exposing sheet substrates using photosensitive liquid
US4518667A (en) * 1982-06-11 1985-05-21 E. I. Du Pont De Nemours And Company Automatic repetitive registration and image wise exposure of sheet substrates
US4527890A (en) * 1982-06-11 1985-07-09 E. I. Du Pont De Nemours And Company Automatic repetitive registration and imagewise exposure of sheet substrates
AU6554486A (en) * 1985-11-20 1987-05-28 Payne, W.D. Pty. Ltd. Vacuum printing frame
US4704028A (en) * 1986-01-24 1987-11-03 Richards Sr Chester L Vacuum printing frame

Also Published As

Publication number Publication date
AU583699B2 (en) 1989-05-04
CN86107270A (zh) 1987-07-15
AU6732187A (en) 1987-05-19
WO1987002790A1 (en) 1987-05-07
US4698284A (en) 1987-10-06
KR900005419B1 (ko) 1990-07-30
JPS62502364A (ja) 1987-09-10
EP0245434A1 (de) 1987-11-19
KR880700323A (ko) 1988-02-22
EP0245434B1 (de) 1990-07-04
PH23138A (en) 1989-05-11
CA1269824A (en) 1990-06-05
CN1003677B (zh) 1989-03-22

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Legal Events

Date Code Title Description
8380 Miscellaneous part iii

Free format text: DER PATENTINHABER LAUTET RICHTIG: ATOCHEM NORTH AMERICA, INC., PHILADELPHIA, PA., US

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee