DE3582807D1 - Negativ arbeitende fotoresistmasse. - Google Patents

Negativ arbeitende fotoresistmasse.

Info

Publication number
DE3582807D1
DE3582807D1 DE8585300267T DE3582807T DE3582807D1 DE 3582807 D1 DE3582807 D1 DE 3582807D1 DE 8585300267 T DE8585300267 T DE 8585300267T DE 3582807 T DE3582807 T DE 3582807T DE 3582807 D1 DE3582807 D1 DE 3582807D1
Authority
DE
Germany
Prior art keywords
sub
polyglutarimide
negative
resist
hydrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585300267T
Other languages
German (de)
English (en)
Inventor
Palaiyur Sundarap Kalyanaraman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Co
Original Assignee
Rohm and Haas Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Co filed Critical Rohm and Haas Co
Application granted granted Critical
Publication of DE3582807D1 publication Critical patent/DE3582807D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
DE8585300267T 1984-01-16 1985-01-15 Negativ arbeitende fotoresistmasse. Expired - Fee Related DE3582807D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/571,053 US4569897A (en) 1984-01-16 1984-01-16 Negative photoresist compositions with polyglutarimide polymer

Publications (1)

Publication Number Publication Date
DE3582807D1 true DE3582807D1 (de) 1991-06-20

Family

ID=24282141

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585300267T Expired - Fee Related DE3582807D1 (de) 1984-01-16 1985-01-15 Negativ arbeitende fotoresistmasse.

Country Status (14)

Country Link
US (1) US4569897A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0149553B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS60159744A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR870000678B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AT (1) ATE63647T1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AU (1) AU581199B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BR (1) BR8500146A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1272059A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3582807D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
HK (1) HK78291A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IL (1) IL74073A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
MY (1) MY103325A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
PH (1) PH21005A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
ZA (1) ZA85320B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4636532A (en) * 1985-10-11 1987-01-13 Shipley Company Inc. Method for preparing polyglutarimide having a lower molecular weight and a low polydispersity
US4980264A (en) * 1985-12-17 1990-12-25 International Business Machines Corporation Photoresist compositions of controlled dissolution rate in alkaline developers
US4720445A (en) * 1986-02-18 1988-01-19 Allied Corporation Copolymers from maleimide and aliphatic vinyl ethers and esters used in positive photoresist
US4968581A (en) * 1986-02-24 1990-11-06 Hoechst Celanese Corporation High resolution photoresist of imide containing polymers
US4912018A (en) * 1986-02-24 1990-03-27 Hoechst Celanese Corporation High resolution photoresist based on imide containing polymers
US4837124A (en) * 1986-02-24 1989-06-06 Hoechst Celanese Corporation High resolution photoresist of imide containing polymers
JPS6344648A (ja) * 1986-08-12 1988-02-25 Matsushita Electric Ind Co Ltd パタ−ン形成用コントラストエンハンスト材料
US5081001A (en) * 1987-05-22 1992-01-14 Hoechst Celanese Corporation Blocked monomer and polymers therefrom for use as photoresists
US4962171A (en) * 1987-05-22 1990-10-09 Hoechst Celanese Corporation Blocked monomer and polymers therefrom for use as photoresists
US4810613A (en) * 1987-05-22 1989-03-07 Hoechst Celanese Corporation Blocked monomer and polymers therefrom for use as photoresists
US4814258A (en) * 1987-07-24 1989-03-21 Motorola Inc. PMGI bi-layer lift-off process
KR100211546B1 (ko) * 1996-10-24 1999-08-02 김영환 신규한 포토레지스트용 공중합체
US6495311B1 (en) 2000-03-17 2002-12-17 International Business Machines Corporation Bilayer liftoff process for high moment laminate
US6395449B1 (en) * 2000-03-31 2002-05-28 Microchem Corp. Poly-hydroxy aromatic dissolution modifiers for lift-off resists
WO2010132284A1 (en) * 2009-05-13 2010-11-18 The Trustees Of The University Of Pennsylvania Photolithographically defined contacts to carbon nanostructures
US20140206185A1 (en) * 2011-12-21 2014-07-24 Ming Lei Ball placement in a photo-patterned template for fine pitch interconnect

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB763288A (en) * 1954-06-16 1956-12-12 Kodak Ltd Improvements in photo mechanical processes and materials therefor
US2852379A (en) * 1955-05-04 1958-09-16 Eastman Kodak Co Azide resin photolithographic composition
US3702766A (en) * 1971-01-29 1972-11-14 Eastman Kodak Co Photoresist compositions containing n-halo cyclic imides
GB1375461A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1972-05-05 1974-11-27
US4079041A (en) * 1975-06-18 1978-03-14 Ciba-Geigy Corporation Crosslinkable polymeric compounds
US3964908A (en) * 1975-09-22 1976-06-22 International Business Machines Corporation Positive resists containing dimethylglutarimide units
JPS52153672A (en) * 1976-06-16 1977-12-20 Matsushita Electric Ind Co Ltd Electron beam resist and its usage
US4197133A (en) * 1977-10-14 1980-04-08 Ciba-Geigy Corporation Photo-curable compositions of matter containing bis-azidophthalimidyl derivatives
US4246374A (en) * 1979-04-23 1981-01-20 Rohm And Haas Company Imidized acrylic polymers
DE2919840A1 (de) * 1979-05-16 1980-11-20 Siemens Ag Verfahren zur phototechnischen herstellung von reliefstrukturen
US4524121A (en) * 1983-11-21 1985-06-18 Rohm And Haas Company Positive photoresists containing preformed polyglutarimide polymer

Also Published As

Publication number Publication date
HK78291A (en) 1991-10-11
EP0149553A3 (en) 1987-07-01
JPH0523429B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1993-04-02
CA1272059A (en) 1990-07-31
BR8500146A (pt) 1985-08-20
JPS60159744A (ja) 1985-08-21
KR870000678B1 (ko) 1987-04-06
IL74073A (en) 1988-07-31
IL74073A0 (en) 1985-04-30
PH21005A (en) 1987-06-23
EP0149553B1 (en) 1991-05-15
AU3767085A (en) 1985-07-25
EP0149553A2 (en) 1985-07-24
ZA85320B (en) 1986-02-26
KR850005630A (ko) 1985-08-28
ATE63647T1 (de) 1991-06-15
AU581199B2 (en) 1989-02-16
US4569897A (en) 1986-02-11
MY103325A (en) 1993-05-29

Similar Documents

Publication Publication Date Title
DE3582807D1 (de) Negativ arbeitende fotoresistmasse.
ATE2581T1 (de) Lichtempfindliches gemisch.
ES455588A1 (es) Un metodo de preparar un material fotosensible que incluye un compuesto de cumarina 3-sustituida.
KR100258834B1 (en) High resolution i-line photoresist
JPS5532070A (en) Photosensitive resin composition
ATE17406T1 (de) Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial.
KR890004201A (ko) 포지티브 방사선-감수성 혼합물
ATE167741T1 (de) Sensibilisatoren für photothermographische elemente
JP2001249458A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
US20030198889A1 (en) Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions
JPH10274845A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR900003678A (ko) 감광제 및 그 감광제를 사용한 감광성 수지조성물 및 그의 감광성 수지조성물을 사용한 패턴형성방법
AU542387B2 (en) Naphthoquinone diazide sulfonic ester
KR940014323A (ko) N, n-이치환 설폰아미드 펜던트 그룹을 갖는 중합체 및 이의 용도
ATE17793T1 (de) Lichtempfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial.
KR940009754A (ko) 화학적으로 강화된 네가티브 포토레지스트
KR920005847A (ko) 수중 오염방지 조성물
BR8203685A (pt) Mistura fotossensivel a material copiador fotossensivel produzido a partir da mesma
JPH10282669A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP2000338680A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH11305443A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR950012153A (ko) 포지티브형 단편 조성물 및 패턴형성방법
JP2001249460A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR930021630A (ko) 페닐아세테이트 및 그의 용도
KR910015886A (ko) 감광성내식막 조성물 및 포지티브상 형성방법

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee