ATE63647T1 - Negativ arbeitende fotoresistmasse. - Google Patents

Negativ arbeitende fotoresistmasse.

Info

Publication number
ATE63647T1
ATE63647T1 AT85300267T AT85300267T ATE63647T1 AT E63647 T1 ATE63647 T1 AT E63647T1 AT 85300267 T AT85300267 T AT 85300267T AT 85300267 T AT85300267 T AT 85300267T AT E63647 T1 ATE63647 T1 AT E63647T1
Authority
AT
Austria
Prior art keywords
sub
polyglutarimide
negative
hydrogen
resist
Prior art date
Application number
AT85300267T
Other languages
English (en)
Inventor
Palaiyur Sundarap Kalyanaraman
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm & Haas filed Critical Rohm & Haas
Application granted granted Critical
Publication of ATE63647T1 publication Critical patent/ATE63647T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AT85300267T 1984-01-16 1985-01-15 Negativ arbeitende fotoresistmasse. ATE63647T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/571,053 US4569897A (en) 1984-01-16 1984-01-16 Negative photoresist compositions with polyglutarimide polymer
EP85300267A EP0149553B1 (de) 1984-01-16 1985-01-15 Negativ arbeitende Fotoresistmasse

Publications (1)

Publication Number Publication Date
ATE63647T1 true ATE63647T1 (de) 1991-06-15

Family

ID=24282141

Family Applications (1)

Application Number Title Priority Date Filing Date
AT85300267T ATE63647T1 (de) 1984-01-16 1985-01-15 Negativ arbeitende fotoresistmasse.

Country Status (14)

Country Link
US (1) US4569897A (de)
EP (1) EP0149553B1 (de)
JP (1) JPS60159744A (de)
KR (1) KR870000678B1 (de)
AT (1) ATE63647T1 (de)
AU (1) AU581199B2 (de)
BR (1) BR8500146A (de)
CA (1) CA1272059A (de)
DE (1) DE3582807D1 (de)
HK (1) HK78291A (de)
IL (1) IL74073A (de)
MY (1) MY103325A (de)
PH (1) PH21005A (de)
ZA (1) ZA85320B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4636532A (en) * 1985-10-11 1987-01-13 Shipley Company Inc. Method for preparing polyglutarimide having a lower molecular weight and a low polydispersity
US4980264A (en) * 1985-12-17 1990-12-25 International Business Machines Corporation Photoresist compositions of controlled dissolution rate in alkaline developers
US4720445A (en) * 1986-02-18 1988-01-19 Allied Corporation Copolymers from maleimide and aliphatic vinyl ethers and esters used in positive photoresist
US4837124A (en) * 1986-02-24 1989-06-06 Hoechst Celanese Corporation High resolution photoresist of imide containing polymers
US4968581A (en) * 1986-02-24 1990-11-06 Hoechst Celanese Corporation High resolution photoresist of imide containing polymers
US4912018A (en) * 1986-02-24 1990-03-27 Hoechst Celanese Corporation High resolution photoresist based on imide containing polymers
JPS6344648A (ja) * 1986-08-12 1988-02-25 Matsushita Electric Ind Co Ltd パタ−ン形成用コントラストエンハンスト材料
US5081001A (en) * 1987-05-22 1992-01-14 Hoechst Celanese Corporation Blocked monomer and polymers therefrom for use as photoresists
US4810613A (en) * 1987-05-22 1989-03-07 Hoechst Celanese Corporation Blocked monomer and polymers therefrom for use as photoresists
US4962171A (en) * 1987-05-22 1990-10-09 Hoechst Celanese Corporation Blocked monomer and polymers therefrom for use as photoresists
US4814258A (en) * 1987-07-24 1989-03-21 Motorola Inc. PMGI bi-layer lift-off process
KR100211546B1 (ko) * 1996-10-24 1999-08-02 김영환 신규한 포토레지스트용 공중합체
US6495311B1 (en) 2000-03-17 2002-12-17 International Business Machines Corporation Bilayer liftoff process for high moment laminate
US6395449B1 (en) * 2000-03-31 2002-05-28 Microchem Corp. Poly-hydroxy aromatic dissolution modifiers for lift-off resists
WO2010132284A1 (en) * 2009-05-13 2010-11-18 The Trustees Of The University Of Pennsylvania Photolithographically defined contacts to carbon nanostructures
WO2013095468A1 (en) * 2011-12-21 2013-06-27 Intel Corporation Ball placement in a photo-patterned template for fine pitch interconnect

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB763288A (en) * 1954-06-16 1956-12-12 Kodak Ltd Improvements in photo mechanical processes and materials therefor
US2852379A (en) * 1955-05-04 1958-09-16 Eastman Kodak Co Azide resin photolithographic composition
US3702766A (en) * 1971-01-29 1972-11-14 Eastman Kodak Co Photoresist compositions containing n-halo cyclic imides
GB1375461A (de) * 1972-05-05 1974-11-27
US4079041A (en) * 1975-06-18 1978-03-14 Ciba-Geigy Corporation Crosslinkable polymeric compounds
US3964908A (en) * 1975-09-22 1976-06-22 International Business Machines Corporation Positive resists containing dimethylglutarimide units
JPS52153672A (en) * 1976-06-16 1977-12-20 Matsushita Electric Ind Co Ltd Electron beam resist and its usage
US4197133A (en) * 1977-10-14 1980-04-08 Ciba-Geigy Corporation Photo-curable compositions of matter containing bis-azidophthalimidyl derivatives
US4246374A (en) * 1979-04-23 1981-01-20 Rohm And Haas Company Imidized acrylic polymers
DE2919840A1 (de) * 1979-05-16 1980-11-20 Siemens Ag Verfahren zur phototechnischen herstellung von reliefstrukturen
US4524121A (en) * 1983-11-21 1985-06-18 Rohm And Haas Company Positive photoresists containing preformed polyglutarimide polymer

Also Published As

Publication number Publication date
ZA85320B (en) 1986-02-26
IL74073A0 (en) 1985-04-30
HK78291A (en) 1991-10-11
CA1272059A (en) 1990-07-31
AU581199B2 (en) 1989-02-16
KR850005630A (ko) 1985-08-28
AU3767085A (en) 1985-07-25
EP0149553B1 (de) 1991-05-15
MY103325A (en) 1993-05-29
BR8500146A (pt) 1985-08-20
US4569897A (en) 1986-02-11
DE3582807D1 (de) 1991-06-20
IL74073A (en) 1988-07-31
KR870000678B1 (ko) 1987-04-06
EP0149553A2 (de) 1985-07-24
JPH0523429B2 (de) 1993-04-02
EP0149553A3 (en) 1987-07-01
PH21005A (en) 1987-06-23
JPS60159744A (ja) 1985-08-21

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee