BR8500146A - Sistema fotorresistente negativo,superficie e processo para formacao de imagem na mesma - Google Patents
Sistema fotorresistente negativo,superficie e processo para formacao de imagem na mesmaInfo
- Publication number
- BR8500146A BR8500146A BR8500146A BR8500146A BR8500146A BR 8500146 A BR8500146 A BR 8500146A BR 8500146 A BR8500146 A BR 8500146A BR 8500146 A BR8500146 A BR 8500146A BR 8500146 A BR8500146 A BR 8500146A
- Authority
- BR
- Brazil
- Prior art keywords
- sub
- polyglutarimide
- negative
- hydrogen
- formation
- Prior art date
Links
- 230000015572 biosynthetic process Effects 0.000 title 1
- -1 alkaryl hydrocarbons Chemical class 0.000 abstract 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 3
- 229920002120 photoresistant polymer Polymers 0.000 abstract 2
- 239000003504 photosensitizing agent Substances 0.000 abstract 2
- 125000003710 aryl alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229930195733 hydrocarbon Natural products 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- KNCYXPMJDCCGSJ-UHFFFAOYSA-N piperidine-2,6-dione Chemical group O=C1CCCC(=O)N1 KNCYXPMJDCCGSJ-UHFFFAOYSA-N 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 125000000547 substituted alkyl group Chemical group 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/0085—Azides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/128—Radiation-activated cross-linking agent containing
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Materials For Photolithography (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Developing Agents For Electrophotography (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/571,053 US4569897A (en) | 1984-01-16 | 1984-01-16 | Negative photoresist compositions with polyglutarimide polymer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR8500146A true BR8500146A (pt) | 1985-08-20 |
Family
ID=24282141
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR8500146A BR8500146A (pt) | 1984-01-16 | 1985-01-14 | Sistema fotorresistente negativo,superficie e processo para formacao de imagem na mesma |
Country Status (14)
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4636532A (en) * | 1985-10-11 | 1987-01-13 | Shipley Company Inc. | Method for preparing polyglutarimide having a lower molecular weight and a low polydispersity |
| US4980264A (en) * | 1985-12-17 | 1990-12-25 | International Business Machines Corporation | Photoresist compositions of controlled dissolution rate in alkaline developers |
| US4720445A (en) * | 1986-02-18 | 1988-01-19 | Allied Corporation | Copolymers from maleimide and aliphatic vinyl ethers and esters used in positive photoresist |
| US4968581A (en) * | 1986-02-24 | 1990-11-06 | Hoechst Celanese Corporation | High resolution photoresist of imide containing polymers |
| US4912018A (en) * | 1986-02-24 | 1990-03-27 | Hoechst Celanese Corporation | High resolution photoresist based on imide containing polymers |
| US4837124A (en) * | 1986-02-24 | 1989-06-06 | Hoechst Celanese Corporation | High resolution photoresist of imide containing polymers |
| JPS6344648A (ja) * | 1986-08-12 | 1988-02-25 | Matsushita Electric Ind Co Ltd | パタ−ン形成用コントラストエンハンスト材料 |
| US5081001A (en) * | 1987-05-22 | 1992-01-14 | Hoechst Celanese Corporation | Blocked monomer and polymers therefrom for use as photoresists |
| US4962171A (en) * | 1987-05-22 | 1990-10-09 | Hoechst Celanese Corporation | Blocked monomer and polymers therefrom for use as photoresists |
| US4810613A (en) * | 1987-05-22 | 1989-03-07 | Hoechst Celanese Corporation | Blocked monomer and polymers therefrom for use as photoresists |
| US4814258A (en) * | 1987-07-24 | 1989-03-21 | Motorola Inc. | PMGI bi-layer lift-off process |
| KR100211546B1 (ko) * | 1996-10-24 | 1999-08-02 | 김영환 | 신규한 포토레지스트용 공중합체 |
| US6495311B1 (en) | 2000-03-17 | 2002-12-17 | International Business Machines Corporation | Bilayer liftoff process for high moment laminate |
| US6395449B1 (en) * | 2000-03-31 | 2002-05-28 | Microchem Corp. | Poly-hydroxy aromatic dissolution modifiers for lift-off resists |
| WO2010132284A1 (en) * | 2009-05-13 | 2010-11-18 | The Trustees Of The University Of Pennsylvania | Photolithographically defined contacts to carbon nanostructures |
| US20140206185A1 (en) * | 2011-12-21 | 2014-07-24 | Ming Lei | Ball placement in a photo-patterned template for fine pitch interconnect |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB763288A (en) * | 1954-06-16 | 1956-12-12 | Kodak Ltd | Improvements in photo mechanical processes and materials therefor |
| US2852379A (en) * | 1955-05-04 | 1958-09-16 | Eastman Kodak Co | Azide resin photolithographic composition |
| US3702766A (en) * | 1971-01-29 | 1972-11-14 | Eastman Kodak Co | Photoresist compositions containing n-halo cyclic imides |
| GB1375461A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1972-05-05 | 1974-11-27 | ||
| US4079041A (en) * | 1975-06-18 | 1978-03-14 | Ciba-Geigy Corporation | Crosslinkable polymeric compounds |
| US3964908A (en) * | 1975-09-22 | 1976-06-22 | International Business Machines Corporation | Positive resists containing dimethylglutarimide units |
| JPS52153672A (en) * | 1976-06-16 | 1977-12-20 | Matsushita Electric Ind Co Ltd | Electron beam resist and its usage |
| US4197133A (en) * | 1977-10-14 | 1980-04-08 | Ciba-Geigy Corporation | Photo-curable compositions of matter containing bis-azidophthalimidyl derivatives |
| US4246374A (en) * | 1979-04-23 | 1981-01-20 | Rohm And Haas Company | Imidized acrylic polymers |
| DE2919840A1 (de) * | 1979-05-16 | 1980-11-20 | Siemens Ag | Verfahren zur phototechnischen herstellung von reliefstrukturen |
| US4524121A (en) * | 1983-11-21 | 1985-06-18 | Rohm And Haas Company | Positive photoresists containing preformed polyglutarimide polymer |
-
1984
- 1984-01-16 US US06/571,053 patent/US4569897A/en not_active Expired - Fee Related
-
1985
- 1985-01-02 CA CA000471302A patent/CA1272059A/en not_active Expired - Fee Related
- 1985-01-14 JP JP60003394A patent/JPS60159744A/ja active Granted
- 1985-01-14 KR KR1019850000193A patent/KR870000678B1/ko not_active Expired
- 1985-01-14 BR BR8500146A patent/BR8500146A/pt not_active IP Right Cessation
- 1985-01-15 AU AU37670/85A patent/AU581199B2/en not_active Ceased
- 1985-01-15 PH PH31721A patent/PH21005A/en unknown
- 1985-01-15 AT AT85300267T patent/ATE63647T1/de not_active IP Right Cessation
- 1985-01-15 ZA ZA85320A patent/ZA85320B/xx unknown
- 1985-01-15 EP EP85300267A patent/EP0149553B1/en not_active Expired - Lifetime
- 1985-01-15 DE DE8585300267T patent/DE3582807D1/de not_active Expired - Fee Related
- 1985-01-16 IL IL74073A patent/IL74073A/xx not_active IP Right Cessation
-
1988
- 1988-07-28 MY MYPI88000851A patent/MY103325A/en unknown
-
1991
- 1991-10-03 HK HK782/91A patent/HK78291A/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| HK78291A (en) | 1991-10-11 |
| EP0149553A3 (en) | 1987-07-01 |
| JPH0523429B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-04-02 |
| CA1272059A (en) | 1990-07-31 |
| JPS60159744A (ja) | 1985-08-21 |
| KR870000678B1 (ko) | 1987-04-06 |
| IL74073A (en) | 1988-07-31 |
| IL74073A0 (en) | 1985-04-30 |
| PH21005A (en) | 1987-06-23 |
| EP0149553B1 (en) | 1991-05-15 |
| AU3767085A (en) | 1985-07-25 |
| EP0149553A2 (en) | 1985-07-24 |
| ZA85320B (en) | 1986-02-26 |
| KR850005630A (ko) | 1985-08-28 |
| DE3582807D1 (de) | 1991-06-20 |
| ATE63647T1 (de) | 1991-06-15 |
| AU581199B2 (en) | 1989-02-16 |
| US4569897A (en) | 1986-02-11 |
| MY103325A (en) | 1993-05-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B21A | Patent or certificate of addition expired [chapter 21.1 patent gazette] |
Free format text: PATENTE EXTINTA EM 14/01/2000 |